KR100260330B1 - A phosphor layer forming method of a flat panel display - Google Patents

A phosphor layer forming method of a flat panel display Download PDF

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KR100260330B1
KR100260330B1 KR1019970063221A KR19970063221A KR100260330B1 KR 100260330 B1 KR100260330 B1 KR 100260330B1 KR 1019970063221 A KR1019970063221 A KR 1019970063221A KR 19970063221 A KR19970063221 A KR 19970063221A KR 100260330 B1 KR100260330 B1 KR 100260330B1
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South Korea
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conductive film
film
transparent conductive
electrodeposition
fluorescent
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KR1019970063221A
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Korean (ko)
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KR19990042411A (en
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김봉철
이남양
백종봉
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김영남
오리온전기주식회사
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22—Applying luminescent coatings
    • H01J9/227—Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00—Electron emission display panels, e.g. field emission display panels
    • H01J2329/18—Luminescent screens
    • H01J2329/32—Means associated with discontinuous arrangements of the luminescent material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/10—Screens on or from which an image or pattern is formed, picked up, converted or stored
    • H01J29/18—Luminescent screens
    • H01J29/30—Luminescent screens with luminescent material discontinuously arranged, e.g. in dots, in lines
    • H01J29/32—Luminescent screens with luminescent material discontinuously arranged, e.g. in dots, in lines with adjacent dots or lines of different luminescent material, e.g. for colour television

Abstract

PURPOSE: A method for forming a fluorescent layer of a flat display device is provided to prevent a color of a fluorescent layer from being mixed by forming uniformally a thickness of a fluorescent layer. CONSTITUTION: A transparent conductive layer red(26), a transparent conductive layer green(28), and a transparent conductive layer blue(26) are formed on a glass substrate(20). An insulating layer is formed on the transparent conductive layer green(28) and the transparent conductive layer blue(26). A conductive layer(24a) is formed thereon. An insulating layer(24b) is formed on one side of the conductive layer(24a). A conductive layer(22b) is formed thereon in order to be connected with the transparent conductive layer green(28). An insulating layer(24c) is formed on one side of the insulating layer(24b). A conductive layer(22c) is formed thereon. A cathode(36) is installed within an electro-deposition solution.(32) An anode is connected with the conductive layer(22a). The conductive layers(22b,22c) are connected with grounding portion(38).

Description

평판표시소자의 형광막 형성방법Method of Forming Fluorescent Film of Flat Panel Display Device

본 발명은 평판표시소자의 형광막 형성방법에 관한 것으로, 더욱 상세하게는 전착법을 이용해 풀 칼라의 형광막 형성시 서로 다른 색의 형광막을 전착시키지 않아 형광막의 혼색을 방지할 수 있는 평판표시소자의 형광막 형성방법에 관한 것이다.The present invention relates to a method for forming a fluorescent film of a flat panel display device, and more particularly, a flat panel display device capable of preventing mixing of fluorescent films by electrodepositing fluorescent films of different colors when forming a full color fluorescent film using an electrodeposition method. It relates to a method for forming a fluorescent film.

일반적으로 종래의 전계방출표시소자는 진공중에서 캐소드로부터 방출되어지는 전자가 애노드의 형광막을 때려 형광막이 발광하는 면에서는 브라운관과 유사점은 있지만, 브라운관은 전자총에서 높은 전압을 걸어 방출하는 것으로, 그 전자의 이동 거리가 긴 반면에 전계방출표시소자는 브라운관과는 달리 수십 만개의 캐소드에 전기장을 형성하여 전자가 방출되는 것을 이용한다.In general, a field emission display device has a similarity to a CRT in that electrons emitted from a cathode in a vacuum hit an anode fluorescent film and emit a fluorescent film, but a CRT emits a high voltage through an electron gun. On the other hand, the field emission display device, unlike the CRT, forms an electric field in hundreds of thousands of cathodes and emits electrons.

