KR100310583B1 - Barrel polishing apparatus - Google Patents

Barrel polishing apparatus Download PDF

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Publication number
KR100310583B1
KR100310583B1 KR1019970063481A KR19970063481A KR100310583B1 KR 100310583 B1 KR100310583 B1 KR 100310583B1 KR 1019970063481 A KR1019970063481 A KR 1019970063481A KR 19970063481 A KR19970063481 A KR 19970063481A KR 100310583 B1 KR100310583 B1 KR 100310583B1
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KR
South Korea
Prior art keywords
precision polishing
workpiece
precision
polishing medium
carried out
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Application number
KR1019970063481A
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Korean (ko)
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KR19980042849A (en
Inventor
아키타카 마츠시타
슈지 가와사키
Original Assignee
가부시키가이샤 비-비-에프 야마테
아키타카 마츠시타
슈지 가와사키
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Priority claimed from JP8332865A external-priority patent/JPH10156674A/en
Priority claimed from JP8332866A external-priority patent/JPH10156700A/en
Priority claimed from JP8358015A external-priority patent/JPH10193251A/en
Priority claimed from JP8358014A external-priority patent/JPH10193272A/en
Priority claimed from JP9047369A external-priority patent/JPH10225860A/en
Priority claimed from JP9047370A external-priority patent/JPH10225859A/en
Priority claimed from JP9231778A external-priority patent/JPH1158215A/en
Application filed by 가부시키가이샤 비-비-에프 야마테, 아키타카 마츠시타, 슈지 가와사키 filed Critical 가부시키가이샤 비-비-에프 야마테
Publication of KR19980042849A publication Critical patent/KR19980042849A/en
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Publication of KR100310583B1 publication Critical patent/KR100310583B1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/003Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor whereby the workpieces are mounted on a holder and are immersed in the abrasive material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/06Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving oscillating or vibrating containers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/06Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving oscillating or vibrating containers
    • B24B31/064Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving oscillating or vibrating containers the workpieces being fitted on a support
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
    • B24B31/12Accessories; Protective equipment or safety devices; Installations for exhaustion of dust or for sound absorption specially adapted for machines covered by group B24B31/00
    • B24B31/14Abrading-bodies specially designed for tumbling apparatus, e.g. abrading-balls
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D13/00Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
    • B24D13/20Mountings for the wheels

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

습식정밀연마가공방법은 최종정밀연마가공단계가 알카리성 정밀연마액체내에서 실행되고 나머지 정밀연마가공단계가 다른 산성버핑액체내에서 실행되도록 실시된다. 가공물정밀연마장치는 연결해체방지부재가 가공물에 대한 축의 전단끝에 배치되고 버핑휠의 외측이 연결해체방지부재와 접촉하고 조임너트가 버핑휠과 나사적으로 맞물리고, 버핑휠이 조임너트를 축을 따라 이동시킴으로써 축에 확고하게 고정하도록 구성되어 있다. 또한, 표면처리실행방법은 표면처리전 또는 후에 가공물이 배럴정밀연마가공되고 그 후에 각각의 표면처리가 실행되도록 실시된다. 또한, 가공물지지장치는 정밀연마매체가 수용된 정밀연마매체수용용기와 가공물지지아암을 가지고 있다. 더욱이, 정밀연마장치에 사용가능한 정밀연마매체는 연성재의 그레인 또는 연성재의 작은 블록으로 이루어져 있다.The wet precision polishing process is carried out such that the final precision polishing step is carried out in an alkaline precision polishing liquid and the remaining precision polishing step is carried out in another acidic buffing liquid. The workpiece precision grinding apparatus is characterized in that the connection disassembly member is disposed at the front end of the shaft relative to the workpiece, the outer side of the buffing wheel contacts the disconnection preventing member, the tightening nut is engaged with the buffing wheel in a spatially interlocking manner, And is firmly fixed to the shaft by moving. Further, the surface treatment execution method is carried out such that the workpiece is subjected to barrel precision polishing before or after the surface treatment, and then each surface treatment is performed. Further, the workpiece supporting apparatus has a precision polishing medium receiving container and a workpiece supporting arm accommodating the precision polishing medium. Further, the precision polishing medium usable in the precision polishing apparatus is composed of a small block of a soft material or a grain of a soft material.

Description

배럴정밀연마장치{BARREL POLISHING APPARATUS}[0001] BARREL POLISHING APPARATUS [0002]

본 발명은 배럴정밀연마장치에 관한 것이다.The present invention relates to a barrel precision polishing apparatus.

