JPWO2021153405A1 - - Google Patents

Info

Publication number
JPWO2021153405A1
JPWO2021153405A1 JP2021545737A JP2021545737A JPWO2021153405A1 JP WO2021153405 A1 JPWO2021153405 A1 JP WO2021153405A1 JP 2021545737 A JP2021545737 A JP 2021545737A JP 2021545737 A JP2021545737 A JP 2021545737A JP WO2021153405 A1 JPWO2021153405 A1 JP WO2021153405A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021545737A
Other languages
Japanese (ja)
Other versions
JP7279802B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021153405A1 publication Critical patent/JPWO2021153405A1/ja
Priority to JP2022172992A priority Critical patent/JP2023015160A/en
Application granted granted Critical
Publication of JP7279802B2 publication Critical patent/JP7279802B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10Esters
    • C08F20/26Esters containing oxygen in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/02Elements
    • C08K3/08Metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/06Non-macromolecular additives organic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/52Mounting semiconductor bodies in containers
JP2021545737A 2020-01-29 2021-01-21 PASTE RESIN COMPOSITION FOR HIGH THERMAL CONDUCTIVE MATERIAL, HIGH THERMAL CONDUCTIVE MATERIAL, AND SEMICONDUCTOR DEVICE Active JP7279802B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2022172992A JP2023015160A (en) 2020-01-29 2022-10-28 Paste resin composition, high thermal conductive material, and semiconductor device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020012506 2020-01-29
JP2020012506 2020-01-29
PCT/JP2021/001980 WO2021153405A1 (en) 2020-01-29 2021-01-21 Paste-like resin composition, highly heat conductive material, and semiconductor device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2022172992A Division JP2023015160A (en) 2020-01-29 2022-10-28 Paste resin composition, high thermal conductive material, and semiconductor device

Publications (2)

Publication Number Publication Date
JPWO2021153405A1 true JPWO2021153405A1 (en) 2021-08-05
JP7279802B2 JP7279802B2 (en) 2023-05-23

Family

ID=77078539

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2021545737A Active JP7279802B2 (en) 2020-01-29 2021-01-21 PASTE RESIN COMPOSITION FOR HIGH THERMAL CONDUCTIVE MATERIAL, HIGH THERMAL CONDUCTIVE MATERIAL, AND SEMICONDUCTOR DEVICE
JP2022172992A Pending JP2023015160A (en) 2020-01-29 2022-10-28 Paste resin composition, high thermal conductive material, and semiconductor device

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2022172992A Pending JP2023015160A (en) 2020-01-29 2022-10-28 Paste resin composition, high thermal conductive material, and semiconductor device

Country Status (4)

Country Link
JP (2) JP7279802B2 (en)
CN (1) CN115023453A (en)
TW (1) TW202138507A (en)
WO (1) WO2021153405A1 (en)

Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11150135A (en) * 1997-11-17 1999-06-02 Nec Corp Conductive paste of superior thermal conductivity and electronic device
JPH11316456A (en) * 1998-02-17 1999-11-16 Toppan Printing Co Ltd Solvent-free type photosensitive calcination paste composition, solvent type photosensitive calcination paste composition and structural body
JP2004139754A (en) * 2002-10-15 2004-05-13 Mitsubishi Paper Mills Ltd Silver oxide paste and manufacturing method of metal silver from silver oxide paste
JP2009295895A (en) * 2008-06-09 2009-12-17 Sumitomo Bakelite Co Ltd Conductive paste for circuit board
JP2011122129A (en) * 2009-11-12 2011-06-23 Sekisui Chem Co Ltd Inorganic fine particle dispersed paste composition
JP2011150897A (en) * 2010-01-21 2011-08-04 Fujikura Ltd Electron beam curing conductive paste and method of manufacturing circuit board using the conductive paste
JP2013026089A (en) * 2011-07-22 2013-02-04 Fujikura Ltd Conductive paste for electron beam hardening, and manufacturing method of circuit board using the same
JP2014074132A (en) * 2012-10-05 2014-04-24 Kyocera Chemical Corp Thermosetting resin composition for semiconductor bonding and semiconductor device
JP2017069175A (en) * 2015-09-30 2017-04-06 Dowaエレクトロニクス株式会社 Conductive paste and conductive film
JP2017106023A (en) * 2015-01-29 2017-06-15 住友ベークライト株式会社 Paste-like adhesive composition, semiconductor device, method for manufacturing semiconductor device and method for bonding heat dissipating plate
JP2017130357A (en) * 2016-01-20 2017-07-27 住友ベークライト株式会社 Conductive paste and method for manufacturing cured body of conductive paste
JP2017130393A (en) * 2016-01-21 2017-07-27 国立大学法人群馬大学 Conductive paste and method for forming silver film
JP2019140145A (en) * 2018-02-06 2019-08-22 ローム株式会社 Semiconductor device and manufacturing method thereof
WO2019167819A1 (en) * 2018-03-01 2019-09-06 住友ベークライト株式会社 Paste adhesive composition and semiconductor device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013067673A (en) * 2011-09-20 2013-04-18 Hitachi Chemical Co Ltd Resin paste composition and semiconductor device
KR102040529B1 (en) * 2016-08-19 2019-11-06 스미또모 베이크라이트 가부시키가이샤 Die attach pastes and semiconductor devices
WO2018079533A1 (en) * 2016-10-31 2018-05-03 住友ベークライト株式会社 Thermally conductive paste and electronic device