그러나 전계방출표시소자는 브라운관과는 다르게 샤도우 마스크 등이 없으므로 형광막의 두께 및 형광막의 균일도에 의하여 그 품위를 좌우하게 되므로, 평판표시소자에서는 형광막의 두께 및 막 균일도를 일정하게 하는 것이 필수적인 것으로, 그 것에 관한 기술들이 연구되어 제시되고는 있지만, 평판표시소자의 형광막 두께, 형광막의 균일도 등을 해결하여 치밀한 형광막을 형성시키는 것에는 별다른 효과를 얻지 못하였다.However, since the field emission display device does not have a shadow mask or the like unlike the CRT, the quality of the field emission display device depends on the thickness of the fluorescent film and the uniformity of the fluorescent film. Although techniques related to the present invention have been studied and presented, it has not been found to have a significant effect in forming a compact fluorescent film by solving the thickness of the fluorescent film of the flat panel display device, the uniformity of the fluorescent film, and the like.

따라서, 최근에는 1950년대부터 CRT의 제조에 응용을 한 것이 발표되었으며, 자동차의 페인팅등에도 응용되었던 전착법을 사용하고 있다.Therefore, recently, the application of CRT to the production of the CRT has been announced since the 1950s, and the electrodeposition method, which has been applied to the painting of automobiles, is used.

상기의 전착법은 막 두께와 막 농도가 균일할 뿐만 아니라, 형광막의 형성 속도가 빠르며 두께의 조절이 용이하며 불규칙적인 물체를 코팅할 수 있는 장점을 가지고 있다.The electrodeposition method has the advantage that the film thickness and the film concentration are not only uniform, but also the formation rate of the fluorescent film is fast, the thickness can be easily adjusted, and an irregular object can be coated.

상기 전착법이란 전착 대상물을 매질에 용해된 바인더를 이용하여 음극 또는 양극으로 이동시키고, 음극 또는 양극에서의 화학반응을 통해 매질에 불용성이 된 바인더가 석출되어 전착 대상물과 함께 코팅되는 것을 말한다.The electrodeposition method means that the electrodeposition object is moved to the negative electrode or the positive electrode using a binder dissolved in the medium, and a binder insoluble in the medium is deposited by chemical reaction at the negative electrode or the positive electrode and coated with the electrodeposition object.

상기와 같은 원리를 이용하여 최근에는 도 1 에 도시한 바와 같이, 평판표시소자의 유리 기판(8) 상에 형광막을 형성하였다.In recent years, as shown in FIG. 1, the fluorescent film was formed on the glass substrate 8 of the flat panel display element by using the above principle.

상기 종래의 형광막 전착 방법은, 전착조(4)의 내부에 형광막 전착액(16)을 넣고, 유리 기판(8)에 세로로 길게 투명 도전막R(10)과, 투명도전막G(12)와, 투명도전막B(14)가 형성된 것을 전착조(4)의 형광막 전착액(16)에 담근다.In the conventional fluorescent film electrodeposition method, the fluorescent film electrodeposition liquid 16 is placed inside the electrodeposition tank 4, and the transparent conductive film R 10 and the transparent conductive film G (12) are vertically long on the glass substrate 8. ) And the transparent conductive film B 14 are dipped in the fluorescent film electrodeposition liquid 16 of the electrodeposition tank 4.

상기 전착액(16)에 음극(2)을 연결하고, 양극(6)을 투명 도전막R(10)에 연결하여 전류를 인가하면 투명도전막R(10)상에 전착액(16)에 혼합되어 있는 적색 형광체가 전착된다.When the cathode 2 is connected to the electrodeposition liquid 16, and the anode 6 is connected to the transparent conductive film R 10 to apply an electric current, the electrode 2 is mixed with the electrodeposition liquid 16 on the transparent conductive film R 10. Red phosphor is electrodeposited.

상기와 같은 종래의 방법으로는, 전착조(4)에 전착액을 바꾸어 전극만을 바꾸어 연결하여 투명도전막G(12)상에 연결하여 전류를 인가하며 투명도전막G(12)상에 원하는 패턴의 형광막을 형성할 수 있고, 계속해서 투명 도전막B(14)에도 상기와 같은 방법으로 형광막을 형성할 수 있다.In the conventional method as described above, by changing the electrodeposition solution to the electrodeposition tank 4, only the electrode is connected, connected to the transparent conductive film G (12) to apply a current, and the fluorescence of a desired pattern on the transparent conductive film (G 12) A film can be formed, and then a fluorescent film can be formed in the transparent conductive film B 14 in the same manner as described above.

