JPS639299B2 - - Google Patents
Info
- Publication number
- JPS639299B2 JPS639299B2 JP55123255A JP12325580A JPS639299B2 JP S639299 B2 JPS639299 B2 JP S639299B2 JP 55123255 A JP55123255 A JP 55123255A JP 12325580 A JP12325580 A JP 12325580A JP S639299 B2 JPS639299 B2 JP S639299B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- head
- magnetic memory
- hydrolyzate
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000576 coating method Methods 0.000 claims description 8
- 238000004140 cleaning Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000003860 storage Methods 0.000 description 16
- 239000010408 film Substances 0.000 description 12
- 230000001681 protective effect Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 229910001566 austenite Inorganic materials 0.000 description 5
- 239000003921 oil Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 229910001096 P alloy Inorganic materials 0.000 description 3
- IGOJDKCIHXGPTI-UHFFFAOYSA-N [P].[Co].[Ni] Chemical compound [P].[Co].[Ni] IGOJDKCIHXGPTI-UHFFFAOYSA-N 0.000 description 3
- 239000000314 lubricant Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 239000003599 detergent Substances 0.000 description 2
- 238000005339 levitation Methods 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920002545 silicone oil Polymers 0.000 description 2
- 239000011232 storage material Substances 0.000 description 2
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000005188 flotation Methods 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/72—Protective coatings, e.g. anti-static or antifriction
- G11B5/725—Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
- G11B5/7253—Fluorocarbon lubricant
Landscapes
- Lubricants (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
本発明は磁気的記憶装置（磁気デイスク装置ま
たは磁気ドラム装置など）に用いられる磁気記憶
体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a magnetic storage body used in a magnetic storage device (such as a magnetic disk device or a magnetic drum device).
一般に記録再生磁気ヘツド（以下ヘツドと呼
ぶ）と磁気記憶体とを構成部とする磁気記憶装置
の記録再生方法には、次のような方法がある。す
なわち、操作開始時にヘツドと磁気記憶体面とを
接触状態でセツトした後、磁気記憶体面とを接触
状態でセツトした後、磁気記憶体に所要の回転を
与えることにより、ヘツドと磁気記憶体面との間
に空気層分の空間を作り、この状態で記録再生を
する方法である（コンタクト・スタート・ストツ
プ方式）。この方法では操作終了時に磁気記憶体
の回転が止まり、この時ヘツドと磁気記憶体面は
操作開始時と同様に接触摩擦状態にある。 In general, there are the following methods for recording and reproducing a magnetic storage device comprising a recording and reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body. That is, after setting the head and the magnetic memory surface in contact at the start of operation, and then setting the head and the magnetic memory surface in contact, the head and the magnetic memory surface are set by applying the required rotation to the magnetic memory. This method creates an air space in between and records and plays in this state (contact start-stop method). In this method, the rotation of the magnetic storage body stops at the end of the operation, and at this time the head and the surface of the magnetic storage body are in the same frictional state as at the beginning of the operation.
これらの接触摩擦状態におけるヘツドと磁気記
憶体の間に生じる摩擦力は、ヘツドおよび磁気記
憶体を摩耗させ、ついにはヘツドおよび磁性媒体
に傷じせしめることがある。また、前記接触摩擦
状態においてヘツドのわずかな姿勢の変化がヘツ
ドにかかる荷重を不均一にさせ、ヘツドおよび磁
気記憶体表面に傷を作ることもある。 The frictional force generated between the head and the magnetic storage material under these contact friction conditions can wear out the head and the magnetic storage material, and may eventually damage the head and the magnetic medium. Further, in the contact friction state, a slight change in the posture of the head causes the load applied to the head to become uneven, which may cause scratches on the surface of the head and the magnetic storage body.
