JPS6360475B2 - - Google Patents
Info
- Publication number
- JPS6360475B2 JPS6360475B2 JP59035903A JP3590384A JPS6360475B2 JP S6360475 B2 JPS6360475 B2 JP S6360475B2 JP 59035903 A JP59035903 A JP 59035903A JP 3590384 A JP3590384 A JP 3590384A JP S6360475 B2 JPS6360475 B2 JP S6360475B2
- Authority
- JP
- Japan
- Prior art keywords
- ion
- ions
- ion implantation
- bubble
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000002500 ions Chemical class 0.000 claims description 33
- 238000005468 ion implantation Methods 0.000 claims description 27
- 239000013078 crystal Substances 0.000 claims description 20
- 239000007789 gas Substances 0.000 claims description 17
- -1 hydrogen ions Chemical class 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 238000000034 method Methods 0.000 description 14
- 229910052754 neon Inorganic materials 0.000 description 7
- 241000894007 species Species 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000002223 garnet Substances 0.000 description 3
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 3
- 238000002513 implantation Methods 0.000 description 3
- 239000007943 implant Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 241000270295 Serpentes Species 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000001965 increasing effect Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
- H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59035903A JPS60182090A (ja) | 1984-02-29 | 1984-02-29 | イオン注入バブルデバイスの作製方法 |
CA000461786A CA1231629A (en) | 1983-08-30 | 1984-08-24 | Process for producing ion implanted bubble device |
US06/644,963 US4568561A (en) | 1983-08-30 | 1984-08-28 | Process for producing ion implanted bubble device |
EP84401728A EP0139556B1 (en) | 1983-08-30 | 1984-08-29 | Process for producing ion implanted bubble device |
DE8484401728T DE3478531D1 (en) | 1983-08-30 | 1984-08-29 | Process for producing ion implanted bubble device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59035903A JPS60182090A (ja) | 1984-02-29 | 1984-02-29 | イオン注入バブルデバイスの作製方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60182090A JPS60182090A (ja) | 1985-09-17 |
JPS6360475B2 true JPS6360475B2 (zh) | 1988-11-24 |
Family
ID=12454983
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59035903A Granted JPS60182090A (ja) | 1983-08-30 | 1984-02-29 | イオン注入バブルデバイスの作製方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60182090A (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0521917U (ja) * | 1991-09-04 | 1993-03-23 | 株式会社長田中央研究所 | 逆根管拡大具 |
FR2774510B1 (fr) * | 1998-02-02 | 2001-10-26 | Soitec Silicon On Insulator | Procede de traitement de substrats, notamment semi-conducteurs |
JP4707275B2 (ja) * | 2001-07-18 | 2011-06-22 | 日本ぱちんこ部品株式会社 | 遊技機用入賞装置及びそれを用いた遊技機 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6049616A (ja) * | 1983-08-30 | 1985-03-18 | Fujitsu Ltd | イオン注入バブルデバイスの作製法 |
-
1984
- 1984-02-29 JP JP59035903A patent/JPS60182090A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6049616A (ja) * | 1983-08-30 | 1985-03-18 | Fujitsu Ltd | イオン注入バブルデバイスの作製法 |
Also Published As
Publication number | Publication date |
---|---|
JPS60182090A (ja) | 1985-09-17 |
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