JPS54111832A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS54111832A
JPS54111832A JP1846678A JP1846678A JPS54111832A JP S54111832 A JPS54111832 A JP S54111832A JP 1846678 A JP1846678 A JP 1846678A JP 1846678 A JP1846678 A JP 1846678A JP S54111832 A JPS54111832 A JP S54111832A
Authority
JP
Japan
Prior art keywords
light
exposure
laser
reticle
enters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1846678A
Other languages
Japanese (ja)
Other versions
JPH0114695B2 (en
Inventor
Takeoki Miyauchi
Katsuro Mizukoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1846678A priority Critical patent/JPS54111832A/en
Publication of JPS54111832A publication Critical patent/JPS54111832A/en
Publication of JPH0114695B2 publication Critical patent/JPH0114695B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Abstract

PURPOSE: To reduce exposure time, make possible flying exposure and improve processing speed by using a laser of high output in place of conventional exposure light sources.
CONSTITUTION: A light source 16 outputting parallel laser light of high output is used for an exposure light source. Namely, the laser light 18 for exposure emitted from a laser oscillator 17 which emits pulse light of sufficiently short pulse widths is reflected downward by a mirror 19 and enters a light integrator 21 through a shutter 20 to become the diffused light 22 of uniform distribution of light which then enters a collimator lens 23, becoming parallel luminous flux. This luminous flux advances to a reticle holding part 2 to which the reticle plate recorded with image is fixed. An XY stage 7 is then continuously moved and in the specified position the pulse laser is outputted to transfer the reticle image to the exposed plate 5 fixed to a plate holder 6 by means of the exposure lens 4 of a camera lens-barrel part 3.
COPYRIGHT: (C)1979,JPO&Japio
JP1846678A 1978-02-22 1978-02-22 Exposure device Granted JPS54111832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1846678A JPS54111832A (en) 1978-02-22 1978-02-22 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1846678A JPS54111832A (en) 1978-02-22 1978-02-22 Exposure device

Publications (2)

Publication Number Publication Date
JPS54111832A true JPS54111832A (en) 1979-09-01
JPH0114695B2 JPH0114695B2 (en) 1989-03-14

Family

ID=11972406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1846678A Granted JPS54111832A (en) 1978-02-22 1978-02-22 Exposure device

Country Status (1)

Country Link
JP (1) JPS54111832A (en)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814530A (en) * 1981-07-17 1983-01-27 Fujitsu Ltd Method for irradiating laser light
DE3323852A1 (en) * 1982-07-02 1984-01-05 Canon K.K., Tokyo LIGHTING DEVICE
JPS597360A (en) * 1982-06-23 1984-01-14 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Light source generator
JPS59153548U (en) * 1983-03-31 1984-10-15 理化学研究所 Pulsed laser-based resin letterpress plate-making device
JPS60162258A (en) * 1984-02-01 1985-08-24 Canon Inc Exposure device
JPS60230629A (en) * 1984-04-28 1985-11-16 Nippon Kogaku Kk <Nikon> Lighting optical device
JPS61117551A (en) * 1984-11-13 1986-06-04 Ushio Inc Exposing device
JPS61169815A (en) * 1985-01-22 1986-07-31 Nippon Kogaku Kk <Nikon> Lighting optical device
JPS62100724A (en) * 1985-10-28 1987-05-11 Canon Inc Illuminating optical system
JPS6344726A (en) * 1986-08-12 1988-02-25 Norihisa Ito Illumination optical device of stepper using excimer laser
JPS63173322A (en) * 1987-01-13 1988-07-16 Toshiba Corp Baking device for ic pattern
JPS6428916A (en) * 1987-07-24 1989-01-31 Canon Kk Aligner
JPS6465836A (en) * 1987-09-04 1989-03-13 Canon Kk Aligner
US4974919A (en) * 1986-10-30 1990-12-04 Canon Kabushiki Kaisha Illuminating device
US5016149A (en) * 1988-11-24 1991-05-14 Hitachi, Ltd. Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
JPH06168862A (en) * 1992-06-30 1994-06-14 Think Lab Kk Semiconductor laser aligner
JPH06302488A (en) * 1994-04-22 1994-10-28 Hitachi Ltd Pattern forming device
US5459547A (en) * 1992-06-25 1995-10-17 Canon Kabushiki Kaisha Illumination device
JPH09102456A (en) * 1996-05-24 1997-04-15 Canon Inc Illuminating optical device
US7245846B2 (en) * 2004-04-28 2007-07-17 Samsung Electronics Co., Ltd. Oxidation catalyst unit and a wet-type electrophotographic image forming apparatus comprising the same and a method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (en) * 1971-08-25 1973-04-23