また、更に記録再生中に突発的にヘツドが磁気
記憶体に接触し、ヘツドと磁気記憶体間に大きな
摩擦力が働き、ヘツドおよび磁気記憶体が破壊さ
れることが、しばしば起こる。この様なヘツドと
磁気記憶体との接触摩擦、接触摩耗および接触破
壊からヘツドおよび磁気記憶体を保護するために
磁気記憶体の表面に潤滑剤を被覆することが必要
であり、従来より種々の潤滑剤が提案されてい
る。例えば、パーフロロアルキルポリエーテル、
シリコーンオイル、フロロシリコーンオイルなど
のオイル類が知られているが、ヘツドと磁気記憶
体の吸着を招き、かつ、ヘツドの浮揚特性に悪影
響を与える。あるいは、ポリテトラフロロエチレ
ン、ナイロンなどのポリマーあるいはカーボン、
二硫化モリブデンなどの固体潤滑剤が知られてい
るがいずれも、磁気記憶体表面との密着性が悪
く、ヘツドとの摩擦により取り去られてしまう。 Furthermore, during recording and reproducing, the head suddenly comes into contact with the magnetic storage body, and a large frictional force acts between the head and the magnetic storage body, which often causes the head and the magnetic storage body to be destroyed. In order to protect the head and the magnetic memory from contact friction, contact wear, and contact destruction between the head and the magnetic memory, it is necessary to coat the surface of the magnetic memory with a lubricant. Lubricants have been proposed. For example, perfluoroalkyl polyether,
Oils such as silicone oil and fluorosilicone oil are known, but they cause adhesion between the head and the magnetic memory and have an adverse effect on the flotation characteristics of the head. Alternatively, polymers such as polytetrafluoroethylene and nylon, or carbon,
Solid lubricants such as molybdenum disulfide are known, but all of them have poor adhesion to the surface of the magnetic memory and are easily removed by friction with the head.
本発明の目的は、潤滑特性に優れ、かつ、磁気
記憶体表面との密着性が良く、かつ、ヘツドと磁
気記憶体の吸着及びヘツドの浮揚特性への影響の
ない潤滑層を有する磁気記憶体およびその製造方
法を提供することにある。すなわち、本発明の磁
気記憶体は、鏡面を有する磁気記憶体の上にヘキ
サパーフロロアルキルジシラザンの加水分解物が
被覆されていることを特徴としている。 An object of the present invention is to provide a magnetic memory having a lubricating layer that has excellent lubrication properties, has good adhesion to the surface of the magnetic memory, and does not affect the adhesion between the head and the magnetic memory and the levitation characteristics of the head. and its manufacturing method. That is, the magnetic memory of the present invention is characterized in that the magnetic memory having a mirror surface is coated with a hydrolyzate of hexaperfluoroalkyldisilazane.
次に図面を参照して本発明を詳細に説明する。
第１，２図は、それぞれ本発明により得られる磁
気記憶体の部分断面図である。第１図において磁
気記憶体の下地体１は、鏡面を有する面に仕上げ
られる。次にこの下地体１の上に磁性媒体２とし
てFe2O4またはγ−Fe2O3に代表される磁性金属
酸−化物が被覆され、次にこの磁性媒体２の上に
ヘキサパーフロロアルキルジンラザンを塗布した
後、100℃〜200℃迄の温度で焼成した後、物理洗
浄もしくはトリクレン蒸気洗浄またはその両洗浄
をもとに行なうことによりヘキサパーフロロアル
キルジンラザンの加水分解物３が被覆される。 Next, the present invention will be explained in detail with reference to the drawings.
FIGS. 1 and 2 are partial cross-sectional views of magnetic storage bodies obtained according to the present invention, respectively. In FIG. 1, the base body 1 of the magnetic storage body is finished to have a mirror surface. Next, a magnetic metal oxide represented by Fe 2 O 4 or γ-Fe 2 O 3 is coated on this base body 1 as a magnetic medium 2, and then a hexaperfluoroalkyl oxide is coated on this magnetic medium 2. After coating Zinlazan, it is baked at a temperature of 100℃ to 200℃, and then the hydrolyzate 3 of hexaperfluoroalkyldinelazan is coated by physical cleaning, trichlene vapor cleaning, or both. be done.
本発明で用いられるヘキサパーフロロアルキル
ジンラザンの加水分解物は、ヘツドとの摩擦に対
して優れた潤滑作用を有すると同時に磁性金属酸
化物との優れた密着性を有する。 The hydrolyzate of hexaperfluoroalkyldine lazan used in the present invention has an excellent lubricating effect against friction with the head and at the same time has excellent adhesion to magnetic metal oxides.
