JPS6412532A - Cleaning device - Google Patents

Cleaning device

Info

Publication number
JPS6412532A
JPS6412532A JP16908287A JP16908287A JPS6412532A JP S6412532 A JPS6412532 A JP S6412532A JP 16908287 A JP16908287 A JP 16908287A JP 16908287 A JP16908287 A JP 16908287A JP S6412532 A JPS6412532 A JP S6412532A
Authority
JP
Japan
Prior art keywords
tank
flow
uniformly
water
wafers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16908287A
Other languages
Japanese (ja)
Inventor
Chizu Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP16908287A priority Critical patent/JPS6412532A/en
Publication of JPS6412532A publication Critical patent/JPS6412532A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

PURPOSE:To cleanse wafers uniformly and effectively by a method wherein the flow of water in a tank is made uniform by rectifier members. CONSTITUTION:Water to flow in through a feedwater port 3 is caused to flow uniformly on the whole feedwater surface by a straightening member 5 mounted on a cap 6 and passes through a straightening member 5 mounted on the lower part of a tank 1 to flow out through a drainage port 4. The cleaning of the surfaces of wafers held in a basket 2 in the tank 1 is uniformly performed from the upper direction toward the lower direction by a water current in a constant direction, fine particles removed from the wafer surfaces flow out without remaining in the tank 1 and the interior of the tank is also held cleanly.
JP16908287A 1987-07-06 1987-07-06 Cleaning device Pending JPS6412532A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16908287A JPS6412532A (en) 1987-07-06 1987-07-06 Cleaning device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16908287A JPS6412532A (en) 1987-07-06 1987-07-06 Cleaning device

Publications (1)

Publication Number Publication Date
JPS6412532A true JPS6412532A (en) 1989-01-17

Family

ID=15879989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16908287A Pending JPS6412532A (en) 1987-07-06 1987-07-06 Cleaning device

Country Status (1)

Country Link
JP (1) JPS6412532A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04104871A (en) * 1990-08-21 1992-04-07 Fujitsu Ltd Washing tank
US5467020A (en) * 1994-03-29 1995-11-14 International Business Machines Corporation Testing fixture and method for circuit traces on a flexible substrate
JPH0985201A (en) * 1995-07-17 1997-03-31 Dan Kagaku:Kk Downward uniflux cleaning tank

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04104871A (en) * 1990-08-21 1992-04-07 Fujitsu Ltd Washing tank
US5467020A (en) * 1994-03-29 1995-11-14 International Business Machines Corporation Testing fixture and method for circuit traces on a flexible substrate
JPH0985201A (en) * 1995-07-17 1997-03-31 Dan Kagaku:Kk Downward uniflux cleaning tank

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