JP2001107220A - Machine parts coated with hard carbon film and its production method - Google Patents
Machine parts coated with hard carbon film and its production methodInfo
- Publication number
- JP2001107220A JP2001107220A JP31727299A JP31727299A JP2001107220A JP 2001107220 A JP2001107220 A JP 2001107220A JP 31727299 A JP31727299 A JP 31727299A JP 31727299 A JP31727299 A JP 31727299A JP 2001107220 A JP2001107220 A JP 2001107220A
- Authority
- JP
- Japan
- Prior art keywords
- hard carbon
- carbon film
- metal
- layer
- gradient layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Landscapes
- Chemical Vapour Deposition (AREA)
- Cylinder Crankcases Of Internal Combustion Engines (AREA)
- Rotary Pumps (AREA)
- Details And Applications Of Rotary Liquid Pumps (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、熱的機械的衝撃を
強く受ける機械部品の表面に被覆する硬質炭素膜の耐磨
耗性、耐久性、接着性を向上させる技術に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for improving the abrasion resistance, durability and adhesion of a hard carbon film coated on the surface of a mechanical part which is strongly subjected to thermal mechanical shock.
【０００２】[0002]
【従来の技術】硬質炭素膜は、硬度が非常に高いことか
ら、耐磨耗性が必要とされる分野、例えば機械部品、金
型、切削工具等において、その表面を硬質炭素膜で覆う
ことが広く行われてきた。このような硬質炭素膜は、接
着性向上を目的とした中間層、例えばシリコンや窒化シ
リコンの上に、メタンやアセチレン等の炭素含有ガスを
使用して熱ＣＶＤ法やプラズマＣＶＤ法等により、作製
されてきた。2. Description of the Related Art Hard carbon films have very high hardness, so that the surface of the hard carbon film is covered with the hard carbon film in fields requiring abrasion resistance, such as machine parts, molds, cutting tools, and the like. Has been widely practiced. Such a hard carbon film is formed on an intermediate layer for improving adhesion, for example, silicon or silicon nitride, using a carbon-containing gas such as methane or acetylene by a thermal CVD method, a plasma CVD method, or the like. It has been.
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、自動車
用エンジンのシリンダやピストンのように非常に大きな
熱的機械的衝撃を受ける機械部品に対しては、硬質炭素
膜中に残留する内部応力に、熱的機械的衝撃を受けて発
生する応力が加わり、硬質炭素膜に亀裂が発生しやすく
なり、（チッピングが支配的な）摩耗が進行しやすくな
る。また、硬質炭素膜と基材の接着性を改善するため、
硬質炭素膜と基材の間に中間層を設けた場合でも、両者
の界面で剥離が生じやすいという問題も存在する。However, for mechanical parts that are subjected to extremely large thermal mechanical shocks, such as cylinders and pistons of automobile engines, the internal stress remaining in the hard carbon film is affected by thermal stress. Stress generated by the mechanical shock is applied, the crack is easily generated in the hard carbon film, and the wear (in which chipping is dominant) is easily advanced. Also, to improve the adhesion between the hard carbon film and the substrate,
Even when an intermediate layer is provided between the hard carbon film and the base material, there is a problem that peeling easily occurs at the interface between the two.
【０００４】本発明において解決すべき課題は、硬質炭
素膜に固有の特性を失わせず、しかも残留する内部応力
や外部衝撃による発生応力が小さく、且つまた、基材に
対する接着性に優れた硬質炭素膜の被覆製品を提供する
ことにある。The problem to be solved in the present invention is that a hard carbon film does not lose its inherent characteristics, has a small residual stress due to internal stress or external impact, and has excellent adhesion to a substrate. An object of the present invention is to provide a product coated with a carbon film.
【０００５】[0005]
【課題を解決するための手段】前記課題は、硬質炭素膜
の表面側の体積比率３０％以下で、硬質炭素膜の下層側
すなわち基材（機械部品）側の体積比率が５０％以上と
なるように体積比率に傾斜を持たせて硬質炭素膜内金属
を添加した層（金属傾斜層）を、硬質炭素膜の下層に設
けることにより達成される。また、中間層は設けなくて
もよいが、設けるほうが接着性がさらに向上する。この
場合、中間層は、硬質炭素膜内に添加する金属と同種類
の金属で構成し、チタンまたはクロムが望ましい。The object of the present invention is that the volume ratio on the surface side of the hard carbon film is 30% or less, and the volume ratio on the lower layer side of the hard carbon film, that is, the base material (machine component) side is 50% or more. As described above, this is achieved by providing a layer (metal gradient layer) in which the metal in the hard carbon film is added with a gradient in the volume ratio as a lower layer of the hard carbon film. Although the intermediate layer does not need to be provided, the provision of the intermediate layer further improves the adhesiveness. In this case, the intermediate layer is made of the same kind of metal as the metal added in the hard carbon film, and is preferably titanium or chromium.