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11150135A (en) * 1997-11-17 1999-06-02 Nec Corp Conductive paste of superior thermal conductivity and electronic device
JPH11316456A (en) * 1998-02-17 1999-11-16 Toppan Printing Co Ltd Solvent-free type photosensitive calcination paste composition, solvent type photosensitive calcination paste composition and structural body
JP2004139754A (en) * 2002-10-15 2004-05-13 Mitsubishi Paper Mills Ltd Silver oxide paste and manufacturing method of metal silver from silver oxide paste
JP2009295895A (en) * 2008-06-09 2009-12-17 Sumitomo Bakelite Co Ltd Conductive paste for circuit board
JP2011122129A (en) * 2009-11-12 2011-06-23 Sekisui Chem Co Ltd Inorganic fine particle dispersed paste composition
JP2011150897A (en) * 2010-01-21 2011-08-04 Fujikura Ltd Electron beam curing conductive paste and method of manufacturing circuit board using the conductive paste
JP2013026089A (en) * 2011-07-22 2013-02-04 Fujikura Ltd Conductive paste for electron beam hardening, and manufacturing method of circuit board using the same
JP2014074132A (en) * 2012-10-05 2014-04-24 Kyocera Chemical Corp Thermosetting resin composition for semiconductor bonding and semiconductor device
JP2017106023A (en) * 2015-01-29 2017-06-15 住友ベークライト株式会社 Paste-like adhesive composition, semiconductor device, method for manufacturing semiconductor device and method for bonding heat dissipating plate
JP2017069175A (en) * 2015-09-30 2017-04-06 Dowaエレクトロニクス株式会社 Conductive paste and conductive film
JP2017130357A (en) * 2016-01-20 2017-07-27 住友ベークライト株式会社 Conductive paste and method for manufacturing cured body of conductive paste
JP2017130393A (en) * 2016-01-21 2017-07-27 国立大学法人群馬大学 Conductive paste and method for forming silver film
JP2019140145A (en) * 2018-02-06 2019-08-22 ローム株式会社 Semiconductor device and manufacturing method thereof
WO2019167819A1 (en) * 2018-03-01 2019-09-06 住友ベークライト株式会社 Paste adhesive composition and semiconductor device

Also Published As

Publication number Publication date
CN115023453A (en) 2022-09-06
TW202138507A (en) 2021-10-16
JP7279802B2 (en) 2023-05-23
WO2021153405A1 (en) 2021-08-05
JP2023015160A (en) 2023-01-31

Similar Documents

Publication Publication Date Title
BR112023012656A2 (en)
BR112022024743A2 (en)
BR102021018859A2 (en)
BR112022009896A2 (en)
BR102021007058A2 (en)
BR102020022030A2 (en)
JPWO2023038146A1 (en)
BR112023011738A2 (en)
BR112023016292A2 (en)
BR112023004146A2 (en)
BR112023011610A2 (en)
BR112023011539A2 (en)
BR112023008976A2 (en)
JPWO2022113923A1 (en)
BR112023009656A2 (en)
BR112023006729A2 (en)
BR102021020147A2 (en)
BR102021018926A2 (en)
BR102021018167A2 (en)
BR102021017576A2 (en)
BR102021016837A2 (en)
BR102021016551A2 (en)
BR102021016375A2 (en)
BR102021016200A2 (en)
BR102021016176A2 (en)

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20210804

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20210804

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20210804

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20211005

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20211201

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220201

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20220405

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20220523

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20220802

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20221028

C60 Trial request (containing other claim documents, opposition documents)

Free format text: JAPANESE INTERMEDIATE CODE: C60

Effective date: 20221028

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20221107

C21 Notice of transfer of a case for reconsideration by examiners before appeal proceedings

Free format text: JAPANESE INTERMEDIATE CODE: C21

Effective date: 20221108

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230117

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230316

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20230411

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20230424

R151 Written notification of patent or utility model registration

Ref document number: 7279802

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151