JPS6482440A - Illuminating angle setting method for focusing ion beam device - Google Patents
Illuminating angle setting method for focusing ion beam deviceInfo
- Publication number
- JPS6482440A JPS6482440A JP24046687A JP24046687A JPS6482440A JP S6482440 A JPS6482440 A JP S6482440A JP 24046687 A JP24046687 A JP 24046687A JP 24046687 A JP24046687 A JP 24046687A JP S6482440 A JPS6482440 A JP S6482440A
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- mark
- illuminating angle
- stage
- moved
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
PURPOSE:To correctly set the illuminating angle by moving a stage to largely move a mark, detecting the mark positions before and after the shift, and determining the illuminating angle of an ion beam based on the result. CONSTITUTION:A stage 26 is moved so that the center of a mark M and the optical axis of an ion beam coincide while the ion beam is not deflected, then the stage 26 is x-moved in the direction X. The mark position is x-moved in the direction X from a point A to a point A' by the shift of the stage 26. When the ion beam is deflected so as to be illuminated to the center of the mark M at the point A', the illuminating angle at that time is determined, when the desired illuminating angle is determined, the shift distance (x) of the stage can be obtained by calculation. When a deflector 25 is adjusted so that the ion beam is illuminated to the center of the mark after the mark position is correctly moved, the ion beam can be correctly set at the desired angle.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24046687A JPS6482440A (en) | 1987-09-24 | 1987-09-24 | Illuminating angle setting method for focusing ion beam device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24046687A JPS6482440A (en) | 1987-09-24 | 1987-09-24 | Illuminating angle setting method for focusing ion beam device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6482440A true JPS6482440A (en) | 1989-03-28 |
Family
ID=17059928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24046687A Pending JPS6482440A (en) | 1987-09-24 | 1987-09-24 | Illuminating angle setting method for focusing ion beam device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6482440A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008298797A (en) * | 2008-09-01 | 2008-12-11 | Hitachi Ltd | Sample preparing device |
JP2009031339A (en) * | 2007-07-24 | 2009-02-12 | Nissin Ion Equipment Co Ltd | Alignment processing apparatus |
US8796651B2 (en) | 2000-11-06 | 2014-08-05 | Hitachi, Ltd. | Method and apparatus for specimen fabrication |
-
1987
- 1987-09-24 JP JP24046687A patent/JPS6482440A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8796651B2 (en) | 2000-11-06 | 2014-08-05 | Hitachi, Ltd. | Method and apparatus for specimen fabrication |
JP2009031339A (en) * | 2007-07-24 | 2009-02-12 | Nissin Ion Equipment Co Ltd | Alignment processing apparatus |
JP2008298797A (en) * | 2008-09-01 | 2008-12-11 | Hitachi Ltd | Sample preparing device |
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