KR101704587B1 - How to implement a complex pattern and complex pattern implemented sheet - Google Patents

How to implement a complex pattern and complex pattern implemented sheet Download PDF

Info

Publication number
KR101704587B1
KR101704587B1 KR1020160027804A KR20160027804A KR101704587B1 KR 101704587 B1 KR101704587 B1 KR 101704587B1 KR 1020160027804 A KR1020160027804 A KR 1020160027804A KR 20160027804 A KR20160027804 A KR 20160027804A KR 101704587 B1 KR101704587 B1 KR 101704587B1
Authority
KR
South Korea
Prior art keywords
pattern
curable resin
mold
resin layer
ultraviolet
Prior art date
Application number
KR1020160027804A
Other languages
Korean (ko)
Inventor
이승재
Original Assignee
주식회사 에이디피
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 에이디피 filed Critical 주식회사 에이디피
Priority to KR1020160027804A priority Critical patent/KR101704587B1/en
Application granted granted Critical
Publication of KR101704587B1 publication Critical patent/KR101704587B1/en

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/76—Patterning of masks by imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2045—Exposure; Apparatus therefor using originals with apertures, e.g. stencil exposure masks
    • G03F7/2047—Exposure with radiation other than visible light or UV light, e.g. shadow printing, proximity printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70458—Mix-and-match, i.e. multiple exposures of the same area using a similar type of exposure apparatus, e.g. multiple exposures using a UV apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

The present invention relates to a method of forming a complex pattern, and a sheet comprising the complex pattern, and more specifically, to a method of forming a complex pattern which can form a pattern made of various patterns on a sheet at a high resolution; and to a sheet comprising the complex pattern. The method comprises: a base mold preparation step for preparing a base mold having a first pattern formed thereon; a photomask preparation step for preparing a first photomask having a second pattern formed thereon and a second photomask having a third pattern formed thereon; a second pattern transfer step for applying a UV-curable resin on top of the base mold, and contacting the first photomask thereto to transfer the second pattern; and a third pattern transfer step for separating the first photomask from the base mold having the second pattern transferred thereto, wherein the base mold preparation step comprises: a first UV-curable resin layer formation step for applying a UV-curable resin between a first mold having a first mold pattern formed thereon and a substrate film to form a first UV-curable resin layer; a first UV-curable resin layer surface-curing step for compressing the first UV-curable resin layer, and irradiating the same with UV rays to cure the surface of the first UV-curable resin layer; and a first pattern formation step for separating the surface-cured first UV-curable resin layer from the first mold while the first UV-curable resin layer is attached to the substrate film, and forming a first pattern corresponding to the first mold pattern on the first UV-curable resin layer.

Description

[0001] The present invention relates to a method for implementing a complex pattern and a sheet on which the complex pattern is implemented,

The present invention relates to a method of producing a composite pattern and a sheet on which the composite pattern is embodied. More particularly, the present invention relates to a method of producing a composite pattern capable of forming a pattern of various patterns on a sheet at high resolution, Quot;

Generally, the case of an electronic product such as a cellular phone is injection-molded into a synthetic resin material to produce an injection molded article. In order to protect or enhance the surface of the molded case, various coating methods are applied.

In addition to research on technical fields for miniaturization, slimming, and high integration of electronic products, active research has been conducted recently on design aspects to satisfy not only diverse needs of consumers but also emotions.

For example, a keypad of a portable terminal or a window that surrounds the periphery of an LCD liquid crystal is made of a metal material having excellent durability. In order to impart a decorative beauty to the surface of a keypad or a window of such a metal material, , And a decorative effect layer such as a pearl effect.

However, conventionally, when a decorative effect layer is formed on the surface of a keypad or a window of a metal material, a new layer must be formed in addition to the basic structure of a transfer film including a printing layer or the like, thereby increasing the thickness of the transfer film. There is a problem that the moldability is lowered.

Furthermore, since the new decorative effect layer can be added not only in a planar shape but also in a relatively simple pattern, it is difficult to realize a composite pattern such as a variety of patterns in a stereoscopic and high-quality manner.

In addition, in a method of forming a composite pattern and a sheet (registration number: 10-1417797) having the composite pattern, a second imprint resin layer is formed on the base film on which the first pattern is formed, The auxiliary masters are positioned on the upper side of the layer, the photomask is positioned on the upper side of the auxiliary master, and then the imprinting process and the exposure patterning process are simultaneously performed to form the first pattern, the second pattern and the third pattern on the upper side of the base film in a complex manner However, as the auxiliary masters and the photomask are located together and their thicknesses are increased, there is a limitation in that there is a large error in the resolution due to frequent exposure of the miscellaneous light.

