JPS63153553A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPS63153553A JPS63153553A JP30355586A JP30355586A JPS63153553A JP S63153553 A JPS63153553 A JP S63153553A JP 30355586 A JP30355586 A JP 30355586A JP 30355586 A JP30355586 A JP 30355586A JP S63153553 A JPS63153553 A JP S63153553A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photoreceptor
- cgm
- ctm
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000126 substance Substances 0.000 claims abstract description 27
- 125000003118 aryl group Chemical group 0.000 claims abstract description 5
- 125000005843 halogen group Chemical group 0.000 claims abstract description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 4
- 108091008695 photoreceptors Proteins 0.000 claims description 95
- 150000001875 compounds Chemical class 0.000 claims description 57
- 125000003107 substituted aryl group Chemical group 0.000 claims description 3
- 239000010410 layer Substances 0.000 abstract description 86
- 230000035945 sensitivity Effects 0.000 abstract description 20
- 239000011241 protective layer Substances 0.000 abstract description 7
- 239000002356 single layer Substances 0.000 abstract description 5
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 238000012546 transfer Methods 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 description 38
- 239000011347 resin Substances 0.000 description 38
- 239000000049 pigment Substances 0.000 description 31
- 239000011230 binding agent Substances 0.000 description 21
- -1 bisazo compound Chemical class 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 12
- 230000007423 decrease Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 230000006866 deterioration Effects 0.000 description 8
- 239000002344 surface layer Substances 0.000 description 8
- 239000006185 dispersion Substances 0.000 description 7
- 150000003949 imides Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 239000004419 Panlite Substances 0.000 description 6
- 206010034972 Photosensitivity reaction Diseases 0.000 description 6
- 230000036211 photosensitivity Effects 0.000 description 6
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 5
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000011888 foil Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 4
- 230000006750 UV protection Effects 0.000 description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 4
- 229920006026 co-polymeric resin Polymers 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
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- 229910052711 selenium Inorganic materials 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
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- 239000007921 spray Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 3
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 3
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 3
- 150000004056 anthraquinones Chemical class 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- BSIHWSXXPBAGTC-UHFFFAOYSA-N isoviolanthrone Chemical class C12=CC=CC=C2C(=O)C2=CC=C3C(C4=C56)=CC=C5C5=CC=CC=C5C(=O)C6=CC=C4C4=C3C2=C1C=C4 BSIHWSXXPBAGTC-UHFFFAOYSA-N 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000012860 organic pigment Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- UBOXGVDOUJQMTN-UHFFFAOYSA-N 1,1,2-trichloroethane Chemical compound ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 2
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- FKNIDKXOANSRCS-UHFFFAOYSA-N 2,3,4-trinitrofluoren-1-one Chemical compound C1=CC=C2C3=C([N+](=O)[O-])C([N+]([O-])=O)=C([N+]([O-])=O)C(=O)C3=CC2=C1 FKNIDKXOANSRCS-UHFFFAOYSA-N 0.000 description 2
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- MJVAVZPDRWSRRC-UHFFFAOYSA-N Menadione Chemical compound C1=CC=C2C(=O)C(C)=CC(=O)C2=C1 MJVAVZPDRWSRRC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 239000006096 absorbing agent Substances 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000001023 inorganic pigment Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 239000000113 methacrylic resin Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 239000002952 polymeric resin Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- NMNSBFYYVHREEE-UHFFFAOYSA-N 1,2-dinitroanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=C([N+]([O-])=O)C([N+](=O)[O-])=CC=C3C(=O)C2=C1 NMNSBFYYVHREEE-UHFFFAOYSA-N 0.000 description 1
- WDCYWAQPCXBPJA-UHFFFAOYSA-N 1,3-dinitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC([N+]([O-])=O)=C1 WDCYWAQPCXBPJA-UHFFFAOYSA-N 0.000 description 1
- HJRJRUMKQCMYDL-UHFFFAOYSA-N 1-chloro-2,4,6-trinitrobenzene Chemical compound [O-][N+](=O)C1=CC([N+]([O-])=O)=C(Cl)C([N+]([O-])=O)=C1 HJRJRUMKQCMYDL-UHFFFAOYSA-N 0.000 description 1
- WPMHMYHJGDAHKX-UHFFFAOYSA-N 1-ethenylpyrene Chemical compound C1=C2C(C=C)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 WPMHMYHJGDAHKX-UHFFFAOYSA-N 0.000 description 1
- BIEFDNUEROKZRA-UHFFFAOYSA-N 2-(2-phenylethenyl)aniline Chemical class NC1=CC=CC=C1C=CC1=CC=CC=C1 BIEFDNUEROKZRA-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- BCHZICNRHXRCHY-UHFFFAOYSA-N 2h-oxazine Chemical compound N1OC=CC=C1 BCHZICNRHXRCHY-UHFFFAOYSA-N 0.000 description 1
- YUXAUJNEGNCZQL-UHFFFAOYSA-N 4,10-dibromo-10h-anthracen-9-one Chemical compound C1=CC(Br)=C2C(Br)C3=CC=CC=C3C(=O)C2=C1 YUXAUJNEGNCZQL-UHFFFAOYSA-N 0.000 description 1
- ITUYMTWJWYTELW-UHFFFAOYSA-N 4-chloroiminocyclohexa-2,5-dien-1-one Chemical compound ClN=C1C=CC(=O)C=C1 ITUYMTWJWYTELW-UHFFFAOYSA-N 0.000 description 1
- ROFZMKDROVBLNY-UHFFFAOYSA-N 4-nitro-2-benzofuran-1,3-dione Chemical compound [O-][N+](=O)C1=CC=CC2=C1C(=O)OC2=O ROFZMKDROVBLNY-UHFFFAOYSA-N 0.000 description 1
- MMVIDXVHQANYAE-UHFFFAOYSA-N 5-nitro-2-benzofuran-1,3-dione Chemical compound [O-][N+](=O)C1=CC=C2C(=O)OC(=O)C2=C1 MMVIDXVHQANYAE-UHFFFAOYSA-N 0.000 description 1
- OGOYZCQQQFAGRI-UHFFFAOYSA-N 9-ethenylanthracene Chemical compound C1=CC=C2C(C=C)=C(C=CC=C3)C3=CC2=C1 OGOYZCQQQFAGRI-UHFFFAOYSA-N 0.000 description 1
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 1
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- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
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- 239000001856 Ethyl cellulose Substances 0.000 description 1
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
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- QHWKHLYUUZGSCW-UHFFFAOYSA-N Tetrabromophthalic anhydride Chemical compound BrC1=C(Br)C(Br)=C2C(=O)OC(=O)C2=C1Br QHWKHLYUUZGSCW-UHFFFAOYSA-N 0.000 description 1
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- 229940027998 antiseptic and disinfectant acridine derivative Drugs 0.000 description 1
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- 229910052738 indium Inorganic materials 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 229910052981 lead sulfide Inorganic materials 0.000 description 1
- 229940056932 lead sulfide Drugs 0.000 description 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- NNYHMCFMPHPHOQ-UHFFFAOYSA-N mellitic anhydride Chemical compound O=C1OC(=O)C2=C1C(C(OC1=O)=O)=C1C1=C2C(=O)OC1=O NNYHMCFMPHPHOQ-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- NYGZLYXAPMMJTE-UHFFFAOYSA-M metanil yellow Chemical group [Na+].[O-]S(=O)(=O)C1=CC=CC(N=NC=2C=CC(NC=3C=CC=CC=3)=CC=2)=C1 NYGZLYXAPMMJTE-UHFFFAOYSA-M 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 150000007978 oxazole derivatives Chemical class 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- DGBWPZSGHAXYGK-UHFFFAOYSA-N perinone Chemical compound C12=NC3=CC=CC=C3N2C(=O)C2=CC=C3C4=C2C1=CC=C4C(=O)N1C2=CC=CC=C2N=C13 DGBWPZSGHAXYGK-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000001791 phenazinyl group Chemical class C1(=CC=CC2=NC3=CC=CC=C3N=C12)* 0.000 description 1
- INAAIJLSXJJHOZ-UHFFFAOYSA-N pibenzimol Chemical class C1CN(C)CCN1C1=CC=C(N=C(N2)C=3C=C4NC(=NC4=CC=3)C=3C=CC(O)=CC=3)C2=C1 INAAIJLSXJJHOZ-UHFFFAOYSA-N 0.000 description 1
- OXNIZHLAWKMVMX-UHFFFAOYSA-N picric acid Chemical compound OC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O OXNIZHLAWKMVMX-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 150000003219 pyrazolines Chemical class 0.000 description 1
- 229940107700 pyruvic acid Drugs 0.000 description 1
- 125000002294 quinazolinyl group Chemical class N1=C(N=CC2=CC=CC=C12)* 0.000 description 1
- 150000004060 quinone imines Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 235000021286 stilbenes Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- QXKXDIKCIPXUPL-UHFFFAOYSA-N sulfanylidenemercury Chemical compound [Hg]=S QXKXDIKCIPXUPL-UHFFFAOYSA-N 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 229940042055 systemic antimycotics triazole derivative Drugs 0.000 description 1
- UGNWTBMOAKPKBL-UHFFFAOYSA-N tetrachloro-1,4-benzoquinone Chemical compound ClC1=C(Cl)C(=O)C(Cl)=C(Cl)C1=O UGNWTBMOAKPKBL-UHFFFAOYSA-N 0.000 description 1
- AUHHYELHRWCWEZ-UHFFFAOYSA-N tetrachlorophthalic anhydride Chemical compound ClC1=C(Cl)C(Cl)=C2C(=O)OC(=O)C2=C1Cl AUHHYELHRWCWEZ-UHFFFAOYSA-N 0.000 description 1
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 1
- PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 150000004867 thiadiazoles Chemical class 0.000 description 1
- 150000007979 thiazole derivatives Chemical class 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- AAAQKTZKLRYKHR-UHFFFAOYSA-N triphenylmethane Chemical compound C1=CC=CC=C1C(C=1C=CC=CC=1)C1=CC=CC=C1 AAAQKTZKLRYKHR-UHFFFAOYSA-N 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- YKSGNOMLAIJTLT-UHFFFAOYSA-N violanthrone Chemical class C12=C3C4=CC=C2C2=CC=CC=C2C(=O)C1=CC=C3C1=CC=C2C(=O)C3=CC=CC=C3C3=CC=C4C1=C32 YKSGNOMLAIJTLT-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0503—Inert supplements
- G03G5/051—Organic non-macromolecular compounds
- G03G5/0517—Organic non-macromolecular compounds comprising one or more cyclic groups consisting of carbon-atoms only
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は電子写真感光体に関し、特に有機光導電性電丘
写真感光体の改良に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to electrophotographic photoreceptors, and particularly to improvements in organic photoconductive electrophotographic photoreceptors.
