JPS6477124A - Projection type exposure device - Google Patents

Projection type exposure device

Info

Publication number
JPS6477124A
JPS6477124A JP63188433A JP18843388A JPS6477124A JP S6477124 A JPS6477124 A JP S6477124A JP 63188433 A JP63188433 A JP 63188433A JP 18843388 A JP18843388 A JP 18843388A JP S6477124 A JPS6477124 A JP S6477124A
Authority
JP
Japan
Prior art keywords
laser beams
pulse
exceeding
constitution
beams
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63188433A
Other languages
Japanese (ja)
Other versions
JPH0480530B2 (en
Inventor
Takeoki Miyauchi
Katsuro Mizukoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63188433A priority Critical patent/JPS6477124A/en
Publication of JPS6477124A publication Critical patent/JPS6477124A/en
Publication of JPH0480530B2 publication Critical patent/JPH0480530B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To cut down the exposure time for accelerating the processing speed by a method wherein pulse laser beams in high output are used for a projection lens projecting a circuit pattern by using said pulse laser beams on a substrate. CONSTITUTION:Exposing laser beams 18 from a laser oscillator 17 emitting pulse beams in sufficiently narrow width are refracted downward entering into an optical integrator 21 through a shutter 20 to become diffused light 22 in even light distribution. Next, the diffused light 22 is entered into a collimator lens 23 to be parallel light fluxes and further fed to a reticle holder 2. Reticle images are transferred to an exposed plate 5 by outputting pulse laser beams at specified position. In such a constitution, the reticle images can be exposed continuously while moving at the speed not exceeding 100mm/s by using laser beams in output exceeding 30mJ subjected to the feed of photorepeater in pulse width not exceeding 1mus and exposure wave length of 3000-4000Angstrom .
JP63188433A 1988-07-29 1988-07-29 Projection type exposure device Granted JPS6477124A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63188433A JPS6477124A (en) 1988-07-29 1988-07-29 Projection type exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63188433A JPS6477124A (en) 1988-07-29 1988-07-29 Projection type exposure device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP3257457A Division JP2501053B2 (en) 1991-10-04 1991-10-04 Projection type exposure method using ultraviolet pulse laser

Publications (2)

Publication Number Publication Date
JPS6477124A true JPS6477124A (en) 1989-03-23
JPH0480530B2 JPH0480530B2 (en) 1992-12-18

Family

ID=16223589

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63188433A Granted JPS6477124A (en) 1988-07-29 1988-07-29 Projection type exposure device

Country Status (1)

Country Link
JP (1) JPS6477124A (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (en) * 1971-08-25 1973-04-23
JPS4831969A (en) * 1971-08-27 1973-04-26
JPS4847848A (en) * 1971-10-18 1973-07-06
JPS4998645A (en) * 1973-01-24 1974-09-18
JPS505040A (en) * 1973-02-19 1975-01-20
JPS5038377A (en) * 1973-08-08 1975-04-09
JPS5038378A (en) * 1973-08-08 1975-04-09
JPS5372575A (en) * 1976-12-10 1978-06-28 Thomson Csf Pattern transfer optical device

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (en) * 1971-08-25 1973-04-23
JPS4831969A (en) * 1971-08-27 1973-04-26
JPS4847848A (en) * 1971-10-18 1973-07-06
JPS4998645A (en) * 1973-01-24 1974-09-18
JPS505040A (en) * 1973-02-19 1975-01-20
JPS5038377A (en) * 1973-08-08 1975-04-09
JPS5038378A (en) * 1973-08-08 1975-04-09
JPS5372575A (en) * 1976-12-10 1978-06-28 Thomson Csf Pattern transfer optical device

Also Published As

Publication number Publication date
JPH0480530B2 (en) 1992-12-18

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