JPS6459930A - Ultraviolet-ray irradiation device for wafer mounting frame - Google Patents

Ultraviolet-ray irradiation device for wafer mounting frame

Info

Publication number
JPS6459930A
JPS6459930A JP21832087A JP21832087A JPS6459930A JP S6459930 A JPS6459930 A JP S6459930A JP 21832087 A JP21832087 A JP 21832087A JP 21832087 A JP21832087 A JP 21832087A JP S6459930 A JPS6459930 A JP S6459930A
Authority
JP
Japan
Prior art keywords
frame
ultraviolet
ray irradiation
mounting frame
nozzles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21832087A
Other languages
Japanese (ja)
Inventor
Shigehisa Kuroda
Matsuro Kanehara
Minoru Ametani
Mitsuharu Daimatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP21832087A priority Critical patent/JPS6459930A/en
Publication of JPS6459930A publication Critical patent/JPS6459930A/en
Pending legal-status Critical Current

Links

Landscapes

  • Die Bonding (AREA)
  • Dicing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To improve the workability and effectiveness of ultraviolet-ray irradiation, to reduce the usage of inert gas and to contrive an economization by a method wherein a mounting frame is attracted by attracting nozzles and is moved to an ultraviolet-ray irradiation place by a traverse mechanism and after ultraviolet-rays are irradiated on an adhesive tape by the vertical motion of the attracting nozzles, which are actuated by an elevating mechanism, the mounting frame is taken out. CONSTITUTION:Attracting holes 7a are abutted on a mounting frame MF by the descent of attracting nozzles 7, the frame MF is attracted to the nozzles 7 by vacuum suction and the frame MF is transferred to an ultraviolet-ray irradiation place P2. Then, the frame MF is made to descent and is placed on a frame supporting plate 14 in an ultraviolet-ray irradiation machine 10. Inert gas G is jetted in the internal space through inert gas jet nozzles 16 and ultraviolet-rays are irradiated on an adhesive tape B to reduce the adhesive force of exposed tape parts B1. Then, the frame MF is made to ascend to a traverse height and a first air cylinder 1 is stretched to transfer the frame MF to a mounting frame separating place P3. Like the above way, the charge and the extraction of the frame MF are automatized. Thereby, an operating efficiency is improved.
JP21832087A 1987-08-31 1987-08-31 Ultraviolet-ray irradiation device for wafer mounting frame Pending JPS6459930A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21832087A JPS6459930A (en) 1987-08-31 1987-08-31 Ultraviolet-ray irradiation device for wafer mounting frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21832087A JPS6459930A (en) 1987-08-31 1987-08-31 Ultraviolet-ray irradiation device for wafer mounting frame

Publications (1)

Publication Number Publication Date
JPS6459930A true JPS6459930A (en) 1989-03-07

Family

ID=16718002

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21832087A Pending JPS6459930A (en) 1987-08-31 1987-08-31 Ultraviolet-ray irradiation device for wafer mounting frame

Country Status (1)

Country Link
JP (1) JPS6459930A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008147468A (en) * 2006-12-12 2008-06-26 Lintec Corp Apparatus and method for energy ray irradiation
JP2015126076A (en) * 2013-12-26 2015-07-06 株式会社ディスコ Processing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008147468A (en) * 2006-12-12 2008-06-26 Lintec Corp Apparatus and method for energy ray irradiation
JP2015126076A (en) * 2013-12-26 2015-07-06 株式会社ディスコ Processing device

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