Registered Patent Registration No. 10-1417797, July 31, 2014.

It is an object of the present invention to provide a method of forming a composite pattern capable of forming a pattern of various patterns on a sheet and a sheet in which the composite pattern is implemented.

delete

According to an aspect of the present invention, there is provided a method of manufacturing a semiconductor device, comprising: preparing a base mold having a first pattern formed thereon; A photomask preparation step of preparing a first photomask having a second pattern and a second photomask having a third pattern formed thereon; A second pattern transferring step of transferring the second pattern by contacting the first photomask after applying an ultraviolet curable resin to the upper portion of the base mold; And separating the first photomask from the base mold to which the second pattern is transferred, applying an ultraviolet curable resin to an upper portion of the base mold, and transferring the third pattern by contacting the second photomask And a third pattern transfer step, wherein the base mold preparation step comprises: a first mold pattern forming step of forming a first UV curable resin layer by applying an ultraviolet curing resin between a first mold having the first mold pattern formed thereon and the base film; An ultraviolet curable resin layer forming step; Curing the surface of the first ultraviolet-curable resin layer by pressing the first ultraviolet-curable resin layer and irradiating ultraviolet rays to the surface of the first ultraviolet-curable resin layer; And separating the first UV cured resin layer having the surface hardened from the first mold in a state of being coupled with the base film, wherein a first pattern corresponding to the first mold pattern is formed in the first UV curable resin layer And a second pattern forming step of patterning the composite pattern.

Preferably, the first photomask of the photomask preparation step includes: a first substrate preparation step of preparing a first substrate on which a first print layer is formed; Forming a second ultraviolet curable resin layer by applying a UV curable resin between a second mold having a second mold pattern and a first print layer formed on the first substrate; A second ultraviolet curing resin layer surface curing step of curing the surface of the second ultraviolet curable resin layer by irradiating ultraviolet rays after pressing the second ultraviolet curable resin layer; And a second pattern corresponding to the second mold pattern is formed on the second ultraviolet curable resin layer, the second pattern corresponding to the second mold pattern is separated from the second mold, And a second pattern forming step of forming a second pattern.

Preferably, the second photomask in the photomask preparation step may include: a second substrate preparation step of preparing a second substrate on which a second printed layer is formed; Forming a third ultraviolet cured resin layer by applying a UV curable resin between a third mold having a third mold pattern formed thereon and a second printed layer formed on the second substrate; Curing the surface of the third ultraviolet-curable resin layer by irradiating ultraviolet rays after pressing the third ultraviolet-curable resin layer, and curing the surface of the third ultraviolet-curable resin layer; And a third pattern corresponding to the third mold pattern is formed on the third ultraviolet curing resin layer, the third pattern corresponding to the third mold pattern is separated from the third mold in a state where the third ultraviolet- And a third pattern forming step of forming a second pattern.

Preferably, in the second pattern transferring step and the third pattern transferring step, ultraviolet light is irradiated toward the upper surface of the base mold to expose selectively.

The present invention is also directed to a composite pattern embodied in a method of embodying a composite pattern according to the present invention.

The method of implementing a composite pattern according to the present invention and the sheet on which the composite pattern is implemented by the solution of the above-described problems can effectively implement various types of composite patterns on a single sheet at high resolution.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a flow chart for manufacturing a base mold according to a preferred embodiment of the present invention; FIG.
2 is a flow chart of a first photomask fabrication process according to a preferred embodiment of the present invention.
3 is a flowchart illustrating a manufacturing process of a second photomask according to a preferred embodiment of the present invention.
4 is a state diagram of a photomask according to a preferred embodiment of the present invention.
5 is an implementation flowchart of a composite pattern according to a preferred embodiment of the present invention.
Figure 6 is a finished sheet according to a preferred embodiment of the present invention.

Hereinafter, a method of implementing a composite pattern including a base mold preparing step, a photomask preparing step, a second pattern transferring step, and a third pattern transferring step according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. Respectively.

First, the base mold preparing step is a step of preparing the base mold 100 in which the first pattern 122 is formed.