(종래의 기술)(Prior art)

종래 배럴정밀연마장치에 있어서, 각각의 가공물은 가공물이 정밀연마매체수용용기내에 수용된 정밀연마매체에 담겨져 있는 동안에 정밀연마매체가 정밀연마매체수용용기내에서 유동하도록 함으로써 정밀연마가공된다.In the conventional barrel precision polishing apparatus, each workpiece is precision-polished by causing the precision polishing medium to flow in the precision polishing medium receiving container while the workpiece is immersed in the precision polishing medium accommodated in the precision polishing medium accommodating container.

하지만, 종래 배럴정밀연마장치에 있어서, 각각의 가공물이 확고하게 파지되어 있는 동안에 정밀연마매체수용용기내에 수용된 배럴정밀연마매체내에 담겨져 있으므로, 가공물을 짧은시간내에 정밀연마하기 어렵다는 불편함을 야기한다.However, in the conventional barrel precision polishing apparatus, since each workpiece is contained in the barrel precision polishing medium accommodated in the precision polishing medium accommodating container while being firmly grasped, it is inconvenient that it is difficult to precisely polish the workpiece in a short time.

(본 발명의 목적)(Object of the present invention)

본 발명은 상술한 바와 같은 종래기술의 본질적인 문제점을 제거하기 위하여 이루어졌다. 그러므로, 본 발명의 목적은 각각의 정밀연마가공작동의 작동효율이 개선될 수 있는 것을 보장하는 배럴정밀연마장치를 제공하는데 있다.SUMMARY OF THE INVENTION The present invention has been made in order to eliminate the essential problems of the prior art as described above. It is therefore an object of the present invention to provide a barrel precision polishing apparatus which ensures that the operating efficiency of each precision polishing operation can be improved.

(본 발명의 구조 및 유리한 효과)(Structure and advantageous effect of the present invention)

본 발명에 따른 배럴정밀연마장치는 이 장치가 정밀연마매체가 수용되는 정밀연마매체수용용기와 가공물지지아암을 가지고 있고 상기 정밀연마매체수용용기가 상부끝개구부를 가지고 있으며, 상기 가공물지지아암이 그 축선라인둘레에서 회전될 수 있고 가공물이 가공물지지아암의 전단끝에 분리가능하게 부착될 수 있도록 구성되어 있다. 따라서, 가공물과 정밀연마매체가 서로 용이하게 접촉함에 따라, 결과적으로, 배럴정밀연마가공작동의 작동효율은 개선될 수 있다.The barrel precision grinding apparatus according to the present invention is characterized in that the apparatus has a precision grinding medium receiving container and a workpiece supporting arm in which a precision grinding medium is accommodated and the precision grinding medium receiving container has an upper end opening, The workpiece can be rotated about the axis line and the workpiece can be detachably attached to the front end of the workpiece support arm. Thus, as the workpiece and the precision polishing medium easily contact each other, as a result, the operating efficiency of the barrel precision polishing operation can be improved.

부가적으로, 가공물지지아암이 축선방향으로 전후방으로 이동되면, 각각의 가공물은 가공물지지축에 부착 및 분리될 때에 하부위치를 취하도록 이동될 수 있다. 따라서, 가공물은 가공물지지축에 쉽게 부착 및 분리될 수 있다.Additionally, when the workpiece support arms are moved back and forth in the axial direction, each workpiece can be moved to assume a lower position when attached and separated to the workpiece support shaft. Thus, the workpiece can be easily attached and separated to the workpiece support shaft.

또한, 가공물지지아암이 수평방향으로 회전가능하게 이동되면, 가공물은 정밀연마매체수용용기에 위치된 적당한 위치에 쉽게 위치될 수 있다.Further, when the workpiece support arm is rotatably moved in the horizontal direction, the workpiece can be easily positioned at a proper position located in the precision polishing medium receiving container.

또한, 가공물지지아암이 회전가능하게 수평방향으로 이동될 때에, 정밀연마될 가공물의 표면이 정밀연마매체수용용기의 내측벽 또는/ 및 바닥벽에 대한 정밀연마매체의 유동방향으로 상향으로 경사져 있는 상태하에서 가공물이 위치될 수 있음에 따라, 정밀연마매체의 유동은 가공물과 정밀연마매체수용용기의 내측벽 또는/ 및 바닥벽사이에서 조절될 수 있다. 그러므로, 가공물의 정밀연마될 표면에 대한 정밀연마매체의 가압은 증가되며 그 결과 정밀연마효과는 개선될 수 있다.Further, when the workpiece support arm is moved in the rotatable horizontal direction, the surface of the workpiece to be precision-grounded is inclined upward in the flow direction of the precision polishing medium relative to the inner wall and / or the bottom wall of the precision polishing medium receiving container The flow of the precision polishing medium can be adjusted between the workpiece and the inner wall and / or the bottom wall of the precision polishing medium receiving container. Therefore, the pressing force of the precision polishing medium against the surface to be precisely polished of the workpiece is increased, and as a result, the precision polishing effect can be improved.