그러나, 상기와 같은 종래의 형광체 형성방법은, 유리 기판(8) 상에 형성되어 있는 투명도전막R(10)과, 투명도전막G(12)와, 투명도전막B(14)를 세로로 길게 형성하여 전착액(16)에 담근 후에 상부측에 전류를 인가하여 형광막을 형성하게 되면 유리 기판(8)의 투명도전막R(10) 상에 형광막이 전착되나, 그 다음 공정으로 투명도전막G(12)에 형광막의 전착시 주변에 있는 투명도전막R(10)과 투명도전막B(14)에의 패턴간에 아주 미세한 것으로, 즉 10∼150㎛로써 누설전류가 발생되어 주변의 투명도전막 등에도 전착이 되어 ITO투명도전막상에 형성되는 형광막이 혼색이 되어 칼라가 혼탁해지는 문제점이 있었다.However, in the conventional phosphor formation method as described above, the transparent conductive film R (10), the transparent conductive film (G) 12, and the transparent conductive film (B 14) formed on the glass substrate (8) are formed vertically long. If the fluorescent film is formed by applying current to the upper side after immersing in the electrodeposition liquid 16, the fluorescent film is electrodeposited on the transparent conductive film R (10) of the glass substrate (8), but in the next step to the transparent conductive film G (12) When electrodepositing the fluorescent film, it is very fine between the pattern between the transparent conductive film R (10) and the transparent conductive film B (14) in the surroundings. That is, a leakage current is generated at 10 to 150 μm, and thus electrodeposited to the surrounding transparent conductive film, etc. There was a problem that the fluorescent film formed on the film became mixed and the color became cloudy.

또한, 상기의 전착법은 전압이 높을수록 상기와 같은 혼색 현상은 두드러지게 나타나는 것을 이는 형광막의 비중이 높고 입자의 크기가 크므로 저전압에서는 전착이 어려운 문제점등이 있었다.In addition, in the electrodeposition method, the higher the voltage, the mixed color phenomenon is more prominent. This is because the specific gravity of the fluorescent film is high and the particle size is large.

따라서, 본 발명은 종래와 같은 문제점을 감안하여 창출된 것으로, 그 목적은 형광막의 두께가 균일하며, 전착시 형성되는 형광막의 혼색을 방지할 수 있는 평판표시소자의 형광막 형성방법을 제공함에 있다.Accordingly, the present invention has been made in view of the same problems as in the prior art, and an object thereof is to provide a method for forming a fluorescent film of a flat panel display device which has a uniform thickness of the fluorescent film and can prevent mixing of the fluorescent film formed during electrodeposition. .

도 1 은, 종래의 형광막을 형성하는 것을 나타내는 도면.BRIEF DESCRIPTION OF THE DRAWINGS The figure which shows forming the conventional fluorescent film.

도 2 는 본 발명의 평판표시소자의 형광막을 전착조에서 전착하는 것을 나타내는 도면.2 is a view showing electrodeposition of a fluorescent film of a flat panel display device of the present invention in an electrodeposition tank;

도 3 은 본 발명의 절연막이 형성된 부위의 단면을 나타내는 절단면도.3 is a cutaway view showing a cross section of a portion where an insulating film of the present invention is formed;

<도면의 주요 부분에 대한 부호의 설명><Explanation of symbols for the main parts of the drawings>

20: 유리 기판 22a,22b,22c: 전도성 도전막20: glass substrate 22a, 22b, 22c: conductive conductive film

24a, 24c, 24b: 절연막 26: 투명 도전막 적색24a, 24c, 24b: insulating film 26: transparent conductive film red

28: 투명 도전막 녹색 30: 투명 도전막 청색28: transparent conductive film green 30: transparent conductive film blue

