JPH04104871A - Washing tank - Google Patents
Washing tankInfo
- Publication number
- JPH04104871A JPH04104871A JP21820790A JP21820790A JPH04104871A JP H04104871 A JPH04104871 A JP H04104871A JP 21820790 A JP21820790 A JP 21820790A JP 21820790 A JP21820790 A JP 21820790A JP H04104871 A JPH04104871 A JP H04104871A
- Authority
- JP
- Japan
- Prior art keywords
- water
- tank
- tank body
- washing
- main body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005406 washing Methods 0.000 title claims abstract description 65
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 81
- 239000013505 freshwater Substances 0.000 claims abstract description 16
- 238000011010 flushing procedure Methods 0.000 claims description 9
- 239000008237 rinsing water Substances 0.000 claims 1
- 230000008674 spewing Effects 0.000 claims 1
- 238000007599 discharging Methods 0.000 abstract description 5
- 239000013049 sediment Substances 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000002351 wastewater Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000003749 cleanliness Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
Landscapes
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Coating Apparatus (AREA)
- Chemically Coating (AREA)
Abstract
Description
【発明の詳細な説明】
概要
無電解銅メツキ工程における製品の洗浄等に用いられる
水洗槽に関し、
内壁に付着物や堆積物が生じ難い水洗槽の提供を目的と
し、
槽本体と、該槽本体の上部に設けられ、新水を上記槽本
体の内壁に沿って吐出する給水手段と、上記槽本体から
オーバーフローした水洗水を排水するオーバーフロー槽
と、上記槽本体の下部に設けられ、上記槽本体における
循環水を上記槽本体の底部に向けて噴８する循環手段と
を備えて構成する。[Detailed Description of the Invention] Summary The purpose of the present invention is to provide a washing tank which is used for cleaning products in an electroless copper plating process, and which does not easily cause deposits or deposits on the inner wall. a water supply means provided at the upper part of the tank body and discharging fresh water along the inner wall of the tank body; an overflow tank discharging flush water overflowing from the tank body; and a circulation means 8 for spouting circulating water toward the bottom of the tank body.
産業上の利用分野
本発明は無電解銅メツキ工程における製品の洗浄等に用
いられる水洗槽に関する。INDUSTRIAL APPLICATION FIELD The present invention relates to a washing tank used for washing products in an electroless copper plating process.
電子機器製造の分野においては、配線パターンが形成さ
れたプリント配線板にＩＣ，コンデンサ、抵抗、その他
の電子部品を装着し、電子部品と配線パターンとを半田
付けすることによって電子回路を実現するようにしてい
る。配線パターンは、一般的に、ガラスエポキシ基板等
の絶縁基板に無電解及び／又は電解メツキを施すことに
よって形成される。この種のメツキ工程においては、製
品の水洗による洗浄が不可欠である。近年においては、
プリント配線板の配線パターンは高密度化しており、メ
ツキ工程においてはわずかな異物付着によっても不良が
生じるので、水洗水の汚れについて細心の注意を払う必
要がある。In the field of electronic device manufacturing, electronic circuits are realized by mounting ICs, capacitors, resistors, and other electronic components on printed wiring boards on which wiring patterns are formed, and then soldering the electronic components and wiring patterns. I have to. Wiring patterns are generally formed by applying electroless and/or electrolytic plating to an insulating substrate such as a glass epoxy substrate. In this type of plating process, washing the product with water is essential. In recent years,
The wiring patterns of printed wiring boards are becoming more dense, and even the slightest amount of foreign matter adhering to them during the plating process can cause defects, so it is necessary to pay close attention to the contamination of the washing water.
従来の技術 第４図に従来の一般的な水洗槽の構成を模式的に示す。Conventional technology FIG. 4 schematically shows the configuration of a conventional general washing tank.
