KR100330785B1 - Manufacturing method of high-durability engine parts using PVD coating processing - Google Patents
Manufacturing method of high-durability engine parts using PVD coating processing Download PDFInfo
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- KR100330785B1 KR100330785B1 KR1019990067676A KR19990067676A KR100330785B1 KR 100330785 B1 KR100330785 B1 KR 100330785B1 KR 1019990067676 A KR1019990067676 A KR 1019990067676A KR 19990067676 A KR19990067676 A KR 19990067676A KR 100330785 B1 KR100330785 B1 KR 100330785B1
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- 238000000576 coating method Methods 0.000 title claims abstract description 34
- 239000011248 coating agent Substances 0.000 title claims abstract description 11
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 10
- 238000000034 method Methods 0.000 claims abstract description 39
- 238000005530 etching Methods 0.000 claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims description 22
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- 239000007789 gas Substances 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 claims description 6
- 229910052786 argon Inorganic materials 0.000 claims description 4
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 3
- 239000000356 contaminant Substances 0.000 claims description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 2
- 239000000376 reactant Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 39
- 239000000463 material Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000011247 coating layer Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000009751 slip forming Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 101100137815 Arabidopsis thaliana PRP8A gene Proteins 0.000 description 1
- 241000220259 Raphanus Species 0.000 description 1
- 235000006140 Raphanus sativus var sativus Nutrition 0.000 description 1
- 101150085660 SUS2 gene Proteins 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000005028 tinplate Substances 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3435—Applying energy to the substrate during sputtering
- C23C14/345—Applying energy to the substrate during sputtering using substrate bias
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Physical Vapour Deposition (AREA)
Abstract
본 발명은 피.브이.디 코팅 공정을 이용한 고 내구성 엔진 부품 제조방법에 관한 것으로서, 더욱 상세하게는 종래의 에어컨의 컴프레셔의 피스톤에 장착된 슈에 관한 것으로 피.브이.디 코팅 공정을 이용하여 히팅, 에칭 및 코팅의 공정을 수행하여 Cr층, WC층 및 WC/C층을 형성하고 또한, 상기 WC/C층에는 C가 풍부한 층과 WC가 풍부한 층이 연속되게 형성됨으로써, 낮은 온도에서 코팅이 가능하여 열변형이 없을 뿐만 아니라 마찰계수를 낮추어주어 스워쉬 플레이트 및 피스톤과의 마모를 줄일 수 있는 피. 브이. 디 코팅 공정을 이용한 고 내구성 엔진 부품 제조방법에 관한 것이다.The present invention relates to a method for manufacturing high durability engine parts using a P.D coating process, and more particularly, to a shoe mounted on a piston of a compressor of a conventional air conditioner. The process of heating, etching and coating is performed to form a Cr layer, a WC layer and a WC / C layer. In addition, the WC / C layer is formed of a layer rich in C and a layer rich in WC, thereby coating at a low temperature. This eliminates heat deformation and lowers the coefficient of friction, reducing wear on the swash plate and piston. V. It relates to a high durability engine parts manufacturing method using a de-coating process.
Description
본 발명은 피.브이.디 코팅 공정을 이용한 고 내구성 엔진 부품 제조방법에 관한 것으로서, 더욱 상세하게는 종래의 에어컨의 컴프레셔의 피스톤에 장착된 슈에 관한 것으로 피.브이.디 코팅 공정을 이용하여 히팅, 에칭 및 코팅의 공정을 수행하여 Cr층, WC층 및 WC/C층을 형성하고 또한, 상기 WC/C층에는 C가 풍부한 층과 WC가 풍부한 층이 연속되게 형성됨으로써, 낮은 온도에서 코팅이 가능하여 열변형이 없을 뿐만 아니라 마찰계수를 낮추어주어 스워쉬 플레이트 및 피스톤과의 마모를 줄일 수 있는 피. 브이. 디 코팅 공정을 이용한 고 내구성 엔진 부품 제조방법에 관한 것이다.The present invention relates to a method for manufacturing high durability engine parts using a P.D coating process, and more particularly, to a shoe mounted on a piston of a compressor of a conventional air conditioner. The process of heating, etching and coating is performed to form a Cr layer, a WC layer and a WC / C layer. In addition, the WC / C layer is formed of a layer rich in C and a layer rich in WC, thereby coating at a low temperature. This eliminates heat deformation and lowers the coefficient of friction, reducing wear on the swash plate and piston. V. It relates to a high durability engine parts manufacturing method using a de-coating process.