【０００６】硬質炭素膜下層（基材側）に位置する金属
傾斜層については、基材（中間層のある場合は中間層）
との接触部の金属の体積比率を５０％以上、望ましくは
１００％にし、基材から遠ざかるに従い、連続的もしく
は階段状に減少させ、金属傾斜層の最終部（硬質炭素膜
の表面側）の金属の体積比率を３０％以下、望ましくは
０％にする。金属傾斜層の膜厚は０．５〜５μｍ，望ま
しくは０．５〜２μｍにする。For the metal gradient layer located under the hard carbon film (substrate side), the base material (intermediate layer if there is an intermediate layer)
The volume ratio of the metal at the contact portion with the metal is 50% or more, desirably 100%, and is reduced continuously or stepwise as the distance from the base material increases, and the final portion of the metal gradient layer (the surface side of the hard carbon film) is formed. The volume ratio of the metal is 30% or less, preferably 0%. The thickness of the metal gradient layer is 0.5 to 5 μm, preferably 0.5 to 2 μm.
【０００７】金属傾斜層以外の硬質炭素膜は、その金属
の体積比率と膜厚をそれぞれ３０％以下、０．５〜５μ
ｍ、望ましくは０％、１〜２μｍにする．さらに、金属
傾斜層以外の硬質炭素膜の金属の体積比率は、金属傾斜
層の最終部（硬質炭素膜の表面側）の金属の体積比率と
同じにし、金属傾斜層を含む硬質炭素膜全体の膜厚を５
μｍ以下にすることが望ましい。また、硬質炭素膜を金
属傾斜層のみで構成してもよい。The hard carbon film other than the metal gradient layer has a volume ratio and a film thickness of the metal of 30% or less and 0.5 to 5 μm, respectively.
m, preferably 0%, 1-2 μm. Further, the volume ratio of the metal of the hard carbon film other than the metal gradient layer is the same as the volume ratio of the metal in the final part of the metal gradient layer (on the surface side of the hard carbon film), and the entire hard carbon film including the metal gradient layer is formed. Film thickness 5
It is desirable that the thickness be not more than μm. Further, the hard carbon film may be composed of only the metal gradient layer.
【０００８】[0008]
【発明の実施の形態】次に、本発明の実施の形態につい
て、実験結果を例にあげて説明する。 第１例 円筒型非平衡型マグネトロンスパッタリング装置を用い
て行った実験例を以下に示す。４個のチタンターゲット
を使い、アルゴンガスにより発生させたプラズマ内にア
セチレンガス（またはアセチレンガスと窒素ガス）を流
すことにより本発明の硬質炭素膜を作製した。作製条件
は次の通りである。 基 材 ：自動車用エンジンのタペット ターゲット ：チタン（ターゲット ４個） ガ ス ：アルゴン アセチレン 圧 力 ：２ｘ１０−１Ｐａ ターゲット電流 ：３ Ａ （成膜時） 基板バイアス電圧 ：−４０ Ｖ（ＤＣ）（成膜時） 基板ホルダー回転数 ：２ Ｒ．Ｐ．Ｍ． 堆 積 速 度 ：０．０３ μｍ／分Next, embodiments of the present invention will be described with reference to experimental results. First Example An experimental example performed using a cylindrical non-equilibrium type magnetron sputtering apparatus is shown below. Using four titanium targets, an acetylene gas (or an acetylene gas and a nitrogen gas) was caused to flow in plasma generated by an argon gas to produce a hard carbon film of the present invention. The manufacturing conditions are as follows. Base material: tappet of automotive engine Target: titanium (4 targets) Gas: argon acetylene Pressure: 2 × 10 -1 Pa Target current: 3 A (at the time of film formation) Substrate bias voltage: -40 V (DC) (composition) At the time of film) Substrate holder rotation speed: 2R. P. M. Deposition speed: 0.03 μm / min
【０００９】作製手順は次の通りである。円筒型非平衡
型マグネトロンスパッタリング装置内に基材をセットし
装置を高真空にした後、アルゴンガスを流し、圧力２ｘ
１０−１Ｐａ、ターゲット電流０．２Ａ，基板バイアス
電圧−６００Ｖ（ＤＣ）の条件で、３０分間イオンボン
バードを行い、基材表面をクリーンにする。その後、タ
ーゲット電流を３Ａに上げて、基板バイアス電圧−４０
Ｖ（ＤＣ）で約８分間保持する。次にＴｉの発光強度が
当初の５０％になるようにアセチレンガスを追加して流
して、約３０分間保持する。その後、約２０分間かけて
Ｔｉの発光強度を当初の１５％になるまで直線的に減少
させ、引き続き、この状態を保持する。The manufacturing procedure is as follows. The substrate was set in a cylindrical non-equilibrium type magnetron sputtering apparatus, and the apparatus was evacuated to a high vacuum.