カールソ：／方法の電子写真複写機においては、感光体
表面に帯電させた後、露光によって静電潜像を形成し、
その静電潜像をトナーによって現像し、次いでその可視
像を紙等に転写、定着させる。In the electrophotographic copying machine of Carlso: / method, after the surface of the photoreceptor is charged, an electrostatic latent image is formed by exposure.
The electrostatic latent image is developed with toner, and then the visible image is transferred and fixed onto paper or the like.
一方、感光体には付着トナーの除去や除電、表面の清浄
化が施され、長期に亘って反復使用される。On the other hand, the photoreceptor is subjected to removal of adhered toner, neutralization of static electricity, and surface cleaning, and is used repeatedly over a long period of time.
従って、電子写真感光体としては、帯電特性および感度
が良好で更に暗減衰が小さい等の電子写真特性は勿論、
加えて繰返し使用での耐刷性、耐摩耗性、耐湿性等の物
理的性質や、コロナ放電時に発生するオゾン、露光時の
紫外線等への耐性（耐環境性）においても良好であるこ
とが要求される。Therefore, as an electrophotographic photoreceptor, it not only has good charging characteristics and sensitivity, but also has electrophotographic characteristics such as low dark decay.
In addition, it has good physical properties such as printing durability, abrasion resistance, and moisture resistance after repeated use, as well as resistance to ozone generated during corona discharge and ultraviolet rays during exposure (environmental resistance). required.
従来、電子写真感光体としては、セレン、酸化亜鉛、硫
化カドミウム等の無機光導電性物質を主成分とする感光
体層を有する無機感光体が広く用いられている。Conventionally, inorganic photoreceptors having a photoreceptor layer containing an inorganic photoconductive substance such as selenium, zinc oxide, or cadmium sulfide as a main component have been widely used as electrophotographic photoreceptors.
一方、種々の有機光導電性物質を電子写真感光体の感光
層の材料として利用することが近年活発に研究、開発さ
れている。On the other hand, the use of various organic photoconductive substances as materials for photosensitive layers of electrophotographic photoreceptors has been actively researched and developed in recent years.
例えば特公昭５０ｉ０１１９６号には、ポリ−Ｎ−上ニ
ルカルバゾールど２，４．７−ｈリニｌ−ｃノー９−
フルオレノンを含有した感光体層を有する有機感光体
について記載されている。しかしこの感光体は、感度及
び耐久性において必ずしも満足できるものではない。こ
のような欠点を改善するために、感光体層において、電
荷発生機能と電荷輸送機能とを異なる物質に個別に分担
させることにより、感度が高くて耐久性の大きい有機感
光体を開発する試みがなされている。このようないわば
機能分離型の電子写真感光体においては、各機能を発揮
する物質を広い範囲のものから選択することができるの
で、任意の特性を有する電子写真感光体を比較的容易に
作製することが可能である。For example, in Japanese Patent Publication No. 50i01196, poly-N-onylcarbazole, 2,4.7-hlinyl-c-no-9-
An organic photoreceptor having a photoreceptor layer containing fluorenone is described. However, this photoreceptor is not necessarily satisfactory in sensitivity and durability. In order to improve these drawbacks, attempts have been made to develop organic photoreceptors with high sensitivity and durability by assigning charge generation and charge transport functions to different materials in the photoreceptor layer. being done. In such so-called function-separated type electrophotographic photoreceptors, substances that exhibit each function can be selected from a wide range of materials, so it is relatively easy to produce electrophotographic photoreceptors with arbitrary characteristics. Is possible.
こうした機能分離型の電子写真感光体に有効な電荷発生
物質として、従来数多くの物質が提案されている。無機
物質を用いる例としては、例えば特公昭４３−１６１９
８号に記載されているように、無定形セレンがある。こ
れは有機電荷輸送物質と組合される。Many substances have been proposed as charge-generating substances that are effective for such functionally separated electrophotographic photoreceptors. Examples of using inorganic substances include, for example, Japanese Patent Publication No. 43-1619
As described in No. 8, there is amorphous selenium. This is combined with an organic charge transport material.
また、有機染料や有機顔料を電荷発生物質として用いた
電子写真感光体も多数提案されており、例えば、ビスア
ゾ化合物を含有する感光体層を有するものは、特開昭４
７−３７５４３号、同５５−２２８３４号、同５４−７
９８３２号、同５６−１１６０４０号等にＪ−り既に知
られている。In addition, many electrophotographic photoreceptors using organic dyes or organic pigments as charge-generating substances have been proposed. For example, one having a photoreceptor layer containing a bisazo compound was published in
No. 7-37543, No. 55-22834, No. 54-7
It is already known from J-No. 9832, No. 56-116040, etc.
と二ろで、有機光導電性物質を用いる公知の感光体は通
常、負帯電用として使用されている。この理由は、負帯
電使用の場合には、電荷のうちホールの移動度が大きい
ことから、光感度等の面で有利なためである。Known photoreceptors using organic photoconductive materials are generally used for negative charging. The reason for this is that when negative charging is used, the mobility of holes among the charges is large, which is advantageous in terms of photosensitivity and the like.
しかしながら、このような負帯電使用の場合の問題は、
帯電器による負帯電時に雰囲気中にオゾンが発生し易く
なり、環境条件を悪くしてしまう。However, the problem with using such a negative charge is that
Ozone is likely to be generated in the atmosphere when negatively charged by the charger, worsening the environmental conditions.
また、負帯電用感光体の現像には正極性のトナーが必要
となるが、正極性のトナーは強磁性体電荷粒子に対する
摩擦帯電系列からみて製造が困難である。二とである。Further, a toner of positive polarity is required for development of a negatively charged photoreceptor, but it is difficult to manufacture a toner of positive polarity in view of the triboelectrification series with respect to ferromagnetic charged particles. It is two.
そこで、有機光導電性物質を用いる感光体を正帯電で使
用する、例えば、電荷発生層上に電荷輸送層を積層し、
電荷輸送層を電子輸送能の大きい物質で形成する正帯電
感光体等が提案されている。Therefore, a photoreceptor using an organic photoconductive substance is used with positive charging, for example, a charge transport layer is laminated on a charge generation layer.
Positively charged photoreceptors and the like have been proposed in which a charge transport layer is formed of a material with a high electron transport ability.
しかし゛ながら電荷輸送層に例えばトリニトロフルオレ
ノン等を含有上しめると、該物質が発癌性である等の問
題を提起することがある。他方、ホール輸送能の大きい
電荷輸送層」−に電荷発生層を積・ 層した正帯電感光
体が考えられろか、この機構では表面側に存在させる電
荷発生層を非常に薄くする必要があり、耐刷性等が悪く
なり、実用的な層構成ではない。However, when the charge transport layer contains, for example, trinitrofluorenone, problems may arise such as the fact that the substance is carcinogenic. On the other hand, it may be possible to consider a positively charged photoreceptor in which a charge-generating layer is laminated on a charge-transporting layer with a large hole-transporting ability, but this mechanism requires that the charge-generating layer present on the surface side be extremely thin. Printing durability deteriorates, and this is not a practical layer structure.
また、正帯電感光体として、米国特許３．６］５，４１
４号には、チアピリリウム塩（電荷発生物質）をポリカ
ーボネート（バインダ樹脂）と錯体を形成するように含
有させたものが示されている。しかしこの感光体では、
メモリ現象が大きく、ゴーストも発生し易いという欠点
がある。また米国特許３．３５７．９８９号には、フタ
ロシアニンを含有せしめた感光体が示されているが、フ
タロシア、−ンは結晶型によって特性が変化する上に、
結晶型を厳密に制御する必要があり、更に短波長感度が
不足しかつメモリ現象も大きく、可視光波長域の光源を
用いる複写機？ζは不適当である。Also, as a positively charged photoreceptor, U.S. Patent No. 3.6]5,41
No. 4 shows a product containing a thiapyrylium salt (charge generating substance) so as to form a complex with polycarbonate (binder resin). However, with this photoreceptor,
The drawbacks are that the memory phenomenon is large and ghosts are likely to occur. Further, U.S. Pat. No. 3,357,989 discloses a photoreceptor containing phthalocyanine, but the characteristics of phthalocyanine vary depending on the crystal type, and
A copying machine that requires strict control of the crystal type, lacks short wavelength sensitivity, has a large memory phenomenon, and uses a light source in the visible wavelength range? ζ is inappropriate.
このように正帯電感光体を得るための試みが種々行なわ
れているが、いずれも光感度、メモリ現象又は労働衛生
等、また紫外線耐性、耐オゾン酸化性等の耐用性の点で
改善すべき多くの問題点がある。Various attempts have been made to obtain positively charged photoreceptors, but all of them require improvements in terms of photosensitivity, memory phenomenon, occupational hygiene, etc., and durability such as ultraviolet resistance and ozone oxidation resistance. There are many problems.
そこで機能上から光照射時ホール及び電子を発生する電
荷発生物質を含有する電荷発生層を上層（表面層）とし
、ホール輸送機能を有する電荷輸送物質を含む電荷輸送
層を下層とする積層構成の感光体を正、負両用帯電感光
体の基本形とし、足らざるを補完することが考えられる
。Therefore, from a functional standpoint, a laminated structure in which the upper layer (surface layer) is a charge generation layer containing a charge generation substance that generates holes and electrons when irradiated with light, and the lower layer is a charge transport layer containing a charge transport substance having a hole transport function. It is conceivable to make the photoreceptor the basic form of a photoreceptor for both positive and negative charging, and to supplement what is lacking.
なおかかる感光体においては、構造中に例えば電子吸引
性基を有する電荷発生物質を用いるようにすれば、感光
体表面の正電荷を打消すための電子の移動が早くなり、
高感度特性が得られることが考えられる。In addition, in such a photoreceptor, if a charge generating substance having, for example, an electron-withdrawing group is used in the structure, the movement of electrons to cancel the positive charge on the surface of the photoreceptor becomes faster.
It is thought that high sensitivity characteristics can be obtained.