４２はその内部で被洗浄物の水洗が行われる槽本体、４
４は槽本体４２からオーツく一フローした水洗水を排水
するためのオーツ・−フロー槽である。槽本体４２の内
部における水洗水の攪拌等を目的として、水洗槽４２の
内部から循環ポンプ４６により吸引した水洗水をシャワ
ーパイプ４８により再び槽本体４２内部に噴出するよう
にしている。シャワーパイプ４８の噴出口は通常上方向
を向いている。５０は汚染されていない新水を供給する
ための新水供給管であり、この供給管５０からの新水の
供給量に応じた量の水洗水がオーバーフロー槽４４にオ
ーバーフローして排水サレるようになっている。42 is a tank main body in which the objects to be washed are washed with water;
4 is an oat-flow tank for draining the oat-flowing water from the tank body 42. For the purpose of stirring the washing water inside the tank main body 42, the washing water sucked from inside the washing tank 42 by a circulation pump 46 is spouted into the tank main body 42 again through a shower pipe 48. The spout of the shower pipe 48 normally faces upward. 50 is a new water supply pipe for supplying uncontaminated fresh water, and an amount of washing water corresponding to the amount of fresh water supplied from this supply pipe 50 overflows into the overflow tank 44 and is drained. It has become.
発明が解決しようとする課題
上述した従来の水洗槽にあっては、この水洗槽を頻繁に
使用するしないにかかわらず、水洗槽内に水洗水を溜於
ておくと、水洗水に浮遊物や汚れが生じ、水洗槽の内壁
に付着物や堆積物が生じることがある。この種の付着物
や堆積物を放置しておくと、これらが水洗水に混入し、
水洗に際して被洗浄物を汚染するという問題があった。Problems to be Solved by the Invention In the above-mentioned conventional washing tank, regardless of whether the washing tank is used frequently or not, if the washing water is stored in the washing tank, floating objects and Dirt may form, and deposits and deposits may form on the inner walls of the washing tank. If these types of deposits and deposits are left untreated, they will get mixed into the flushing water.
There was a problem in that the object to be washed was contaminated during washing.
例えばプリント配線板の無電解メツキ工程においては、
メツキがなされる面にわずかでも異物付着があると、メ
ツキネ良が生じ、所要の配線パターンを形成することが
できなくなる。For example, in the electroless plating process for printed wiring boards,
If there is even a slight amount of foreign matter adhering to the surface to be plated, poor plating will occur, making it impossible to form the desired wiring pattern.
本発明はこのような事情に鑑みて創作されたもので、内
壁に付着物や堆積物が生じ難い水洗槽の提供を目的とし
ている。The present invention was created in view of the above circumstances, and aims to provide a flushing tank in which deposits and deposits are less likely to form on the inner wall.
課題を解決するための手段
第１図は本発明の原理説明図であり、本発明の水洗槽の
構成が模式的に示されている。本発明の水洗槽は、槽本
体２と、該槽本体２の上部に設けられ、新水を上記槽本
体２の内壁に沿って吐出する給水手段４と、上記槽本体
２からオーバーフローした水洗水を排水するオーバーフ
ロー槽６と、上記槽本体２の下部に設けられ、上記槽本
体２における循環水を上記槽本体２の底部に向けて噴出
する循環手段８とを備えて構成されている。Means for Solving the Problems FIG. 1 is a diagram illustrating the principle of the present invention, and schematically shows the configuration of the washing tank of the present invention. The washing tank of the present invention includes a tank main body 2, a water supply means 4 provided on the upper part of the tank main body 2 and discharging fresh water along the inner wall of the tank main body 2, and a washing water overflowing from the tank main body 2. The tank includes an overflow tank 6 for draining water, and a circulation means 8 provided at the lower part of the tank body 2 and for spouting the circulating water in the tank body 2 toward the bottom of the tank body 2.
