JPS6457721A - Wafer cleaning equipment - Google Patents
Wafer cleaning equipmentInfo
- Publication number
- JPS6457721A JPS6457721A JP21434387A JP21434387A JPS6457721A JP S6457721 A JPS6457721 A JP S6457721A JP 21434387 A JP21434387 A JP 21434387A JP 21434387 A JP21434387 A JP 21434387A JP S6457721 A JPS6457721 A JP S6457721A
- Authority
- JP
- Japan
- Prior art keywords
- cassette
- cleaning tank
- wafer
- washings
- opening section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE:To improve the utilization rate of washings and to remove dead space in a wafer cleaning tank by a method wherein the inside of a cassette is supplied concentrically with the washings from an opening section in the bottom of the cassette for placing a wafer, the wafer is cleaned and the washings are made to overflow from the upper end section of the cleaning tank and discharged to a cleaning tank on the outside. CONSTITUTION:A plate 21 for positioning with an opening section 21a is mounted to the bottom of a cleaning tank 4, a cassette 9 is placed onto the plate 21 so that an opening section 9a for the cassette 9 is conformed, and an introducing pipe 5 is connected by a funnel-shaped path 22. An introduced washing is passed in the path 22 and the cassette 9, and made to overflow to a cleaning tank 1 from the upper end section of the cleaning tank 4. The washing all flows in the cassette 9, and the greater part of the washings can be used for cleaning a wafer 8. No dead space is shaped, thus avoiding re- adhesion to the wafer and the cassette of particles.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21434387A JPS6457721A (en) | 1987-08-28 | 1987-08-28 | Wafer cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21434387A JPS6457721A (en) | 1987-08-28 | 1987-08-28 | Wafer cleaning equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6457721A true JPS6457721A (en) | 1989-03-06 |
Family
ID=16654191
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21434387A Pending JPS6457721A (en) | 1987-08-28 | 1987-08-28 | Wafer cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6457721A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5234499A (en) * | 1990-06-26 | 1993-08-10 | Dainippon Screen Mgf. Co., Ltd. | Spin coating apparatus |
| JPH09321017A (en) * | 1996-03-13 | 1997-12-12 | Lg Semicon Co Ltd | Wet type wafer processing unit |
| US6378534B1 (en) | 1993-10-20 | 2002-04-30 | Verteq, Inc. | Semiconductor wafer cleaning system |
| JP2008218885A (en) * | 2007-03-07 | 2008-09-18 | Shin Etsu Polymer Co Ltd | Accommodation tank for substrate storing vessel |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61125136A (en) * | 1984-11-22 | 1986-06-12 | Hitachi Ltd | Treatment tank |
-
1987
- 1987-08-28 JP JP21434387A patent/JPS6457721A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61125136A (en) * | 1984-11-22 | 1986-06-12 | Hitachi Ltd | Treatment tank |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5234499A (en) * | 1990-06-26 | 1993-08-10 | Dainippon Screen Mgf. Co., Ltd. | Spin coating apparatus |
| US6378534B1 (en) | 1993-10-20 | 2002-04-30 | Verteq, Inc. | Semiconductor wafer cleaning system |
| JPH09321017A (en) * | 1996-03-13 | 1997-12-12 | Lg Semicon Co Ltd | Wet type wafer processing unit |
| JP2008218885A (en) * | 2007-03-07 | 2008-09-18 | Shin Etsu Polymer Co Ltd | Accommodation tank for substrate storing vessel |
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