しかしながら、前記正帯電感光体は電荷発生物質を含む
層が表面層として形成されるため、光照射、特に紫外線
等の短波光照射、コロナ放電、湿度、オゾン酸化、機械
的摩擦等外部作用に脆弱な電荷発生物質が直接に曝され
ることとなり、感光体の保存中及び像形成の過程で電子
写真性能が劣化し、画質が低下するようになる。However, since the positively charged photoreceptor is formed with a layer containing a charge generating substance as a surface layer, it is vulnerable to external effects such as light irradiation, especially short wave light irradiation such as ultraviolet light, corona discharge, humidity, ozone oxidation, and mechanical friction. As a result, the electrophotographic performance deteriorates during the storage of the photoreceptor and during the image formation process, resulting in a decrease in image quality.
従来の電荷輸送層を表面層とする負帯電感光体において
は、前記各種の外部作用の影響は極めて少なく、むしろ
前記電荷輸送層が下層の電荷発生層を保護する作用を有
している。In a negatively charged photoreceptor having a conventional charge transport layer as a surface layer, the effects of the various external effects described above are extremely small, and rather the charge transport layer has the effect of protecting the underlying charge generation layer.
そこで、例えば絶縁性かつ透明な樹脂から成る薄い保護
層を設け、前記電荷発生物質を含む層を外部作用から保
護することが考えられるが、光照射時発生ずる電荷が該
保護層でブロッキングされて光照射効果が失なわれてく
るし、また表面層となる保護層が厚い場合には感度低下
を招き、剰え紫外線遮断効果も少いので、外部作用から
の遮蔽、特に紫外線からの保護を単なる保護層だけに委
ねることはできない。Therefore, it is conceivable to provide a thin protective layer made of an insulating and transparent resin to protect the layer containing the charge-generating substance from external effects, but the protective layer may block the charges generated during light irradiation. The effect of light irradiation will be lost, and if the protective layer that forms the surface layer is thick, it will cause a decrease in sensitivity and will have little residual UV blocking effect. It cannot be left to the layers alone.
本発明の目的は、正、負帯電に適用することができ、良
好な感度を有し、耐環境性に優れ、特に紫外線耐性、耐
酸化性がよく、耐用物性のよい有機先導電性電ｒ−写真
感光体の提供にある。The purpose of the present invention is to provide an organic lead conductive electrode that can be applied to positive and negative charging, has good sensitivity, excellent environmental resistance, and particularly has good UV resistance, oxidation resistance, and durable physical properties. - To provide a photographic photoreceptor.
前記本発明の目的は、導電性支持体」二に電荷発生物質
（ｃ Ｇ Ｍと標記）及び電荷輸送物質（Ｃ，’Ｉ’
Ｍと標記）を含んでなる層を有ずろ電子写真感光体に於
て、１ζ記一般式で表わされろ化合物を含有ずろごとを
特徴と４−ろ電、（−ｑｇ真真先光体よって達成されろ
、。The object of the present invention is to combine a conductive support with a charge generating substance (labeled as cGM) and a charge transporting substance (C, 'I').
In an electrophotographic photoreceptor having a layer containing a compound represented by the general formula 1ζ, 4-roelectricity, (-qg) is achieved by a straight photoreceptor. Be it.
一般式 ％式％ 式中、■（はアリール基または置換アリール基を表す。general formula %formula% In the formula, (■) represents an aryl group or a substituted aryl group.
またＡ ！ＪニーＣ１！、−または−Ｃｉ（−＝ ＣＩ
？′−（Ｒ’は水素原ｒ−、ハロゲン原Ｊ’）を表す。A again! J knee C1! , - or -Ci (-= CI
? '-(R' represents a hydrogen atom r-, a halogen atom J').
本発明ｌ：係る導電性支持体−）−（ご設ける感光体層
は、ＣＴＭ及びＣ，Ｇ Ｍを混和した中層構成でもｊ−
いし、Ｃ’Ｔ’ ！１．４を含む層をＦ層としＣＧＭを
含む層を１一層と４−ろ複層構成でもよし或はその逆の
構成でもよい、また必要？、二応じて保護層（□ ＣＬ
と標記）を設けてしよい。The present invention l: Such conductive support
Ishi, C'T'! Is it possible to have a multi-layer structure with the layer containing 1.4 as the F layer and the layer containing CGM as the 1 layer, or vice versa? , 2 depending on the protective layer (□ CL
) may be provided.
本発明に係る化合物は前記少くと６−・層に添加＝７−
されるが、感光体の表層に添加されることが効果的であ
る。尚表層に最も濃密に、内部にゆくに従って逓減させ
る形態であってもよい。The compound according to the present invention is added to at least the above-mentioned 6- layer, but it is effective to add it to the surface layer of the photoreceptor. In addition, it may be in a form where it is most concentrated on the surface layer and gradually decreases toward the inside.
以下に本発明の詳細な説明する。The present invention will be explained in detail below.
カールソンブ「１セスに基く電子写真プロセスには、一
般に像露光、消去露光、転写面露光、クリーニング露光
等に紫外線を発生ずる光源が用いられており、該光源か
らの光に含まれ、ｃｉＪ視光に比べ大きなエネルギを有
４−る紫外線の繰返し照射は、感光体に用いられている
有機化合物分子を解裂させるに充分である。即ち感光体
をなずＣＧＭ、Ｃ１゛Ｍ或（ｊバインダ等はラジカル解
離を起し本来の分子構造を失って劣化し、従って感光体
の劣化を招来し、具体的には感度低下、残電位」−昇等
を惹起し７、かぶりの発生、画質の低下に陥る。In the electrophotographic process based on Carl Sonb's 1 process, a light source that generates ultraviolet rays is generally used for image exposure, erasing exposure, transfer surface exposure, cleaning exposure, etc.; Repeated irradiation with ultraviolet light, which has a higher energy than light, is sufficient to decompose the organic compound molecules used in the photoreceptor. etc., cause radical dissociation, lose the original molecular structure, and deteriorate, resulting in deterioration of the photoreceptor. Specifically, it causes a decrease in sensitivity, an increase in residual potential, etc.7, fogging, and a decrease in image quality. fall into decline.
感光体の紫外線或は紫外線及びオゾンにＪ−〜て托発、
派生ずろ複合劣化（Ｊ反復して付加されろ各種露光処理
、ニＩ ｒ７す放電によって生ずるが、露光によって発
生する−・単項酸素にｊ−っても強めらねると考えられ
る。また、感光体の層構成、ＣＧ ＭやＣＴＭの種類等
にｊ−一でも紫外線等に、Ｌろ複合劣化を受ける程度は
変化するが、Ｃ’Ｉ’ Ｍの方が劣化を受ＩＪ易く、特
に有機光導電性物質を使用ずろ場合、その影響は極めて
大きい、。Exposed to ultraviolet rays or ultraviolet rays and ozone from the photoreceptor,
Derivative shear compound deterioration (J) is caused by various exposure treatments and discharges that are repeatedly added, but it is thought that the deterioration of the photoreceptor will not be strengthened even if it is exposed to single oxygen generated by exposure. Although the extent to which C'I' M is susceptible to deterioration due to ultraviolet rays, etc. varies depending on the layer structure of CGM and the type of CTM, etc., C'I' M is more susceptible to deterioration, especially organic photoconductive materials. The effects of using sexual substances are extremely large.
本発明者らは、感光体の複合劣化（特に電位低ド）の改
良に関し鋭倉検討の結果、感光体層中に曲記一般式で示
されろ特定のピルビン酸類の化合物が複合劣化を著しく
防ＩＪコするだけでなく、その他の電子写真特性や物理
的性質の向上にも寄与ずろことを見い出した。As a result of Eikura's investigation into improving the complex deterioration of photoreceptors (particularly at low potentials), the present inventors found that a specific pyruvic acid compound in the photoreceptor layer, which is shown by the general formula below, significantly causes complex deterioration. It has been found that it not only helps prevent IJ, but also contributes to improving other electrophotographic properties and physical properties.
以［・°、本発明をより具体的に説明する。Hereinafter, the present invention will be explained in more detail.
前記一般式で表される化合物；
■え−Ａ−ＣＯＣＯＯＩＩ
に於てＲはアリール基、置換アリール基を表し、具体的
には
またＡは−ＣＨ，−または−ＣＩＩ＝ＣＲ’ −（Ｒ
′ は水素原子またはハロゲン原子）を表わす。In the compound represented by the above general formula; (i)-A-COCOOII, R represents an aryl group or a substituted aryl group; specifically, A is -CH,- or -CII=CR'-(R
′ represents a hydrogen atom or a halogen atom).
前記の本発明に係る化合物即ち一般に紫外線吸収剤と目
される化合物の有機物質に対する安定化機構としては、
紫外線（Ｕｖと標記ずろことがある）の保有ずろ分解エ
ネルギがＬＪ Ｖ吸収剤内で振動のエネルギに変貌する
ことによると思われる。The stabilization mechanism of the compound according to the present invention, that is, a compound generally regarded as an ultraviolet absorber, against organic substances is as follows:
This is thought to be due to the fact that the residual decomposition energy of ultraviolet light (sometimes referred to as Uv) is transformed into vibrational energy within the LJV absorber.
この振動のエネルギは該ＬＪＶ吸収剤から熱Ｊ、ネルギ
として放出されるが、熱エネルギでは既に有機物質を劣
化させるには不充分であって、感光体は紫外線の繰返し
照射による害から保護されるものと思われる。The energy of this vibration is released as heat and energy from the LJV absorber, but the thermal energy is already insufficient to degrade the organic material, and the photoreceptor is protected from harm caused by repeated irradiation with ultraviolet rays. It seems to be.
以下に本発明の化合物の代表的具体例を示すが、これに
よって本発明に用いられろ化合物がこれらに限定される
ものではない。Typical specific examples of the compounds of the present invention are shown below, but the compounds that can be used in the present invention are not limited thereto.
Ｒ−ＣＨ＝Ｃ−ＣＯＣＯＯＨ
Ｒ′
−１，１一
本発明において用いられる前記一般式で示される化合物
（以下、本発明の化合物と称する）の添加量は、感光体
の層構成、ＣＴＭの種類などによって一定ではないが、
ＣＴＭに対して、０．１−１００重量％、好ましくは１
〜５０重量％、特に好ましくは５〜２５重量％の範囲で
用いられる。R-CH=C-COCOOH R' -1,1 The amount of the compound represented by the above general formula used in the present invention (hereinafter referred to as the compound of the present invention) depends on the layer structure of the photoreceptor and the type of CTM. Although it is not constant due to
0.1-100% by weight relative to CTM, preferably 1
It is used in an amount of 50 to 50% by weight, particularly preferably 5 to 25% by weight.