Ion bombardment is performed for 30 minutes under the conditions of 10 -1 Pa, a target current of 0.2 A, and a substrate bias voltage of -600 V (DC) to clean the substrate surface. Thereafter, the target current is increased to 3 A, and the substrate bias voltage is set to -40.
Hold at V (DC) for about 8 minutes. Next, an acetylene gas is additionally added so that the emission intensity of Ti becomes 50% of the initial value, and the gas is held for about 30 minutes. Thereafter, the emission intensity of Ti is linearly reduced to 15% of the initial value over about 20 minutes, and this state is maintained.
【００１０】このようにして、Ｔｉの中間層（０．０２
μｍ）と、金属傾斜層のみから成る硬質炭素膜（２．４
μｍ）が基材の上に成膜される。金属傾斜層内は、Ｔｉ
の堆積比率の値の違いにより、基材側から順番に、５０
％一定の層（０．９μｍ）、５０％から１５％まで直線
的に減少する層（０．６μｍ）、１５％一定の層（０．
９μｍ）の３層で構成されている。Thus, the Ti intermediate layer (0.02
μm) and a hard carbon film (2.4
μm) is deposited on the substrate. Ti in the metal gradient layer
Due to the difference in the value of the deposition ratio of
% Constant layer (0.9 μm), linearly decreasing layer from 50% to 15% (0.6 μm), 15% constant layer (0.
9 μm).
【００１１】以上の方法で作製した硬質炭素膜の性能
は、従来方法による場合に比べて、基材との接着性及び
耐磨耗性に関して１．５〜２倍向上していた。また、硬
質炭素膜の膜厚を厚くできた効果も加わり、本実施例の
硬質炭素膜の被覆された基材（機械部品）は、従来方法
による場合に比べて、２〜３倍、製品寿命が長くなっ
た。尚、窒素ガスを追加して流すことにより、Ｔｉの中
間層と金属傾斜層のみから成る硬質炭素膜の間にＴｉＮ
層を設けたり、硬質炭素膜内にＴｉＮまたはＴｉＣＮを
含有させることも試み、さらに若干の性能の向上を得
た。The performance of the hard carbon film produced by the above method was improved by 1.5 to 2 times in terms of the adhesion to the substrate and the abrasion resistance as compared with the conventional method. In addition to the effect of increasing the thickness of the hard carbon film, the substrate (machine component) coated with the hard carbon film of this embodiment has a product life that is 2-3 times longer than that of the conventional method. Became longer. In addition, by flowing additional nitrogen gas, TiN is placed between the Ti intermediate layer and the hard carbon film consisting of only the metal gradient layer.
An attempt was made to provide a layer or to include TiN or TiCN in the hard carbon film, and a slight improvement in performance was obtained.