作 用
本発明の構成によると、給水手段により新水を槽本体の
内壁に沿って吐出するようにし、しかも、循環手段によ
り循環水を槽本体の底部に向けて噴出するようにしてい
るので、槽本体の内壁の付着物や堆積物を除去すること
ができるようになる。According to the configuration of the present invention, the water supply means discharges fresh water along the inner wall of the tank body, and the circulation means jets the circulating water toward the bottom of the tank body. It becomes possible to remove deposits and deposits from the inner wall of the tank body.
水洗水中に除去された上記付着物や堆積物は、新水の供
給に伴って水洗水と供にオーバーフロー槽にオーバーフ
ローして水洗水は排水される。The above-mentioned deposits and deposits removed in the washing water overflow into an overflow tank together with the washing water as fresh water is supplied, and the washing water is drained.
実 施 例 以下本発明の実施例を説明する。Example Examples of the present invention will be described below.
第２図は本発明の実施例を示す水洗槽の断面図である。FIG. 2 is a sectional view of a washing tank showing an embodiment of the present invention.
２はその内部に水洗水が溜められる槽本体であり、この
槽本体２の上部の側方にはオーバーフロー槽６が設けら
れている。給水手段４は、供給された新水を概略下方向
に向いた吐出口１０ａから槽本体の内壁に沿って吐出す
る給水用シャワーパイプ１０を備えて構成されている。Reference numeral 2 denotes a tank main body in which washing water is stored, and an overflow tank 6 is provided on the upper side of the tank main body 2. The water supply means 4 includes a water supply shower pipe 10 that discharges supplied fresh water from a discharge port 10a facing generally downward along the inner wall of the tank body.
給水用シャワーパイプ１０は、槽本体２の内部の上方に
内壁に沿って設けられている。循環手段８は、供給され
た循環水を槽本体２の底部の隅に向いた噴出口１２ａか
ら噴出する循環用シャワーパイプ１２と、槽本体２内の
水洗水を吸引して循環水として循環用シャワーパイプ１
２に供給する循環パイプ１４とを備えて構成されている
。循環ポンプ１４による水洗水の吸引はパイプ１６を介
して行われ、循環用シャワーパイプ１２への循環水の供
給はパイプ１８を介して行われる。循環用シャワーパイ
プ１２は、槽本体２の内部の下方に内壁に沿って設けら
れている。The water supply shower pipe 10 is provided above the inside of the tank body 2 along the inner wall. The circulation means 8 includes a circulation shower pipe 12 that spouts the supplied circulating water from a spout 12a facing the bottom corner of the tank body 2, and a circulation shower pipe 12 that sucks the flushing water in the tank body 2 and uses it as circulating water. shower pipe 1
2, and a circulation pipe 14 for supplying the water. Suction of flush water by the circulation pump 14 is performed through a pipe 16, and circulating water is supplied to the circulating shower pipe 12 through a pipe 18. The circulation shower pipe 12 is provided below inside the tank body 2 along the inner wall.
実施例では、循環ポンプ１４と循環用シャワーパイプ１
２を接続するパイプ１８の途中に分岐流路２０を設け、
この分岐流路２０の途中に自動弁２２を設け、水洗水の
更新に際しては、自動弁２２を開いて循環ポンプ１４に
より分岐流路２０を介して速やかに水洗水を水洗槽外部
（例えば後述するバッファ槽）に排水するようにしてい
る。このように速やかに水洗水を排水することによって
、その後に給水手段４により新水を水洗槽２内に供給し
たときに、汚れの少ない水洗水が得られることになる。In the embodiment, a circulation pump 14 and a circulation shower pipe 1 are used.
A branch flow path 20 is provided in the middle of the pipe 18 connecting the two,
An automatic valve 22 is provided in the middle of this branch flow path 20, and when renewing the washing water, the automatic valve 22 is opened and the circulation pump 14 immediately transfers the washing water through the branch flow path 20 to the outside of the washing tank (for example, as described later). The water is drained into a buffer tank). By quickly draining the washing water in this way, when fresh water is subsequently supplied into the washing tank 2 by the water supply means 4, washing water with less dirt can be obtained.