−Ｉ２− ’ 次に本発明の感光体の構成を図面によって説明する。-I2- ’ Next, the structure of the photoreceptor of the present invention will be explained with reference to the drawings.
本発明の感光体は例えば第１図に示すように支持体ｌ
（導電性支持体またはシート上に導電層を設けたもの）
上にＣＧＭ５と必要に応じてバインダ樹脂を含有する電
荷発生層（以下、ＣＧＬと標記する）２を下層とし、Ｃ
ＴＭ６と必要に応じてバインダ樹脂を含有する電荷輸送
層（以下、ＣＴＬと標記する）３を上層とする積層構成
の感光体層４を設けたもの、第２図に示すように支持体
ｌ上にＣＴＬ３を下層とし、ＣＧＬ ２を上層とする積
層構成の感光体層４を設けたもの、および第３図に示す
ように支持体１上にＣＧＭＳＣＴＭおよび必要に応じて
バインダ樹脂を含有する単層構成の感光体層４を設けた
もの等が挙げられる。The photoreceptor of the present invention has a support l as shown in FIG.
(A conductive layer provided on a conductive support or sheet)
A charge generation layer (hereinafter referred to as CGL) 2 containing CGM 5 and a binder resin as required is formed as a lower layer;
As shown in FIG. 2, a photoreceptor layer 4 having a laminated structure having a charge transport layer (hereinafter referred to as CTL) 3 containing TM6 and a binder resin as an upper layer is provided, as shown in FIG. A photoreceptor layer 4 having a laminated structure with CTL 3 as a lower layer and CGL 2 as an upper layer is provided, and a single layer containing CGMSCTM and a binder resin as necessary on a support 1 as shown in FIG. Examples include those provided with a photoreceptor layer 4 of the following configuration.
また、第２図と同様の層構成で上層のＣＧＬにＣＧＭと
ＣＴＭの両方が含有されてもよく、該層の上に保護層（
ＯＣＬ）を設けてもよく、支持体と感光体層の間に中間
層を設けてもよい。第４図にその１例を示しである。す
なわち、支持体ｌ上に中間層７を設（プ、その上にＣＴ
Ｍ ６ ａとバインダ樹脂を含有するＣ Ｔ Ｌ ３
およびＣＧＭ５、ＣＴＭ６ｂおよびバインダ樹脂を含有
するＣ Ｇ Ｌ ２を積層した感光体層４を有し、更に
バインダを主成分とするＯ ＣＬ ８を設けた感光体で
ある。In addition, both CGM and CTM may be contained in the upper CGL layer with the same layer configuration as shown in FIG. 2, and a protective layer (
OCL) may be provided, and an intermediate layer may be provided between the support and the photoreceptor layer. An example is shown in FIG. That is, the intermediate layer 7 is provided on the support l, and the CT
C T L 3 containing M 6 a and binder resin
The photoreceptor has a photoreceptor layer 4 in which CGM5, CTM6b, and CGL 2 containing a binder resin are laminated, and is further provided with OCL 8 whose main component is a binder.
本発明の化合物は、感光体を構成するＣＧＬ、ＣＴ Ｌ
、単層構成感光体層またはＯＣＬのいずれに含有されて
もよく、複数層に含有されてもよい。The compound of the present invention is applicable to CGL, CTL, which constitutes the photoreceptor.
, may be contained in either a single-layer structure photoreceptor layer or OCL, or may be contained in multiple layers.
本発明の効果がより顕著に発揮されるのは、ＣＣｌ２を
」二層としＣＴ Ｌを下層とする積層構成の感光体にお
いてである。The effects of the present invention are more clearly exhibited in a photoreceptor having a laminated structure with two layers of CCl2 and a lower layer of CTL.
次に本発明に適するＣＧＭとしては、可視光を吸収して
フリー電荷を発生ずるものであれば、無機顔料及び有機
顔料の何れをも用いることができる。無定形セレン、三
方晶系セレン、セレン−砒素合金、セレン−テルル合金
、硫化カドミウム、セレン化カドミウム、硫セレン化カ
ドミウム、硫化水銀、酸化鉛、硫化鉛等の無機顔料の外
、次の代表例で示されるような有機顔料が用いられる。Next, as the CGM suitable for the present invention, both inorganic pigments and organic pigments can be used as long as they absorb visible light and generate free charges. In addition to inorganic pigments such as amorphous selenium, trigonal selenium, selenium-arsenic alloy, selenium-tellurium alloy, cadmium sulfide, cadmium selenide, cadmium selenide sulfide, mercury sulfide, lead oxide, lead sulfide, the following representative examples Organic pigments such as those shown are used.
（１）モノアゾ顔料、ポリアゾ顔料、金属錯塩アゾ顔料
、ピラゾロンアゾ顔料、スチルベンアゾ及びデアゾール
アゾ顔料等のアゾ系顔料（２）ペリレン酸無水物及びペ
リレン酸イミド等のペリレン系顔料
（３）アントラキノン誘導体、アントアントロン誘導体
、ジヘンズピレンキノン誘導体、ピラントロン誘導体、
ビオラントロン誘導体及びイソビオラントロン誘導体等
のアントラキノン系又は多環キノン系顔料
（４）インジゴ誘導体及びヂオインジゴ誘導体等のイン
ジゴイド系顔料
（５）金属フタロンアニン及び無金属フタロンアニン等
のフタロソアニン系顔料
（６） ジフェニルメタン系顔料、トリフェニルメタン
顔料、キザンテン顔料及びアクリジン顔料等のカルボニ
ウム系顔料
（７）アジン顔料、オキサジン顔料及びデアジン顔料等
のキノンイミン系顔料
（８） シアニン顔料及びアゾメヂン顔料等のメチン系
顔料
（９）キノリン系顔料 −
（１０）ニトロ系顔料
（１１）ニトロソ系顔料
（１２）ベンゾキノン及びナフトキノン系顔料（１３）
ナフタルイミド系顔料
（１４） ビスベンズイミダゾール誘導体等のペリノ
ン系顔料
前記本発明に用いられるアゾ系顔料としては、例えば次
の例示構造化合物群〔Ｉ〕〜〔■〕で示されるものがあ
り、該例示構造化合物群の中の個々の好ましい具体的化
合物の数例を併せ掲げる。(1) Azo pigments such as monoazo pigments, polyazo pigments, metal complex azo pigments, pyrazolone azo pigments, stilbene azo and deazole azo pigments, (2) perylene pigments such as perylenic anhydride and perylenic acid imide, (3) anthraquinone derivatives, Antoanthrone derivatives, dihenzpyrenequinone derivatives, pyrantrone derivatives,
Anthraquinone-based or polycyclic quinone-based pigments such as violanthrone derivatives and isoviolanthrone derivatives (4) Indigoid-based pigments such as indigo derivatives and dioindigo derivatives (5) Phthalosoanine-based pigments such as metal phthalonanine and metal-free phthalonanine (6) Diphenylmethane-based pigments pigments, carbonium pigments such as triphenylmethane pigments, xanthene pigments and acridine pigments (7) quinone imine pigments such as azine pigments, oxazine pigments and deazine pigments (8) methine pigments such as cyanine pigments and azomedine pigments (9) quinoline Pigments - (10) Nitro pigments (11) Nitroso pigments (12) Benzoquinone and naphthoquinone pigments (13)
Naphthalimide pigments (14) Perinone pigments such as bisbenzimidazole derivatives Examples of the azo pigments used in the present invention include those shown in the following exemplary structural compound groups [I] to [■]. Several preferred examples of specific compounds in the group of exemplified structural compounds are also listed.
その好ましい具体的化合物の全容については特願昭６１
−．１９５８８１号が参照される。For details of the preferred specific compounds, please refer to the patent application filed in 1983.
−． Reference is made to No. 195881.
二へ、
以丁′余白
叉−ノ′
例示構造化合物群〔■〕：
例示構造化合物群〔■〕：
例示構造化合物群〔■〕：
例示構造化合物群〔Ｖ〕：
また、以下の多環キノン顔料から成る例示構造化合物群
（Ｖｌ）〜〔■〕はＣＧＭとして最も好ま例示構造化合
物群（Ｖｌ）・
一２３＝
−２４〜
例示構造化合物群〔■〕：
次に本発明で使用可能なＣＴＭとしては、特に制限はな
いが、例えばオキサゾール誘導体、−オキサジアゾ−゛
ル誘導体、チアゾール誘導体、チアジアゾール誘導体、
トリアゾール誘導体、イミダゾール誘導体、イミダシロ
ン誘導体、イミダゾリジン誘導体、ビスイミダゾリジン
誘導体、スチリル化合物、ヒドラゾン化合物、ピラゾリ
ン誘導体、オキサシロン誘導体、ベンゾチアゾール誘導
体、ベンズイミダゾール誘導体、キナゾリン誘導体、ベ
ンゾフラン誘導体、アクリジン誘導体、フェナジン誘導
体、アミノスチルベン誘導体、ポリ−Ｎ−ビニルカルバ
ゾール、ポリ−１−ビニルピレン、ポリ−９−ビニルア
ントラセン等であってよい。To 2, Itcho' Margin 叉-ノ' Exemplary structural compound group [■]: Exemplary structural compound group [■]: Exemplary structural compound group [■]: Exemplary structural compound group [V]: In addition, the following polycyclic quinones Exemplary structural compound group (Vl) ~ [■] consisting of pigments is the most preferred exemplary structural compound group (Vl) as CGM. Although there are no particular limitations on the derivative, for example, oxazole derivatives, -oxadiazole derivatives, thiazole derivatives, thiadiazole derivatives,
Triazole derivatives, imidazole derivatives, imidacilone derivatives, imidazolidine derivatives, bisimidazolidine derivatives, styryl compounds, hydrazone compounds, pyrazoline derivatives, oxacilone derivatives, benzothiazole derivatives, benzimidazole derivatives, quinazoline derivatives, benzofuran derivatives, acridine derivatives, phenazine derivatives, It may be an aminostilbene derivative, poly-N-vinylcarbazole, poly-1-vinylpyrene, poly-9-vinylanthracene, or the like.