【００１２】第２例 円筒型非平衡型マグネトロンスパッタリング装置を用い
て行った別の実施例を以下に示す。３個のカーボンター
ゲットと１個のクロムターゲットを使い、下記の作製条
件により本発明の硬質炭素膜を作製した。 基 材 ：自動車用エンジンの燃料噴射ポンプのシャフト ターゲット ：カーボン ３個 クロム １個 ガ ス ：アルゴン 圧 力 ：２ｘ１０−１Ｐａ ターゲット電流 ：０〜７Ａ 基板バイアス電圧 ：−６０ Ｖ（パルスＤＣ 周波数５０ｋＨｚ パルス幅１５００ｎｓｅｃ）（成膜時） 基板ホルダー回転数 ：２ Ｒ．Ｐ．Ｍ． 堆 積 速 度 ：０．０１４ μｍ／分Second Example Another example performed using a cylindrical non-equilibrium type magnetron sputtering apparatus will be described below. Using three carbon targets and one chromium target, a hard carbon film of the present invention was produced under the following production conditions. Base material: shaft of fuel injection pump for automobile engine Target: 3 carbons 1 chromium Gas: Argon Pressure: 2 × 10 -1 Pa Target current: 0 to 7 A Substrate bias voltage: -60 V (pulse DC frequency 50 kHz pulse Width 1500 nsec) (at the time of film formation) Substrate holder rotation speed: 2R. P. M. Deposition speed: 0.014 μm / min
【００１３】作製手順は次の通りである。円筒型非平衡
型マグネトロンスパッタリング装置内に基材をセットし
装置を高真空にした後、アルゴンガスを流し、圧力を２
ｘ１０−１Ｐａにして、第１例と同様の方法で３０分間
イオンボンバードを行い、基材表面をクリーンにする。
その後、クロムターゲット電流のみを７Ａにして、約１
２分間保持する。このとき、基板バイアス電圧は上記の
値にしておく。次に、約４５分かけて、クロムターゲッ
ト電流を７Ａから０Ａまで直線的に下げていくと同時
に、３個のカーボンターゲットの電流をそれぞれ０Ａか
ら７Ａに直線的に上げていく。その後、そのままの条件
で約１４０分間保持する。The manufacturing procedure is as follows. The substrate was set in a cylindrical non-equilibrium type magnetron sputtering apparatus, and the apparatus was evacuated to a high vacuum.
At x10 -1 Pa, ion bombardment is performed for 30 minutes in the same manner as in the first example to clean the substrate surface.
After that, only the chromium target current was set to 7A, and about 1
Hold for 2 minutes. At this time, the substrate bias voltage is set to the above value. Next, the chromium target current is linearly decreased from 7 A to 0 A over about 45 minutes, and the current of the three carbon targets is linearly increased from 0 A to 7 A, respectively. Thereafter, the condition is maintained for about 140 minutes.
【００１４】このようにして、クロムの中間層（０．２
μｍ）と、金属傾斜層（０．７μｍ）、金属傾斜層以外
の硬質炭素膜（２．０μｍ）が基材の上に成膜される。
金属傾斜層のクロムの体積比率は、基材側（中間層との
接触部）が１００％、金属傾斜層の最終部（硬質炭素膜
の表面側）が０％であり、その間１００％から０％まで
直線的に減少していく。金属傾斜層以外の硬質炭素膜の
クロムの体積比率は０％である。Thus, the intermediate layer of chromium (0.2
μm), a metal gradient layer (0.7 μm), and a hard carbon film (2.0 μm) other than the metal gradient layer are formed on the substrate.
The volume ratio of chromium in the metal gradient layer is 100% on the base material side (contact portion with the intermediate layer), and 0% on the final portion of the metal gradient layer (surface side of the hard carbon film). %. The volume ratio of chromium in the hard carbon film other than the metal gradient layer is 0%.
【００１５】以上の方法で作製した硬質炭素膜の性能
は、従来方法による場合に比べて、基材との密着性及び
耐磨耗性に関して約２倍向上していた。また、硬質炭素
膜の膜厚を厚くできた効果も加わり、本実施例の硬質炭
素膜の被覆された基材（機械部品）は、従来方法による
場合に比べて、、約３倍製品寿命が長くなった。尚、最
終クロムターゲット電流を０Ａの代わりに０．５Ａにす
ると、金属傾斜層の最終部（硬質炭素膜の表面側）及び
金属傾斜層以外の硬質炭素膜のクロムの体積比率は約８
％となり、耐磨耗性がさらに若干向上した。本実施例に
おいては、上記の部分のクロムの体積比率が０〜１５％
の範囲のとき、優れた耐磨耗性を示すが、上記の８％の
ときが最もよく、特に高荷重の条件の下での耐磨耗性が
優れている。The performance of the hard carbon film produced by the above-described method was improved about twice with respect to the adhesion to the substrate and the abrasion resistance as compared with the conventional method. In addition to the effect of increasing the thickness of the hard carbon film, the base material (machine component) coated with the hard carbon film of this embodiment has a product life that is about three times longer than that of the conventional method. It became longer. When the final chromium target current is 0.5 A instead of 0 A, the volume ratio of chromium in the final portion of the metal gradient layer (on the surface side of the hard carbon film) and in the hard carbon film other than the metal gradient layer is about 8%.