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (en) * 1971-08-25 1973-04-23

Cited By (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814530A (en) * 1981-07-17 1983-01-27 Fujitsu Ltd Method for irradiating laser light
JPS597360A (en) * 1982-06-23 1984-01-14 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Light source generator
JPH0360105B2 (en) * 1982-06-23 1991-09-12 Intaanashonaru Bijinesu Mashiinzu Corp
DE3323852A1 (en) * 1982-07-02 1984-01-05 Canon K.K., Tokyo LIGHTING DEVICE
JPS59153548U (en) * 1983-03-31 1984-10-15 理化学研究所 Pulsed laser-based resin letterpress plate-making device
JPH0432651Y2 (en) * 1983-03-31 1992-08-06
JPS60162258A (en) * 1984-02-01 1985-08-24 Canon Inc Exposure device
JPH059933B2 (en) * 1984-02-01 1993-02-08 Canon Kk
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
JPS60230629A (en) * 1984-04-28 1985-11-16 Nippon Kogaku Kk <Nikon> Lighting optical device
JPS61117551A (en) * 1984-11-13 1986-06-04 Ushio Inc Exposing device
JPS61169815A (en) * 1985-01-22 1986-07-31 Nippon Kogaku Kk <Nikon> Lighting optical device
JPS62100724A (en) * 1985-10-28 1987-05-11 Canon Inc Illuminating optical system
JPS6344726A (en) * 1986-08-12 1988-02-25 Norihisa Ito Illumination optical device of stepper using excimer laser
US4974919A (en) * 1986-10-30 1990-12-04 Canon Kabushiki Kaisha Illuminating device
JPS63173322A (en) * 1987-01-13 1988-07-16 Toshiba Corp Baking device for ic pattern
JPH0545051B2 (en) * 1987-01-13 1993-07-08 Tokyo Shibaura Electric Co
JPS6428916A (en) * 1987-07-24 1989-01-31 Canon Kk Aligner
JPS6465836A (en) * 1987-09-04 1989-03-13 Canon Kk Aligner
US5016149A (en) * 1988-11-24 1991-05-14 Hitachi, Ltd. Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
US5463497A (en) * 1989-06-08 1995-10-31 Canon Kabushiki Kaisha Illumination device including an optical integrator defining a plurality of secondary light sources and related method
US5459547A (en) * 1992-06-25 1995-10-17 Canon Kabushiki Kaisha Illumination device
US5684567A (en) * 1992-06-25 1997-11-04 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method for projecting light from a secondary light source onto a mask or pattern
JPH06168862A (en) * 1992-06-30 1994-06-14 Think Lab Kk Semiconductor laser aligner
JPH06302488A (en) * 1994-04-22 1994-10-28 Hitachi Ltd Pattern forming device
JPH07105337B2 (en) * 1994-04-22 1995-11-13 株式会社日立製作所 Pattern engraving device
JPH09102456A (en) * 1996-05-24 1997-04-15 Canon Inc Illuminating optical device
US7245846B2 (en) * 2004-04-28 2007-07-17 Samsung Electronics Co., Ltd. Oxidation catalyst unit and a wet-type electrophotographic image forming apparatus comprising the same and a method thereof

Also Published As

Publication number Publication date
JPH0114695B2 (en) 1989-03-14

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