しかしながら光照射時発生するホールの支持体側への輸
送能力が優れている外、前記ＣＧＭとの組合せに好適な
ものが好ましく用いられ、かかるＣＴＭとしては、例え
ば下記例示構造化合物群〔ＩＸ〕又は（Ｘ）で示される
スチル化合物が使用される。該例示構造化合物群中の個
々の具体的化合物の数例を併せ掲げるが、その全貌につ
いては特願昭６１−１９５８８１号が参照される。However, in addition to its excellent ability to transport holes generated during light irradiation to the support side, those suitable for combination with the above-mentioned CGM are preferably used, and such CTMs include, for example, the following exemplary structural compound group [IX] or ( A still compound represented by X) is used. Several examples of individual specific compounds in the group of exemplified structural compounds are listed below, and for the complete details, refer to Japanese Patent Application No. 1988-1958.
例示構造化合物群〔■〕：
−２８＝
また、ＣＴＭとして下記例示構造化合物群［ＸＩ）〜（
ＸＶ）で示されるヒドラゾン化合物も使用可能である。Exemplary structural compound group [■]: -28= In addition, the following exemplary structural compound group [XI] to (
Hydrazone compounds represented by XV) can also be used.
向側々の具体的化合物の全容については特願昭６１−１
９５８８１号が参照される。For the complete details of the specific compounds on the opposite side, please refer to the patent application 1986-1.
Reference is made to No. 95881.
例示構造化合物群〔■〕
例示構造化合物群（Ｘｌｌｌ）：
例示構造化合物群（ＸＶ ） ：
例示構造化合物群（ＸＶＩ ） ：
また、ＣＴＭとして下記例示構造化合物群〔Ｘ■〕で示
されるアミン誘導体も使用可能である。Exemplary Structural Compound Group [■] Exemplary Structural Compound Group (Xll): Exemplary Structural Compound Group (XV): Exemplary Structural Compound Group (XVI): In addition, amine derivatives shown in the following exemplary structural compound group [X■] are also available as CTMs. Available for use.
尚詳しくは特願昭６１−１９５８８１号が参照される。For details, refer to Japanese Patent Application No. 195881/1981.
本発明の感光体の層構成は前記のように積層構成と単層
構成とがあるが、表面層となるＣＴＬ。The layer structure of the photoreceptor of the present invention has a laminated structure and a single layer structure as described above, and CTL is used as the surface layer.
ＣＧＬ、ＯＣＬ、単層感光体層またはＯＣＬのいずれか
、もしくは複数層には感度の向上、残留電位ないし反復
使用時の疲労低減等を目的として、１種または２種以上
の電子受容性物質を含有せしめることができる。One or more electron-accepting substances may be added to CGL, OCL, single photoreceptor layer, OCL, or multiple layers for the purpose of improving sensitivity, reducing residual potential or fatigue during repeated use, etc. It can be made to contain.
本発明の感光体に使用可能な電子受容性物質きしては、
例えば無水琥珀酸、無水マレイン酸、ジブロム無水マレ
イン酸、無水フタル酸、テトラクロル無水フタル酸、テ
トラブロム無水フタル酸、３−ニトロ無水フタル酸、４
−ニトロ無水フタル酸、無水ピロメリット酸、無水メリ
ット酸、テトラシアノエチレン、テトラシアノキノジメ
タン、０−ジニトロベンゼン、ｍ−ジニトロベンゼン、
１，３，５．−トリニトロベンゼン、バラニトロベンゾ
ニトリル、ピクリルクロライド、キノンクロルイミド、
クロラニル、ブルマニル、２−メチルナフトキノン、ジ
クロロジシアノバラベンゾキノン、アントラキノン、ジ
ニトロアントラキノン、トリニトロフルオレノン、９−
フルオレノンデン〔ジシアノメチレンマロノジニトリル
〕、ポリニトロ−９−フルオレノンデンー〔ジシアノメ
チレンマロノジニトリル〕、ピクリン酸、フタル酸等が
挙げられる。Electron-accepting substances that can be used in the photoreceptor of the present invention include:
For example, succinic anhydride, maleic anhydride, dibromaleic anhydride, phthalic anhydride, tetrachlorophthalic anhydride, tetrabromophthalic anhydride, 3-nitrophthalic anhydride, 4
-Nitrophthalic anhydride, pyromellitic anhydride, mellitic anhydride, tetracyanoethylene, tetracyanoquinodimethane, 0-dinitrobenzene, m-dinitrobenzene,
1, 3, 5. - trinitrobenzene, varanitrobenzonitrile, picryl chloride, quinone chlorimide,
Chloranil, brumanil, 2-methylnaphthoquinone, dichlorodicyanobarabenzoquinone, anthraquinone, dinitroanthraquinone, trinitrofluorenone, 9-
Examples include fluorenonedine [dicyanomethylenemalonodinitrile], polynitro-9-fluorenonedine [dicyanomethylenemalonodinitrile], picric acid, phthalic acid, and the like.
本発明において感光体層に使用可能なバインダ樹脂とし
ては、例えばポリエチレン、ポリプロピレン、アクリル
樹脂、メタクリル樹脂、塩化ビニル樹脂、酢酸ビニル樹
脂、エポキシ樹脂、ポリウレタン樹脂、フェノール樹脂
、ポリエステル樹脂、アルキッド樹脂、ポリカーボネー
ト樹脂、シリコン樹脂、メラミン樹脂等の付加重合型樹
脂、重付加型樹脂、重縮合型樹脂並びにこれらの樹脂の
繰返し単位のうちの２つ以上を含む共重合体樹脂、例え
ば塩化ビニル−酢酸ビニル共重合体樹脂、塩化ビニル−
酢酸ビニル−無水マレイン酸共重合体樹脂等の絶縁性樹
脂の他、ポリ−Ｎ−ビニルカルバゾール等の高分子有機
半導体が挙げられる。Examples of binder resins that can be used in the photoreceptor layer in the present invention include polyethylene, polypropylene, acrylic resin, methacrylic resin, vinyl chloride resin, vinyl acetate resin, epoxy resin, polyurethane resin, phenol resin, polyester resin, alkyd resin, and polycarbonate. Addition polymer resins such as resins, silicone resins, and melamine resins, polyaddition resins, polycondensation resins, and copolymer resins containing two or more of the repeating units of these resins, such as vinyl chloride-vinyl acetate copolymer resins. Polymer resin, vinyl chloride
In addition to insulating resins such as vinyl acetate-maleic anhydride copolymer resins, polymeric organic semiconductors such as poly-N-vinylcarbazole may be used.
また、前記中間層は接着層又はバリヤ層等として機能す
るもので、上記バインダ樹脂の外に、例えばポリビニル
アルコール、エチルセルロース、カルボキシメチルセル
ロース、塩化ビニル−酢酸ビニル共重合体、塩化ビニル
−酢酸ビニル−無水マレイン酸共重合体、カゼイン、Ｎ
−アルコキシメチル化ナイロン、澱粉等が用いられる。Further, the intermediate layer functions as an adhesive layer or a barrier layer, and in addition to the binder resin, for example, polyvinyl alcohol, ethyl cellulose, carboxymethyl cellulose, vinyl chloride-vinyl acetate copolymer, vinyl chloride-vinyl acetate-anhydrous Maleic acid copolymer, casein, N
-Alkoxymethylated nylon, starch, etc. are used.
次に前記感光体層を支持する導電性支持体としては、ア
ルミニウム、ニッケルなどの金属板、金属ドラム又は金
属箔、アルミニウム、酸化錫、酸化インジウムなどを蒸
着したプラスチックフィルムあるいは導電性物質を塗布
した紙、プラスデックなどのフィルム又はドラムを使用
することができる。Next, the conductive support supporting the photoreceptor layer may be a metal plate made of aluminum or nickel, a metal drum or metal foil, a plastic film coated with aluminum, tin oxide, indium oxide, etc., or a conductive material coated thereon. Paper, films such as Plus Deck, or drums can be used.
ＣＧ Ｌは既述のＣＧＭを」二記支持体上に真空蒸着さ
せる方法、ＣＧＭを適当な溶剤に単独もしくは適当なバ
インダ樹脂と共に溶解もしくは分散せしめたものを塗布
して乾燥させる方法により設けることができる。CG L can be provided by vacuum-depositing the above-mentioned CGM on the support described in Section 2, or by applying a solution or dispersion of CGM alone or with a suitable binder resin in a suitable solvent and drying it. can.
上記ＣＧＭを分散せしめてＣＧＬを形成する場合、当該
ＣＧＭは２μｍ以下、好ましくは１μｍ以下の平均粒径
の粉粒体とするのが好ましい。即ち、粒径があまり大き
いと層中への分散が悪くなると共に、粒子が裏面に一部
突出して表面の平滑性が悪くなり、場合によっては粒子
の突出部分で放電が生１Σたり或はそこにトナー粒子が
付着してトナーフィルミング現象が生じ易い。When CGL is formed by dispersing the above CGM, it is preferable that the CGM is a powder having an average particle size of 2 μm or less, preferably 1 μm or less. That is, if the particle size is too large, dispersion in the layer will be poor, and some of the particles will protrude to the back surface, resulting in poor surface smoothness. Toner particles tend to adhere to the toner, causing a toner filming phenomenon.
ただし、上記粒径があまり小さいと却って凝集し易く、
層の抵抗が」二昇したり、結晶欠陥が増えて感度及び繰
返し特性が低下したり、或いは微細化する上で限界があ
るから、平均粒径の下限を０．０１μｍとするのが望ま
しい。However, if the above particle size is too small, it tends to aggregate,
It is desirable to set the lower limit of the average grain size to 0.01 μm because the resistance of the layer increases, the sensitivity and repeatability decrease due to an increase in crystal defects, or there is a limit to miniaturization.
ＣＧＬは、次の如き方法によって設けることができる。CGL can be provided by the following method.
即ち、記述のＣＧＬをボールミル、ホモミキザ等によっ
て分散媒中で微細粒子とし、バインダ樹脂を加えて混合
分散して得られる分散液を塗布する方法である。この方
法において超音波の作用下に粒子を分散させると、均一
分散が可能である。That is, this is a method in which the CGL described above is made into fine particles in a dispersion medium using a ball mill, a homomixer, etc., a binder resin is added, and a dispersion obtained by mixing and dispersing is applied. When the particles are dispersed under the action of ultrasound in this method, uniform dispersion is possible.
ＣＴ Ｌの形成に用いられる溶媒としては、例えばＮ、
Ｎ−ジメチルポルムアミド、ベンゼン、トルエン、キシ
レン、モノクロルベンゼン、１．２−ジクロロエタン、
ジクロロメタン、］、１．２−）リクロロエタン、テト
ラヒドロフラン、メチルエチルケトン、酢酸エチル、酢
酸ブヂル等を挙げることができる。Examples of the solvent used to form CTL include N,
N-dimethylpolamide, benzene, toluene, xylene, monochlorobenzene, 1,2-dichloroethane,
Examples include dichloromethane, ], 1.2-)dichloroethane, tetrahydrofuran, methyl ethyl ketone, ethyl acetate, butyl acetate, and the like.