%, And the abrasion resistance was slightly improved. In this embodiment, the volume ratio of chromium in the above portion is 0 to 15%.
When the ratio is within the range, excellent abrasion resistance is exhibited, but the above-mentioned 8% is the best, and in particular, the abrasion resistance under high load conditions is excellent.
【００１６】また、本実施例と同様の作製条件で、金属
傾斜層の膜厚を０〜７μｍの範囲で変化させた硬質炭素
膜を、３０ｘ３０ｘ２ｔ（ｍｍ）のサイズのＳＫＨ５１
のテストピース上にそれぞれ作製し、ピンオンディスク
テストにより、各硬質炭素膜の摩耗率を測定した。テス
ト条件は次の通りである。 荷重 ：１０Ｎ 回転半径 ：６ｍｍ 回転速度 ：３１８Ｒ．Ｐ．Ｍ．（線速度：２００ｍｍ
／ｓｅｃ） 回転数 ：１０００００回転 温度、湿度：２０〜２５℃ ４０〜６０％ このテストの測定結果、すなわち、硬質炭素膜の摩耗率
の金属傾斜層膜厚依存性を表１に示す。Further, under the same manufacturing conditions as in this embodiment, a hard carbon film in which the film thickness of the metal gradient layer is changed in the range of 0 to 7 μm was used for the SKH51 having a size of 30 × 30 × 2t (mm).
Of the hard carbon films were measured by a pin-on-disk test. The test conditions are as follows. Load: 10N Rotation radius: 6mm Rotation speed: 318R. P. M. (Linear speed: 200mm
/ Sec) Number of rotations: 100,000 rotations Temperature, humidity: 20 to 25 ° C. 40 to 60% Table 1 shows the measurement results of this test, that is, the dependency of the wear rate of the hard carbon film on the thickness of the metal gradient layer.
【００１７】[0017]
【表１】 [Table 1]
【００１８】表１から、金属傾斜層の膜厚が０．４μｍ
以下では、金属傾斜層内の金属の含有率の勾配が大きす
ぎて、その効果が十分に発揮されず、効果を発揮するに
は０．５μｍ以上の膜厚が必要なことがわかる。また、
金属傾斜層の膜厚が２μｍを越えると、その膜内の応力
の増加により、効果が減少していき、５μｍを越えると
効果がなくなる。According to Table 1, the thickness of the metal gradient layer is 0.4 μm.
In the following, it can be seen that the gradient of the metal content in the metal gradient layer is too large and the effect is not sufficiently exhibited, and a film thickness of 0.5 μm or more is required to exhibit the effect. Also,
When the thickness of the metal gradient layer exceeds 2 μm, the effect decreases due to an increase in stress in the film, and when the thickness exceeds 5 μm, the effect is lost.
【００１９】第３例 前記の第２例と同様の手順で、クロムの中間層を含まな
い構造を持つ硬質炭素膜を成膜した実施例を示す。基材
として、自動車用エンジンのピストンリングを用いた。
作製条件は、イオンボンバードの後、「クロムターゲッ
ト電流を７Ａにして約１２分間保持する」という工程を
省く以外は、全て第２例と同じであり、基材の上に直接
金属傾斜層（０．７μｍ）、金属傾斜層以外の硬質炭素
膜（２μｍ）が成膜される。金属傾斜層のクロムの体積
比率は、基材との接触部が１００％、金属傾斜層の最終
部（硬質炭素膜の表面側）が０％であり、その間１００
％から０％まで直線的に減少していく。金属傾斜層以外
の硬質炭素膜のクロムの体積比率は０％である。Third Example An example in which a hard carbon film having a structure not including an intermediate layer of chromium is formed in the same procedure as in the second example described above. A piston ring of an automobile engine was used as a base material.
The fabrication conditions were all the same as in the second example except that after the ion bombardment, the step of “holding the chromium target current at 7 A and holding for about 12 minutes” was omitted, and the metal gradient layer (0 .7 μm), and a hard carbon film (2 μm) other than the metal gradient layer is formed. The volume ratio of chromium in the metal gradient layer is 100% in the contact portion with the base material, and 0% in the final portion (the surface side of the hard carbon film) of the metal gradient layer.
% Linearly decreases from 0% to 0%. The volume ratio of chromium in the hard carbon film other than the metal gradient layer is 0%.
