JPS52117570A - Position detecting method - Google Patents

Position detecting method

Info

Publication number
JPS52117570A
JPS52117570A JP3417676A JP3417676A JPS52117570A JP S52117570 A JPS52117570 A JP S52117570A JP 3417676 A JP3417676 A JP 3417676A JP 3417676 A JP3417676 A JP 3417676A JP S52117570 A JPS52117570 A JP S52117570A
Authority
JP
Japan
Prior art keywords
position detecting
detecting method
stage
continuous
correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3417676A
Other languages
Japanese (ja)
Other versions
JPS606088B2 (en
Inventor
Masahiko Washimi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP51034176A priority Critical patent/JPS606088B2/en
Publication of JPS52117570A publication Critical patent/JPS52117570A/en
Publication of JPS606088B2 publication Critical patent/JPS606088B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To perform position detection at early stage of electrostatic scanning giving continuous mark in the continuous shift direction of the stage and then to carry out drawing by beam blanking. Thus, the correction is performed for the drawing position.
COPYRIGHT: (C)1977,JPO&Japio
JP51034176A 1976-03-30 1976-03-30 Electron beam drawing method Expired JPS606088B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP51034176A JPS606088B2 (en) 1976-03-30 1976-03-30 Electron beam drawing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51034176A JPS606088B2 (en) 1976-03-30 1976-03-30 Electron beam drawing method

Publications (2)

Publication Number Publication Date
JPS52117570A true JPS52117570A (en) 1977-10-03
JPS606088B2 JPS606088B2 (en) 1985-02-15

Family

ID=12406885

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51034176A Expired JPS606088B2 (en) 1976-03-30 1976-03-30 Electron beam drawing method

Country Status (1)

Country Link
JP (1) JPS606088B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54118777A (en) * 1978-03-08 1979-09-14 Cho Lsi Gijutsu Kenkyu Kumiai Method of exposing pattern

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54118777A (en) * 1978-03-08 1979-09-14 Cho Lsi Gijutsu Kenkyu Kumiai Method of exposing pattern

Also Published As

Publication number Publication date
JPS606088B2 (en) 1985-02-15

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