KR100554086B1 - 탄소나노튜브 합성기의 능동형 가스공급 장치 - Google Patents

탄소나노튜브 합성기의 능동형 가스공급 장치 Download PDF

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Publication number
KR100554086B1
KR100554086B1 KR1020050065874A KR20050065874A KR100554086B1 KR 100554086 B1 KR100554086 B1 KR 100554086B1 KR 1020050065874 A KR1020050065874 A KR 1020050065874A KR 20050065874 A KR20050065874 A KR 20050065874A KR 100554086 B1 KR100554086 B1 KR 100554086B1
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KR
South Korea
Prior art keywords
gas
reaction
carbon
reaction chamber
carbon nanotubes
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KR1020050065874A
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English (en)
Korean (ko)
Inventor
정상문
함헌
Original Assignee
주식회사 비코
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Publication date
Application filed by 주식회사 비코 filed Critical 주식회사 비코
Priority to KR1020050065874A priority Critical patent/KR100554086B1/ko
Priority to JP2005308134A priority patent/JP2007022898A/ja
Application granted granted Critical
Publication of KR100554086B1 publication Critical patent/KR100554086B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/158—Carbon nanotubes
    • C01B32/16—Preparation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J7/00—Apparatus for generating gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0004—Apparatus specially adapted for the manufacture or treatment of nanostructural devices or systems or methods for manufacturing the same
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Carbon And Carbon Compounds (AREA)
KR1020050065874A 2005-07-20 2005-07-20 탄소나노튜브 합성기의 능동형 가스공급 장치 KR100554086B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020050065874A KR100554086B1 (ko) 2005-07-20 2005-07-20 탄소나노튜브 합성기의 능동형 가스공급 장치
JP2005308134A JP2007022898A (ja) 2005-07-20 2005-10-24 炭素ナノチューブ合成器の能動型ガス供給装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050065874A KR100554086B1 (ko) 2005-07-20 2005-07-20 탄소나노튜브 합성기의 능동형 가스공급 장치

Publications (1)

Publication Number Publication Date
KR100554086B1 true KR100554086B1 (ko) 2006-02-22

Family

ID=37178989

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050065874A KR100554086B1 (ko) 2005-07-20 2005-07-20 탄소나노튜브 합성기의 능동형 가스공급 장치

Country Status (2)

Country Link
JP (1) JP2007022898A (ja)
KR (1) KR100554086B1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100828117B1 (ko) 2006-12-26 2008-05-08 세메스 주식회사 탄소나노튜브의 합성 장치
KR100830531B1 (ko) 2006-12-27 2008-05-21 세메스 주식회사 탄소나노튜브의 합성 방법 및 장치
RU2497752C2 (ru) * 2011-11-29 2013-11-10 Инфра Текнолоджис Лтд. Способ получения длинных углеродных нанотрубок и устройство для осуществления этого способа

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100905256B1 (ko) 2007-08-07 2009-06-29 세메스 주식회사 탄소나노튜브 합성 장치
JP7312393B2 (ja) * 2018-06-29 2023-07-21 ジカンテクノ株式会社 炭素素材の製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5064527A (ja) * 1973-10-18 1975-05-31
JPH0511494Y2 (ja) * 1987-06-18 1993-03-22
JPH0314623A (ja) * 1988-11-07 1991-01-23 Asahi Chem Ind Co Ltd 炭素繊維の製造方法
JPH05290960A (ja) * 1992-04-08 1993-11-05 Mitsubishi Electric Corp 電気加熱装置
AU1603300A (en) * 1998-11-03 2000-05-22 William Marsh Rice University Gas-phase nucleation and growth of single-wall carbon nanotubes from high pressure co
EP1061041A1 (en) * 1999-06-18 2000-12-20 Iljin Nanotech Co., Ltd. Low-temperature thermal chemical vapor deposition apparatus and method of synthesizing carbon nanotube using the same
JP4627863B2 (ja) * 2000-10-13 2011-02-09 株式会社アルバック グラファイトナノファイバー薄膜形成用熱ｃｖｄ装置
JP2002201532A (ja) * 2000-12-27 2002-07-19 Seiji Motojima コイル状炭素繊維の製造方法及び製造装置
JP4665113B2 (ja) * 2003-06-18 2011-04-06 国立大学法人京都工芸繊維大学 微粒子製造方法および微粒子製造装置
JP4608863B2 (ja) * 2003-09-22 2011-01-12 富士ゼロックス株式会社 カーボンナノチューブの製造装置および製造方法、並びにそれに用いるガス分解器

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100828117B1 (ko) 2006-12-26 2008-05-08 세메스 주식회사 탄소나노튜브의 합성 장치
KR100830531B1 (ko) 2006-12-27 2008-05-21 세메스 주식회사 탄소나노튜브의 합성 방법 및 장치
RU2497752C2 (ru) * 2011-11-29 2013-11-10 Инфра Текнолоджис Лтд. Способ получения длинных углеродных нанотрубок и устройство для осуществления этого способа

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