【００２０】以上の方法で作製した硬質炭素膜の性能
は、従来方法による場合に比べて、基材との接着性で約
１．８倍、耐磨耗性に関しては約２倍向上していた。ま
た硬質炭素膜の膜厚を厚くできた効果も加わり、本実施
例の硬質炭素膜の被覆された基材（機械部品）は、従来
方法による場合に比べて、約３倍、製品寿命が長くなっ
た。The performance of the hard carbon film produced by the above method was improved by about 1.8 times in the adhesiveness to the base material and by about 2 times in the abrasion resistance as compared with the conventional method. . In addition to the effect of increasing the thickness of the hard carbon film, the substrate (machine component) coated with the hard carbon film of this embodiment has a product life that is approximately three times longer than that of the conventional method. became.
【００２１】第４例 既述の第１例の方法で作製された硬質炭素膜の上に、真
空を解除せずそのまま引き続き同一チャンバー内で、プ
ラズマＣＶＤ法により硬質炭素膜を形成した実施例を以
下に示す。基材には自動車エンジンのピストンを用い、
そのスカート部に成膜した。第１例と同じ方法で硬質炭
素膜を基材の上に作製した後、一旦１ｘ１０−３Ｐａ以
下まで真空引きする。その後、同一チャンバー内で下記
の条件で、プラズマＣＶＤ法により硬質炭素膜を０．５
μｍ作製した。 ガ ス ：メタン 圧 力 ：１ｘ１０−１Ｐａ 高周波電力 ：１．５ ｋＷ 基板ホルダー回転数 ：２ Ｒ．Ｐ．Ｍ． 堆積速度 ：０．１ μｍ／時Fourth Embodiment An embodiment in which a hard carbon film is formed on a hard carbon film produced by the method of the above-described first example by plasma CVD in the same chamber without releasing the vacuum. It is shown below. Using the piston of an automobile engine as the base material,
A film was formed on the skirt. After a hard carbon film is formed on a base material in the same manner as in the first example, vacuum is once drawn to 1 × 10 −3 Pa or less. Then, a hard carbon film was formed in the same chamber by the plasma CVD method under the following conditions under the following conditions.
μm was produced. Gas: methane Pressure: 1 × 10 -1 Pa High frequency power: 1.5 kW Number of rotations of substrate holder: 2 P. M. Deposition speed: 0.1 μm / hour
【００２２】以上の方法で作製した硬質炭素膜の性能
は、従来方法による場合に比べて、基材との接着性及び
耐磨耗性に関して１．５〜２倍向上していた。また、硬
質炭素膜の膜厚を厚くできた効果も加わり、本実施例の
硬質炭素膜の被覆された基材（機械部品）は、従来方法
による場合に比べて、３〜４倍製品寿命が長くなった。The performance of the hard carbon film produced by the above method was improved by 1.5 to 2 times in terms of the adhesion to the substrate and the abrasion resistance as compared with the conventional method. In addition to the effect of increasing the thickness of the hard carbon film, the substrate (machine component) coated with the hard carbon film of this embodiment has a product life that is three to four times longer than that of the conventional method. It became longer.
【００２３】[0023]
【発明の効果】上記第１例〜第４例で示したように、本
発明によれば、耐磨耗性、接着性、耐久性に優れた硬質
炭素膜を機械部品に被覆することができる。すなわち、
硬質炭素膜中に金属を分散含有させることにより、膜中
に応力が内的要因（残留歪みによるもの）あるいは外的
原因（外部応力、熱による衝撃）により発生しても、そ
れが小さくなり、従って機械部品中に発生する熱的機械
的衝撃による内部クラックが発生しにくくなり、耐磨耗
性が向上する。また、前記のような金属傾斜層を硬質炭
素膜の下層側に設けることにより、基材（または中間
層）と硬質炭素膜の界面における応力が緩和され、両者
間の接着性が向上する。さらに、従来の方法では、硬質
炭素膜の大きな内部応力に起因して膜の剥離が起こるた
め、硬質炭素膜の膜厚を１〜２μｍ以上にすることがで
きなかったが、本発明によれば硬質炭素膜の内部応力が
小さいので、５μｍもしくはそれ以上にすることがで
き、実質的な耐久性が向上する。As shown in the first to fourth examples, according to the present invention, a hard carbon film having excellent wear resistance, adhesion and durability can be coated on machine parts. . That is,
By dispersing metal in the hard carbon film, even if stress is generated in the film due to internal factors (residual strain) or external factors (external stress, thermal shock), it becomes smaller, Therefore, internal cracks are less likely to occur due to thermal mechanical shock generated in mechanical parts, and wear resistance is improved. Further, by providing such a metal gradient layer on the lower layer side of the hard carbon film, the stress at the interface between the base material (or the intermediate layer) and the hard carbon film is reduced, and the adhesion between the two is improved. Furthermore, in the conventional method, since the film is peeled off due to the large internal stress of the hard carbon film, the thickness of the hard carbon film could not be made 1 to 2 μm or more. Since the internal stress of the hard carbon film is small, it can be set to 5 μm or more, which substantially improves the durability.