일반적으로 에어컨의 컴프레셔는 도 2에 도시된 바와 같이, 샤프트(200)가 회전함에 따라 상기 샤프트(200)에 연결된 사판(Swash Plate)(300) 동일방향으로 회전하면서 피스톤(400)에 부착된 슈(Shoe)(500)을 밀어주어 상기 피스톤(400)이 직선방향으로 이동하면서 냉매를 압축시켜준다.In general, the compressor of the air conditioner is a shoe attached to the piston 400 while rotating in the same direction as the swash plate 300 connected to the shaft 200 as the shaft 200 rotates, as shown in FIG. 2. By pushing the shoe 500, the piston 400 moves in a linear direction to compress the refrigerant.
여기서, 미설명 부호 100은 컴프레셔 몸체를 나타낸다.Here, reference numeral 100 denotes a compressor body.
통상 컴프레셔의 슈(500)는 SUJ2(Cr-베어링 강) 재질이고 사판(300)과 피스톤(400)은 알루미늄 재질로 되어 있다.Typically, the shoe 500 of the compressor is made of SUJ2 (Cr-bearing steel) and the swash plate 300 and the piston 400 are made of aluminum.
그러나, 상기 슈(500)와 사판(300) 및 피스톤(400)의 경도차가 다르므로 마찰계수에 차이가 커 마모되기가 쉽고, 또한 마찰로 인해 윤활유의 역할이 미비하여 실제 무윤활 상태에서 마찰 및 마모가 발생되어 컴프레서의 작동을 중단시키는 문제가 있어, 이를 개선하는 고 내구성 부품의 개발이 요구되고 있다.However, since the hardness difference between the shoe 500, the swash plate 300, and the piston 400 is different, the friction coefficient is large, so that it is easy to be worn, and due to the friction, the role of the lubricating oil is insufficient. There is a problem that wear occurs to stop the operation of the compressor, there is a demand for the development of high-durability parts to improve it.
따라서, 본 발명은 상기와 같은 문제점을 해결하기 위해 안출한 것으로서, 더욱 상세하게는 종래의 에어컨의 컴프레셔의 피스톤에 장착된 슈에 관한 것으로 피.브이.디 코팅 공정을 이용하여 히팅, 에칭 및 코팅의 공정을 수행하여 Cr층, WC층 및 WC/C층을 형성하고 또한, 상기 WC/C층에는 C가 풍부한 층과 WC가 풍부한 층이 연속되게 형성됨으로써, 낮은 온도에서 코팅이 가능하여 열변형이 없을 뿐만 아니라 마찰계수를 낮추어주어 스워쉬 플레이트 및 피스톤과의 마모를 줄이는데 그 목적이 있다.Accordingly, the present invention has been made to solve the above problems, and more particularly relates to a shoe mounted on the piston of the compressor of the conventional air conditioner, heating, etching and coating using a P. V coating process The Cr layer, the WC layer, and the WC / C layer are formed by performing the process, and the C-rich layer and the WC-rich layer are continuously formed in the WC / C layer, so that the coating can be performed at a low temperature, thereby thermally deforming. Not only that, but also to lower the coefficient of friction to reduce wear with the swash plate and the piston.
도 1은 본 발명에 따른 피.브이.디 코딩 공정 장비의 개략도.1 is a schematic diagram of a P. Decoding process equipment according to the present invention.
도 2는 본 발명된 컴프레셔의 슈의 장착을 도시한 단면도.Figure 2 is a cross-sectional view showing the mounting of the shoe of the compressor of the present invention.
<도면의 주요 부분에 대한 부호의 설명><Explanation of symbols for main parts of the drawings>
1 : 공정 챔버 2, 7 : 주입구1: process chamber 2, 7: injection hole
3 : 진공펌프 4 : 평판 마그네트론 스퍼터링 소오스3: vacuum pump 4: flat plate magnetron sputtering source
5 : SUJ2 기판 6 : WC 타겟5: SUJ2 substrate 6: WC target
이하, 본 발명을 설명하면 다음과 같다.Hereinafter, the present invention will be described.