即ち、循環ポンプ１４を用いて強制的な排水を行うこと
によって、強制的な排水を行わなかった場合と比較して
、同一の新水供給量によって得られる水洗水の洗浄度が
向上する。That is, by performing forced drainage using the circulation pump 14, the cleanliness of flush water obtained with the same amount of fresh water supplied is improved compared to the case where forced drainage is not performed.
オーバーフロー槽６からの排水はパイプ２８を介して排
水管３０に導かれ、水洗槽２の底部からの排水はパイプ
２４及び手動バルブ２６を介して排水管３０に導かれる
。水洗槽２の底部からの排水は、例えば水洗槽内部の清
掃等に際して手動バルブ２６を開くことによって行われ
る。Drainage from the overflow tank 6 is led to a drain pipe 30 via a pipe 28, and wastewater from the bottom of the washing tank 2 is led to a drain pipe 30 via a pipe 24 and a manual valve 26. Drainage from the bottom of the washing tank 2 is performed, for example, by opening the manual valve 26 when cleaning the inside of the washing tank.
第３図は第２図に示された水洗槽を用いて構成される水
洗システムの説明図である。第２図におけるものと同一
の部分には同一の符号が付されている。この例では、無
電解銅メツキ工程における３つの水洗槽が図示されてお
り、それぞれの容積は例えば６００βである。３２はコ
ンディショナー処理後の水洗槽、３４は硫酸処理後の水
洗槽、３６はエツチング処理後の水洗槽である。各水洗
槽３２，３４．３６は第２図に示された構成を有してい
る。各水洗槽３２，３４．３６からの分岐流路２０は、
内容量が例えば３ ｍ’のバッファ槽３３に導かれ、バ
ッファ槽３３の排水弁３９からの排水は排水管３０に導
かれている。FIG. 3 is an explanatory diagram of a flushing system constructed using the flushing tank shown in FIG. 2. The same parts as in FIG. 2 are given the same reference numerals. In this example, three washing tanks in the electroless copper plating process are illustrated, each having a volume of, for example, 600β. 32 is a washing tank after conditioner treatment, 34 is a washing tank after sulfuric acid treatment, and 36 is a washing tank after etching treatment. Each washing tank 32, 34, 36 has the configuration shown in FIG. The branch flow path 20 from each washing tank 32, 34, 36 is
The water is led to a buffer tank 33 having an internal capacity of, for example, 3 m', and drainage from a drain valve 39 of the buffer tank 33 is led to a drain pipe 30.
コンディショナー処理後の水洗槽３２を例に取り水洗の
動作を説明する。被洗浄物の水洗に際しては、自動バル
ブ２２は閉じており、このとき水洗槽内部の水洗水は循
環ポンプ１４を介して循環されている。また、給水用ン
ヤワーパイブ１０からは所定量の新水が供給されており
、新水の供給量に見合った量の排水がオーバーフロー槽
６から排出されている。この状態において、被洗浄物は
例えばバッチ処理により水洗される。被洗浄物の水洗を
繰り返していくうちに、水洗水が汚れてくるので、適当
な回数の水洗を行ったならば、水洗水を全量更新する。The rinsing operation will be explained by taking the rinsing tank 32 after conditioner treatment as an example. When washing the object to be washed, the automatic valve 22 is closed, and at this time, the washing water inside the washing tank is circulated via the circulation pump 14. Further, a predetermined amount of fresh water is supplied from the water supply pipe 10, and an amount of waste water commensurate with the amount of fresh water supplied is discharged from the overflow tank 6. In this state, the object to be cleaned is washed with water, for example, by batch processing. As the items to be washed are repeatedly washed, the washing water becomes dirty, so after washing an appropriate number of times, the entire amount of washing water is renewed.