【図１】本発明の実施第１例の基材である自動車用エン
ジンのタペットの断面図FIG. 1 is a sectional view of a tappet of an automobile engine which is a base material according to a first embodiment of the present invention.
【図２】本発明の実施第２例の基材である自動車用エン
ジンの燃料噴射ポンプのシャフトの斜視図FIG. 2 is a perspective view of a shaft of a fuel injection pump for an automobile engine, which is a base material according to a second embodiment of the present invention.
【図３】本発明の実施第３例及び第４例の基材である自
動車用エンジンのピストンリング及びピストンスカート
の断面図FIG. 3 is a cross-sectional view of a piston ring and a piston skirt of an automobile engine which is a base material according to third and fourth embodiments of the present invention.
１はプッシュロッド ２はタペット ３はカム ４はバルブリフター ５はシャフト ６はピストンリング ７はシリンダブロック ８はピストンスカート ９はコンロッド 1 is a push rod 2 is a tappet 3 is a cam 4 is a valve lifter 5 is a shaft 6 is a piston ring 7 is a cylinder block 8 is a piston skirt 9 is a connecting rod
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｆ０４Ｃ 15/00 Ｆ０４Ｃ 15/00 Ｄ Ｆターム(参考） 3G024 AA21 FA04 FA06 GA16 HA01 3H040 CC14 CC16 DD36 3H044 CC12 CC14 DD23 4K029 AA02 BA07 BA17 BA34 BA64 BB02 BC02 BD03 BD04 CA05 EA01 4K030 AA10 BA06 BA18 BA28 BA61 BB12 BB13 CA02 FA01 LA01 LA23 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI theme coat ゛ (reference) F04C 15/00 F04C 15/00 DF term (reference) 3G024 AA21 FA04 FA06 GA16 HA01 3H040 CC14 CC16 DD36 3H044 CC12 CC14 DD23 4K029 AA02 BA07 BA17 BA34 BA64 BB02 BC02 BD03 BD04 CA05 EA01 4K030 AA10 BA06 BA18 BA28 BA61 BB12 BB13 CA02 FA01 LA01 LA23
Claims (6)
硬質炭素膜を被覆した部材において、硬質炭素膜の上層
側に占める金属含有率が体積比率で３０％以下であり、
硬質炭素膜の下層側すなわち基材側に占める金属含有率
が体積比率で５０％以上となるように、金属含有率に傾
斜を持たせて硬質炭素膜内に金属を添加した層（金属傾
斜層）を、硬質炭素膜の下層に設けることを特徴とする
硬質炭素膜を被覆した機械部品。1. A member in which a hard carbon film is coated on a surface of a mechanical component subjected to a thermal mechanical shock, wherein a metal content occupying an upper layer side of the hard carbon film is 30% or less by volume,
A layer (metal gradient layer) in which a metal is added to the hard carbon film with a gradient so that the metal content occupying the lower layer side of the hard carbon film, that is, the base material side is 50% or more by volume ratio. ) Is provided below the hard carbon film.
間層を、機械部品（基材）と硬質炭素膜の間に設けるこ
とを特徴とする請求項１に記載の硬質炭素膜を被覆した
機械部品。2. The hard carbon film according to claim 1, wherein an intermediate layer containing the same metal as the additive metal of the metal gradient layer is provided between the mechanical component (base material) and the hard carbon film. Machine parts.
を特徴とする請求項１または２に記載の硬質炭素膜を被
覆した機械部品。3. A machine part coated with a hard carbon film according to claim 1, wherein titanium or chromium is added metal.
０．２〜２μｍとし、チタンまたはクロム等の金属傾斜
層の厚みを０．５〜５μｍとし、金属傾斜層以外の硬質
炭素膜の厚みを０．５〜５μｍとすることを特徴とする
請求項１、２または３に記載の硬質炭素膜を被覆した機
械部品。4. The thickness of an intermediate layer of titanium or chromium is 0.2 to 2 μm, the thickness of a metal gradient layer of titanium or chromium is 0.5 to 5 μm, and the thickness of a hard carbon film other than the metal gradient layer. The mechanical component coated with the hard carbon film according to claim 1, wherein the thickness is 0.5 to 5 μm.