32: 전착액 34: 전착조32: electrodeposition liquid 34: electrodeposition tank

36: 음극36: cathode

따라서, 상기와 같은 목적을 달성하기 위하여, 본 발명의 평판표시소자의 형광막 형성방법은, 유리 기판상에 투명 도전막 적색과, 투명 도전막 녹색과, 투명 도전막 청색을 형성하고, 상기 투명 도전막 녹색과, 투명 도전막 청색에만 절연막을 형성하며, 그 위에 투명 도전막 적색이 연결되도록 전도성 도전막을 형성하고, 상기 전도성 도전막의 일측에 투명 도전막 적색과 투명 도전막 청색상에 절연막을 형성하며, 그 위에 투명 도전막 녹색만을 연결하도록 전도성 도전막을 형성하고, 상기 절연막의 일측에 투명 도전막 적색과 투명 도전막 녹색상에 절연막을 형성하며, 그 위에 투명 도전막 청색만을 연결하도록 전도성 도전막을 형성하고, 전착시 전착액을 갖는 전착조에 음극은 전착액에 연결되고, 양극은 전도성 도전막에 연결하고 그이외의 전도성 도전막은 지면의 접지부에 접지시켜 전착시키도록 구성된 특징이 있다.Therefore, in order to achieve the above object, the method for forming a fluorescent film of the flat panel display device of the present invention comprises forming a transparent conductive film red, a transparent conductive film green, and a transparent conductive film blue on a glass substrate. An insulating film is formed only on the conductive film green and the transparent conductive film blue, and a conductive conductive film is formed thereon so that the transparent conductive film red is connected thereon, and an insulating film is formed on the transparent conductive film red and the transparent conductive film blue on one side of the conductive conductive film. A conductive conductive film is formed thereon so as to connect only the transparent conductive film green, and an insulating film is formed on the transparent conductive film red and the transparent conductive film green on one side of the insulating film, and the conductive conductive film is connected thereon to connect only the transparent conductive film blue thereon. In the electrodeposition tank having the electrodeposition liquid at the time of electrodeposition, the anode is connected to the electrodeposition liquid, the anode is connected to the conductive conductive film, and other conduction It was ground to ground the conductive film surface has a feature configured to electrodeposition.

상기와 같은 본 발명의 평판표시소자의 형광막 형성방법을 첨부된 도면을 참조하여 아래와 같이 상세하게 설명한다.A method of forming a fluorescent film of a flat panel display device according to the present invention as described above will be described in detail below with reference to the accompanying drawings.

도 2 는 본 발명의 평판표시소자의 형광막을 전착조에서 전착하는 것을 나타내는 도면이고, 도 3 은 본 발명의 절연막이 형성된 부위의 단면을 나타내는 절단면도이다.FIG. 2 is a view showing electrodeposition of a fluorescent film of a flat panel display device of the present invention in an electrodeposition tank, and FIG. 3 is a cross-sectional view showing a cross section of a portion where an insulating film of the present invention is formed.

유리 기판(20)상에 적색, 녹색, 청색의 형광막을 형성하기 위하여, 투명 도전막 적색(26)과, 투명 도전막 녹색(28)과, 투명 도전막 청색(30)의 패턴을 형성하기 위하여 유리 기판(20)의 전면에 ITO층을 형성하고, 그 위에 감광성 고분자를 코팅, 건조시킨 후, 광을 조사하여 노광시키고, 현상을 한다.In order to form a red, green, and blue fluorescent film on the glass substrate 20, to form a pattern of the transparent conductive film red 26, the transparent conductive film green 28, and the transparent conductive film blue 30 After forming an ITO layer on the whole surface of the glass substrate 20, coating and drying a photosensitive polymer on it, it irradiates light for exposure, and develops.

그리고 상기의 감광 고분자 패턴을 이용하여 외부로 노출된 ITO층을 에칭하여 유리 기판(20) 상에 투명 도전막 적색(26)과, 투명 도전막 녹색(28)과, 투명 도전막 청색(30)을 형성하고 난후에 감광성 고분자를 제거한다.The ITO layer exposed to the outside is etched using the photosensitive polymer pattern, and the transparent conductive film red 26, the transparent conductive film green 28, and the transparent conductive film blue 30 are formed on the glass substrate 20. After forming the photosensitive polymer is removed.