FIG. 1 is a flowchart illustrating a manufacturing process of a base mold 100 according to a preferred embodiment of the present invention. As shown in FIG. 1, a first mold pattern 112 is formed on an upper part of a mold, a fabric, and a film material through etching, sanding, or machining to form a composite pattern having various shapes. The first mold 110 is prepared.

For example, the pattern of the hair line can be formed using sandpaper. In the case of forming the pattern of the hair line by using the sandpaper, the occurrence frequency of the article is small and the cleaning is easy even if the article occurs.

The ultraviolet curing resin is applied between the first mold 110 and the base film 130 so as to form the first ultraviolet curing resin layer 120. The first ultraviolet curing resin layer 120 is then passed between the pair of press rollers, The surface of the first ultraviolet curing resin layer 120 is cured by irradiating ultraviolet rays after the resin layer 120 is pressed so that the first ultraviolet curing resin layer 120, The base mold 100 having the first pattern 122 corresponding to the first mold pattern 112 is completed.

At this time, the base film 130 is preferably made of PET (Poly Ethylene Terephthalate) or PETG (Poly Ethylene Terephthalate Glycol). Since PET or PETG has a warm stretch rate superior to that of a general base film, moldability can be maximized by using the base film 130 made of PET or PETG.

1, in the base mold preparing step, the base mold 100 having the first pattern 122 with the oblique shape formed by using the first mold 110 having the first mold pattern 112 having a raised shape It is naturally also possible to change the design of the base mold in which the relief pattern is formed by using the first mold having the relief pattern.

Next, the photomask preparation step is a step of preparing a first photomask 200 having a second pattern 222 and a second photomask 300 having a third pattern 322 formed thereon.

2 is a flowchart illustrating a manufacturing process of a first photomask 200 according to a preferred embodiment of the present invention. Referring to FIG. 2, after a second mold 210 having a second mold pattern 212 of irregularities or the like is prepared, the second mold 210 and the first printed layer formed on the first substrate 230 The second ultraviolet curing resin layer 220 is formed and then the second ultraviolet curing resin layer 220 is compressed by passing through a pair of pressing rollers.

The surface of the second ultraviolet curable resin layer 220 is cured by irradiating ultraviolet rays to cure the surface of the second ultraviolet curable resin layer 220. The second ultraviolet cured resin layer 220, The first photomask 200 is completed.

3 is a flowchart illustrating a manufacturing process of a second photomask 300 according to a preferred embodiment of the present invention. 3, the second photomask 300 is the same as the first photomask 200, except that the second photomask 300 has a different shape than the second pattern 222 The third pattern 322 is formed.

That is, the second photomask 300 is prepared by preparing a second substrate 330 having a second printed layer formed thereon in the same manner as the first photomask 200 and forming a third mold 310 and a second printed layer formed on an upper portion of the second substrate 330 to form a third ultraviolet curable resin layer 320 and then a third ultraviolet curable resin layer 320 After pressing, the surface of the third ultraviolet curable resin layer 320 is cured by irradiating ultraviolet rays.

The third ultraviolet curing resin layer 320 is then separated from the third mold 310 in a state of being coupled to the second substrate 330. The third ultraviolet curing resin layer 320 is separated from the third mold pattern 320, A third pattern 322 corresponding to the second pattern 312 is formed.

In addition, it is preferable to form a release layer (not shown) on the surfaces of the second pattern 222 and the third pattern 322 to prevent unnecessary direct contact with the surface of the first pattern 122 of the base mold 100 Do. The second ultraviolet curing resin layer 220 and the third ultraviolet curing resin layer 320 formed with the second pattern 222 and the third pattern 322 are easily cured when fully cured .

At this time, the releasing layer may be formed by ejecting a releasing agent. As the releasing agent, a melamine-based releasing agent or a silicone-based releasing agent can be selectively used.

For reference, the melamine-based releasing agent or silicone-based releasing agent can be applied thinly in a liquid phase and is also suitable for use as a material for bonding the first ultraviolet-curable resin layer 120 to the base film 130.

4 is a state diagram of a photomask according to a preferred embodiment of the present invention. Referring to FIG. 4, there is shown a state of a photomask which is irradiated with ultraviolet rays and cured during a process according to a photomask preparation step. FIG. 4 shows that a variety of photomasks can be fabricated according to a desired design such as shape and size.

Referring to FIG. 4- (a), when the ultraviolet ray is irradiated, it can be seen that the second pattern is formed by curing only at the A portion. Similarly, referring to FIG. 4- (b), when the ultraviolet ray is irradiated, only the portion B is cured to form the third pattern.

