JPS6463219A - Manufacture of superconductive thin film - Google Patents
Manufacture of superconductive thin filmInfo
- Publication number
- JPS6463219A JPS6463219A JP62219752A JP21975287A JPS6463219A JP S6463219 A JPS6463219 A JP S6463219A JP 62219752 A JP62219752 A JP 62219752A JP 21975287 A JP21975287 A JP 21975287A JP S6463219 A JPS6463219 A JP S6463219A
- Authority
- JP
- Japan
- Prior art keywords
- oxygen
- copper
- thin film
- sputtering
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Abstract
PURPOSE:To obtain a superconductive thin film having superconductive characteristic stable at high temperatures by making adhesion of group IIIa metallic sum and/or its oxide, group IIa metal and/or its oxide, and copper and/or its oxide to a substrate under the existence of oxygen and fluorine. CONSTITUTION:For instance, an alloy of group IIIa metal-group IIa metal- copper-oxygen of Y-Ba-Cu-O etc., is used as a target 3. At that time, the atomic number ratio of group IIIa metal: group IIa metal: copper is made to about 0.5-2:2-10:3-10. Sputtering occurs with an ion beam a drawn from an ion source 2 for sputtering striked to the target 3 when forming film to a substrate 8. Forming film is made with sputtering particles b emissioned from the target 3 by the sputtering adhered to the substrate 8 surface. During such forming film, a thin film composed of IIIa-IIa-copper-oxygen-fluoring is formed on the substrate 8 with oxygen gas and fluoring gas introduced from gas introduction pipes 6 and 7 and reacted to the particles b. Crystallization of rhombic system is made to prompt with the thin film heat treated under an oxygen gas atmosphere after forming film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62219752A JPS6463219A (en) | 1987-09-01 | 1987-09-01 | Manufacture of superconductive thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62219752A JPS6463219A (en) | 1987-09-01 | 1987-09-01 | Manufacture of superconductive thin film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6463219A true JPS6463219A (en) | 1989-03-09 |
Family
ID=16740444
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62219752A Pending JPS6463219A (en) | 1987-09-01 | 1987-09-01 | Manufacture of superconductive thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6463219A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013071255A1 (en) * | 2011-11-11 | 2013-05-16 | Veeco Instruments, Inc. | Ion beam deposition of fluorine-based optical films |
-
1987
- 1987-09-01 JP JP62219752A patent/JPS6463219A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013071255A1 (en) * | 2011-11-11 | 2013-05-16 | Veeco Instruments, Inc. | Ion beam deposition of fluorine-based optical films |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0269111A3 (en) | Method of forming a thin aluminium film | |
EP0662724A3 (en) | ||
Hallak et al. | Synthesis and stability of Nb3Ge made by electron‐beam codeposition | |
Echlin | Recent advances in specimen coating techniques. | |
JPS5727079A (en) | Manufacture of josephson element of oxide superconductor | |
JPS6463219A (en) | Manufacture of superconductive thin film | |
EP0269112A3 (en) | Method of forming a thin crystalline metal film | |
JPS6486577A (en) | Preparation of superconductive oxide film | |
GB2156387A (en) | Cutting tool and method of manufacture thereof | |
EP0298933B1 (en) | Method for the manufacture of copper oxide superconducting films | |
JPS5772307A (en) | Alloy film material for magneticstorage and manufacture of the same | |
JPS5578235A (en) | Sensor and its manufacture | |
JPS56156760A (en) | Method and apparatus for forming coat | |
JPS57121219A (en) | Manufacture of semiconductor device | |
JPS5671831A (en) | Manufacture for magnetic recording medium | |
JPS52151555A (en) | Manufacture of luminous screen | |
JPS6411380A (en) | Manufacture of josephson element | |
JPS5641636A (en) | Directly heated type oxide cathode | |
RU93049159A (en) | METHOD OF MAKING A THIN-FILM CARBON TARGET | |
JPS6417314A (en) | Thin film superconductor | |
JPS6414820A (en) | Manufacture of superconductor thin film | |
CA2016028A1 (en) | Method of fabricating oxide superconducting film | |
JPS56135927A (en) | Forming method for electrode of semiconductor device | |
Buhl | Technology of Thermal Evaporators and Sputtering Equipment for Physical Vapor Deposition.(Retroactive Coverage) | |
JPS5698469A (en) | Forming method for thin film of fluoro-resin |