また、他の磁気記憶体を示す第２図においては
鏡面を有する面に仕上げられた下地体１の上に磁
性媒体２としてCoNiPに代表される磁性金属が
被覆され、次にこの磁性媒体２の上に保護膜４と
してポリ珪酸に代表される酸化物が被覆され、こ
の保護膜４の上に上記例と同様にヘキサパーフロ
ロアルキルジンラザンを塗布した後、100℃から
200℃の温度で焼成した後、物理洗浄もしくはト
リクレン蒸気洗浄または両洗浄をともに行なうこ
とによりヘキサパーフロロアルキルジンラザンの
加水分解物３が被覆される。これによりヘツドと
磁気記憶体の吸着及びヘツドの浮揚特性への影響
を防ぐことができる。このようにして形成される
ヘキサパーフロロアルキルジンラザンの加水分解
物３の膜厚は、磁気記憶体の表面粗さと同じ程度
かそれ以下である。 In addition, in FIG. 2 showing another magnetic storage body, a magnetic metal such as CoNiP is coated as a magnetic medium 2 on a base body 1 finished with a mirror surface. An oxide typified by polysilicate is coated on top as a protective film 4, and after coating hexaperfluoroalkyldine lazan on this protective film 4 in the same manner as in the above example, it is heated at 100°C.
After firing at a temperature of 200° C., the hydrolyzate 3 of hexaperfluoroalkyldine lazan is coated by physical washing, trichlene vapor washing, or both washings. This can prevent the head from adhering to the magnetic storage body and from affecting the head's levitation characteristics. The film thickness of the hydrolyzate 3 of hexaperfluoroalkyldine lazan thus formed is approximately the same as or less than the surface roughness of the magnetic memory.
本発明で用いられるヘキサパーフロロアルキル
ジシラザンの加水分解物は、次の様な方法で作ら
れる。まず、原料として用いられるヘキサパーフ
ロロアルキルジンラザンは、次の様な一般式で表
わされる。 The hydrolyzate of hexaperfluoroalkyldisilazane used in the present invention is produced by the following method. First, hexaperfluoroalkyldine lazan used as a raw material is represented by the following general formula.
（CnF2o+1）3SiNHSi（CnF2o+1）3
CnF2o+1は、CF3、C2F5、C3F7、C17F35などの
フロロアルキル基である。但し、Ｆの代りに一部
がＨ又はClに置き代つていても良いが、最も望ま
しいものは、パーフロロアルキル基である。(CnF2o +1 ) 3SiNHSi (CnF2o +1 ) 3CnF2o +1 is a fluoroalkyl group such as CF3 , C2F5 , C3F7 , C17F35 . However, a part of F may be replaced with H or Cl, but the most desirable one is a perfluoroalkyl group.
このヘキサパーフロロアルキルジシラザンは磁
気記憶体表面にそのまま、あるいはアルコール、
ケトン、エステル、ハロゲン化炭化水素の溶液と
して浸漬法、スプレー法、スピンコート法、ベー
パーコートなどの塗布方法により塗布する。 This hexaperfluoroalkyldisilazane can be applied directly to the surface of the magnetic memory, or with alcohol.
It is applied as a solution of ketone, ester, or halogenated hydrocarbon by a coating method such as dipping, spraying, spin coating, or vapor coating.
その際に前記シラザンは空気中の水分あるいは
磁気記憶体表面の吸着水によつて加水分解され、
磁気記憶体表面と強固に反応し結合して優れた密
着性が現われる。一方、前記シラザンの加水分解
物のCnF2o+1の部分は磁気記憶体の表面すなわち
ヘツドと摩擦する面に配向し、優れた潤滑性が現
われる。 At that time, the silazane is hydrolyzed by moisture in the air or adsorbed water on the surface of the magnetic memory,
It strongly reacts and bonds with the surface of the magnetic memory material, resulting in excellent adhesion. On the other hand, the CnF 2o+1 portion of the silazane hydrolyzate is oriented on the surface of the magnetic memory, that is, the surface that rubs against the head, exhibiting excellent lubricity.
次に実施例および比較例により本発明の磁気記
憶体の製造方法を詳細に説明する。 Next, the method for manufacturing the magnetic storage body of the present invention will be explained in detail with reference to Examples and Comparative Examples.
