JPS6428630A - Resin composition cross linkable by photopolymerization - Google Patents
Resin composition cross linkable by photopolymerizationInfo
- Publication number
- JPS6428630A JPS6428630A JP63143833A JP14383388A JPS6428630A JP S6428630 A JPS6428630 A JP S6428630A JP 63143833 A JP63143833 A JP 63143833A JP 14383388 A JP14383388 A JP 14383388A JP S6428630 A JPS6428630 A JP S6428630A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- aldehyde compound
- photopolymerization
- photopolymerizable
- photopolymerizable monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/10—Esters; Ether-esters
- C08K5/101—Esters; Ether-esters of monocarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/07—Aldehydes; Ketones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/155—Nonresinous additive to promote interlayer adhesion in element
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3719844.0 | 1987-06-13 | ||
DE19873719844 DE3719844A1 (de) | 1987-06-13 | 1987-06-13 | Durch photopolymersisation vernetzbares gemisch |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6428630A true JPS6428630A (en) | 1989-01-31 |
JP2672122B2 JP2672122B2 (ja) | 1997-11-05 |
Family
ID=6329683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63143833A Expired - Lifetime JP2672122B2 (ja) | 1987-06-13 | 1988-06-13 | 光重合により架橋可能な樹脂組成物 |
Country Status (4)
Country | Link |
---|---|
US (1) | US4970134A (ja) |
EP (1) | EP0295547B1 (ja) |
JP (1) | JP2672122B2 (ja) |
DE (2) | DE3719844A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006124709A (ja) * | 2004-10-29 | 2006-05-18 | Clariant (France) | アミノプラスト樹脂組成物 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2041023C (en) * | 1990-04-26 | 2002-03-12 | William K. Goss | Photocurable elements and flexographic printing plates prepared therefrom |
US5296333A (en) * | 1990-11-16 | 1994-03-22 | Raytheon Company | Photoresist adhesion promoter |
US6268457B1 (en) | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
KR100804873B1 (ko) | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | 포토리소그래피용 sog 반사방지 코팅 |
NL1015524C2 (nl) * | 2000-06-26 | 2001-12-28 | Otb Group Bv | Werkwijze ter vervaardiging van een substraat om te worden toegepast in een stampervervaardigingsproces, alsmede substraat verkregen volgens een dergelijke werkwijze. |
EP1472574A4 (en) | 2001-11-15 | 2005-06-08 | Honeywell Int Inc | ANTI-REFLECTIVE COATINGS DESIGNED TO BE INSTALLED BY ROTATION FOR PHOTOLITHOGRAPHY |
US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US8927182B2 (en) * | 2006-03-30 | 2015-01-06 | Basf Se | Photosensitive resist composition for color filters for use in electronic paper display devices |
US7825672B2 (en) * | 2006-06-19 | 2010-11-02 | Mrl Industries, Inc. | High accuracy in-situ resistance measurements methods |
US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
TW201303489A (zh) * | 2011-04-19 | 2013-01-16 | Sumitomo Chemical Co | 感光性樹脂組合物 |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
WO2016167892A1 (en) | 2015-04-13 | 2016-10-20 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS495923A (ja) * | 1972-05-11 | 1974-01-19 | ||
JPS5223281A (en) * | 1975-08-15 | 1977-02-22 | Nec Corp | Method of manufacturing semiconductor device |
JPS5229304A (en) * | 1975-08-20 | 1977-03-05 | Dow Chemical Co | Composition allowing hardening of free radical in image development and method of making same and method of producing relief product using same |
JPS5888742A (ja) * | 1981-11-12 | 1983-05-26 | バスフ アクチェン ゲゼルシャフト | 活版及び凸版の製造に適する感光性材料及びこれを使用して活版及び凸版を製造する方法 |
JPS6046550A (ja) * | 1983-06-25 | 1985-03-13 | バスフ アクチエンゲゼルシヤフト | 印刷版、レリ−フ版またはレジストパタ−ンを製造するための水現像可能な感光記録材料 |
JPS60252602A (ja) * | 1984-05-29 | 1985-12-13 | Mitsui Petrochem Ind Ltd | 可視光硬化性組成物 |
JPS60252603A (ja) * | 1984-05-29 | 1985-12-13 | Mitsui Petrochem Ind Ltd | 光硬化性組成物 |
JPS62146902A (ja) * | 1985-11-30 | 1987-06-30 | バスフ アクチェン ゲゼルシャフト | オレフイン不飽和側鎖基を有するポリビニルアルコ−ルおよびその製造方法およびそれにより製造されたオフセツト印刷版 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5223281B2 (ja) * | 1972-12-15 | 1977-06-23 | ||
US4043819A (en) * | 1974-06-11 | 1977-08-23 | Ciba-Geigy Ag | Photo-polymerizable material for the preparation of stable polymeric images and process for making them by photopolymerization in a matrix |
-
1987
- 1987-06-13 DE DE19873719844 patent/DE3719844A1/de not_active Withdrawn
-
1988
- 1988-06-08 EP EP88109083A patent/EP0295547B1/de not_active Expired - Lifetime
- 1988-06-08 DE DE3889773T patent/DE3889773D1/de not_active Expired - Fee Related
- 1988-06-10 US US07/205,380 patent/US4970134A/en not_active Expired - Fee Related
- 1988-06-13 JP JP63143833A patent/JP2672122B2/ja not_active Expired - Lifetime
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS495923A (ja) * | 1972-05-11 | 1974-01-19 | ||
JPS5223281A (en) * | 1975-08-15 | 1977-02-22 | Nec Corp | Method of manufacturing semiconductor device |
JPS5229304A (en) * | 1975-08-20 | 1977-03-05 | Dow Chemical Co | Composition allowing hardening of free radical in image development and method of making same and method of producing relief product using same |
JPS5888742A (ja) * | 1981-11-12 | 1983-05-26 | バスフ アクチェン ゲゼルシャフト | 活版及び凸版の製造に適する感光性材料及びこれを使用して活版及び凸版を製造する方法 |
JPS6046550A (ja) * | 1983-06-25 | 1985-03-13 | バスフ アクチエンゲゼルシヤフト | 印刷版、レリ−フ版またはレジストパタ−ンを製造するための水現像可能な感光記録材料 |
JPS60252602A (ja) * | 1984-05-29 | 1985-12-13 | Mitsui Petrochem Ind Ltd | 可視光硬化性組成物 |
JPS60252603A (ja) * | 1984-05-29 | 1985-12-13 | Mitsui Petrochem Ind Ltd | 光硬化性組成物 |
JPS62146902A (ja) * | 1985-11-30 | 1987-06-30 | バスフ アクチェン ゲゼルシャフト | オレフイン不飽和側鎖基を有するポリビニルアルコ−ルおよびその製造方法およびそれにより製造されたオフセツト印刷版 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006124709A (ja) * | 2004-10-29 | 2006-05-18 | Clariant (France) | アミノプラスト樹脂組成物 |
Also Published As
Publication number | Publication date |
---|---|
EP0295547B1 (de) | 1994-06-01 |
DE3719844A1 (de) | 1988-12-29 |
EP0295547A2 (de) | 1988-12-21 |
DE3889773D1 (de) | 1994-07-07 |
US4970134A (en) | 1990-11-13 |
JP2672122B2 (ja) | 1997-11-05 |
EP0295547A3 (de) | 1991-01-02 |
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