JPS55111184A - Reluctance unit and manufacturing method thereof - Google Patents
Reluctance unit and manufacturing method thereofInfo
- Publication number
- JPS55111184A JPS55111184A JP1887379A JP1887379A JPS55111184A JP S55111184 A JPS55111184 A JP S55111184A JP 1887379 A JP1887379 A JP 1887379A JP 1887379 A JP1887379 A JP 1887379A JP S55111184 A JPS55111184 A JP S55111184A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- thin film
- plane
- unit
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Hall/Mr Elements (AREA)
Abstract
PURPOSE: To simplify a manufacturing process and raise the sensitivity of a reluctance unit, by coating a thin film of Ni, Co, Bi or the like to provide a magnetic material.
CONSTITUTION: An SiO2 film 2 is produced on an si substrate 1. A thin film 3 of Ni, Co, Bi or their alloy is produced. Electrodes 4a, 4b and a protective film 5 are provided. When a magnetic field is applied to the assembly of these members, its crystallographic axis is shifted as the (111) plane is oriented in the direction of the magnetic field as to the thin film of Ni or the plane (001) plane is oriented in the direction of the magnetic field as to the thin film of Co. The electric resistance continuously varies depending on the change in the magnetic field. This results in providing a relutance unit of high sensitivity. When Ni or Co is used alone, the resistance decreases with the increase of the magnetic field.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1887379A JPS55111184A (en) | 1979-02-20 | 1979-02-20 | Reluctance unit and manufacturing method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1887379A JPS55111184A (en) | 1979-02-20 | 1979-02-20 | Reluctance unit and manufacturing method thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55111184A true JPS55111184A (en) | 1980-08-27 |
Family
ID=11983654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1887379A Pending JPS55111184A (en) | 1979-02-20 | 1979-02-20 | Reluctance unit and manufacturing method thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55111184A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57173988A (en) * | 1981-04-20 | 1982-10-26 | Matsushita Electric Ind Co Ltd | Magnetic sensor |
US5005064A (en) * | 1987-08-21 | 1991-04-02 | Nippondenso Co., Ltd. | Device for detecting magnetism |
US5262666A (en) * | 1989-05-15 | 1993-11-16 | Nippondenso Co., Ltd. | Semiconductor device with a nickel alloy protective resistor |
-
1979
- 1979-02-20 JP JP1887379A patent/JPS55111184A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57173988A (en) * | 1981-04-20 | 1982-10-26 | Matsushita Electric Ind Co Ltd | Magnetic sensor |
US5005064A (en) * | 1987-08-21 | 1991-04-02 | Nippondenso Co., Ltd. | Device for detecting magnetism |
US5262666A (en) * | 1989-05-15 | 1993-11-16 | Nippondenso Co., Ltd. | Semiconductor device with a nickel alloy protective resistor |
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