実施例 １
表面粗さ0.02μｍに鏡面仕上げしたニツケル−
燐めつき膜からなる下地体１の上に磁性媒体２と
してコバルト−ニツケル−燐合金を0.05μｍの厚
さにめつきした。次にこの磁性媒体２の上に保護
膜４として特開昭52−20804号公報に示された様
なポリ珪酸が回転塗布法により被覆される。Example 1 Nickel mirror-finished to a surface roughness of 0.02μm
A cobalt-nickel-phosphorus alloy was plated to a thickness of 0.05 μm as a magnetic medium 2 on a base body 1 made of a phosphor-plated film. Next, the magnetic medium 2 is coated with polysilicic acid as a protective film 4 as disclosed in Japanese Unexamined Patent Publication No. 52-20804 by spin coating.
次にこの保護膜４の上にヘキサパーフロロオク
タヂシルシラザンの0.1％トリクレン溶液を回転
塗布法により塗布し、全体を150℃にて30分焼成
した後、洗剤洗浄およびトリクレン蒸気洗浄をす
ることにより、ヘキサパーフロロアルキルシラザ
ンの加水分解物３を被覆して磁気デイスクを作つ
た。 Next, a 0.1% trichlene solution of hexaperfluorooctadicylsilazane is applied onto this protective film 4 by a spin coating method, and the whole is baked at 150° C. for 30 minutes, followed by detergent cleaning and trichlene vapor cleaning. A magnetic disk was prepared by coating the hydrolyzate 3 of hexaperfluoroalkylsilazane.
実施例 ２
実施例１と同様にして、但し、コバルト−ニツ
ケル−燐合金からなる磁性媒体２を0.15μｍの厚
さにめつきし、この磁性媒体２の表面に出力
250W、ビーム直径0.15mmの連続発振炭酸ガスレ
ーザーを空気中で照射することにより前記コバル
ト−ニツケル−燐合金の酸化物を0.1μｍの厚さで
保護膜４として形成した。Example 2 In the same manner as in Example 1, however, a magnetic medium 2 made of a cobalt-nickel-phosphorus alloy was plated to a thickness of 0.15 μm, and an output was applied to the surface of the magnetic medium 2.
The oxide of the cobalt-nickel-phosphorus alloy was formed as a protective film 4 with a thickness of 0.1 μm by irradiating in air with a continuous wave carbon dioxide laser of 250 W and a beam diameter of 0.15 mm.
次に実施例１と同様にして、但しヘキサパーフ
ロロオクタデシルジシラザンの代りにテトラパー
フロロメチルジパーフロロオクタデシルジシラザ
ンを用いて保護膜４の上にヘキサパーフロロアル
キルジシラザンの加水分解物３を被覆して磁気デ
イスクを作つた。 Next, in the same manner as in Example 1, except that tetraperfluoromethyldiperfluorooctadecyldisilazane was used instead of hexaperfluorooctadecyldisilazane, a hydrolyzate of hexaperfluoroalkyldisilazane 3 was coated on the protective film 4. A magnetic disk was made by coating it with
実施例 ３
表面粗さ0.02μｍに鏡面仕上げしたアルミナ膜
からなる下地体１の上に磁性媒体２としてFe3O4
薄膜が被覆され、この磁性媒体２の上にヘキサパ
ーフロロオクタデシルジシラザンの0.1％、１，
１，２−トリクロロ−１，２，２−トリフロロエ
タン溶液を回転塗布法により塗布し、全体を130
℃にて30分焼成した後、洗剤洗浄およびトリクレ
ン蒸気洗浄をすることによりヘキサパーフロロア
ルキルジシラザンの加水分解物３を被覆して磁気
デイスクを作つた。Example 3 Fe 3 O 4 was deposited as the magnetic medium 2 on the base body 1 made of an alumina film mirror-finished to a surface roughness of 0.02 μm.
A thin film of 0.1% hexaperfluorooctadecyldisilazane, 1,
1,2-Trichloro-1,2,2-trifluoroethane solution was applied by spin coating method, and the whole was coated with 130%
After baking for 30 minutes at .degree. C., the material was washed with detergent and vaporized with trichlene to coat the hydrolyzate 3 of hexaperfluoroalkyldisilazane to produce a magnetic disk.