前記第１．２図及び第４図の様な機能分離層構成では、
ＣＧＬ中ＣＧＭバインダ樹脂１００重量当り２０〜２０
０重量部、好ましくは２５〜１００重量部である。ＣＧ
Ｍがこれより少ないと光感度が低く、残留電位の増加を
招き、又これより多いと暗減衰が増大し、かつ受容電位
が低下する。In the functional separation layer configuration as shown in FIG. 1.2 and FIG. 4,
20 to 20 per 100 weight of CGM binder resin in CGL
0 parts by weight, preferably 25 to 100 parts by weight. CG
If M is less than this, the photosensitivity will be low and the residual potential will increase, and if it is more than this, dark decay will increase and the acceptance potential will decrease.
以」二のようにして形成されるＣ Ｇ Ｌの膜厚は、正
帯電用構成の場合は好ましくは、１〜１０μｍ１特に好
ましくは３〜７μｍであり、負帯電用構成の場合は好ま
しくは０．０１〜１０μｍ１特に好ましくは０．１〜３
μｍである。The film thickness of the CGL formed in the following manner is preferably 1 to 10 μm, particularly preferably 3 to 7 μm, in the case of a positive charging configuration, and preferably 0 to 7 μm in the case of a negative charging configuration. .01-10μm1 Particularly preferably 0.1-3
It is μm.
前記正帯電用構成においてはＣＧ Ｌが表面層となるの
で耐傷性に欠け、耐用性向」二のためにはＣＧ Ｌ膜厚
を厚くする必要があるが、感度低下を引き起こす。これ
を抑制する手段としてＣＧ Ｌ中へＣＴＭが添加される
。この場合のＣＧＭとＣＴＭの比はＣＧＭ１００重量部
に対してＣＴＭ３０重量部から４００重指部である。In the configuration for positive charging, since the CGL is a surface layer, it lacks scratch resistance, and although it is necessary to increase the thickness of the CGL film in order to improve durability, it causes a decrease in sensitivity. CTM is added to CGL as a means to suppress this. In this case, the ratio of CGM to CTM is 30 to 400 parts by weight of CTM to 100 parts by weight of CGM.
しかしながら、このＣＴＭはＣＧＭに比へ複合劣化を受
は易い構造を有するので、紫外線等により容易に劣化を
受は感光体の耐久性が損なわれる。However, since this CTM has a structure that is more susceptible to complex deterioration than that of CGM, it is easily deteriorated by ultraviolet rays and the like, which impairs the durability of the photoreceptor.
本発明は、この悪循環を本発明の化合物の添加により解
消したものである。The present invention eliminates this vicious cycle by adding the compound of the present invention.
次に、ＣＴ Ｌ ｉｌｌ：、既述のＣＴＭを上述のｃＧ
Ｌと同様にして（即ち、単独であるいは上述のバインダ
樹脂と共に溶解、分散せしめたものを塗布、乾燥して）
形成することができる。Next, CT ill:, the above CTM is converted into the above cG
In the same manner as L (that is, apply it alone or dissolve and disperse it together with the above-mentioned binder resin, and dry it)
can be formed.
ＣＴＬ中のＣＴＭｆｆｉはバインダ樹脂１００重量部当
り２０〜２００重量部、好ましくは３０〜１５０重量部
である。CTMffi in CTL is 20 to 200 parts by weight, preferably 30 to 150 parts by weight, per 100 parts by weight of binder resin.
ＣＴＭの含有割合がこれより少ないと光感度が悪く残留
電位が高くなり易く、又これより多いと溶媒溶解性が悪
くなる。If the CTM content is less than this, the photosensitivity will be poor and the residual potential will tend to be high, and if it is more than this, the solvent solubility will be poor.
形成されるＣ Ｔ Ｌの膜厚は、好ましくは５〜５０μ
ｍ、特に好ましくは５〜３０１ｔｍである。また、ＣＧ
ＬとＣＴＬの膜厚比ハＩ ：（１−３０）でＩ） ７
） ０） カ好ましい。The thickness of the formed CTL is preferably 5 to 50μ
m, particularly preferably 5 to 301 tm. Also, CG
Film thickness ratio of L and CTL I: (1-30) I) 7
) 0) Fa preferable.
前記第３図に示した単層構成の場合、ＣＧ Ｍがバイン
ダ樹脂に含有される割合は、バインダ樹脂１００重量部
に対して２０〜２００重量部、好ましくは２５〜１００
重量部である。In the case of the single-layer structure shown in FIG. 3, the proportion of CGM contained in the binder resin is 20 to 200 parts by weight, preferably 25 to 100 parts by weight, based on 100 parts by weight of the binder resin.
Parts by weight.
ＣＧＭの含有割合がこれより少ないと光感度が低く、残
留電位の増加を招き、又これより多いと暗減衰及び受容
電位が低下する。If the content of CGM is less than this, the photosensitivity will be low and the residual potential will increase, and if it is more than this, dark decay and acceptance potential will decrease.
またＣＴＭがバインダ樹脂に対して含有される割合は、
バインダ樹脂１００重量部に対して２０〜２００重量部
、好ましくは３０〜１５０重量部である。In addition, the ratio of CTM to the binder resin is
The amount is 20 to 200 parts by weight, preferably 30 to 150 parts by weight, based on 100 parts by weight of the binder resin.
ＣＴＭの含有割合がこれより少ないと光感度が悪く残留
電位が高くなり易く、又これより多いと溶媒溶解性が悪
くなる。If the CTM content is less than this, the photosensitivity will be poor and the residual potential will tend to be high, and if it is more than this, the solvent solubility will be poor.
中層構成の場合感光体層中のＣＧＭに対するＣＴＭの量
比は重量比で１：３〜１：２とするのが好ましい。また
、この場合の感光体層の膜厚は７〜５０μｍ１好ましく
け１０〜３０μｍである。In the case of an intermediate layer structure, the weight ratio of CTM to CGM in the photoreceptor layer is preferably 1:3 to 1:2. Further, the thickness of the photoreceptor layer in this case is 7 to 50 μm, preferably 10 to 30 μm.
本発明おいて必要に応じて設けられるＯＣＬのバインダ
として体積抵抗１０’Ωｃｍ以上、好ましくは１０Ｉ０
ΩｃＩ１１以上、より好ましくは１０１３ΩｃＩ！１以
上の透明樹脂が用いられる。又前記バインダは光又は熱
により硬化する樹脂を少なくとも５０重量％以上含有す
るものとされる。In the present invention, the OCL binder provided as necessary has a volume resistance of 10'Ωcm or more, preferably 10I0
ΩcI of 11 or more, more preferably 1013 ΩcI! One or more transparent resins are used. Further, the binder contains at least 50% by weight of a resin that is cured by light or heat.
かかる光又は熱により硬化する樹脂としては、例えば熱
硬化性アクリル樹脂、シリコン樹脂、エポキシ樹脂、ウ
レタン樹脂、尿素樹脂、フェノール樹脂、ポリエステル
樹脂、アルキッド樹脂、メラミン樹脂、光硬化性の桂皮
酸樹脂等又はこれらの共重合もしくは共縮合樹脂があり
、その外電子写真材料に供される光又は熱硬化性樹脂の
全てが利用される。又前記ＣＧＬ中には加工性及び物性
の改良（亀裂防止、柔軟性付与等）を目的として必要に
より熱可塑性樹脂を５０重量％未満含有せしめることが
できる。かかる熱可塑性樹脂としては、例えばポリプロ
ピレン、アクリル樹脂、メタクリル樹脂、塩化ビニル樹
脂、酢酸ビニル樹脂、エポキシ樹脂、ブチラール樹脂、
ポリカーボネート樹脂、シリコン樹脂、又はこれらの共
重合樹脂、例えば塩化ビニル−酢酸ビニル共重合体樹脂
、塩化ビニル−酢酸ビニル−無水マレイン酸共重合体樹
脂、ポリ−Ｎ−ビニルカルバゾール等の高分子有機半導
体、その他電子写真材料に供される熱可塑、 他樹脂の
全てが利用される。Examples of such resins that harden with light or heat include thermosetting acrylic resins, silicone resins, epoxy resins, urethane resins, urea resins, phenol resins, polyester resins, alkyd resins, melamine resins, and photocurable cinnamic acid resins. In addition to these copolymerized or cocondensed resins, all of the photo- or thermosetting resins used in electrophotographic materials can be used. If necessary, the CGL may contain less than 50% by weight of a thermoplastic resin for the purpose of improving processability and physical properties (preventing cracks, imparting flexibility, etc.). Examples of such thermoplastic resins include polypropylene, acrylic resin, methacrylic resin, vinyl chloride resin, vinyl acetate resin, epoxy resin, butyral resin,
Polycarbonate resins, silicone resins, or copolymer resins thereof, such as vinyl chloride-vinyl acetate copolymer resins, vinyl chloride-vinyl acetate-maleic anhydride copolymer resins, poly-N-vinylcarbazole, and other polymeric organic semiconductors , thermoplastics, and other resins used in electrophotographic materials are all used.
また前記ＯＣＬは、電子受容性物質を含有してもよく、
その他、必要によりＣＧＬを保護する目的で酸化防止剤
等を含有してもよく、前記バインダと共に溶剤に溶解さ
れ、例えばディップ塗布、スプレー塗布、ブレード塗布
、ロール塗布等により塗布・乾燥されて２μｍ以下、好
ましくは１μ園以下の層厚に形成される。Further, the OCL may contain an electron-accepting substance,
In addition, if necessary, an antioxidant or the like may be included for the purpose of protecting CGL, which is dissolved in a solvent together with the binder, and applied and dried to a thickness of 2 μm or less by, for example, dip coating, spray coating, blade coating, roll coating, etc. The layer thickness is preferably 1 μm or less.
以下、本発明を実施例により説明するが、これにより本
発明の実施の態様が限定されるものではない。EXAMPLES The present invention will be explained below with reference to Examples, but the embodiments of the present invention are not limited thereby.