본 발명은 히팅, 에칭 및 코팅 공정으로 이루어져 고 내구성 컴프레셔 슈를 제조하는 피.브이.디 코팅 공정을 이용한 고 내구성 엔진 부품 제조방법에 있어서, 상기 코팅 공정의 코팅 구조가 Cr층, WC층 및 WC/C층으로 이루어지는 것을 특징으로 한다.The present invention is a method for manufacturing a high durability engine component using a P. V coating process consisting of a heating, etching and coating process to produce a high durability compressor shoe, the coating structure of the coating process is Cr layer, WC layer and WC It is characterized by consisting of / C layer.
특히, 상기 WC/C 혼합층은 WC가 풍부한 층과 C가 풍부한 층이 연속되게 형성되는 것을 특징으로 한다.In particular, the WC / C mixed layer is characterized in that the WC-rich layer and the C-rich layer is formed continuously.
또한, 상기 코팅 공정 진행시 챔버 내부 온도는 150 ~ 250℃의 범위에 있는 것을 특징으로 한다.In addition, the chamber internal temperature during the coating process is characterized in that in the range of 150 ~ 250 ℃.
이하, 본 발명의 공정방법을 더욱 상세히 설명하면 다음과 같다.Hereinafter, the process method of the present invention in more detail as follows.
본 발명은 물리적 기상 증착(PVD : Physical Vapour Deposition) 코팅 공정을 이용하여 고 내구성을 가지는 엔진 부품을 제조하는 것으로서, 더욱 상세하게는 에어컨의 컴프레셔의 슈(Shoe)를 히팅, 에칭 및 코딩 공정을 통해 제조하여 고 내구성을 가지면서 마찰계수가 적은 고 내구성 엔진 부품 제조방법에 관한 것이다.The present invention manufactures an engine component having high durability by using a physical vapor deposition (PVD) coating process, and more particularly, by heating, etching and coding a shoe of a compressor of an air conditioner. The present invention relates to a high durability engine component manufacturing method having high durability and low coefficient of friction.
좀 더 상세히 설명하면 다음과 같다.A more detailed description is as follows.
본 발명은 크게 3단계 공정 즉, 히팅, 에칭 및 코팅 공정으로 이루어진다.The present invention largely consists of a three step process, that is, heating, etching and coating process.
상기 히팅 공정은 기판(여기서는 코팅되지 않은 SUJ2)을 양극으로 하여 음극인 필라멘트에 전압을 인가하면 전자가 튀어나와 양극인 기판으로 입사되어 기판과의 충돌로 히팅이 된다.In the heating process, when a voltage is applied to a filament, which is a cathode, using a substrate (here, uncoated SUJ2) as an anode, electrons are blown out and incident on the substrate, which is an anode, and is heated by collision with the substrate.
이때, 챔버 내부의 온도는 240 ~ 250℃이고 공정시간은 10 ~ 15분이 적합하다.At this time, the temperature inside the chamber is 240 ~ 250 ℃ and the process time is suitable 10 ~ 15 minutes.
히팅 공정 다음에는 에칭 공정으로서 기판에 코팅의 금속결합을 발생시키기 위한 공정이다.The heating process is followed by an etching process to generate metal bonds of the coating to the substrate.
따라서, 상기 에칭 공정은 대기 중이나 고 진공에서 만들어진 얇은 산화층을 제거시킨다.Thus, the etching process removes the thin oxide layer made in air or at high vacuum.
챔버 내의 보조 양극에서 아크가 발생하고 이 때 기판은 네거티브로 바이어스되어 있다.An arc occurs at the auxiliary anode in the chamber, with the substrate negatively biased.
또한, 상기 기판이 플라즈마로부터 양이온을 끌어오게 되어, 상기 양이온이 가속되어 기판을 때리게 되어 얇은 산화층이나 잔여 오염물질을 제거한다.In addition, the substrate draws positive ions from the plasma, and the positive ions accelerate to strike the substrate to remove thin oxide layers or residual contaminants.