상기와 같이 형성된 유리 기판(20)의 투명 도전막 적색(26)과 투명 도전막 녹색(28)과 투명 도전막 청색(30) 상에 형광막을 전착하기 위한 것으로 전류를 흘려주기 위해서는, 유리기판 (20)의 가장 상부측에 투명 도전막 녹색(28)과, 투명 도전막 청색(30)에만 절연막(24)을 형성하여 전류가 흐르지 않도록 형성하고, 그 위에 투명 도전막 적색(26)이 연결되도록 전도성 도전막(24a)을 형성한다.Electrodepositing a fluorescent film on the transparent conductive film red 26, the transparent conductive film green 28, and the transparent conductive film blue 30 of the glass substrate 20 formed as described above. The insulating film 24 is formed only on the transparent conductive film green 28 and the transparent conductive film blue 30 on the uppermost side of the 20 so as to prevent current from flowing, and the transparent conductive film red 26 is connected thereon. The conductive conductive film 24a is formed.

상기와 같이 구성된 것과 같이, 전도성 도전막(24a)의 일측에 투명 도전막 적색(26)이 투명 도전막 청색(30)상에 절연막(24b)을 형성하며, 그 위에 투명 도전막 녹색(28)만을 연결하도록 전도성 도전막(22b)을 형성한다.As described above, the transparent conductive film red 26 forms an insulating film 24b on the transparent conductive film blue 30 on one side of the conductive conductive film 24a, and the transparent conductive film green 28 is formed thereon. The conductive conductive film 22b is formed so as to connect only.

또한 상기 절연막(24b)의 일측에는 투명 도전막 적색(26)이 투명 도전막 녹색(28)상에 절연막(24c)을 형성하며, 그 위에 투명 도전막(30) 만을 연결하도록 전도성 도전막(22c)을 형성한다.In addition, at one side of the insulating film 24b, the transparent conductive film red 26 forms the insulating film 24c on the transparent conductive film green 28, and the conductive conductive film 22c connects only the transparent conductive film 30 thereon. ).

상기의 유리 기판(20)에 형광막을 형성하기 위한 전류를 인가하도록 전도성 절연막을 형성한다.A conductive insulating film is formed to apply a current to form the fluorescent film on the glass substrate 20.

상기와 같이 구성된 본 고안의 유리 기판(20)에 형광막을 전착하기 위하여 전착시 전착액(32)을 갖는 전착조(34) 내부에 전도성 물질인 음극(36)을 설치하며, 양극은 전도성 도전막(22a)에 연결시켜 전류를 인가하기 전에 전도성 도전막(22b)과 전도성 도전막(22c)은 전착조(34)의 외부 측으로 접지시켜 전착시 전도성 도전막(22a)으로 통하여 흐르는 전류가 투명 도전막 적색(26)의 주변에서 미세하게 흐르는 누설 전류를 외측의 접지부(38)로 흘려 보낸다.In order to deposit the fluorescent film on the glass substrate 20 of the present invention configured as described above, a cathode 36, which is a conductive material, is installed inside the electrodeposition tank 34 having the electrodeposition solution 32 when the electrode is deposited. The conductive conductive film 22b and the conductive conductive film 22c are grounded to the outside of the electrodeposition tank 34 before being connected to the 22a to apply the current, so that the current flowing through the conductive conductive film 22a during electrodeposition is transparent. The leakage current flowing in the vicinity of the membrane red color 26 flows to the outer ground portion 38.

상기 투명 도전막 녹색(28)과, 투명 도전막 청색(30)에 형광막을 형성할 때에는 상기에서 설명한바와 같이 음극의 연결선과 접지선의 연결만을 바꾸어 사용하면 되므로 미세하게 형성되어 있는 투명 도전막의 사이에서 발생되는 누설 전류를 차단하므로, 다른 패턴의 투명 도전막상에는 다른 형광막이 전착되지 않는다.When the fluorescent film is formed on the transparent conductive film green 28 and the transparent conductive film blue 30, as described above, only the connection between the cathode connection line and the ground line may be used, and thus, between the finely formed transparent conductive film. Since the leakage current generated is cut off, another fluorescent film is not electrodeposited on the transparent conductive film of another pattern.

