KR100453365B1 - 액정표시장치용유리기판세정장치및이를이용한유리기판세정방법 - Google Patents
액정표시장치용유리기판세정장치및이를이용한유리기판세정방법 Download PDFInfo
- Publication number
- KR100453365B1 KR100453365B1 KR1019970065601A KR19970065601A KR100453365B1 KR 100453365 B1 KR100453365 B1 KR 100453365B1 KR 1019970065601 A KR1019970065601 A KR 1019970065601A KR 19970065601 A KR19970065601 A KR 19970065601A KR 100453365 B1 KR100453365 B1 KR 100453365B1
- Authority
- KR
- South Korea
- Prior art keywords
- glass substrate
- cleaning
- crystal display
- liquid crystal
- lamp
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
- H01L21/02052—Wet cleaning only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
Abstract
Description
Claims (3)
- 유리 기판상에 박막 트랜지스터를 형성하기 이전에 유리 기판 표면을 세정하는 장치 액정 표시 장치용 유리 기판 세정 장치에 있어서,상기 유리 기판 표면을 세정 용액에 의하여 세정하는 세정부와,상기 세정된 유리 기판을 헹구어내는 헹굼부와,상기 헹구어진 유리 기판을 건조시키는 건조부와,건조된 유리 기판 표면에 잔존하는 유리물에 UV선을 조사하여 산화막을 형성시키는 UV 조사부를 포함하며,상기 UV 조사부는 UV램프가 장착되어 있는 상부 커버와, 산화막을 형성하기 위해 유리 기판에 UV선을 조사하는 UV램프와, 상기 유리 기판을 수평으로 이동하기 위한 롤러를 구비하는 것을 특징으로 하는 액정 표시 장치용 유리 기판 세정 장치.
- 제 1 항에 있어서, 상기 UV 조사부는UV램프 파워는 100~200W/ea로, UV램프 세기는 2.5~6mW/cm2로, UV램프 파장은 172, 184 및 253nm 중 어느 하나를 선택하여 사용하며, UV램프는 1~3개월 사용하여 유리 기판에 UV선을 조사하는 것을 특징으로 하는 액정 표시 장치용 유리 기판 세정 장치.
- 제 1 항기재의 액정 표시 장치용 유리 기판 세정 장치를 이용한 액정 표시 장치용 유리 기판을 세정하는 방법으로서,유리 기판을 세정액으로 세정하는 단계;상기 세정된 유리 기판에 존재하는 세정액을 헹구어내는 단계;상기 헹구어진 유리 기판을 건조시키는 단계;상기 건조된 유리 기판에 UV선을 조사하여, 유리 기판 표면에 산화막을 형성하는 단계를 포함하는 것을 특징으로 하는 액정 표시 장치용 유리 기판 세정 방법.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970065601A KR100453365B1 (ko) | 1997-12-03 | 1997-12-03 | 액정표시장치용유리기판세정장치및이를이용한유리기판세정방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970065601A KR100453365B1 (ko) | 1997-12-03 | 1997-12-03 | 액정표시장치용유리기판세정장치및이를이용한유리기판세정방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19990047265A KR19990047265A (ko) | 1999-07-05 |
KR100453365B1 true KR100453365B1 (ko) | 2005-04-06 |
Family
ID=37301812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019970065601A KR100453365B1 (ko) | 1997-12-03 | 1997-12-03 | 액정표시장치용유리기판세정장치및이를이용한유리기판세정방법 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100453365B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104455545A (zh) * | 2014-11-28 | 2015-03-25 | 合肥鑫晟光电科技有限公司 | 自切换t型三通接头及卡夹清洗干燥装置 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR930003273Y1 (ko) * | 1988-03-10 | 1993-06-07 | 닛도우 고우기 가부시기가이샤 | 유체 배관용 연결관(joint) |
-
1997
- 1997-12-03 KR KR1019970065601A patent/KR100453365B1/ko not_active IP Right Cessation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR930003273Y1 (ko) * | 1988-03-10 | 1993-06-07 | 닛도우 고우기 가부시기가이샤 | 유체 배관용 연결관(joint) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104455545A (zh) * | 2014-11-28 | 2015-03-25 | 合肥鑫晟光电科技有限公司 | 自切换t型三通接头及卡夹清洗干燥装置 |
US9803757B2 (en) | 2014-11-28 | 2017-10-31 | Boe Technology Group Co., Ltd. | Auto-switching tee joint, device and method for washing and drying clamps |
Also Published As
Publication number | Publication date |
---|---|
KR19990047265A (ko) | 1999-07-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5372651A (en) | Method for cleaning a substrate | |
US6090723A (en) | Conditioning of dielectric materials | |
US6651680B1 (en) | Washing apparatus with UV exposure and first and second ultrasonic cleaning vessels | |
US6983756B2 (en) | Substrate treatment process and apparatus | |
US6391117B2 (en) | Method of washing substrate with UV radiation and ultrasonic cleaning | |
KR100453365B1 (ko) | 액정표시장치용유리기판세정장치및이를이용한유리기판세정방법 | |
US5803980A (en) | De-ionized water/ozone rinse post-hydrofluoric processing for the prevention of silicic acid residue | |
JP3535820B2 (ja) | 基板処理方法および基板処理装置 | |
JP3167625B2 (ja) | 基板のウェット洗浄方法 | |
TW469479B (en) | Method of wet etching and apparatus thereof | |
KR0140652B1 (ko) | 반도체 기판의 세정방법 | |
CN102496558B (zh) | 半导体晶圆的表面处理方法、避免光刻胶残留的方法 | |
JPH0719764B2 (ja) | 表面洗浄方法 | |
US7332440B2 (en) | Wet etching apparatus and method | |
JPH024269A (ja) | ホトレジストの除去方法 | |
JP2002018379A (ja) | 薄膜剥離方法、薄膜剥離装置及び電子デバイスの製造方法 | |
JPH09171989A (ja) | 半導体基板のウエットエッチング方法 | |
KR100389749B1 (ko) | 반도체 장치의 제조 방법 및 제조 장치 | |
KR0161851B1 (ko) | 산화막 형성방법 | |
JP3340701B2 (ja) | 枚葉式洗浄装置および枚葉式洗浄方法 | |
JPH0266551A (ja) | フォトレジスト塗布装置 | |
JPH04186351A (ja) | レチクルの洗浄方法 | |
KR20060076109A (ko) | 세정 장치 및 게이트 산화막의 전세정 방법 | |
KR920007190B1 (ko) | 세정공정시 건조방법 | |
JPS62160173A (ja) | ポリイミド系樹脂塗布方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
N231 | Notification of change of applicant | ||
A201 | Request for examination | ||
N231 | Notification of change of applicant | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20120906 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20130911 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20140919 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20150918 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20160920 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20170921 Year of fee payment: 14 |
|
EXPY | Expiration of term |