JPS6441218A - Surface treatment - Google Patents
Surface treatmentInfo
- Publication number
- JPS6441218A JPS6441218A JP19625887A JP19625887A JPS6441218A JP S6441218 A JPS6441218 A JP S6441218A JP 19625887 A JP19625887 A JP 19625887A JP 19625887 A JP19625887 A JP 19625887A JP S6441218 A JPS6441218 A JP S6441218A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- discharge
- layer
- shaped
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To obtain a surface protective film, on which a surface oxide film is not formed, by exposing a sample in the discharge of a gas containing halocarbon gas, to which hydrogen gas is added, changing discharge into the conditions of discharge, in which a layer containing carbon is shaped, and exposing the sample in discharge. CONSTITUTION:SiO2 12 is etched by a CF4 gas by using a resist mask 11. A contaminating layer 14 is shaped onto the etched surface on an Si substrate 13. The resist 11 is ashed by oxygen plasma, CF4 gas, to which hydrogen is added, is flowed into a dry etching devide, and the surface is treated by plasma. When hydrogen gas is increased successively, a thin oxide film on the contaminating layer 14 on the substrate 13 is removed, and a surface protective layer 15, the surface of which is replaced with a polymer containing fluorine, is shaped.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19625887A JPH0611038B2 (en) | 1987-08-07 | 1987-08-07 | Surface treatment method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19625887A JPH0611038B2 (en) | 1987-08-07 | 1987-08-07 | Surface treatment method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6441218A true JPS6441218A (en) | 1989-02-13 |
JPH0611038B2 JPH0611038B2 (en) | 1994-02-09 |
Family
ID=16354819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19625887A Expired - Lifetime JPH0611038B2 (en) | 1987-08-07 | 1987-08-07 | Surface treatment method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0611038B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04103750U (en) * | 1991-01-25 | 1992-09-07 | 大洋漁業株式会社 | mobile phone |
JPH05102076A (en) * | 1991-03-06 | 1993-04-23 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPH09148268A (en) * | 1995-11-22 | 1997-06-06 | Nec Corp | Method for manufacturing semiconductor device |
-
1987
- 1987-08-07 JP JP19625887A patent/JPH0611038B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04103750U (en) * | 1991-01-25 | 1992-09-07 | 大洋漁業株式会社 | mobile phone |
JPH05102076A (en) * | 1991-03-06 | 1993-04-23 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
JPH09148268A (en) * | 1995-11-22 | 1997-06-06 | Nec Corp | Method for manufacturing semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPH0611038B2 (en) | 1994-02-09 |
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