JPWO2022113724A1 - - Google Patents

Info

Publication number
JPWO2022113724A1
JPWO2022113724A1 JP2022565201A JP2022565201A JPWO2022113724A1 JP WO2022113724 A1 JPWO2022113724 A1 JP WO2022113724A1 JP 2022565201 A JP2022565201 A JP 2022565201A JP 2022565201 A JP2022565201 A JP 2022565201A JP WO2022113724 A1 JPWO2022113724 A1 JP WO2022113724A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022565201A
Other versions
JPWO2022113724A5 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022113724A1 publication Critical patent/JPWO2022113724A1/ja
Publication of JPWO2022113724A5 publication Critical patent/JPWO2022113724A5/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C07F7/1872—Preparation; Treatments not provided for in C07F7/20
    • C07F7/188—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-O linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/10—Energy storage using batteries

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)
JP2022565201A 2020-11-24 2021-11-09 Pending JPWO2022113724A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020194714 2020-11-24
PCT/JP2021/041158 WO2022113724A1 (ja) 2020-11-24 2021-11-09 珪素含有モノマー、混合物、ポリシロキサン、およびそれらの製造方法

Publications (2)

Publication Number Publication Date
JPWO2022113724A1 true JPWO2022113724A1 (ja) 2022-06-02
JPWO2022113724A5 JPWO2022113724A5 (ja) 2023-08-08

Family

ID=81755856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022565201A Pending JPWO2022113724A1 (ja) 2020-11-24 2021-11-09

Country Status (5)

Country Link
JP (1) JPWO2022113724A1 (ja)
KR (1) KR20230110761A (ja)
CN (1) CN116457363A (ja)
TW (1) TW202227461A (ja)
WO (1) WO2022113724A1 (ja)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2567984B2 (ja) 1990-09-21 1996-12-25 東京応化工業株式会社 ポジ型レジスト組成物
JP2005330488A (ja) 2005-05-19 2005-12-02 Tokyo Ohka Kogyo Co Ltd アルカリ可溶性ポリシロキサン樹脂
JP5726632B2 (ja) 2011-05-19 2015-06-03 メルクパフォーマンスマテリアルズＩｐ合同会社 感光性シロキサン樹脂組成物
JP6281288B2 (ja) 2013-01-21 2018-02-21 セントラル硝子株式会社 ヘキサフルオロイソプロパノール基を含む珪素化合物およびその製造方法、並びにそれが重合してなる高分子化合物
JP6323225B2 (ja) 2013-11-01 2018-05-16 セントラル硝子株式会社 ポジ型感光性樹脂組成物、それを用いた膜の製造方法および電子部品
JP7189453B2 (ja) * 2018-02-28 2022-12-14 セントラル硝子株式会社 ヘキサフルオロイソプロパノール基を含む珪素化合物、およびその製造方法

Also Published As

Publication number Publication date
KR20230110761A (ko) 2023-07-25
TW202227461A (zh) 2022-07-16
WO2022113724A1 (ja) 2022-06-02
CN116457363A (zh) 2023-07-18

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Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230526