実施例 ４
実施例３と同様にして、但し、磁性媒体２とし
てFe3O4薄膜の代りにγ−Fe2O3薄膜を用いて磁
気デイスクを作つた。Example 4 A magnetic disk was fabricated in the same manner as in Example 3, except that a γ-Fe 2 O 3 thin film was used as the magnetic medium 2 instead of the Fe 3 O 4 thin film.
実施例 ５
実施例１と同様にして、但し、ヘキサパーフロ
ロメチルジンラザンの蒸気中に磁気記憶体を１時
間曝して、保護膜４の上にヘキサパーフロロアル
キルジシラザンの加水分解物３を被覆して磁気デ
イスクを作つた。Example 5 In the same manner as in Example 1, except that the magnetic memory was exposed to the vapor of hexaperfluoromethyldine lazan for 1 hour, and the hydrolyzate 3 of hexaperfluoroalkyldisilazane was formed on the protective film 4. It was coated to make magnetic disks.
実施例 ６
実施例３と同様にして、但し、磁性媒体２とし
てFe3O4薄膜の代りにγ−Fe2O3薄膜を用い、か
つ、ヘキサパーフロロオクタデシルジシラザンの
代りにヘキサパーフロロオクチルジシラザンを用
いて磁気デイスクを作つた。Example 6 Same as Example 3, except that a γ-Fe 2 O 3 thin film was used instead of the Fe 3 O 4 thin film as the magnetic medium 2, and hexaperfluorooctyl was used instead of hexaperfluorooctadecyldisilazane. A magnetic disk was made using disilazane.
比較例 １
実施例１と同様にして、但し、保護膜４の上に
ヘキサパーフロロアルキルジシラザンの加水分解
物の代りにシリコーンオイルを約100Åの厚さに
被覆して磁気デイスクを作つた。Comparative Example 1 A magnetic disk was produced in the same manner as in Example 1, except that the protective film 4 was coated with silicone oil to a thickness of about 100 Å instead of the hydrolyzate of hexaperfluoroalkyldisilazane.
比較例 ２
実施例３と同様にして、但し、磁性媒体２とし
てFe3O4薄膜の代りにγ−Fe2O3薄膜を用い、か
つその上にはヘキサパーフロロアルキルジシラザ
ンの加水分解物の代りにパーフロロアルキルポリ
エーテルからなるオイルを約100Åの厚さに被覆
して磁気デイスクを作つた。Comparative Example 2 Same as Example 3, except that a γ-Fe 2 O 3 thin film was used instead of the Fe 3 O 4 thin film as the magnetic medium 2, and a hydrolyzate of hexaperfluoroalkyldisilazane was added on top of the γ-Fe 2 O 3 thin film. Instead, a magnetic disk was made by coating an oil made of perfluoroalkyl polyether to a thickness of about 100 Å.
実施例１〜６および比較例１、２で示した各磁
気デイスクを用いて次の試験を行なつた。 The following tests were conducted using each of the magnetic disks shown in Examples 1 to 6 and Comparative Examples 1 and 2.
(1) 48時間テーパフラツトヘツドと磁気デイスク
を接触放置させた後の起動トルクの測定。但
し、相対湿度80％。(1) Measurement of starting torque after the tapered flat head and magnetic disk were left in contact for 48 hours. However, the relative humidity is 80%.
(2) ３万回の磁気デイスクの回転・停止繰り返し
テスト（CSSテスト）におけるテーパフラツト
ヘツドのステイツクリツプ状態と起動トルクの
測定。(2) Measurement of state clip state and starting torque of the taper flat head during 30,000 rotation/stop rotation test (CSS test) of magnetic disk.
(3) ヘツドヒツト（ヘツドがぶつかる磁気デイス
ク面上の突起）の測定。但し、ヘツド浮揚高さ
0.15μｍ。(3) Measurement of head hits (protrusions on the magnetic disk surface that the head hits). However, the head floating height
0.15μm.
