JPS6477939A - System of forming resist pattern - Google Patents

System of forming resist pattern

Info

Publication number
JPS6477939A
JPS6477939A JP23540387A JP23540387A JPS6477939A JP S6477939 A JPS6477939 A JP S6477939A JP 23540387 A JP23540387 A JP 23540387A JP 23540387 A JP23540387 A JP 23540387A JP S6477939 A JPS6477939 A JP S6477939A
Authority
JP
Japan
Prior art keywords
resist
polymer
exposed
generated
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23540387A
Other languages
Japanese (ja)
Inventor
Seiichi Baba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP23540387A priority Critical patent/JPS6477939A/en
Publication of JPS6477939A publication Critical patent/JPS6477939A/en
Pending legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To conduct the dry development of a resist easily by forming a polymer superposing layer onto the surface of a high molecular crosslinking section generated by exposing the negative type photoresist. CONSTITUTION:A negative type photo-resist 2 generating a crosslinking reaction by optical irradiation is applied onto a substrate 1. The resist of a polycinnamic acid group, a polyisoprene rubber, etc., is used as such a resist. The resist is exposed to a desired pattern by ultraviolet rays after vacuum drying. A crosslinking reaction is generated in the exposure section of the resist 2 by the exposure, and high molecular crosslinks 2a are shaped. The surface of the resist 2 is exposed to plasma or reactive ions generated by employing fluorocarbon gas. A gas used is changed into O2, and reactive ion etching by O2 gas is performed. Polymer superposing layers 26 are hardly etched to O2 plasma at that time, and function as protective films, and only sections not exposed not coated with the polymer superposing layers 26 are etched.
JP23540387A 1987-09-18 1987-09-18 System of forming resist pattern Pending JPS6477939A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23540387A JPS6477939A (en) 1987-09-18 1987-09-18 System of forming resist pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23540387A JPS6477939A (en) 1987-09-18 1987-09-18 System of forming resist pattern

Publications (1)

Publication Number Publication Date
JPS6477939A true JPS6477939A (en) 1989-03-23

Family

ID=16985575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23540387A Pending JPS6477939A (en) 1987-09-18 1987-09-18 System of forming resist pattern

Country Status (1)

Country Link
JP (1) JPS6477939A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5599654A (en) * 1992-08-21 1997-02-04 Fujitsu Limited Process for forming patterned layer of fluorinated resin and devices containing same
KR970051922A (en) * 1995-12-29 1997-07-29

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5599654A (en) * 1992-08-21 1997-02-04 Fujitsu Limited Process for forming patterned layer of fluorinated resin and devices containing same
US6048786A (en) * 1992-08-21 2000-04-11 Fujitsu Limited Process for forming fluorinated resin or amorphous carbon layer and devices containing same
KR970051922A (en) * 1995-12-29 1997-07-29

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