However, in the step of preparing the photomask of the present invention, the order of production of the first photomask 200 and the second photomask 300 is not limited, and a photomask having another pattern is further prepared A composite pattern of more various shapes may be implemented on a single sheet.

Next, the second pattern transferring step is a step of transferring the second pattern 222 by contacting the first photomask 200 after applying the ultraviolet curable resin to the upper portion of the base mold 100.

That is, in the present invention, the second pattern transferring step and the third pattern transferring step are separately performed because conventionally, the auxiliary master and the photomask are placed on the upper side of the base film so that the first pattern, the second pattern, However, since the auxiliary masters and the photomasks on the upper side of the base film are thickly laminated together, they are easily exposed to the common light, resulting in a large resolution error as well as a low resolution.

In view of such drawbacks, in the present invention, the first photomask 200 and the second photomask 300 are separately used at different steps to increase the resolution. The following description with reference to FIG. 5 have.

5 is an implementation flowchart of a composite pattern according to a preferred embodiment of the present invention. Referring to FIG. 5, it can be seen that a composite pattern can be implemented on a single sheet using the base mold 100, the first photomask 200 and the second photomask 300 in the above-described steps.

That is, an ultraviolet curable resin is applied to an upper portion of the base mold 100 on which the first pattern 122 is formed, and then a first photomask 200 having a second pattern 222 formed thereon is contacted with the ultraviolet curable resin, And the second pattern 222 is transferred. (For reference, P 1 means a second pattern transferred onto a single sheet.)

Finally, in the third pattern transfer step, the first photomask 200 is separated from the base mold 100 to which the second pattern 222 is transferred, and then the ultraviolet curing resin is applied again to the upper portion of the base mold 100 And then transferring the third pattern 322 by contacting the second photomask 300.

5, an ultraviolet curable resin is applied to the upper portion of the base mold 100 onto which the second pattern 222 is transferred, and the second photomask 300 is contacted with the pair of the pressure- It can be seen that the third pattern 322 is transferred by irradiating the roller with an ultraviolet lamp after pressing the roller. (For reference, P 2 means the third pattern transferred onto a single sheet.)

It is preferable that the second pattern P 1 transferred on the single sheet and the transferred third pattern P 2 are formed at a height of 1 to 5 μm so that sufficient stereoscopic effect can be exhibited.

If the height of the transferred second pattern P 1 and the transferred third pattern P 2 is less than 1 μm, it is not meaningful to implement the composite pattern through the same process as the present invention, none.

On the contrary, if the height of the transferred second pattern P 1 and the transferred third pattern P 2 exceeds 5 탆, not only the thickness of the entire sheet is increased but also the moldability is lowered and it is difficult to realize a normal composite pattern .

Next, after the third pattern transfer step, it is preferable to further perform an etching and coating step for coating the surface of the etched base mold after etching to remove the remaining ultraviolet cured resin of the base mold 100.

More specifically, the residual ultraviolet-curing resin remaining on the base mold 100 is washed with alcohol and removed, and then fully cured with a mercury lamp under high-pressure conditions, thereby improving the productivity.

Figure 6 is a finished sheet according to a preferred embodiment of the present invention. Referring to FIG. 6, it can be seen that the second pattern P 1 transferred on the sheet on which the first pattern 122 is implemented and the transferred third pattern P 2 are implemented together according to the present invention.

However, the first pattern 122, the transferred second pattern P 1 , and the transferred third pattern P 2 in the present invention may include both positive and negative patterns, Implementation is possible.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention may be embodied otherwise without departing from the spirit and scope of the invention. Therefore, the embodiments disclosed in the present invention are not intended to limit the technical spirit of the present invention, but to illustrate them, and the scope of the technical idea of the present invention is not limited by these embodiments. The scope of protection of the present invention should be construed according to the claims, and all technical ideas within the scope of the claims should be construed as being included in the scope of the present invention.