도 1은 본 발명의 실시예에 따라 작동가능한 배럴정밀연마장치에 채용가능한 가공물지지유니트를 도시한 사시도,BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a perspective view illustrating a workpiece support unit employable in a barrel precision polishing apparatus operable in accordance with an embodiment of the present invention,

도 2는 도 1에 도시된 배럴정밀연마장치에 의해서 취해진 부착/분리상태를 도시한 사시도,FIG. 2 is a perspective view showing an attachment / detachment state taken by the barrel precision polishing apparatus shown in FIG. 1;

도 3은 도 1에 도시된 가공물지지유니트상에 장착된 가공물지지아암에 채용가능한 전방/후방 이동기구를 도시한 설명도, 및Fig. 3 is an explanatory view showing a forward / rearward moving mechanism which can be adopted in the workpiece support arm mounted on the workpiece support unit shown in Fig. 1, and Fig.

도 4는 도 1에 도시된 가공물지지유니트상에 배열된 배면판에 채용가능한 회전기구를 도시한 설명도.Fig. 4 is an explanatory view showing a rotation mechanism employable in the back plate arranged on the workpiece support unit shown in Fig. 1; Fig.

(본발명의 실시예)(Embodiment of the present invention)

도 1은 가공물이 정밀연마가공상태로 유지되는 본 발명의 실시예에 따라 구성된 배럴정밀연마장치에 채용가능한 가공물지지유니트를 도시한 사시도이며, 도 2는 배럴정밀연마장치에서 가공물의 부착/분리를 도시한 사시도이며, 도 3은 가공물지지유니트에서 가공물지지아암용 전후방이동기구를 도시한 사시도이고 도 4는 가공물지지유니트내의 배면판용 회전기구를 도시한 사시도이다.Fig. 1 is a perspective view showing a workpiece support unit that can be employed in a barrel precision polishing apparatus constructed in accordance with an embodiment of the present invention in which a workpiece is kept in a precision abrasive machining state, and Fig. 2 is a perspective view showing the attachment / Fig. 3 is a perspective view showing a front and rear moving mechanism for a workpiece support arm in the workpiece support unit, and Fig. 4 is a perspective view showing a rotation mechanism for a backplate in the workpiece support unit.

도 1 및 도 2에서, 참조번호(9B)는 배럴정밀연마장치를 나타내며 참조번호(910)는 배럴정밀연마장치(9B)용 베이스보드를 나타낸다. 참조번호(920)는 정밀연마매체수용용기를 나타내며, 이 정밀연마매체수용용기(920)는 베이스보드(910)상에 장착된다. 정밀연마매체수용용기(920)는 적당한 구동수단(도시안됨)을 작동시킴으로써 축선라인 둘레에서 원주방향으로 회전될 수 있다. 참조번호(921)는 정밀연마매체를 나타내며, 이 정밀연마매체(921)는 정밀연마매체수용용기(920)내에 수용된다. 세라믹그레인 등과 같이 통상 사용가능한 모든 종류는사용될 수 있다. 부수적으로, 습식정밀연마과정은 정밀연마가공방법을 실시하기 위하여 사용될 수 있으며 대안적으로, 건식정밀연마과정은 정밀연마가공방법을 실시하기 위하여 사용될 수 있다.In Figs. 1 and 2, reference numeral 9B denotes a barrel precision polishing apparatus, and reference numeral 910 denotes a baseboard for a barrel precision polishing apparatus 9B. Reference numeral 920 denotes a precision polishing medium receiving container, and this precision polishing medium receiving container 920 is mounted on the base board 910. The precision polishing medium receiving container 920 can be rotated in the circumferential direction around the axial line by operating suitable driving means (not shown). Reference numeral 921 denotes a precision polishing medium, and this precision polishing medium 921 is received in a precision polishing medium receiving container 920. Ceramic grains, and the like can be used. Incidentally, the wet precision polishing process can be used to perform a precision polishing process. Alternatively, the dry precision polishing process can be used to perform a precision polishing process.