(1)の試験の結果、実施例１〜６の各磁気デイス
クは起動トルクの増加は全く無かつたが、比較例
１、２の磁気デイスクは、ヘツドと磁気デイスク
の吸着により５倍増加した。 As a result of the test (1), there was no increase in starting torque for each of the magnetic disks of Examples 1 to 6, but for the magnetic disks of Comparative Examples 1 and 2, the starting torque increased five times due to the adsorption between the head and the magnetic disk. .
(2)の試験の結果、実施例１〜６の各磁気デイス
クは起動トルクの増加およびヘツドのステイツク
スリツプは、全く無かつたが、比較例１、２の磁
気デイスクは７倍増加し、ヘツドのステイツクス
リツプによりヘツドのバネが増傷した。 As a result of the test (2), each of the magnetic disks of Examples 1 to 6 had no increase in starting torque and no head stick slip, but the magnetic disks of Comparative Examples 1 and 2 had an increase of 7 times, The spring of the head was damaged due to the head's stick slip.
(3)の試験の結果、実施例１〜６の磁気デイスク
ではヘツドヒツトの数は、０であつたが、比較例
１、２の磁気デイスクではオイルによるごみの取
り込みにより100個以上であつた。 As a result of the test (3), the number of heads was 0 in the magnetic disks of Examples 1 to 6, but more than 100 in the magnetic disks of Comparative Examples 1 and 2 due to the incorporation of dirt by oil.
以上のことから、本発明の磁気記憶体は優れた
信頼性を有していることがわかつた。 From the above, it was found that the magnetic memory of the present invention has excellent reliability.
第１，２図は、それぞれ本発明により製造され
る磁気記憶体を示す部分断面図である。
１は下地体、２は磁性媒体、３はヘキサパーフ
ロロアルキルジシラザンの加水分解物、４は保護
膜である。
FIGS. 1 and 2 are partial cross-sectional views showing magnetic storage bodies manufactured according to the present invention, respectively. 1 is a base, 2 is a magnetic medium, 3 is a hydrolyzate of hexaperfluoroalkyldisilazane, and 4 is a protective film.
Claims (1)
ーフロロアルキルジシラザン加水分解物が被覆さ
れていることを特徴とする磁気記憶体。 ２ 鏡面を有する磁気記憶体表面の上にヘキサパ
ーフロロアルキルジンラザンを含む溶液を塗布
し、100〜200℃にて焼成した後、物理洗浄もしく
はトリクレン蒸気洗浄またはその両洗浄をもとに
行なうことによりヘキサパーフロロアルキルジシ
ラザンの加水分解物を被覆することを特徴とする
磁気記憶体の製造方法。[Scope of Claims] 1. A magnetic memory body characterized in that the surface of the magnetic memory body having a mirror surface is coated with a hexaperfluoroalkyldisilazane hydrolyzate. 2. Applying a solution containing hexaperfluoroalkyldine lazan on the surface of a magnetic memory having a mirror surface, baking it at 100 to 200°C, and then performing physical cleaning, Triclean vapor cleaning, or both cleaning. 1. A method for producing a magnetic memory, comprising coating a hydrolyzate of hexaperfluoroalkyldisilazane with:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55123255A JPS5746330A (en) | 1980-09-05 | 1980-09-05 | Magnetic storage medium and its production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55123255A JPS5746330A (en) | 1980-09-05 | 1980-09-05 | Magnetic storage medium and its production |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5746330A JPS5746330A (en) | 1982-03-16 |
| JPS639299B2 true JPS639299B2 (en) | 1988-02-26 |
Family
ID=14856038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55123255A Granted JPS5746330A (en) | 1980-09-05 | 1980-09-05 | Magnetic storage medium and its production |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5746330A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3374152D1 (en) * | 1983-05-02 | 1987-11-26 | Ibm Deutschland | Device consisting of a magnetic disc with a lubricant and a magnetic head, and process for manufacturing the device |
| JPS61923A (en) * | 1984-06-12 | 1986-01-06 | Sony Corp | Production of magnetic recording medium |
| JP4854382B2 (en) * | 2006-05-11 | 2012-01-18 | 中国電力株式会社 | Signal processing apparatus, electric energy measuring apparatus, signal processing apparatus gain changing method, and program |
-
1980
- 1980-09-05 JP JP55123255A patent/JPS5746330A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5746330A (en) | 1982-03-16 |
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