100: base mold
110: first mold
112: first mold pattern
120: a first UV curable resin layer
122: 1st pattern
130: substrate film
200: First photo mask
210: second mold
212: second mold pattern
220: second UV curable resin layer
222: second pattern
230: first substrate
300: Second photomask
310: Third Mold
312: third mold pattern
320: a third ultraviolet curing resin layer
322: Third pattern
330: second substrate
P 1 : transferred second pattern
P 2 : Transferred third pattern

Claims (6)

delete A base mold preparing step of preparing a base mold having a first pattern formed thereon;
A photomask preparation step of preparing a first photomask having a second pattern and a second photomask having a third pattern formed thereon;
A second pattern transferring step of transferring the second pattern by contacting the first photomask after applying an ultraviolet curable resin to the upper portion of the base mold; And
The first photomask is separated from the base mold to which the second pattern is transferred, the ultraviolet curable resin is applied to the upper portion of the base mold, and then the second photomask is contacted to transfer the third pattern. 3 pattern transfer step,
The base mold preparing step may include:
Forming a first ultraviolet-curable resin layer by applying an ultraviolet-curable resin between the first mold having the first mold pattern and the base film;
Curing the surface of the first ultraviolet-curable resin layer by pressing the first ultraviolet-curable resin layer and irradiating ultraviolet rays to the surface of the first ultraviolet-curable resin layer; And
A first pattern corresponding to the first mold pattern is formed on the first ultraviolet-curable resin layer while the first ultraviolet-curable resin layer whose surface is cured from the first mold is separated from the base film in a state where the first ultraviolet- And a first pattern forming step of patterning the composite pattern. 3. The method of claim 2,
In the first photomask of the photomask preparation step,
A first substrate preparation step of preparing a first substrate on which a first print layer is formed;
Forming a second ultraviolet curable resin layer by applying a UV curable resin between a second mold having a second mold pattern and a first print layer formed on the first substrate;
A second ultraviolet curing resin layer surface curing step of curing the surface of the second ultraviolet curable resin layer by irradiating ultraviolet rays after pressing the second ultraviolet curable resin layer; And
And a second pattern corresponding to the second mold pattern is formed on the second ultraviolet curing resin layer while the second ultraviolet curable resin layer whose surface is cured is separated from the second mold in a state of being coupled with the first substrate, And a second pattern forming step of forming a second pattern on the substrate. 3. The method of claim 2,
Wherein the second photomask in the photomask preparation step comprises:
A second substrate preparation step of preparing a second substrate on which a second printed layer is formed;
Forming a third ultraviolet cured resin layer by applying a UV curable resin between a third mold having a third mold pattern formed thereon and a second printed layer formed on the second substrate;
Curing the surface of the third ultraviolet-curable resin layer by irradiating ultraviolet rays after pressing the third ultraviolet-curable resin layer, and curing the surface of the third ultraviolet-curable resin layer; And
A third pattern corresponding to the third mold pattern is formed on the third ultraviolet curing resin layer while the third ultraviolet curable resin layer having the surface hardened is separated from the third mold in a state of being coupled with the second substrate, And a second pattern forming step of patterning the second pattern. 3. The method of claim 2,
In the second pattern transferring step and the third pattern transferring step,
And irradiating ultraviolet rays toward the upper surface of the base mold to selectively expose the composite pattern. A composite pattern embodied in a composite pattern according to any one of claims 2 to 5.
KR1020160027804A 2016-03-08 2016-03-08 How to implement a complex pattern and complex pattern implemented sheet KR101704587B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020160027804A KR101704587B1 (en) 2016-03-08 2016-03-08 How to implement a complex pattern and complex pattern implemented sheet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020160027804A KR101704587B1 (en) 2016-03-08 2016-03-08 How to implement a complex pattern and complex pattern implemented sheet

Publications (1)

Publication Number Publication Date
KR101704587B1 true KR101704587B1 (en) 2017-02-08

Family

ID=58154838

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020160027804A KR101704587B1 (en) 2016-03-08 2016-03-08 How to implement a complex pattern and complex pattern implemented sheet

Country Status (1)

Country Link
KR (1) KR101704587B1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180135682A (en) * 2017-06-13 2018-12-21 주식회사 케이에이피에스 Film with 3d image pattern and method for manufacturing the same
KR20190050168A (en) * 2017-11-02 2019-05-10 주식회사 케이에이피에스 Film with micro pattern and method for manufacturing the same
KR20210029935A (en) * 2019-09-09 2021-03-17 안병학 Product Of Lenticular Transferring Printed Matter Heat-Adhered By Hot-Melt Resin
KR102400656B1 (en) * 2021-02-17 2022-05-23 (주)제이비필름디자인 Manufacturing method of multi-patterned film and multi-patterned film