참조번호(922)는 정밀연마매체수용용기(920)의 상부끝에 형성된 상부끝개구부를 나타내며 나중에 설명될 가공물(W)(차량등에 사용가능한 알루미늄휠)은 상부끝개구부(922)를 경유하여 정밀연마매체(921)내에 담겨져 있다. 그 다음에, 참조번호(911)는 지지프레임을 나타내며, 이 지지프레임(911)은 베이스보드(910)상에 직립되어 있다. 지지프레임(911)은 정밀연마매체수용용기(920)의 상부끝에 실질적으로 도달하도록 윗쪽방향으로 뻗어 있다.Reference numeral 922 denotes an upper end opening formed at the upper end of the precision polishing medium receiving container 920 and a workpiece W (an aluminum wheel usable in a vehicle or the like) to be described later is mounted on the upper end opening 922, And is contained in the medium 921. Next, reference numeral 911 denotes a support frame, and this support frame 911 is erected on the base board 910. The support frame 911 extends upwards so as to substantially reach the upper end of the precision polishing medium receiving container 920.

참조번호(930)는 배면판을 나타내며, 이 배면판(930)은 회전축(931)을 경유하여 지지프레임(911)상에 회전가능하게 장착된다. 이 배면판(930)은 회전축(931)의 회전을 기초로 하여(즉, 도 1 및 도 2에 도시된 상태로 형성된 범위내에서) 약 180°의 범위내에서 회전될 수 있다. 또한, 도 4에 도시된 바와 같이, 제1 구동모터(932)는 지지프레임(911)상에 장착되어 있다. 모터(932)의 회전력이 감속된 상태에서 감소되는 동안에, 상기 회전력은 제1 구동모터(932)의 풀리(933)로부터 V벨트(934)를 경유하여 회전축(931)의 풀리(935)로 전달되며 이에 따라 배면판(930)은 약 180°의 범위내에서 왕복가능하게 회전될 수 있다.Reference numeral 930 denotes a back plate which is rotatably mounted on the support frame 911 via a rotation shaft 931. [ This back plate 930 can be rotated within a range of about 180 degrees based on the rotation of the rotation shaft 931 (that is, within a range formed in the state shown in Figs. 1 and 2). 4, the first drive motor 932 is mounted on the support frame 911. [ The rotational force is transmitted from the pulley 933 of the first drive motor 932 to the pulley 935 of the rotational shaft 931 through the V belt 934 while the rotational force of the motor 932 is reduced in the decelerated state So that the back plate 930 can be reciprocally rotated within a range of about 180 degrees.

참조번호(940)는 지지베드를 나타내며, 이 지지베드(940)는 한쌍의 브래킷(941)을 경유하여 배면판(930)에 고정된다. 이러한 지지베드(940)은 전방으로 경사진 상태(나중에 설명될 가공물지지아암의 전단측이 전방방향으로 나타내는것으로 가정한다)로 지지프레임(911)상에 장착된다. 지지베드(940)의 경사각도가 조정될 수 있다는 것에 주의하여야 한다.Reference numeral 940 denotes a support bed, and the support bed 940 is fixed to the back plate 930 via a pair of brackets 941. This support bed 940 is mounted on the support frame 911 in a forwardly inclined state (assuming that the front end side of the workpiece support arm to be described later is indicated in the forward direction). It should be noted that the tilt angle of the support bed 940 can be adjusted.

그 다음에, 슬라이드판(950)은 지지베드(940)의 경사진 표면을 따라 전후방향으로 이동하도록 지지베드(940)의 후방표면상에 배열되어 있다. 이 슬라이드판(950)은 볼트/너트기구(95)를 작동시킴으로써 지지베드(940)에 대해 전방/후방방향으로 이동될 수 있다. 부수적으로, 참조번호(9511)는 지지베드(940)의 후방표면상에 배열된 볼트/너트기구(95)내에 있는 볼트부분을 나타내며 참조번호(9512)는 슬라이드판(950)상에 배열된 한쌍의 너트부분을 나타낸다. 제2 구동모터(952)가 구동되어 볼트부분(9511)이 회전되면, 너트부분(9511) 즉 슬라이드판(950)은 너트부분(9512)과의 볼트부분(9511)의 나사맞물림방식으로 전방/후방방향으로 이동된다.The slide plate 950 is then arranged on the back surface of the support bed 940 so as to move back and forth along the inclined surface of the support bed 940. This slide plate 950 can be moved in the forward / backward direction with respect to the support bed 940 by operating the bolt / nut mechanism 95. Incidentally, reference numeral 9511 denotes a bolt portion in a bolt / nut mechanism 95 arranged on the rear surface of the support bed 940, and reference numeral 9512 denotes a pair of bolts / . When the second drive motor 952 is driven to rotate the bolt portion 9511, the nut portion 9511, that is, the slide plate 950 is screwed into the bolt portion 9511 with the nut portion 9512, And is moved in the rearward direction.

