JPWO2012090643A1 - 太陽電池の製造方法及び太陽電池 - Google Patents
太陽電池の製造方法及び太陽電池 Download PDFInfo
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Abstract
Description
(太陽電池1の構成)
まず、本実施形態において製造される太陽電池1の構成について、図1及び図2を参照しながら詳細に説明する。
図13は、第2の実施形態における太陽電池の略図的断面図である。
10,30…半導体基板
10a…受光面
10b…裏面
12p…p型非晶質半導体層
13n…n型非晶質半導体層
14…p側電極
15…n側電極
16,23…絶縁層
18…絶縁層
22…p型非晶質半導体層
25…n型非晶質半導体層
31p…半導体領域
Claims (20)
- 第1の導電型を有する半導体基板であって、一主面の一部分に設けられた第2の導電型を有する第1の半導体領域と、前記第1の半導体領域の表面上に設けられた絶縁層とを有する半導体基板を用意する工程と、
前記第1の導電型を有する第2の半導体層を、前記絶縁層の表面上を含んで前記一主面の略全面上に形成する工程と、
前記第2の半導体層の前記絶縁層上に位置する一部を除去し、開口部を形成する工程と、
前記第2の半導体層をマスクとして前記開口部から露出する前記絶縁層を除去し、前記第1の半導体領域の表面の一部を露出させる工程と、
前記第1の半導体領域の表面と、前記第2の半導体層の表面とに電気的に接続する電極を形成する工程と、
を備える太陽電池の製造方法。 - 前記第1の半導体領域は、前記一主面の一部分上に形成された第1の半導体層により構成されている、請求項1に記載の太陽電池の製造方法。
- 前記半導体基板の前記一主面の実質的に全体が、前記第1の半導体層または前記第2の半導体層により覆われるように前記第2の半導体層を形成する、請求項2に記載の太陽電池の製造方法。
- 前記第1及び第2の半導体層のそれぞれを水素を含むアモルファスシリコンにより形成し、前記絶縁層を、窒化ケイ素、酸化ケイ素または酸窒化ケイ素により形成する、請求項3に記載の太陽電池の製造方法。
- 前記第1の半導体領域は、前記一主面の一部分に前記第2の導電型のドーパントが拡散されて形成されている、請求項1に記載の太陽電池の製造方法。
- 前記第2の半導体層の前記絶縁層の上に位置している部分の一部分のエッチングを、アルカリ性のエッチング液を用いて行い、前記開口部から露出する前記絶縁層のエッチングを、酸性のエッチング液を用いて行う、請求項4に記載の太陽電池の製造方法。
- 前記半導体基板の一主面と前記第1及び第2の半導体層のそれぞれとの間に、真性のアモルファスシリコン層を形成する工程を含む、請求項4に記載の太陽電池の製造方法。
- 前記電極を形成する工程は、
前記第1の半導体領域の表面上、前記第2の半導体層の表面上及び前記絶縁層の表面上に跨って第1の導電層を形成する工程と、
前記第1の導電層の前記絶縁層の上に位置している部分を分断することにより、前記第1の導電層の前記第1の半導体領域の上に形成されている部分と、前記第1の導電層の前記第2の半導体層の上に形成されている部分とを電気的に絶縁する工程とを含む、請求項4に記載の太陽電池の製造方法。 - 前記電極を形成する工程は、
前記第1の導電層の前記第1の半導体領域の上に形成されている部分上と、前記第1の導電層の前記第2の半導体層の上に形成されている部分上とのそれぞれの上に、第2の導電層を形成する工程を含む、請求項8に記載の太陽電池の製造方法。 - 第1の導電型を有する第1の半導体領域と、第2の導電型を有する第2の半導体領域と、を有する半導体基板を用意する工程と、
前記第1の半導体領域の表面と、前記第2の半導体層の表面とに電極を形成する工程と、を備え、
前記電極を形成する工程は、
スパッタリング法またはCVD法によって、透光性導電酸化物からなる第1の導電層を形成する工程と、
めっき法によって、金属または合金からなる第2の導電層を形成する工程と、を備える、太陽電池の製造方法。 - 第1の導電層を形成する工程と第2の導電層を形成する工程との間に、スパッタリング法またはCVD法によって、金属や合金からなる第3の導電層を形成する工程を備える、請求項10に記載の太陽電池の製造方法。
- 前記第1の導電層の厚みは、前記第2の導電層の厚みより薄く形成する、請求項11に記載の太陽電池の製造方法。
- 前記第1の導電層はITOを含み、前記第2の導電層および前記第3の導電層はCuを含む、請求項12に記載の太陽電池の製造方法。
- 第1の導電型を有する半導体基板であって、一主面の一部分に第2の導電型を有する第1の半導体領域が設けられている半導体基板と、
前記第1の半導体領域の中央部を除く両端部の上に設けられている絶縁層と、
前記半導体基板の一主面の前記第1の半導体領域に隣接した部分上と、前記絶縁層の少なくとも一部上に跨って設けられており、前記第1の導電型を有する第2の半導体層と、
前記第1の半導体領域の表面上に設けられた第1の電極と、
前記第2の半導体層の表面上に設けられた第2の電極と、
を備える、太陽電池。 - 前記第1の半導体領域は、前記半導体基板中に前記第2の導電型のドーパントが拡散されることによって形成されている、請求項14に記載の太陽電池。
- 前記第1の半導体領域は、前記半導体基板の一主面の前記一部分上に形成され、前記第2の導電型のドーパントを含む半導体層を有する、請求項14に記載の太陽電池。
- 前記第2の導電型のドーパントを含む半導体層は、水素を含むアモルファスシリコン層である、請求項16に記載の太陽電池。
- 前記第1の半導体領域は、前記半導体基板の一主面と前記第2の導電型のドーパントを含む半導体層との間に配された真性のアモルファスシリコン層を含む、請求項17に記載の太陽電池。
- 前記第2の半導体層は、水素を含むアモルファスシリコン層である、請求項14に記載の太陽電池。
- 前記第2の半導体層と、前記半導体基板の一主面との間に配された真性のアモルファスシリコン層を備える、請求項19に記載の太陽電池。
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US20160380126A1 (en) * | 2015-06-25 | 2016-12-29 | David Aaron Randolph Barkhouse | Multi-layer barrier for metallization |
EP3163632A1 (en) * | 2015-11-02 | 2017-05-03 | CSEM Centre Suisse d'Electronique et de Microtechnique SA - Recherche et Développement | Photovoltaic device and method for manufacturing the same |
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JP5879515B2 (ja) | 2016-03-08 |
EP2660873A4 (en) | 2018-03-28 |
US9059340B2 (en) | 2015-06-16 |
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TW201234638A (en) | 2012-08-16 |
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