実施例 １
アルミニウム箔をラミネートしたポリエステルフィルム
、及びアルミニウムドラムより成る導電性支持体上に、
塩化ビニル−酢酸ビニル−無水マレイン酸共重合体（エ
スレックＭＰ−ＩＱ、種水化学工業社製）よりなる厚さ
Ｑ、１μｍの中間層を形成した。Example 1 On a conductive support consisting of a polyester film laminated with aluminum foil and an aluminum drum,
An intermediate layer of vinyl chloride-vinyl acetate-maleic anhydride copolymer (S-LEC MP-IQ, manufactured by Tanezu Kagaku Kogyo Co., Ltd.) having a thickness of Q and 1 μm was formed.
４ｔ−一
次いでＣＴ Ｍ （ＩＸ−７５）／ポリカーボネート樹
脂（パンライトＬ−１２５０、音大化成社製） −７５
／ １００（重量比）を１６．５重量％含有する１、２
−ジクロルエタン溶液を前記中間層上にディップ塗布、
乾燥して１５μ霧厚のＣＴＬを得た。4t-first CT M (IX-75)/polycarbonate resin (Panlite L-1250, manufactured by Ondai Kasei Co., Ltd.) -75
/ 100 (weight ratio) 1, 2 containing 16.5% by weight
- dip coating a dichloroethane solution onto the intermediate layer;
After drying, a CTL with a mist thickness of 15 μm was obtained.
次いで、ＣＧＭとして昇華した４、１０〜ジブロモアン
スアンス［！ン（Ｖｌ−３）／パンライトＬ−１２５０
＝ ５０／１００（重量比）をボールミルで２４時間粉
砕し、９重量％になるよう１．２−ジクロルエタンを加
えて更にボールミルで２４時間分散した液にＣＴＭ（Ｉ
Ｉ−７５）をパンライトＬ−１２５０に対して７５重量
％および本発明の化合物（１）をＣＴＭに対して１０重
量％加えた。この分散液にモノクロロベンゼンを加えて
モノクロロベンゼン／ｌ、２−ジクロルエタン−３／７
（体積比）になるよう調製したものをＣＴＬ上にスプレ
ー塗布方法により厚さ５μｍのＣＧＬを形成し、積層構
成の感光体層を有する本発明の感光体１を得た。Next, 4, 10 ~ dibromo unance [! (Vl-3)/Panlight L-1250
CTM (I
I-75) was added in an amount of 75% by weight based on Panlite L-1250, and the compound (1) of the present invention was added in an amount of 10% by weight based on CTM. Monochlorobenzene was added to this dispersion and monochlorobenzene/l, 2-dichloroethane-3/7
A CGL with a thickness of 5 μm was formed on the CTL by a spray coating method to obtain a photoconductor 1 of the present invention having a laminated photoconductor layer.
比較例（１）
ＣＧ Ｌ中の化合物（１）を除いた以外は実施例１と同
様にして比較用の感光体（１）を得た。Comparative Example (1) A comparative photoreceptor (1) was obtained in the same manner as in Example 1 except that compound (1) in CG L was removed.
実施例 ２
実施例１における化合物（］）に代えて、化合物（３）
を添加した以外は実施例１と同様にして感光体２を得た
。Example 2 Compound (3) was substituted for compound (]) in Example 1.
Photoreceptor 2 was obtained in the same manner as in Example 1 except that .
実施例 ３
実施例１のＣＧＬから化合物（１）を除いた感光体（比
較例１の感光体に同じ）上に、熱硬化性アクリルメラミ
ン−エポキシ（１：Ｉ：］）樹脂１．５５重量部および
本発明の化合物（１） ０．１５５重量部をモノクロロ
ベンゼン／１，１．２−）−ジクロロエタン（１／１体
積比）混合溶媒１００重頃部中に溶解して得られた塗布
液をスプレー塗布、乾燥して１μｍ厚のＯＣＬを形成し
、本発明の感光体３を得た。Example 3 1.55 weight of thermosetting acrylic melamine-epoxy (1:I:]) resin was placed on a photoreceptor (same as the photoreceptor of Comparative Example 1) obtained by removing compound (1) from the CGL of Example 1. A coating solution obtained by dissolving 0.155 parts by weight of the compound (1) of the present invention in 100 parts by weight of a mixed solvent of monochlorobenzene/1,1.2-)-dichloroethane (1/1 volume ratio) was spray-coated and dried to form an OCL having a thickness of 1 μm, thereby obtaining a photoreceptor 3 of the present invention.
実施例 ４
実施例１のＣＧＩ−から化合物（＋）を除いた感光体１
−に、シリコンハードコート用プライマＰＨ９１（東芝
シリコン社製）を０，１μｍ厚にスプレー塗布し、更に
その上にシリコンハードコートトスガード５１０（東芝
シリコン社製）および化合物（１）を樹脂１００１ＴＴ
、州都に対して１０重量部となるよう一添加した溶液を
スプレー塗布、乾燥して１μｍ０ｃＬを形成し、本発明
の感光体４を得た。Example 4 Photoreceptor 1 obtained by removing the compound (+) from CGI- of Example 1
- Spray silicon hard coat primer PH91 (manufactured by Toshiba Silicon Co., Ltd.) to a thickness of 0.1 μm, and then apply silicon hard coat Tosguard 510 (manufactured by Toshiba Silicon Co., Ltd.) and compound (1) on top of the resin 1001TT.
A solution of 10 parts by weight relative to the state capital was spray applied and dried to form a 1 μm0 cL solution, thereby obtaining a photoreceptor 4 of the present invention.
実施例 ５
アルミニウム箔をラミネートしたポリエステルフィルム
、及びアルミニウムドラムより成る導電性支持体−にに
実施例１と全く同様の中間層を形成した。Example 5 An intermediate layer exactly the same as in Example 1 was formed on a conductive support consisting of a polyester film laminated with aluminum foil and an aluminum drum.
次いでＣＴ Ｌ用塗布液としてブチラール樹脂（エスレ
ックＢＸ−］、接水化学社製）８重量％、ＣＴＭ（ＩＸ
−７５）６重量％となるようメチルエチルケトンに溶解
して得られる溶液を前記中間層−１二に塗布、乾燥して
ｌ０７１ｍ厚のＣ’Ｉ’ Ｌを形成した。Next, as a coating liquid for CT L, 8% by weight of butyral resin (S-LEC BX-) manufactured by Suisui Kagaku Co., Ltd. and CTM (IX
-75) A solution obtained by dissolving 6% by weight in methyl ethyl ketone was coated on the intermediate layer-12 and dried to form C'I'L with a thickness of 1071 m.
次いでＣＧ Ｍ （ＩＶ−７）０．２９をペイントコン
デショナ（Ｐａｉｎｔ Ｃｏｎｄｉｔｉｏｎｅｒ、 Ｒ
ｅｄ Ｄｅｖｉ１社製）で３０分粉砕し、これにポリカ
ーボネート樹脂（パンライトＬ−１２５０、前出）を１
．２−ジクロロエタン／１，１．２−トリクロロエタン
混合溶媒に０．５重量％となるよう溶解させた溶液を８
．３ｇ加えて３分間分散した後、これにポリカーボネー
ト樹脂、ＣＴＭ （ＩＸ−７５）および化合物（１）
を、それぞれ３．３重量％、２．６重量％および０．２
６重量％となるよう１．２−ジクロロエタン／１，１．
２−トリクロロエタン混合溶媒に溶解して得られる溶液
１９．１ｇを加えて更に３００分間分散た。Next, apply CGM (IV-7) 0.29 to Paint Conditioner (R).
(manufactured by ED Devi1) for 30 minutes, and to this was added 1 portion of polycarbonate resin (Panlite L-1250, mentioned above).
．． A solution of 0.5% by weight dissolved in a mixed solvent of 2-dichloroethane/1,1,2-trichloroethane was added to 8
．． After adding 3g and dispersing for 3 minutes, polycarbonate resin, CTM (IX-75) and compound (1)
3.3% by weight, 2.6% by weight and 0.2% by weight, respectively.
1,2-dichloroethane/1,1.
19.1 g of a solution obtained by dissolving in a 2-trichloroethane mixed solvent was added, and the mixture was further dispersed for 300 minutes.
かくして得られた分散液を前記ＣＴ Ｌ−ににスプレー
塗布し、かつ乾燥して５１１Ｉ１１厚のＣＧ Ｌを形成
し、積層構成の感光体層を有する本発明の態様の感光体
５を得た。The thus obtained dispersion was spray coated on the CT L- and dried to form a CGL having a thickness of 511I11, thereby obtaining a photoreceptor 5 according to an embodiment of the present invention having photoreceptor layers having a laminated structure.
比較例 （２）
ＣＧＬ中の化合物（１）を除いた以外は実施例５と同様
にして比較用の感光体（２）を得た。Comparative Example (2) A comparative photoreceptor (2) was obtained in the same manner as in Example 5 except that compound (1) in CGL was removed.
実施例 ６
実施例５における化合物（］）に代えて、化合物（３）
を添加した以外は実施例５と同様にして本発明の感光体
６を得た。Example 6 Compound (3) was substituted for compound (]) in Example 5.
Photoreceptor 6 of the present invention was obtained in the same manner as in Example 5 except that .
実施例 ７
実施例５のＣＧＬから化合物（１）を除いた感光体（比
較例２の感光体に同じ）」二に、実施例３に用いた化合
物（１）を含有するＯ Ｃ］、を設け、本発明の感光体
７を得た。Example 7 A photoreceptor obtained by removing compound (1) from the CGL of Example 5 (same as the photoreceptor of Comparative Example 2); A photoreceptor 7 of the present invention was obtained.
＝４８一
実施例 ８
実施例５のＣＧ Ｌから化合物（１）を除いた感光体層
に、実施例７に用いた化合物（１）を含有するＯＣＬを
設け、本発明の感光体８を得た。=48-Example 8 OCL containing the compound (1) used in Example 7 was provided on the photoreceptor layer obtained by removing compound (1) from CG L of Example 5, and photoreceptor 8 of the present invention was obtained. Ta.
実施例 ９
アルミニウム箔をラミネートしたポリエステルフィルム
、及びアルミニウムドラム上に、実施例１と全く同様の
中間層を形成した。Example 9 An intermediate layer exactly the same as in Example 1 was formed on a polyester film laminated with aluminum foil and an aluminum drum.