이 때, 공정 압력은 10-5Torr이고 에칭시간은 20분 정도이다.At this time, the process pressure is 10 -5 Torr and the etching time is about 20 minutes.
마지막으로 코팅 공정은 본 발명의 핵심 공정으로 이를 집중적으로 설명하면 다음과 같다.Finally, the coating process is the core process of the present invention.
상기 코팅 공정은 스퍼터링 공정으로 수행된다.The coating process is performed by a sputtering process.
공정 장비의 구조를 간략히 살펴보면도 1에 도시된 바와 같이, 공정 챔버(1) 내의 주입구(2)를 통해 아르곤 가스가 주입되고 소정의 공정을 수행하고 잔류가스 또는 공정 중 오염 물질은 진공펌프(3)를 경유하여 배출구로 빠져나가게 된다.Referring to the structure of the process equipment, as shown in FIG. 1, argon gas is injected through an injection port 2 in the process chamber 1, a predetermined process is performed, and residual gas or contaminants in the process are vacuum pumps 3. Exit to the outlet via).
상기 공정 챔버(1) 내에는 코팅되지 않은 SUJ2 기판(5)과 WC 타겟(Target)(6)이 소정의 위치에 설치되고, 공정 챔버(1)의 외주면에는 평판 마그네트론 스퍼터링 소오스(Planar Magnetron Sputtering Source)(4)가 장착된다.In the process chamber 1, an uncoated SUJ2 substrate 5 and a WC target 6 are installed at predetermined positions, and a planar magnetron sputtering source is formed on an outer circumferential surface of the process chamber 1. (4) is mounted.
여기서, 상기 평판 마그네트론 스퍼터링 소오스(4)는 전면에 Cr타겟을 부착하여 공정에 이용할 수 있게 하였다.Here, the flat plate magnetron sputtering source 4 is attached to the Cr target on the front surface to be used in the process.
통상 스퍼터링 공정은 공정 챔버(1) 내부로 아르곤가스를 주입하고 저 진공상태에서 고전압을 인가하면 평판 마그네트론 스퍼터링 소오스(4)에 의해 플라즈마가 발생하여 상기 아르곤가스가 이온화되고, 이 때 상기 양의 성질을 띠는 이온은 음극인 기판에 의해 끌어당겨지어 기판에 주입되어 층이 형성되게 하는 공정이다.In general, in the sputtering process, when argon gas is injected into the process chamber 1 and a high voltage is applied in a low vacuum state, plasma is generated by a flat plate magnetron sputtering source 4 to ionize the argon gas. The ion is attracted by the substrate, which is the cathode, and injected into the substrate to form a layer.
본 발명의 공정 챔버는 상기 평판 마그네트론 스퍼터링 소오스가 캐소드로 작용하고 이와 별도로 몇 mm 거리에 아노드가 있에 되어 플라즈마가 발생하여 가스가 이온화되고, 상기 이온이 평판 마그네트론 스퍼터링 소오스(4)로 입사 및 충돌을 하여 평판 마그네트론 스퍼터링 소오스(4) 전면에 있는 Cr 타겟의 Cr원자가 튀어나가게 되여 이것이 SUS2 기판(5)에 증착되는 것이다.In the process chamber of the present invention, the plate magnetron sputtering source acts as a cathode and the anode is several mm apart, so that plasma is generated to ionize the gas, and the ions enter and exit the plate magnetron sputtering source 4. The collision causes the Cr atoms of the Cr target on the front surface of the plate magnetron sputtering source 4 to protrude, which is deposited on the SUS2 substrate 5.
여기서, 평판 마그네트론 스퍼터링 소오스(4)에는 -600V의 직류전압이 인가된다.Here, a DC voltage of -600 V is applied to the flat plate magnetron sputtering source 4.
본 발명에서는 공정 챔버(1)의 내부 온도는 150 ~ 250℃로 유지하면서 공정을 수행하였다.In the present invention, the process was performed while maintaining the internal temperature of the process chamber 1 at 150 to 250 ° C.
