KR100377596B1 - 워크 배출 시스템 - Google Patents
워크 배출 시스템 Download PDFInfo
- Publication number
- KR100377596B1 KR100377596B1 KR10-2000-0043438A KR20000043438A KR100377596B1 KR 100377596 B1 KR100377596 B1 KR 100377596B1 KR 20000043438 A KR20000043438 A KR 20000043438A KR 100377596 B1 KR100377596 B1 KR 100377596B1
- Authority
- KR
- South Korea
- Prior art keywords
- work
- swinging
- arm
- solenoid
- turntable
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67706—Mechanical details, e.g. roller, belt
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Specific Conveyance Elements (AREA)
Abstract
Description
Claims (3)
- 외주(外周)에 워크 수납 홈이 설치된 턴 테이블과,턴 테이블 외주의 바깥쪽에 설치되고, 각각이 워크 배출구를 갖는 복수의 워크 배출 장치를 구비하고,각 워크 배출 장치는반경 방향의 바깥쪽의 요동단부와 반경 방향 안쪽의 자유단부를 갖는 요동 암과,요동 암의 요동단부와 자유단부 사이에 설치된 지지점과,요동 암의 자유단부에 설치된 워크 배출구를 개폐하는 셔터와,요동 암의 요동단부측에 설치되고 요동 암을 상기 지지점을 중심으로 요동시키는 솔레노이드를 갖는 것을 특징으로 하는 워크 배출 시스템.
- 제1항에 있어서,턴 테이블의 워크 수납 홈 아래쪽에 워크 수납 홈 내의 워크 배출구에 이송하기 위한 에어를 내뿜는 에어 분출구를 설치한 것을 특징으로 하는 워크 배출 시스템.
- 제1항에 있어서,솔레노이드는 요동 암의 요동단부에 설치되어 있는 것을 특징으로 하는 워크배출 시스템.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000-121103 | 2000-04-21 | ||
JP2000121103A JP3660201B2 (ja) | 2000-04-21 | 2000-04-21 | ワーク排出システム |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010098345A KR20010098345A (ko) | 2001-11-08 |
KR100377596B1 true KR100377596B1 (ko) | 2003-03-29 |
Family
ID=18631805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2000-0043438A KR100377596B1 (ko) | 2000-04-21 | 2000-07-27 | 워크 배출 시스템 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP3660201B2 (ko) |
KR (1) | KR100377596B1 (ko) |
TW (1) | TW510151B (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100721840B1 (ko) * | 2004-07-21 | 2007-05-28 | 가부시키가이샤 도쿄 웰드 | 진공 흡인 시스템 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5028589B2 (ja) * | 2006-10-10 | 2012-09-19 | 株式会社 東京ウエルズ | ワーク排出装置 |
-
2000
- 2000-04-21 JP JP2000121103A patent/JP3660201B2/ja not_active Expired - Lifetime
- 2000-07-27 KR KR10-2000-0043438A patent/KR100377596B1/ko active IP Right Grant
- 2000-08-04 TW TW089115738A patent/TW510151B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100721840B1 (ko) * | 2004-07-21 | 2007-05-28 | 가부시키가이샤 도쿄 웰드 | 진공 흡인 시스템 |
Also Published As
Publication number | Publication date |
---|---|
JP2001301958A (ja) | 2001-10-31 |
JP3660201B2 (ja) | 2005-06-15 |
KR20010098345A (ko) | 2001-11-08 |
TW510151B (en) | 2002-11-11 |
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