도 1 및 도 2를 다시 참조하면, 참조번호(960)는 가공물지지아암을 나타내며 도 3에 도시된 바와 같이, 가공물지지아암(960)은 슬라이드판(950)으로부터 돌출된다. 가공물(W)(차량등에 사용가능한 휠)은 가공물(W)이 정밀연마매체수용용기(920)내에 수용된 정밀연마매체(821)에 담겨져 있도록 에어척(도시안됨)의 도움으로 가공물지지아암(960)의 전단끝에 분리가능하게 부착된다. 또한, 제3 구동모터(961)는 슬라이드판(950)상에 장착된다. 감속된 상태로 제3 구동모터(961)의 회전력을 가공물지지아암(960)으로 전달시킴으로써 그 축선라인둘레에서 회전될 수 있다. 부수적으로, 가공물지지아암(960)은 역방향으로 뿐만 아니라 정상방향으로 간헐적으로 회전될 수 있다.Referring back to Figs. 1 and 2, reference numeral 960 denotes a workpiece support arm, and the workpiece support arm 960 protrudes from the slide plate 950, as shown in Fig. The workpiece W (a wheel that can be used for a vehicle or the like) is supported by a workpiece support arm 960 (not shown) with the aid of an air chuck (not shown) so that the workpiece W is immersed in a precision polishing medium 821 housed in a precision polishing medium receiving container 920 At the front end of the frame. Further, the third drive motor 961 is mounted on the slide plate 950. And can be rotated about its axial line by transmitting the rotational force of the third drive motor 961 to the workpiece support arm 960 in a decelerated state. Incidentally, the workpiece support arm 960 can be rotated intermittently in the normal direction as well as in the reverse direction.

정밀연마장치의 작동은 나중에 설명된다.The operation of the precision polishing apparatus will be described later.

먼저, 도 2에 도시된 바와 같이, 배면판(930)은 제1 구동모터(932)를 구동시킴으로써 정밀연마매체수용용기(920)의 외측에 배열되어 회전축(931)이 회전되도록 한다(도 4에서 가상선으로 표시된 상태를 참조)하도록 한다. 이때, 가공물지지아암(960)의 전방끝부분은 윗쪽으로 경사진 상태를 취하고 있다. 이 상태가 유지되는 동안에, 조작자는 가공물이 지지아암(960)에 고정되도록 지지아암(960)의 전단끝상에 가공물(W)을 위치시킨다.2, the back plate 930 is arranged outside the precision polishing medium receiving container 920 by driving the first driving motor 932 so that the rotating shaft 931 is rotated (see FIG. 4 (See the state indicated by the virtual line in FIG. At this time, the front end portion of the workpiece support arm 960 is inclined upward. While this state is maintained, the operator places the workpiece W on the front end of the support arm 960 so that the workpiece is fixed to the support arm 960.

그 후, 도 1에 도시된 바와 같이, 배면판(30)이 제1 구동모터(932)를 구동시킴으로써 정밀연마매체수용용기(920)의 내측에 위치되어 회전축(931)이 회전되며 이에 따라 휠(W)이 정밀연마매체수용용기(920)내에서 유지되는 유동상태의 정밀연마매체(921)내에 담겨진다. 부수적으로, 가공물(W)이 정밀연마매체(921)내에 담겨진 상태로 유지되는 동안에, 가공물지지아암(960)은 진동상태로 부분적으로 이동된다. 정밀연마가공작동의 완료후, 배면판(930)이 제1 구동모터(932)를 구동시켜 회전축이 회전됨으로써 정밀연마매체수용용기(920)의 외측에 위치되어 회전축(931)이 회전하게 된다. 이때, 가공물지지아암(960)의 전단끝부분은 윗쪽으로 경사진 상태를 취한다. 이 상태가 유지되는 동안에, 조작자는 휠(W)을 가공물지지아암(960)으로부터 연결해체되며 그 후에 그 다음 가공물이 가공물지지아암(960)에 고정되도록 그 다음 가공물을 가공물상에 위치시킨다.1, the back plate 30 is positioned inside the precision polishing medium receiving container 920 by driving the first driving motor 932 so that the rotating shaft 931 is rotated, (W) is held in the precision polishing medium 921 in a fluid state held in the precision polishing medium receiving container 920. [ Incidentally, while the workpiece W is held in the precision abrasive medium 921, the workpiece support arm 960 is partially moved to the vibration state. After the completion of the precision polishing operation, the back plate 930 drives the first driving motor 932 to rotate the rotary shaft, thereby being located outside the precision polishing medium accommodating container 920 and rotating the rotary shaft 931. At this time, the front end portion of the workpiece supporting arm 960 is inclined upward. While this state is maintained, the operator disconnects the wheel W from the workpiece support arm 960 and then places the workpiece on the workpiece so that the next workpiece is secured to the workpiece support arm 960.