この場合、新水の供給は継続して、自動弁２２を開いて
、循環ポンプ１４から排出された水洗水を速やかにバッ
ファ槽３３内に回収する。そして、水洗槽２内の水洗水
がほとんどなくなったならば、自動弁２２を閉じる。水
洗槽２内の水洗水がなくなったことは、例えば液面レベ
ルゲージやタイマーを用いて知ることができる。自動弁
２２を閉じた後に、断水が供給されると、再び循環ポン
プ１４による循環が行われ、水洗が可能な状態になる。In this case, the supply of fresh water continues, the automatic valve 22 is opened, and the flushing water discharged from the circulation pump 14 is promptly collected into the buffer tank 33. Then, when the washing water in the washing tank 2 is almost completely exhausted, the automatic valve 22 is closed. The fact that the washing water in the washing tank 2 has run out can be detected using, for example, a liquid level gauge or a timer. When water is cut off after the automatic valve 22 is closed, circulation is performed again by the circulation pump 14, and water washing becomes possible.
このように本実施例によると、循環ポンプ１４を用いて
水洗槽２内の水洗水の排水を行うようにしているので、
容易に水洗水の全量更新を行うことができ、少ない水量
で洗浄度の高い水洗水を得ることができる。尚、バッフ
ァ槽３３内に回収された排水は、排水弁３９を介して徐
々に排水されるので、バッファ槽３３からの排水に動力
は不要である。また、この実施例によると、水洗槽２内
における水洗水の滞留時間が短いので、水洗槽内に微生
物が発生することが抑制され、水洗水の水質を良好に維
持することができる。As described above, according to this embodiment, since the circulation pump 14 is used to drain the washing water in the washing tank 2,
The total amount of flush water can be easily renewed, and high-quality flush water can be obtained with a small amount of water. Note that since the waste water collected in the buffer tank 33 is gradually drained via the drain valve 39, no power is required for draining water from the buffer tank 33. Further, according to this embodiment, since the residence time of the washing water in the washing tank 2 is short, the generation of microorganisms in the washing tank is suppressed, and the quality of the washing water can be maintained at a good level.
発明の詳細
な説明したように、本発明によると、内壁に付着物や堆
積物が生じ難い水洗槽の提供が可能になるという効果を
奏する。また、全量更新に際して、循環ポンプにより分
岐流路を介して水洗水をバッファ槽に送り込むようにす
ることによって、更新された水洗水の洗浄度が向上する
という効果もある。DETAILED DESCRIPTION OF THE INVENTION As described in detail, the present invention has the effect of making it possible to provide a flushing tank in which deposits and deposits are less likely to form on the inner wall. Moreover, when the total amount is updated, the washing water is sent into the buffer tank via the branch flow path by the circulation pump, which has the effect of improving the cleanliness of the updated washing water.
２・・・槽本体、 ４・・・給水手段、 ６・・・オーバーフロー槽、 ８・・・循環手段、 １０・・・給水用シャワーパイプ、 １２・・・循環用シャワーパイプ、 １４・・・循環ポンプ。2...tank body, 4... Water supply means, 6... Overflow tank, 8... Circulation means, 10... Shower pipe for water supply, 12...Circulation shower pipe, 14...Circulation pump.
Claims (3)
２）の内壁に沿って吐出する給水手段（４）と、上記槽
本体（２）からオーバーフローした水洗水を排水するオ
ーバーフロー槽（６）と、 上記槽本体（２）の下部に設けられ、上記槽本体（２）
における循環水を上記槽本体（２）の底部に向けて噴出
する循環手段（８）とを備えたことを特徴とする水洗槽
。1. A tank body (2) and a tank provided at the top of the tank body (2) to supply fresh water to the tank body (2).
2); an overflow tank (6) for draining the flushing water overflowing from the tank body (2); Tank body (2)
A washing tank characterized by comprising: a circulation means (8) for spouting the circulating water in the tank body (2) toward the bottom of the tank body (2).