次いで昇華した４、１０−ジブロモアンスアンスロン（
Ｖｌ−３）４０ｇを磁製ボールミルにて４Ｏｒｐｍで２
４時間粉砕し、パンライトＬ−１２５０、（前出）２０
ｇと１．２−ジクロロエタン１３００ｍ９を加え、更に
２４時間分散してＣＧ １．、用塗布液とした。これを
前記中間層」二に塗布し膜厚１μｍのＣＧ Ｌを設けた
。Then sublimed 4,10-dibromoanthrone (
Vl-3) 40g in a porcelain ball mill at 4Orpm 2
Grind for 4 hours, Panlite L-1250, (mentioned above) 20
CG and 1,300 m9 of 1,2-dichloroethane were added, and the mixture was further dispersed for 24 hours. , as a coating liquid for use. This was applied to the intermediate layer 2 to form a CGL with a thickness of 1 μm.
次いでＣＴ Ｍ （ＩＸ−６１）？、５９、パンライト
Ｌ−１２５０１０ｇおよび化合物（］ ）０．７５ｇを
、１．２−ジクロロエタン８０ｍ（２に溶解した溶液を
前記ＣＧＬに塗布して膜厚１５μｍのＣＴＬを形成し、
本発明の感光体９を作成した。Then CT M (IX-61)? , 59, a solution of 10 g of Panlite L-1250 and 0.75 g of the compound () dissolved in 80 m of 1,2-dichloroethane (2) was applied to the CGL to form a CTL with a film thickness of 15 μm,
Photoreceptor 9 of the present invention was created.
比較例 （３）
ＣＴＬ中の化合物（１）を除いた以外は実施例９と同様
にして比較用の感光体（３）を得た。Comparative Example (3) A comparative photoreceptor (3) was obtained in the same manner as in Example 9 except that compound (1) in the CTL was removed.
実施例１０
アルミニウム箔をラミネートしたポリエステルフィルム
、及びアルミニウムドラムから成る導電性支持体上に、
実施例１と全く同様の中間層を形成した。Example 10 On a conductive support consisting of a polyester film laminated with aluminum foil and an aluminum drum,
An intermediate layer exactly the same as in Example 1 was formed.
次いでＣＧＬとしてビスアゾ化合物ＣＮ −７）１．５
９を１．２−ジクロロエタン／モノエタノールアミン（
１０００／ １体積比）混合溶媒１００ｍＱ中にボール
ミルで８時間分散させた分散液を上記中間層上に塗布し
、充分乾燥して０．３９厚のＣＧＬを設けた。Then bisazo compound CN-7) 1.5 as CGL
9 to 1,2-dichloroethane/monoethanolamine (
A dispersion liquid was dispersed in 100 mQ of a mixed solvent (volume ratio: 1000/1) using a ball mill for 8 hours, and then applied onto the above intermediate layer and sufficiently dried to form a CGL having a thickness of 0.39.
次いでＣＴＭとしてスヂリル化合物（ＩＸ−４３）１１
．２５ｇ、パンライトＬ−１２５０（前出）１５ｇおよ
び化合物（１）１．２５９を１，２−ジクｒｚロエタ：
ｚ１００ｍｆｆＬ：溶解した溶液を前記ＣＧＬ上に塗布
し、充分乾燥して１５μｍ厚のＣＴＬを形成し、本発明
の感光体１ｏを作成した。Then, as a CTM, sudyryl compound (IX-43) 11
．． 25 g, Panlite L-1250 (above) 15 g and compound (1) 1.259 to 1,2-dicrzroeta:
z100mffL: The dissolved solution was applied onto the CGL and sufficiently dried to form a CTL with a thickness of 15 μm, thereby producing the photoreceptor 1o of the present invention.
比較例 （４）
ＣＴＬ中の化合物（夏）を除いた以外は、実施例１０と
同様にして比較用の感光体（４）を作成した。Comparative Example (4) A comparative photoreceptor (4) was prepared in the same manner as in Example 10, except that the compound (summer) in CTL was removed.
前記実施例試料１〜ｌＯ及び比較例試料（１）〜（４）
についてＵｖ耐性について、帯電性に対する２万回の実
写テスト及びＵＶ曝射による感度変化の定量的測定を行
った。The Example Samples 1 to 1O and Comparative Example Samples (1) to (4)
Regarding UV resistance, we conducted a 20,000-shot photo test on chargeability and quantitatively measured changes in sensitivity due to UV exposure.
帯電性実写テストＧｆ、 Ｕ−Ｂ ｉｘ ２８１２ Ｍ
Ｒ（小西六写真工業（株）製）の改造実験機に試料感光
体ドラムを装着し、正または負帯電させ、前記感光体に
対する像露光をはじめとする各工程及び定着からなる栄
位サイクルを２万回繰返し、実写テスト初期の正、負帯
電電位を±ｖ、、２万回終了後回終了後帯電電位を±ｖ
１とする。Chargeability live-action test Gf, U-B ix 2812 M
A sample photoreceptor drum was attached to a modified experimental machine of R (manufactured by Konishiroku Photo Industry Co., Ltd.), charged positively or negatively, and the photoreceptor was subjected to a eulogy cycle consisting of various steps including image exposure and fixing. Repeat 20,000 times, positive and negative charging potential at the beginning of the live-action test, ±v, after completing 20,000 times, set the charging potential at ±v after the end of the test.
Set to 1.
またＵＶ＠射による感度変化は、既知強度の紫外線を試
料フィルムを断裁した感光体シートに照射し、その照射
前後に於て、＋または一６００■に帯電させた該感光体
の電位を夫々±１００■にまで責す露光＠Ｅ？：：を用
いて求めた。Sensitivity changes due to UV radiation can be determined by irradiating ultraviolet rays of known intensity onto a photoreceptor sheet obtained by cutting a sample film, and before and after the irradiation, the potential of the photoreceptor, which has been charged to + or -600, is adjusted to ± Exposure @E that blames up to 100■? :: was used.
感光体の感度ＳはＥ ０００ ｏｃｌ ／ Ｓの関係と
して定義され、Ｅ冗：が小さいほど感度Ｓは大きく硬調
な画像かえられる。The sensitivity S of the photoreceptor is defined as the relationship E 000 ocl / S, and the smaller the E red:, the greater the sensitivity S becomes, resulting in a sharper image.
Ｕｖ曝射前後の感度を夫々Ｓｏ、Ｓ、とすれば、その逆
数比Ｒｓ；（１／ Ｓ ＋）／ （１／ Ｓ 、）”
Ｓ ｏ／ Ｓ 、はＵｖ耐性を表し、Ｒｓが大きいほど
Ｕ■耐性があることになる。If the sensitivities before and after UV irradiation are So and S, respectively, the reciprocal ratio Rs; (1/ S +) / (1/ S ,)"
S o/S represents Uv resistance, and the larger Rs is, the more U■ resistance is.
ＵＶ照射は理化学用水銀ランプＳ ＨＬ −１００Ｕ
Ｖ−２（（株）東芝製）を用い試料の感光体シートを３
０ｃｍの距離に置き他の電磁波を遮断しＵＶ強度１５０
０ｃｄ／ｍ”で１００分間照射を行い、感度測定は静電
試験機（川口電機製作所、５Ｐ−４２８型）によった。UV irradiation is done using a physical and chemical mercury lamp S HL-100U
Using V-2 (manufactured by Toshiba Corporation), the sample photoreceptor sheet was
Placed at a distance of 0cm to block other electromagnetic waves and UV intensity 150
Irradiation was performed for 100 minutes at 0 cd/m'', and sensitivity was measured using an electrostatic tester (Kawaguchi Electric Seisakusho, Model 5P-428).
これらの結果を第１表に示す。These results are shown in Table 1.
＝５２− 第１表 註：括弧を付した試料Ｎｏ、は比較試料。=52- Table 1 Note: Sample numbers in parentheses are comparative samples.
以下余白
第１表からも明らかなように、本発明の化合物を添加す
ることにより、紫外線照射下にお（Ｊるコロナ帯電での
電位低下が著しく改善される。しかも、本発明の化合物
の添加により、感度低下も殆どないことが判る。As is clear from Table 1 below, by adding the compound of the present invention, the potential drop due to corona charging under ultraviolet irradiation is significantly improved.Moreover, addition of the compound of the present invention It can be seen that there is almost no decrease in sensitivity.
第１図〜第４図は本発明の感光体の断面図である。 １・・・支持体 ２・・電荷発生層（ＣＧＬ） ３・電荷輸送層（ＣＴＬ） ４・・・感光層 ５・・・電荷発生物質（ＣＧＭ） ６・・・電荷輸送物質（ＣＴＭ） ７・・中間層 ８・保護層（ＯＣＬ） 1 to 4 are cross-sectional views of the photoreceptor of the present invention. 1...Support 2. Charge generation layer (CGL) 3. Charge transport layer (CTL) 4...Photosensitive layer 5... Charge generating material (CGM) 6...Charge transport material (CTM) 7. Middle class 8. Protective layer (OCL)
Claims (1)
でなる層を有する電子写真感光体に於て、下記一般式で
表される化合物を含有することを特徴とする電子写真感
光体。 一般式 Ｒ−Ａ−ＣＯＣＯＯＨ 〔式中、Ｒはアリール基または置換アリール基を表す。 またＡは−ＣＨ＿２−または−ＣＨ＝ＣＲ′−（Ｒ′は
水素原子又はハロゲン原子）を表す。〕[Scope of Claims] An electrophotographic photoreceptor having a layer containing a charge-generating substance and a charge-transporting substance on a conductive support, characterized by containing a compound represented by the following general formula. Electrophotographic photoreceptor. General formula RA-COCOOH [wherein R represents an aryl group or a substituted aryl group]. Further, A represents -CH_2- or -CH=CR'- (R' is a hydrogen atom or a halogen atom). ]
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30355586A JPS63153553A (en) | 1986-12-17 | 1986-12-17 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30355586A JPS63153553A (en) | 1986-12-17 | 1986-12-17 | Electrophotographic sensitive body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63153553A true JPS63153553A (en) | 1988-06-25 |
| JPH0522230B2 JPH0522230B2 (en) | 1993-03-26 |
Family
ID=17922420
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30355586A Granted JPS63153553A (en) | 1986-12-17 | 1986-12-17 | Electrophotographic sensitive body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63153553A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5278014A (en) * | 1991-06-21 | 1994-01-11 | Konica Corporation | Electrophotographic photoreceptor |
-
1986
- 1986-12-17 JP JP30355586A patent/JPS63153553A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5278014A (en) * | 1991-06-21 | 1994-01-11 | Konica Corporation | Electrophotographic photoreceptor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0522230B2 (en) | 1993-03-26 |
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