부수적으로 스폰지, 고무, 연성플라스틱 등과 같은 연성재가 정밀연마매체로서 정밀연마장치(9B)에 사용될 때, 각각의 마무리정밀연마가공작동은 고효율로 달성될 수 있다. 더욱이 연성재는 각각의 단단한 그레인 또는 각각의 단단한 작은 블록의 표면상에 코팅된다. 코팅된 단단한 그레인 또는 코팅된 단단하고 작은 블록은 상술된 타입의 정밀연마매체로서 사용될 수 있다.Incidentally, when a soft material such as sponge, rubber, soft plastic or the like is used as a precision grinding medium in the precision grinding apparatus 9B, each finishing precision grinding working operation can be achieved with high efficiency. Furthermore, the soft material is coated on the surface of each hard grain or each hard small block. The coated hard grain or coated hard and small block may be used as a precision polishing medium of the type described above.

배럴정밀연마가공작동이 완료된 후, 코팅, 도금, 알루마이트처리 등과 같은 표면처리는 가공물에 대해서 달성된다. 통상 사용가능한 표면처리의 모든 종류는 표면처리의 개념에 포함된다.After the barrel precision polishing operation is completed, surface treatments such as coating, plating, alumite treatment and the like are achieved for the workpiece. All kinds of commonly available surface treatments are included in the concept of surface treatment.

따라서, 가공물과 정밀연마매체가 서로 용이하게 접촉함에 따라, 결과적으로, 배럴정밀연마가공작동에 의해서 얻어진 작동효율은 개선될 수 있다.Thus, as the workpiece and the precision polishing medium easily come into contact with each other, consequently, the operating efficiency obtained by the barrel precision polishing operation can be improved.

부가적으로, 가공물지지아암이 축선방향으로 전후방으로 이동되면, 각각의 가공물은 가공물지지축에 부착 및 분리될 때에 하부위치를 취하도록 이동될 수 있다. 따라서, 가공물은 가공물지지축에 쉽게 부착 및 분리될 수 있다.Additionally, when the workpiece support arms are moved back and forth in the axial direction, each workpiece can be moved to assume a lower position when attached and separated to the workpiece support shaft. Thus, the workpiece can be easily attached and separated to the workpiece support shaft.

또한, 가공물지지아암이 수평방향으로 회전가능하게 이동되면, 가공물은 정밀연마매체수용용기에 위치된 적당한 위치에 쉽게 위치될 수 있다.Further, when the workpiece support arm is rotatably moved in the horizontal direction, the workpiece can be easily positioned at a proper position located in the precision polishing medium receiving container.

또한, 가공물지지아암이 회전가능하게 수평방향으로 이동될 때에, 정밀연마될 가공물의 표면이 정밀연마매체수용용기의 내측벽 또는/ 및 바닥벽에 대한 정밀연마매체의 유동방향으로 상향으로 경사져 있는 상태하에서 가공물이 위치될 수 있음에 따라, 정밀연마매체의 유동은 가공물과 정밀연마매체수용용기의 내측벽 또는/ 및 바닥벽사이에서 조절될 수 있다. 그러므로, 가공물의 정밀연마될 표면에 대한 정밀연마매체의 가압은 증가되며 그 결과 정밀연마효과는 개선될 수 있다.Further, when the workpiece support arm is moved in the rotatable horizontal direction, the surface of the workpiece to be precision-grounded is inclined upward in the flow direction of the precision polishing medium relative to the inner wall and / or the bottom wall of the precision polishing medium receiving container The flow of the precision polishing medium can be adjusted between the workpiece and the inner wall and / or the bottom wall of the precision polishing medium receiving container. Therefore, the pressing force of the precision polishing medium against the surface to be precisely polished of the workpiece is increased, and as a result, the precision polishing effect can be improved.