品が自動車用エンジン部品であり、それがシリンダー、
タペット、ピストン、プランジャー、パワーステアリン
グのベーンポンプまたは自動車用各種ベアリングに用い
られる部品であることを特徴とする硬質炭素膜を被覆し
た機械部品。5. The machine part according to claim 1, 2, 3 or 4, wherein the machine part is an engine part for an automobile, which is a cylinder,
A mechanical part coated with a hard carbon film, which is used for a tappet, a piston, a plunger, a vane pump for power steering, or various bearings for automobiles.
属をスッパタリング法で堆積させながら、同時に、炭素
含有ガスをスッパタリング装置内のプラズマ内に導入す
ることにより、プラズマＣＶＤ法で硬質炭素の堆積を行
うことを特徴とする、請求項１、２、３、４または５に
記載の機械部品に被覆する硬質炭素膜の製造方法。6. While depositing a metal such as titanium or chromium as an additional metal by a sputtering method and simultaneously introducing a carbon-containing gas into plasma in a sputtering apparatus, a hard carbon is removed by a plasma CVD method. The method for producing a hard carbon film for coating a mechanical part according to claim 1, 2, 3, 4, or 5, wherein the deposition is performed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31727299A JP2001107220A (en) | 1999-09-30 | 1999-09-30 | Machine parts coated with hard carbon film and its production method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31727299A JP2001107220A (en) | 1999-09-30 | 1999-09-30 | Machine parts coated with hard carbon film and its production method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001107220A true JP2001107220A (en) | 2001-04-17 |
Family
ID=18086393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31727299A Pending JP2001107220A (en) | 1999-09-30 | 1999-09-30 | Machine parts coated with hard carbon film and its production method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001107220A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003027214A (en) * | 2001-07-17 | 2003-01-29 | Sumitomo Electric Ind Ltd | Amorphous carbon film, method for producing amorphous carbon film and member coated with amorphous carbon film |
| JP2004239191A (en) * | 2003-02-07 | 2004-08-26 | Kayaba Ind Co Ltd | Hydraulic piston pump motor |
| JP2005256047A (en) * | 2004-03-10 | 2005-09-22 | Ulvac Japan Ltd | SURFACE TREATMENT METHOD AND SURFACE TREATMENT APPARATUS FOR Mg ALLOY MEMBER |
| JP2006077856A (en) * | 2004-09-08 | 2006-03-23 | Nissan Motor Co Ltd | Low friction sliding member |
| JP2007246996A (en) * | 2006-03-16 | 2007-09-27 | Tdk Corp | Protective film, and component for use in internal combustion engine provided with the protective film |
| JP2008214759A (en) * | 2001-08-21 | 2008-09-18 | Toshiba Corp | Method for producing carbon film-coated member |
| JP2010100878A (en) * | 2008-10-22 | 2010-05-06 | Nachi Fujikoshi Corp | Substantially hydrogen-free low chromium-containing dlc film and sliding component |
-
1999
- 1999-09-30 JP JP31727299A patent/JP2001107220A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003027214A (en) * | 2001-07-17 | 2003-01-29 | Sumitomo Electric Ind Ltd | Amorphous carbon film, method for producing amorphous carbon film and member coated with amorphous carbon film |
| JP2008214759A (en) * | 2001-08-21 | 2008-09-18 | Toshiba Corp | Method for producing carbon film-coated member |
| JP2004239191A (en) * | 2003-02-07 | 2004-08-26 | Kayaba Ind Co Ltd | Hydraulic piston pump motor |
| JP2005256047A (en) * | 2004-03-10 | 2005-09-22 | Ulvac Japan Ltd | SURFACE TREATMENT METHOD AND SURFACE TREATMENT APPARATUS FOR Mg ALLOY MEMBER |
| JP2006077856A (en) * | 2004-09-08 | 2006-03-23 | Nissan Motor Co Ltd | Low friction sliding member |
| JP2007246996A (en) * | 2006-03-16 | 2007-09-27 | Tdk Corp | Protective film, and component for use in internal combustion engine provided with the protective film |
| JP2010100878A (en) * | 2008-10-22 | 2010-05-06 | Nachi Fujikoshi Corp | Substantially hydrogen-free low chromium-containing dlc film and sliding component |
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