JPS6431987A - Electrolytic refining method for copper - Google Patents
Electrolytic refining method for copperInfo
- Publication number
- JPS6431987A JPS6431987A JP62187329A JP18732987A JPS6431987A JP S6431987 A JPS6431987 A JP S6431987A JP 62187329 A JP62187329 A JP 62187329A JP 18732987 A JP18732987 A JP 18732987A JP S6431987 A JPS6431987 A JP S6431987A
- Authority
- JP
- Japan
- Prior art keywords
- purity
- cathode
- electrolysis
- electrolyte
- value
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Abstract
PURPOSE:To deposit extremely high-purity electrolytic copper on the cathode, by keeping the pH value of an electrolyte in a specific range and carrying out electrolysis in a specific cathode current density by using an A.C.-D.C. superimposed current at the time of performing electrolysis by using an electrolyte containing copper nitrate and also using crude copper as a consumable anode. CONSTITUTION:High-purity Cu(NO3)2.3H2O is dissolved in pure water so as to be formed into an aqueous solution of 70g/l concentration, and HNO3 is added to the above aqueous solution to prepare a strongly acidic electrolyte for Cu refining in which pH value is regulated to 0.1-1.0, and then, electrolysis is carried out by using a Cu plate of ordinary grade as a consumable anode and also using high-purity Cu as a cathode. At this time, electrolytic refining is carried out by using an A.C.-D.C. superimposed current as an electric current for electrolysis and also regulating cathode current density to <=3.0A/dm<2> while maintaining the pH value of the electrolyte to 0.1-1.0 by always adding small amounts of HNO3. By this method, high-purity Cu of >99.9999% purity can be deposited on the cathode.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62187329A JPH0653949B2 (en) | 1987-07-27 | 1987-07-27 | Copper electrolytic refining method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62187329A JPH0653949B2 (en) | 1987-07-27 | 1987-07-27 | Copper electrolytic refining method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6431987A true JPS6431987A (en) | 1989-02-02 |
JPH0653949B2 JPH0653949B2 (en) | 1994-07-20 |
Family
ID=16204095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62187329A Expired - Lifetime JPH0653949B2 (en) | 1987-07-27 | 1987-07-27 | Copper electrolytic refining method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0653949B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102534657A (en) * | 2012-02-17 | 2012-07-04 | 重庆重冶铜业有限公司 | Method for treating waste electrolyte in process of producing cathode copper |
CN114293227A (en) * | 2021-12-16 | 2022-04-08 | 虹华科技股份有限公司 | Processing technology of high-purity copper product for aerospace |
-
1987
- 1987-07-27 JP JP62187329A patent/JPH0653949B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102534657A (en) * | 2012-02-17 | 2012-07-04 | 重庆重冶铜业有限公司 | Method for treating waste electrolyte in process of producing cathode copper |
CN114293227A (en) * | 2021-12-16 | 2022-04-08 | 虹华科技股份有限公司 | Processing technology of high-purity copper product for aerospace |
Also Published As
Publication number | Publication date |
---|---|
JPH0653949B2 (en) | 1994-07-20 |
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