JPS6445176A - Manufacture of solar cell element - Google Patents
Manufacture of solar cell elementInfo
- Publication number
- JPS6445176A JPS6445176A JP62201713A JP20171387A JPS6445176A JP S6445176 A JPS6445176 A JP S6445176A JP 62201713 A JP62201713 A JP 62201713A JP 20171387 A JP20171387 A JP 20171387A JP S6445176 A JPS6445176 A JP S6445176A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- gas
- main surface
- atmosphere
- boron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/546—Polycrystalline silicon PV cells
Abstract
PURPOSE:To make possible the formation of a roughness, by which the reflection of light is reduced, by a method wherein a boron oxide is coated on one main surface of a substrate and the diffusion of boron is performed in the substrate while halogen gas is supplied in an inactive atmosphere. CONSTITUTION:Ethylene glycol monoether, in which a boric acid is dissolved, is coated on one main surface of a p-type poly Si substrate 1 and is dried to form a boron oxide coat film 2. Then, a heating treatment is performed in a nitrogen gas-containing atmosphere to react the film 2 with silicon and to form a borosilicate glass 3. Moreover, halogen gas, such as chlorine gas, is supplied in an atmosphere containing chlorine and nitrogen and the other main surface, which is not covered with the glass 3, of the substrate 1 is subjected to vapor phase etching with the chlorine gas. After this, the supply of the chlorine gas is stopped and a high-temperature heating treatment is performed in a nitrogen gas-containing atmosphere to form a surface roughness 5 and a boron diffused layer (a p<+> layer) 4. Thereby, the surface roughness, by which the reflection of light is reduced, can be formed using the low-cost substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62201713A JPS6445176A (en) | 1987-08-14 | 1987-08-14 | Manufacture of solar cell element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62201713A JPS6445176A (en) | 1987-08-14 | 1987-08-14 | Manufacture of solar cell element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6445176A true JPS6445176A (en) | 1989-02-17 |
Family
ID=16445696
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62201713A Pending JPS6445176A (en) | 1987-08-14 | 1987-08-14 | Manufacture of solar cell element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6445176A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06260670A (en) * | 1993-03-05 | 1994-09-16 | Hitachi Ltd | Light confining structure for solar cell |
CN1082254C (en) * | 1995-08-22 | 2002-04-03 | 松下电器产业株式会社 | Silicon Structure, its mfg. method and apparatus, and solar cell using same |
JP2002134410A (en) * | 2000-10-27 | 2002-05-10 | Shin Etsu Handotai Co Ltd | Semiconductor substrate and solar cell utilizing the same their producing method |
KR100416740B1 (en) * | 1997-02-17 | 2004-05-17 | 삼성전자주식회사 | Method for fabricating rear locally sintered silicon solar cell |
JP2005191315A (en) * | 2003-12-25 | 2005-07-14 | Kyocera Corp | Photoelectric converter and its manufacturing method |
WO2014174613A1 (en) * | 2013-04-24 | 2014-10-30 | 三菱電機株式会社 | Method for producing solar cell |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5498189A (en) * | 1977-12-30 | 1979-08-02 | Mobil Tyco Solar Energy Corp | Method of fabricating solar battery having shallow deep composite junction unit |
JPS55105382A (en) * | 1979-02-05 | 1980-08-12 | Ibm | Method of roughening surface of silicon substrate |
JPS6231834A (en) * | 1985-08-02 | 1987-02-10 | Hitachi Ltd | Shutter control device |
-
1987
- 1987-08-14 JP JP62201713A patent/JPS6445176A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5498189A (en) * | 1977-12-30 | 1979-08-02 | Mobil Tyco Solar Energy Corp | Method of fabricating solar battery having shallow deep composite junction unit |
JPS55105382A (en) * | 1979-02-05 | 1980-08-12 | Ibm | Method of roughening surface of silicon substrate |
JPS6231834A (en) * | 1985-08-02 | 1987-02-10 | Hitachi Ltd | Shutter control device |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06260670A (en) * | 1993-03-05 | 1994-09-16 | Hitachi Ltd | Light confining structure for solar cell |
CN1082254C (en) * | 1995-08-22 | 2002-04-03 | 松下电器产业株式会社 | Silicon Structure, its mfg. method and apparatus, and solar cell using same |
KR100416740B1 (en) * | 1997-02-17 | 2004-05-17 | 삼성전자주식회사 | Method for fabricating rear locally sintered silicon solar cell |
JP2002134410A (en) * | 2000-10-27 | 2002-05-10 | Shin Etsu Handotai Co Ltd | Semiconductor substrate and solar cell utilizing the same their producing method |
JP2005191315A (en) * | 2003-12-25 | 2005-07-14 | Kyocera Corp | Photoelectric converter and its manufacturing method |
WO2014174613A1 (en) * | 2013-04-24 | 2014-10-30 | 三菱電機株式会社 | Method for producing solar cell |
US9685581B2 (en) | 2013-04-24 | 2017-06-20 | Mitsubishi Electric Corporation | Manufacturing method of solar cell |
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