또한 누설 전류가 만약 흐른다 하더라도 누설 전류는 외부의 접지부(38)로 흐르기 때문에 누설 전류에 의해 다른 투명 도전막 등에 전착되지 않는다.In addition, even if the leakage current flows, the leakage current flows to the external ground portion 38 so that it is not electrodeposited to another transparent conductive film or the like by the leakage current.

또한 전도성 도전막의 하부측에 형성되어 있는 절연막은 누설 전류를 차단하기 위하여 전도성 도전막보다 넓게 형성하는 것이 바람직하다.In addition, the insulating film formed on the lower side of the conductive conductive film is preferably formed wider than the conductive conductive film to block the leakage current.

따라서, 상기와 같은 본 발명 평판표시소자의 형광막 형성방법으로 인해, 전착법의 특징으로 형광막의 두께가 균일한 것을 얻을 수 있으며, 상기 전착시에 형성되는 형광체의 혼색을 방지할 수 있어 선명도를 높일 수 있는 효과가 있다.Therefore, the fluorescent film forming method of the flat panel display device of the present invention as described above, it is possible to obtain a uniform thickness of the fluorescent film as a feature of the electrodeposition method, it is possible to prevent the color mixture of the phosphor formed during the electrodeposition can be improved It can increase the effect.

Claims (2)

전착법을 이용하여 형광막 형성시 혼색을 방지할 수 있는 평판표시소자의 형광막 형성방법에 있어서,In the method of forming a fluorescent film of a flat panel display device that can prevent color mixing when forming a fluorescent film by using an electrodeposition method, 유리 기판(20)상에 투명 도전막 적색(26)과, 투명 도전막 녹색(28)과, 투명 도전막 청색(30)을 형성하고,On the glass substrate 20, the transparent conductive film red 26, the transparent conductive film green 28, and the transparent conductive film blue 30 are formed, 상기 투명 도전막 녹색(28)과, 투명 도전막 청색(30)에만 절연막(24)을 형성하며, 그 위에 투명 도전막 적색(26)이 연결되도록 전도성 도전막(24a)을 형성하고,The insulating film 24 is formed only on the transparent conductive film green 28 and the transparent conductive film blue 30, and the conductive conductive film 24a is formed to connect the transparent conductive film red 26 thereon. 상기 전도성 도전막(24a)의 일측에 투명 도전막 적색(26)과 투명 도전막 청색(30)상에 절연막(24b)을 형성하며, 그 위에 투명 도전막 녹색(28)만을 연결하도록 전도성 도전막(22b)을 형성하고,An insulating film 24b is formed on the transparent conductive film red 26 and the transparent conductive film blue 30 on one side of the conductive conductive film 24a, and the conductive conductive film is connected to connect only the transparent conductive film green 28 thereon. (22b), 상기 절연막(24b)의 일측에 투명 도전막 적색(26)과 투명 도전막 녹색(28)상에 절연막(24c)를 형성하며, 그 위에 투명 도전막(30) 만을 연결하도록 전도성 도전막(22c)을 형성하고,An insulating film 24c is formed on the transparent conductive film red 26 and the transparent conductive film green 28 on one side of the insulating film 24b, and the conductive conductive film 22c is connected to connect only the transparent conductive film 30 thereon. Form the 전착시 전착액(32)을 갖는 전착조(34)에 음극(36)은 전착액(32)내에 설치되고, 양극은 전도성 도전막(22a)에 연결되고, 전도성 도전막(22b)과 전도성 도전막(22c)은 지면의 접지부(38)에 접지시켜 전착시키는 것을 특징으로 하는 평판표시소자의 형광막 형성방법.In the electrodeposition tank 34 having the electrodeposition liquid 32 at the time of electrodeposition, the cathode 36 is installed in the electrodeposition liquid 32, the anode is connected to the conductive conductive film 22a, and the conductive conductive film 22b and the conductive conduction. And a film (22c) is grounded to the ground (38) of the ground and electrodeposited. 제 1 항에 있어서, 상기 절연막은, 전도성 도전막보다 넓게 형성하는 것을 특징으로 하는 평판표시소자의 형광막 형성방법.The method of claim 1, wherein the insulating film is formed wider than the conductive conductive film.
KR1019970063221A 1997-11-26 1997-11-26 A phosphor layer forming method of a flat panel display KR100260330B1 (en)

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