JPS649606A - Sputtering apparatus having superconducting magnet - Google Patents

Sputtering apparatus having superconducting magnet

Info

Publication number
JPS649606A
JPS649606A JP16452487A JP16452487A JPS649606A JP S649606 A JPS649606 A JP S649606A JP 16452487 A JP16452487 A JP 16452487A JP 16452487 A JP16452487 A JP 16452487A JP S649606 A JPS649606 A JP S649606A
Authority
JP
Japan
Prior art keywords
superconductive
target
magnetic
liquid nitrogen
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16452487A
Other languages
Japanese (ja)
Inventor
Hideji Kawabata
Norio Miyatake
Masahiro Orukawa
Yoshihiko Kudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16452487A priority Critical patent/JPS649606A/en
Publication of JPS649606A publication Critical patent/JPS649606A/en
Pending legal-status Critical Current

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Landscapes

  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To make it possible to form a magnetic thin film on plastic material, by using a superconductive electromagnet in place of a conventional permanent magnet as a target magnet, and using a magnetic target having a large thickness without yield of heat. CONSTITUTION:A superconductive electromagnet 11 is arranged in the vicinity of a magnetic target 2. As the exciting coil of the superconductive electromagnet 11, the material prepared as follows is used: a superconductive material such as Y-Ba-Cu-O and the like is made to be a piece of wire or a superconductive material is kneaded with an organic binder in a paste state; and the material is applied on a coil base and baked. The wire has a critical temperature higher than a liquid nitrogen temperature (77 deg.K). An electric resistance below this temperature is almost zero. Joule heat is not generated. The exciting coil is held in liquid nitrogen, which is introduced from a liquid nitrogen introducing pipe 12. Electrons perform spiral movement around a magnetic filed of a parallel magnetic field region of a magnetron for confining charged particles. The electrons are confined around the target and do not reach a substrate. Thus the temperature increase is controlled.
JP16452487A 1987-07-01 1987-07-01 Sputtering apparatus having superconducting magnet Pending JPS649606A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16452487A JPS649606A (en) 1987-07-01 1987-07-01 Sputtering apparatus having superconducting magnet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16452487A JPS649606A (en) 1987-07-01 1987-07-01 Sputtering apparatus having superconducting magnet

Publications (1)

Publication Number Publication Date
JPS649606A true JPS649606A (en) 1989-01-12

Family

ID=15794801

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16452487A Pending JPS649606A (en) 1987-07-01 1987-07-01 Sputtering apparatus having superconducting magnet

Country Status (1)

Country Link
JP (1) JPS649606A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0175404U (en) * 1987-11-06 1989-05-22
JP2006265681A (en) * 2005-03-25 2006-10-05 Aisin Seiki Co Ltd Production method of multilayer film and multilayer film
JP2006280535A (en) * 2005-03-31 2006-10-19 Fujinon Corp Portable endoscope
JP5037630B2 (en) * 2007-12-18 2012-10-03 キヤノンアネルバ株式会社 Plasma processing equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0175404U (en) * 1987-11-06 1989-05-22
JP2006265681A (en) * 2005-03-25 2006-10-05 Aisin Seiki Co Ltd Production method of multilayer film and multilayer film
JP2006280535A (en) * 2005-03-31 2006-10-19 Fujinon Corp Portable endoscope
JP5037630B2 (en) * 2007-12-18 2012-10-03 キヤノンアネルバ株式会社 Plasma processing equipment

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