코팅 공정의 첫번째는 2개의 Cr가 스퍼트되어 0.2 ~ 0.5㎛의 얇은 층이 형성되었고, 다음에 WC의 스퍼트에 의해 WC층이 형성되었다.In the first of the coating process, two Cr were sputtered to form a thin layer of 0.2 to 0.5 mu m, and then a WC layer was formed by the sputter of WC.
몇분 뒤에 반응 가스인 아세틸렌이 주입구(7)를 통해 공정챔버(1)에 주입시켰다.After a few minutes, acetylene, a reaction gas, was injected into the process chamber 1 through the inlet 7.
그 때, 아세틸렌은 이온화되었고 C 이온은 기판에 가속되어 주입되었다.At that time, acetylene was ionized and C ions were accelerated and implanted into the substrate.
여기서, 기판은 공정 중에 회전을 시켜주어 WC가 풍부한 층과 C가 풍부한 층이 연속하여 형성되었다.Here, the substrate was rotated during the process to form a WC-rich layer and a C-rich layer in succession.
또한, 본 발명의 코팅 공정에 이용된 공정 장비는 상기 히팅 및 에칭 공정에도 똑같이 적용되고 있음을 밝혀둔다.It is also noted that the process equipment used in the coating process of the present invention is equally applicable to the heating and etching processes.
아래의 참고도 1은 본 발명에 따른 증착된 코팅층의 구조를 나타내고, 참고도 2는 참고도 1에서 WC/C 코팅층의 확대된 것을 나타낸 것이다.Reference Figure 1 below shows the structure of the deposited coating layer according to the present invention, Reference Figure 2 shows an enlarged view of the WC / C coating layer in Reference Figure 1.
상기와 같은 공정에 의해 제조된 것을 다른 것과 비교를 하면 다음과 같다.Comparing the one prepared by the above process with another is as follows.
참고도 1Reference diagram 1
참고도 2Reference diagram 2
참고도 1에 도시된 바와 같이, 본 발명에 따라 SUJ2 기판을 물리적 기상 증착을 이용하여 공정을 수행하여 3개의 코팅층, 즉 Cr층, WC층 및 WC/C층이 형성되었다.As shown in FIG. 1, according to the present invention, the SUJ2 substrate was subjected to a process using physical vapor deposition to form three coating layers, that is, a Cr layer, a WC layer, and a WC / C layer.
특히, 참고도 2에 도시된 바와 같이, WC/C층은 C가 풍부한 층과 WC가 풍부한 층이 연속하여 형성되는 구조로 이루어져 있다.In particular, as shown in FIG. 2, the WC / C layer has a structure in which a layer rich in C and a layer rich in WC are continuously formed.
여기서, C가 풍부한 층은 무윤활 상태에서의 마찰을 적게 하고, WC가 풍부한 층은 마모성능을 뛰어나게 하여 준다.Here, the layer rich in C reduces friction in the non-lubricated state, and the layer rich in WC provides excellent wear performance.
비교예 1Comparative Example 1
표 1은 본 발명의 WC/C 코팅된 부품과 다른 재료로 코팅 또는 코팅되지 않은 부품을 비교한 것이다.Table 1 compares the WC / C coated parts of the present invention with parts coated or uncoated with other materials.
표 1은 핀온 디스크 테스팅 결과로서, 무윤활 상태이고, 디스크의 회전속도는 1000rpm이고 10,000번 정도 회전시켜 주었다. 또한, 핀과 시편의 접촉 압력은 50F/cm2이다.Table 1 shows the results of the pin-on disk testing, in the state of no lubrication, and the rotation speed of the disk was 1000 rpm and rotated about 10,000 times. In addition, the contact pressure between the pin and the specimen is 50 F / cm 2 .
상기 표 1에 도시된 바와 같이, 본 발명이 마찰계수가 다른 비교예에 비해 5 ~ 10배정도 적을 뿐만 아니라 마찰 온도에 있어서도 2 ~ 3배 적을 뿐만 아니라 마찰시 소음도 없는 것으로 나타났다.As shown in Table 1, the present invention is not only less than 5 to 10 times less than the friction coefficient of the other comparative example as well as 2 to 3 times less in the friction temperature as well as no noise during friction.