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10148950A (en) * 1996-11-18 1998-06-02 Dainippon Printing Co Ltd Formation of patterns
KR20100056483A (en) * 2007-08-03 2010-05-27 캐논 가부시끼가이샤 Imprint method and processing method of substrate
KR20100130113A (en) * 2009-06-02 2010-12-10 엘지디스플레이 주식회사 Apparatus and method for forming pattern
KR101417797B1 (en) 2013-01-07 2014-07-14 주식회사 세코닉스 Manufacturing process for making the multi shaped pattern and multi shaped pattern sheet thereby

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10148950A (en) * 1996-11-18 1998-06-02 Dainippon Printing Co Ltd Formation of patterns
KR20100056483A (en) * 2007-08-03 2010-05-27 캐논 가부시끼가이샤 Imprint method and processing method of substrate
KR20100130113A (en) * 2009-06-02 2010-12-10 엘지디스플레이 주식회사 Apparatus and method for forming pattern
KR101417797B1 (en) 2013-01-07 2014-07-14 주식회사 세코닉스 Manufacturing process for making the multi shaped pattern and multi shaped pattern sheet thereby

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20180135682A (en) * 2017-06-13 2018-12-21 주식회사 케이에이피에스 Film with 3d image pattern and method for manufacturing the same
KR101942241B1 (en) * 2017-06-13 2019-01-25 주식회사 케이에이피에스 Film with 3d image pattern and method for manufacturing the same
KR20190050168A (en) * 2017-11-02 2019-05-10 주식회사 케이에이피에스 Film with micro pattern and method for manufacturing the same
KR102042757B1 (en) * 2017-11-02 2019-11-08 주식회사 케이에이피에스 Film with micro pattern and method for manufacturing the same
KR20210029935A (en) * 2019-09-09 2021-03-17 안병학 Product Of Lenticular Transferring Printed Matter Heat-Adhered By Hot-Melt Resin
KR102264589B1 (en) * 2019-09-09 2021-06-11 안병학 Product Of Lenticular Transferring Printed Matter Heat-Adhered By Hot-Melt Resin
KR102400656B1 (en) * 2021-02-17 2022-05-23 (주)제이비필름디자인 Manufacturing method of multi-patterned film and multi-patterned film

Similar Documents

Publication Publication Date Title
KR101704587B1 (en) How to implement a complex pattern and complex pattern implemented sheet
US20130052294A1 (en) Molding tool with a three dimensional surface relief pattern and method of making the same
KR101381252B1 (en) Imprint device, method of fabricating the same, method of patterning thin film using the same
KR102138960B1 (en) Film mask, preparing method thereof, pattern forming method using the same and pattern formed by using the same
US20170157836A1 (en) Mold for step-and-repeat imprinting, and method for producing same
CN106142528B (en) Method for stamping and imprinting apparatus
CN108437344A (en) A kind of plastic shell and its manufacturing method with nanometer texture
CN109739067A (en) A kind of metallic mold for nano-imprint and preparation method thereof and nano-imprinting method
KR20090119041A (en) Method of manufacturing imprint substrate and method of imprinting
US20170017160A1 (en) Curved shaped mask, curved device having color resists pattern and method for manufacturing the same
KR100995580B1 (en) method of manufacturing an multifunction optical filter as plasma display panel using roll stamper
KR101385976B1 (en) Manufacturing method of mold for forming nano-micro composite pattern
JP5349777B2 (en) Optical element manufacturing method
KR100927457B1 (en) Manufacturing Method of Mold and Manufacturing Method of Plastic Film Using Mold
KR101321882B1 (en) Hologram stamping card and preparing method for the same
KR101408737B1 (en) Mold in which Micro pattern and Nano hologram pattern are molded and Method for Manufacturing same
KR102400656B1 (en) Manufacturing method of multi-patterned film and multi-patterned film
KR20110018588A (en) A decoration member applied to the external surface of home appliances and manufacturing method thereof
US6350558B1 (en) Method of making decorative panels
TWM519808U (en) Device having color resists pattern
KR101373078B1 (en) Method for fabricating light guide plate having multi patern and light guide plate having multi patern by the same
KR102164142B1 (en) Photo mask structures for manufacturing multi-layered micro-pattern body and multi-layered micro-pattern body manufacturing method using the same
KR101479417B1 (en) The preparing method for card having ultra-violet pattern layer
KR101134982B1 (en) Apparatus for making film with uv layer
TWI344422B (en) Plastic component having a pattern and fabrication method thereof

Legal Events

Date Code Title Description
A201 Request for examination
GRNT Written decision to grant