Claims (3)

배럴정밀연마장치에 있어서, 상기 장치는 버핑매체가 수용된 정밀연마매체수용용기와 가공물지지아암을 가지고 있으며 상기 정밀연마매체수용용기는 상부끝개구부를 가지고 있으며, 상기 가공물지지아암은 축선라인둘레에서 회전될 수 있으며 가공물은 가공물의 전단끝에 분리가능하게 부착될 수 있는 것을 특징으로 하는 배럴정밀연마장치.A barrel precision polishing apparatus comprising: a precision polishing medium receiving vessel and a workpiece support arm, wherein the buffing medium is received, the precision polishing medium receiving vessel having an upper end opening, the workpiece support arm being rotatable about an axis line And the workpiece can be detachably attached to the front end of the workpiece. 제 1 항에 있어서, 상기 가공물지지아암은 수평방향으로 회전가능하게 이동될 수 있는 것을 특징으로 하는 배럴정밀연마장치.The barrel precision grinding apparatus according to claim 1, wherein the workpiece support arm is rotatably movable in a horizontal direction. 제 1 항에 있어서, 상기 가공물지지아암은 축선방향으로 전후이동될 수 있는 것을 특징으로 하는 배럴정밀연마장치.The barrel precision grinding apparatus according to claim 1, wherein the workpiece support arm can be moved back and forth in an axial direction.
KR1019970063481A 1996-11-27 1997-11-27 Barrel polishing apparatus KR100310583B1 (en)

Applications Claiming Priority (14)

Application Number Priority Date Filing Date Title
JP96-332865 1996-11-27
JP8332865A JPH10156674A (en) 1996-11-27 1996-11-27 Polishing method of workpiece
JP96-332866 1996-11-27
JP8332866A JPH10156700A (en) 1996-11-27 1996-11-27 Wet grinding method
JP8358015A JPH10193251A (en) 1996-12-31 1996-12-31 Barrel polishing device
JP8358014A JPH10193272A (en) 1996-12-31 1996-12-31 Polishing device for work
JP96-358015 1996-12-31
JP96-358014 1996-12-31
JP9047369A JPH10225860A (en) 1997-02-14 1997-02-14 Surface treatment method of work
JP97-047370 1997-02-14
JP9047370A JPH10225859A (en) 1997-02-14 1997-02-14 Work support device for barrel polishing device and polishing medium
JP97-047369 1997-02-14
JP97-231778 1997-08-12
JP9231778A JPH1158215A (en) 1997-08-12 1997-08-12 Barrel polishing device and work holder therefor

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020000051039A Division KR100318999B1 (en) 1996-11-27 2000-08-31 Work polishing method and barrel polishing apparatus

Publications (2)

Publication Number Publication Date
KR19980042849A KR19980042849A (en) 1998-08-17
KR100310583B1 true KR100310583B1 (en) 2003-03-15

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Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0922530B1 (en) * 1997-12-10 2005-03-23 Shuji Kawasaki Barrel-polishing apparatus
US6261154B1 (en) * 1998-08-25 2001-07-17 Mceneny Jeffrey William Method and apparatus for media finishing
US20020088773A1 (en) * 2001-01-10 2002-07-11 Holland Jerry Dwayne Nonabrasive media with accelerated chemistry
CN101486158B (en) * 2009-02-14 2012-05-30 陈炳巽 Sanding wire-drawing machine
US10179388B2 (en) * 2009-05-12 2019-01-15 Rem Technologies, Inc. High throughput finishing of metal components
EP2283969A1 (en) * 2009-07-30 2011-02-16 REM Technologies, Inc. High throughput finishing of metal components
CN102211307B (en) * 2011-06-10 2012-10-03 湖南科技大学 Automatic oilstone feeding device of portable plastic mould conformal-polishing machine
CN103522171B (en) * 2012-07-05 2016-04-06 上海华虹宏力半导体制造有限公司 A kind of nitrogen gas conveying device for polishing pad abrasive disk
CN107030583A (en) * 2017-03-21 2017-08-11 天津华海清科机电科技有限公司 Silicon substrate film polishing method and device
CN108356635A (en) * 2017-09-26 2018-08-03 六和轻合金(昆山)有限公司 A kind of automotive hub smart car part coating process
CN108115499B (en) * 2017-12-25 2023-08-22 中信戴卡股份有限公司 Wheel shape-following bristle thorn device
DE102018216615A1 (en) * 2018-09-17 2020-03-19 Aktiebolaget Skf Process for processing a surface of a metal object
CN110039432B (en) * 2019-04-22 2024-05-07 珠海广鑫厨卫科技有限公司 Polishing machine and polishing process
KR102528200B1 (en) * 2021-03-19 2023-05-03 주식회사 기현테크 Deburring method of processed surface of biocompatible parts made of titanium alloy material
CN114178935B (en) * 2021-12-30 2022-11-29 无锡市夸克微智造科技有限责任公司 Artificial crystalline lens micro-processing equipment and processing technology
CN115213793A (en) * 2022-07-19 2022-10-21 无锡汉瓷特种陶瓷技术有限公司 Polishing device and polishing method for production of engine ceramic core
CN115157018B (en) * 2022-07-28 2023-12-12 九江德福科技股份有限公司 Method for solving poor texture of foil surface of lithium electric copper foil