따라서, WC/C 코팅된 재료는 고 내구성을 가질 수 있다.Thus, the WC / C coated material can have high durability.
상기와 같이 제조된 피스톤에 장착된 슈(Shoe)는 고 내구성을 가지면서 컴프레셔 내에 무윤활 상태에서도 작동이 가능하게 된다.The shoe mounted on the piston manufactured as described above has a high durability and can be operated even in a non-lubricated state in the compressor.
상기와 같은 본 발명에 따른 피.브이.디 코팅 공정을 이용한 고 내구성 엔진 부품 제조방법은 종래의 에어컨의 컴프레셔의 피스톤에 장착된 슈에 관한 것으로 피.브이.디 코팅 공정을 이용하여 히팅, 에칭 및 코팅의 공정을 수행하여 Cr층, WC층 및 WC/C층을 형성하고 또한, 상기 WC/C층에는 C가 풍부한 층과 WC가 풍부한 층이 연속되게 형성됨으로써, 낮은 온도에서 코팅이 가능하여 열변형이 없을 뿐만 아니라 마찰계수를 낮추어주어 스워쉬 플레이트 및 피스톤과의 마모를 줄일 수 있고, 사판에 주석도금을 할 필요가 없어 원가절감을 기할 수 있는 효과가 있다.The high durability engine parts manufacturing method using the P. V coating process according to the present invention as described above relates to a shoe mounted on the piston of the compressor of a conventional air conditioner, which is heated and etched using the P. D coating process. And forming a Cr layer, a WC layer, and a WC / C layer by performing a coating process, and the C-rich layer and the WC-rich layer are continuously formed on the WC / C layer, thereby allowing coating at a low temperature. Not only is there no heat deformation, but also the friction coefficient can be lowered to reduce wear to the swash plate and the piston, and there is no need to tin plate the swash plate, thereby reducing the cost.
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KR101306224B1 (en) * | 2011-04-13 | 2013-09-09 | 바코스 주식회사 | High Speed Film Forming Apparatus, And Film Forming Method Using The Same |
WO2013165036A1 (en) * | 2012-05-02 | 2013-11-07 | 바코스 주식회사 | High-speed film-forming device and film-forming method using same |
KR101421605B1 (en) * | 2012-03-06 | 2014-07-22 | (주)국민진공 | Plasma Cleaning Method of PVD Coating Device |
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KR100643617B1 (en) * | 2004-11-15 | 2006-11-10 | 현대자동차주식회사 | Method for Tungsten Carbide Carbon coating of tappet in engine |
KR102427732B1 (en) * | 2022-01-25 | 2022-08-01 | 한국진공주식회사 | Wc/c coating film structure for extending lifetime of press roll for producing facility of secondary battery |
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JPS60100660A (en) * | 1983-11-07 | 1985-06-04 | Toshiba Tungaloy Co Ltd | Surface-coated hard material |
JPH0657409A (en) * | 1992-08-11 | 1994-03-01 | Mitsubishi Materials Corp | Production of hard layer composite coated cutting tool excellent in strength and wear resistance |
JPH06220608A (en) * | 1993-01-28 | 1994-08-09 | Sumitomo Electric Ind Ltd | Surface-coated hard member and its production |
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JPS60100660A (en) * | 1983-11-07 | 1985-06-04 | Toshiba Tungaloy Co Ltd | Surface-coated hard material |
JPH0657409A (en) * | 1992-08-11 | 1994-03-01 | Mitsubishi Materials Corp | Production of hard layer composite coated cutting tool excellent in strength and wear resistance |
JPH06220608A (en) * | 1993-01-28 | 1994-08-09 | Sumitomo Electric Ind Ltd | Surface-coated hard member and its production |
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KR101306224B1 (en) * | 2011-04-13 | 2013-09-09 | 바코스 주식회사 | High Speed Film Forming Apparatus, And Film Forming Method Using The Same |
KR101421605B1 (en) * | 2012-03-06 | 2014-07-22 | (주)국민진공 | Plasma Cleaning Method of PVD Coating Device |
WO2013165036A1 (en) * | 2012-05-02 | 2013-11-07 | 바코스 주식회사 | High-speed film-forming device and film-forming method using same |
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