沿って設けられ供給された新水を概略下方向に向いた吐
出口（１０ａ）から上記内壁に沿って吐出する給水用シ
ャワーパイプ（１０）を備え、上記循環手段（８）は、
上記槽本体（２）の底部近傍に設けられ供給された循通
水を上記槽本体（２）の底部の隅に向いた噴出口（１２
ａ）から噴出する循環用シャワーパイプ（１２）と、上
記槽本体（２）内の水洗水を吸引して循環水として上記
循環用シャワーパイプ（１２）に供給する循環ポンプ（
１４）とを備えていることを特徴とする請求項１に記載
の水洗槽。2. The water supply means (4) is a water supply shower pipe that is provided along the inner wall of the tank body (2) and discharges the supplied fresh water along the inner wall from a discharge port (10a) facing approximately downward. (10), the circulation means (8) comprising:
A spout (12) provided near the bottom of the tank body (2) directs the supplied circulating water to a corner of the bottom of the tank body (2).
a); a circulating shower pipe (12) spewing out from the tank body (2); and a circulating pump (1) that sucks the flushing water in the tank body (2) and supplies it as circulating water to the circulating shower pipe (12).
14) The washing tank according to claim 1, further comprising: 14).
流路（２０）を設け、上記槽本体（２）内の水洗水の更
新に際しては、上記循環ポンプ（１４）により上記分岐
流路（２０）を介して水洗水をバッファ槽（３３）に送
り込むようにしたことを特徴とする請求項２に記載の水
洗槽。3. A branch flow path (20) branched from the output of the circulation pump (14) is provided, and when renewing the washing water in the tank body (2), the circulation pump (14) is connected to the branch flow path (20). The rinsing tank according to claim 2, wherein the rinsing water is sent to the buffer tank (33) through the buffer tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21820790A JPH04104871A (en) | 1990-08-21 | 1990-08-21 | Washing tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21820790A JPH04104871A (en) | 1990-08-21 | 1990-08-21 | Washing tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04104871A true JPH04104871A (en) | 1992-04-07 |
Family
ID=16716300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21820790A Pending JPH04104871A (en) | 1990-08-21 | 1990-08-21 | Washing tank |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04104871A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04128399A (en) * | 1990-09-18 | 1992-04-28 | Fujitsu Ltd | Device for cleaning plating tank |
| US20100175723A1 (en) * | 2009-01-15 | 2010-07-15 | Panasonic Electric Works Co., Ltd. | Washing apparatus for washing a head portion of a depilation apparatus |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60113433A (en) * | 1983-11-22 | 1985-06-19 | Mitsubishi Electric Corp | Washing equipment of thin plate |
| JPS6358840A (en) * | 1986-08-29 | 1988-03-14 | Hoya Corp | Cleaning and apparatus therefor |
| JPS6412532A (en) * | 1987-07-06 | 1989-01-17 | Mitsubishi Electric Corp | Cleaning device |
-
1990
- 1990-08-21 JP JP21820790A patent/JPH04104871A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60113433A (en) * | 1983-11-22 | 1985-06-19 | Mitsubishi Electric Corp | Washing equipment of thin plate |
| JPS6358840A (en) * | 1986-08-29 | 1988-03-14 | Hoya Corp | Cleaning and apparatus therefor |
| JPS6412532A (en) * | 1987-07-06 | 1989-01-17 | Mitsubishi Electric Corp | Cleaning device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04128399A (en) * | 1990-09-18 | 1992-04-28 | Fujitsu Ltd | Device for cleaning plating tank |
| US20100175723A1 (en) * | 2009-01-15 | 2010-07-15 | Panasonic Electric Works Co., Ltd. | Washing apparatus for washing a head portion of a depilation apparatus |
| US8361241B2 (en) * | 2009-01-15 | 2013-01-29 | Panasonic Corporation | Washing apparatus for washing a head portion of a depilation apparatus |
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