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2660009A (en) * 1952-01-05 1953-11-24 Lyon Inc Abrading wheel
US2726495A (en) * 1952-10-04 1955-12-13 Field Albert Abrading implement
US3623278A (en) * 1969-12-03 1971-11-30 Teletype Corp Deburring process
JPS5111874A (en) * 1974-07-19 1976-01-30 Adobansuto Mashin Puraningu In JUGOHOHOOYOBISORENIMOCHIIRU HEISASOCHIKEI
JPS5256490A (en) * 1975-10-01 1977-05-09 Tipton Mfg Corp Frozen barrel processing method
US4205487A (en) * 1978-03-24 1980-06-03 King-Seeley Thermos Co. Workpiece holding apparatus for spindle finishing machines and the like
US4446656A (en) * 1979-04-09 1984-05-08 Kabushiki Kaisha Shikishima Chipton Long-travel annular vibratory barrel finishing apparatus for line-processing
DE3047088A1 (en) * 1980-12-13 1982-07-29 Estel Hoesch Werke Ag, 4600 Dortmund Metal strip coating removal - before welding by acid, alkaline solution, rotary brushes and drying
FR2511919B1 (en) * 1981-08-27 1986-04-04 Parker Ste Continentale PINBOARD TRIBOFINITION MACHINE
JPS5947156A (en) * 1982-09-10 1984-03-16 Shintou Bureetaa Kk Method and device for polishing hydraulically vibrating surface
JPS60242960A (en) * 1984-05-17 1985-12-02 Tipton Mfg Corp Porous resin media and its manufacturing method
DE3610341A1 (en) * 1986-03-26 1987-10-01 Spaleck Gmbh Max Sound-absorbing lid for trough- or bowl-shaped receptacles for working workpieces
JPH0812158B2 (en) * 1988-02-06 1996-02-07 株式会社マックサイエンス X-ray diffractometer
JP2698623B2 (en) * 1988-09-27 1998-01-19 松下電工株式会社 Reflector
WO1992000162A1 (en) * 1990-06-26 1992-01-09 Hoffman Steve E Method for surface finishing of articles
JP2689706B2 (en) * 1990-08-08 1997-12-10 上村工業株式会社 Polishing method
JP3253643B2 (en) * 1991-03-19 2002-02-04 旭テック株式会社 Barrel polishing equipment
FR2675418B1 (en) * 1991-04-16 1995-09-29 Perrot Yvan PROCESS OF CRYOGENIC DEBURRING IN VACUUM.
JPH05111874A (en) * 1991-10-21 1993-05-07 Tsutsumi Seisakusho:Kk Polisher
US5507685A (en) * 1993-08-25 1996-04-16 Hoffman; Steve E. Method for surface finishing of difficult polish surfaces
DE4404123C1 (en) * 1994-02-09 1995-09-07 Dreher Manfrid Kg Dr Ing Process for dry grinding and subsequent dry polishing of objects in rotating centrifugal mass finishing machines
JPH08144083A (en) * 1994-11-17 1996-06-04 Taiyo Yuden Co Ltd Plating post treatment of electronic parts
EP0868259A4 (en) * 1995-11-30 1999-02-24 Dave Lapoint Automobile wheel finishing apparatus
JPH09155724A (en) * 1995-12-11 1997-06-17 B B F Yamate:Kk Wet type polishing method

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Publication number Publication date
DE69729779D1 (en) 2004-08-12
EP0845327A2 (en) 1998-06-03
KR100318999B1 (en) 2002-01-04
CA2220820C (en) 2002-05-07
BR9706040A (en) 2001-11-27
EP0956925A1 (en) 1999-11-17
MX9709152A (en) 1998-09-30
CN1184018A (en) 1998-06-10
AU4517097A (en) 1998-06-04
ES2222494T3 (en) 2005-02-01
DE69729779T2 (en) 2005-07-14
EP0845327B1 (en) 2004-07-07
EP0845327A3 (en) 1998-09-30
CA2323335A1 (en) 1998-05-27
MY123830A (en) 2006-06-30
CA2323328A1 (en) 1998-05-27
KR19980042849A (en) 1998-08-17
TR199701398A3 (en) 1999-10-21
AU706377B2 (en) 1999-06-17
CN1078835C (en) 2002-02-06
EP0956926A1 (en) 1999-11-17
TR199701398A2 (en) 1999-10-21
CA2220820A1 (en) 1998-05-27

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