JPS649606A - Sputtering apparatus having superconducting magnet - Google Patents
Sputtering apparatus having superconducting magnetInfo
- Publication number
- JPS649606A JPS649606A JP16452487A JP16452487A JPS649606A JP S649606 A JPS649606 A JP S649606A JP 16452487 A JP16452487 A JP 16452487A JP 16452487 A JP16452487 A JP 16452487A JP S649606 A JPS649606 A JP S649606A
- Authority
- JP
- Japan
- Prior art keywords
- superconductive
- target
- magnetic
- liquid nitrogen
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Abstract
PURPOSE:To make it possible to form a magnetic thin film on plastic material, by using a superconductive electromagnet in place of a conventional permanent magnet as a target magnet, and using a magnetic target having a large thickness without yield of heat. CONSTITUTION:A superconductive electromagnet 11 is arranged in the vicinity of a magnetic target 2. As the exciting coil of the superconductive electromagnet 11, the material prepared as follows is used: a superconductive material such as Y-Ba-Cu-O and the like is made to be a piece of wire or a superconductive material is kneaded with an organic binder in a paste state; and the material is applied on a coil base and baked. The wire has a critical temperature higher than a liquid nitrogen temperature (77 deg.K). An electric resistance below this temperature is almost zero. Joule heat is not generated. The exciting coil is held in liquid nitrogen, which is introduced from a liquid nitrogen introducing pipe 12. Electrons perform spiral movement around a magnetic filed of a parallel magnetic field region of a magnetron for confining charged particles. The electrons are confined around the target and do not reach a substrate. Thus the temperature increase is controlled.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16452487A JPS649606A (en) | 1987-07-01 | 1987-07-01 | Sputtering apparatus having superconducting magnet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16452487A JPS649606A (en) | 1987-07-01 | 1987-07-01 | Sputtering apparatus having superconducting magnet |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS649606A true JPS649606A (en) | 1989-01-12 |
Family
ID=15794801
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16452487A Pending JPS649606A (en) | 1987-07-01 | 1987-07-01 | Sputtering apparatus having superconducting magnet |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS649606A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0175404U (en) * | 1987-11-06 | 1989-05-22 | ||
JP2006265681A (en) * | 2005-03-25 | 2006-10-05 | Aisin Seiki Co Ltd | Production method of multilayer film and multilayer film |
JP2006280535A (en) * | 2005-03-31 | 2006-10-19 | Fujinon Corp | Portable endoscope |
JP5037630B2 (en) * | 2007-12-18 | 2012-10-03 | キヤノンアネルバ株式会社 | Plasma processing equipment |
-
1987
- 1987-07-01 JP JP16452487A patent/JPS649606A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0175404U (en) * | 1987-11-06 | 1989-05-22 | ||
JP2006265681A (en) * | 2005-03-25 | 2006-10-05 | Aisin Seiki Co Ltd | Production method of multilayer film and multilayer film |
JP2006280535A (en) * | 2005-03-31 | 2006-10-19 | Fujinon Corp | Portable endoscope |
JP5037630B2 (en) * | 2007-12-18 | 2012-10-03 | キヤノンアネルバ株式会社 | Plasma processing equipment |
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