JPS6453460A - Mos transistor - Google Patents
Mos transistorInfo
- Publication number
- JPS6453460A JPS6453460A JP62209816A JP20981687A JPS6453460A JP S6453460 A JPS6453460 A JP S6453460A JP 62209816 A JP62209816 A JP 62209816A JP 20981687 A JP20981687 A JP 20981687A JP S6453460 A JPS6453460 A JP S6453460A
- Authority
- JP
- Japan
- Prior art keywords
- gate electrode
- gate insulating
- polycrystalline silicon
- active layer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 6
- 235000012239 silicon dioxide Nutrition 0.000 abstract 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 3
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000010453 quartz Substances 0.000 abstract 2
- 239000004065 semiconductor Substances 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78645—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate
- H01L29/78648—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with multiple gate arranged on opposing sides of the channel
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thin Film Transistor (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62209816A JPS6453460A (en) | 1987-08-24 | 1987-08-24 | Mos transistor |
EP88113531A EP0304824B1 (en) | 1987-08-24 | 1988-08-19 | Thin film mos transistor having pair of gate electrodes opposing across semiconductor layer |
DE88113531T DE3879323T2 (de) | 1987-08-24 | 1988-08-19 | Dünnschicht-MOS-Transistor mit zwei Gate-Elektroden, die gegenüber der halbleitenden Schicht liegen. |
KR1019880010526A KR970011766B1 (ko) | 1987-08-24 | 1988-08-19 | Mos 트랜지스터 |
CA000575400A CA1315421C (en) | 1987-08-24 | 1988-08-23 | Thin film mos transistor having pair of gate electrodes opposing across semiconductor layer |
US07/601,003 US5140391A (en) | 1987-08-24 | 1990-10-19 | Thin film MOS transistor having pair of gate electrodes opposing across semiconductor layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62209816A JPS6453460A (en) | 1987-08-24 | 1987-08-24 | Mos transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6453460A true JPS6453460A (en) | 1989-03-01 |
Family
ID=16579090
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62209816A Pending JPS6453460A (en) | 1987-08-24 | 1987-08-24 | Mos transistor |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0304824B1 (ja) |
JP (1) | JPS6453460A (ja) |
KR (1) | KR970011766B1 (ja) |
CA (1) | CA1315421C (ja) |
DE (1) | DE3879323T2 (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06112491A (ja) * | 1992-08-10 | 1994-04-22 | Internatl Business Mach Corp <Ibm> | 電界効果トランジスタ |
US6340830B1 (en) | 1992-06-09 | 2002-01-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for forming the same |
US6501097B1 (en) | 1994-04-29 | 2002-12-31 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device |
US6835586B2 (en) | 1998-12-25 | 2004-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
US6914302B2 (en) | 1998-12-18 | 2005-07-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
US6982460B1 (en) | 2000-07-07 | 2006-01-03 | International Business Machines Corporation | Self-aligned gate MOSFET with separate gates |
JP2006049928A (ja) * | 2005-09-29 | 2006-02-16 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
US8158980B2 (en) | 2001-04-19 | 2012-04-17 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a pixel matrix circuit that includes a pixel TFT and a storage capacitor |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4984040A (en) * | 1989-06-15 | 1991-01-08 | Xerox Corporation | High voltage thin film transistor with second gate |
US4984041A (en) * | 1989-07-28 | 1991-01-08 | Xerox Corporation | High voltage thin film transistor with second control electrode |
US5173753A (en) * | 1989-08-10 | 1992-12-22 | Industrial Technology Research Institute | Inverted coplanar amorphous silicon thin film transistor which provides small contact capacitance and resistance |
JPH0824193B2 (ja) * | 1990-10-16 | 1996-03-06 | 工業技術院長 | 平板型光弁駆動用半導体装置の製造方法 |
US5420048A (en) * | 1991-01-09 | 1995-05-30 | Canon Kabushiki Kaisha | Manufacturing method for SOI-type thin film transistor |
US5777364A (en) * | 1992-11-30 | 1998-07-07 | International Business Machines Corporation | Graded channel field effect transistor |
US6576202B1 (en) | 2000-04-21 | 2003-06-10 | Kin-Chung Ray Chiu | Highly efficient compact capacitance coupled plasma reactor/generator and method |
JP2019067938A (ja) * | 2017-10-02 | 2019-04-25 | シャープ株式会社 | 薄膜トランジスタ |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6094773A (ja) * | 1983-10-27 | 1985-05-27 | Agency Of Ind Science & Technol | 電界効果トランジスタ |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4422090A (en) * | 1979-07-25 | 1983-12-20 | Northern Telecom Limited | Thin film transistors |
GB2064866A (en) * | 1979-11-30 | 1981-06-17 | Gen Electric Co Ltd | Field effect semiconductor device |
-
1987
- 1987-08-24 JP JP62209816A patent/JPS6453460A/ja active Pending
-
1988
- 1988-08-19 DE DE88113531T patent/DE3879323T2/de not_active Expired - Lifetime
- 1988-08-19 EP EP88113531A patent/EP0304824B1/en not_active Expired - Lifetime
- 1988-08-19 KR KR1019880010526A patent/KR970011766B1/ko not_active IP Right Cessation
- 1988-08-23 CA CA000575400A patent/CA1315421C/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6094773A (ja) * | 1983-10-27 | 1985-05-27 | Agency Of Ind Science & Technol | 電界効果トランジスタ |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6340830B1 (en) | 1992-06-09 | 2002-01-22 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for forming the same |
US6528852B2 (en) | 1992-06-09 | 2003-03-04 | Semiconductor Energy Laboratory Co., Ltd. | Double gated electronic device and method of forming the same |
US6815772B2 (en) | 1992-06-09 | 2004-11-09 | Semiconductor Energy Laboratory Co., Ltd. | Dual gate MOSFET |
JPH06112491A (ja) * | 1992-08-10 | 1994-04-22 | Internatl Business Mach Corp <Ibm> | 電界効果トランジスタ |
US6501097B1 (en) | 1994-04-29 | 2002-12-31 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device |
US7102164B2 (en) | 1994-04-29 | 2006-09-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a conductive layer with a light shielding part |
US6914302B2 (en) | 1998-12-18 | 2005-07-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
US6835586B2 (en) | 1998-12-25 | 2004-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
US8643015B2 (en) | 1998-12-28 | 2014-02-04 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a pixel matrix circuit that includes a pixel TFT and a storage capacitor |
US6982460B1 (en) | 2000-07-07 | 2006-01-03 | International Business Machines Corporation | Self-aligned gate MOSFET with separate gates |
US7101762B2 (en) | 2000-07-07 | 2006-09-05 | International Business Machines Corporation | Self-aligned double gate mosfet with separate gates |
US8158980B2 (en) | 2001-04-19 | 2012-04-17 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a pixel matrix circuit that includes a pixel TFT and a storage capacitor |
JP2006049928A (ja) * | 2005-09-29 | 2006-02-16 | Semiconductor Energy Lab Co Ltd | 半導体装置 |
Also Published As
Publication number | Publication date |
---|---|
DE3879323D1 (de) | 1993-04-22 |
KR970011766B1 (ko) | 1997-07-15 |
EP0304824A3 (en) | 1989-05-03 |
CA1315421C (en) | 1993-03-30 |
DE3879323T2 (de) | 1993-09-30 |
EP0304824B1 (en) | 1993-03-17 |
EP0304824A2 (en) | 1989-03-01 |
KR890004444A (ko) | 1989-04-22 |
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