JPS6314258B2 - - Google Patents
Info
- Publication number
- JPS6314258B2 JPS6314258B2 JP57008853A JP885382A JPS6314258B2 JP S6314258 B2 JPS6314258 B2 JP S6314258B2 JP 57008853 A JP57008853 A JP 57008853A JP 885382 A JP885382 A JP 885382A JP S6314258 B2 JPS6314258 B2 JP S6314258B2
- Authority
- JP
- Japan
- Prior art keywords
- space
- air
- passage space
- clean
- main
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012423 maintenance Methods 0.000 claims description 23
- 238000004891 communication Methods 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 description 41
- 230000003749 cleanliness Effects 0.000 description 14
- 238000000034 method Methods 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 6
- 238000005286 illumination Methods 0.000 description 6
- 238000004378 air conditioning Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000004887 air purification Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000011045 prefiltration Methods 0.000 description 3
- 230000008439 repair process Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000000149 argon plasma sintering Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 238000009423 ventilation Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/163—Clean air work stations, i.e. selected areas within a space which filtered air is passed
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Ventilation (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、半導体の製品などに必要とする清浄
な作業環境を作り出すための清浄室装置（クリー
ンルーム）に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a clean room apparatus (clean room) for creating a clean working environment required for semiconductor products and the like.
従来、半導体製造工程に用いられていた清浄作
業室の代表的な例（全面ダウンフロー式クリーン
ルーム）を第１図に示す。ａは製造ラインのレイ
アウトと共に示した切断平面図、ｂは側断面図で
１は建屋、２はクリーンルーム室内、３は外部の
一般室、４はクリーンルームの出入口に設置され
たエアシヤワー、５は露光、エツチング、拡散、
CVD、メタライズ、検査等の各製造ライン用機
器、６は水、ガス等の配管類、７は高性能フイル
タ、８は照明灯、９は天井部多孔板、１０は床部
多孔板、１１は空調用給気ダクト、１２は空調用
戻りダクトであり、図中矢印で示すように高性能
フイルタ７で処理した清浄空気を天井全面より層
流状としてクリーンルーム室内２に吹き出し、床
下を通して室内空気を排出することにより、製造
ライン用機器５が設置されたクリーンルーム室内
２をほぼ一様な高清浄度（たとえばクラス100）
に維持し、全工程の作業をこの清浄雰囲気中で行
えるようにしている。
FIG. 1 shows a typical example of a clean work room (full-scale downflow clean room) conventionally used in semiconductor manufacturing processes. 1 is a building, 2 is a clean room interior, 3 is an external general room, 4 is an air shower installed at the entrance to the clean room, 5 is an exposure, etching, diffusion,
Equipment for each manufacturing line such as CVD, metallization, and inspection, 6 is water, gas, etc. piping, 7 is a high-performance filter, 8 is a lighting lamp, 9 is a ceiling perforated plate, 10 is a floor perforated plate, 11 is The air conditioning supply air duct 12 is an air conditioning return duct, and as shown by the arrow in the figure, clean air treated with a high-performance filter 7 is blown out into the clean room interior 2 in a laminar flow form from the entire ceiling, and indoor air is passed through under the floor. By discharging the air, the clean room 2 in which the production line equipment 5 is installed is kept at a substantially uniform high level of cleanliness (for example, class 100).
The entire process is maintained in this clean atmosphere.
この全面ダウンフロー式クリーンルームは室全
体の清浄度を高める上からは最良の方式とされて
いるが、清浄化区域および空調対象区域が広く、
高価な高性能フイルタを多量に使用しているた
め、設備費が非常に高い。なお清浄室の公知例と
してＵ，Ｓ，P3，570，385、Ｕ，Ｓ，P4，030，
518、Ｕ，Ｓ，P3，728，866、Ｕ，Ｓ，P3，638，
404、特開昭53−82039、実公昭55−14990号公報
記載のものがあるが、いずれも全面ダウンフロー
式クリーンルームである。 This full-scale downflow clean room is considered the best method for increasing the cleanliness of the entire room, but the cleaning area and air conditioning area are large,
Equipment costs are extremely high because a large amount of expensive high-performance filters are used. Known examples of clean rooms include U, S, P3, 570, 385, U, S, P4, 030,
518, U, S, P3, 728, 866, U, S, P3, 638,
404, JP-A-53-82039, and Utility Model Publication No. 55-14990, all of which are full-scale downflow clean rooms.
なお、他に関連するものとして昭和56年10月20
日株式会社オーム社発行の財団法人日本空気清浄
協会編「空気清浄ハンドブツク」476頁〜479頁が
挙げられるが、これには清浄室内の清浄度の維
持、保守作業の容易性、および清浄室内での作業
性の点については開示されていない。 In addition, as a related matter, October 20, 1982
"Air Purification Handbook" edited by the Japan Air Cleaning Association, published by Ohmsha Co., Ltd., pages 476 to 479, contains information on maintaining cleanliness in clean rooms, ease of maintenance work, and There is no disclosure regarding workability.
本発明の目的は保守時の作業性に優れ、しかも
主通路および枝通路への外気からの汚染空気の侵
入を防止して清浄度の維持を図れるとともに、主
通路から枝通路への出入りが容易で作業性に優れ
た清浄室装置を提供することにある。
The purpose of the present invention is to provide excellent workability during maintenance, to maintain cleanliness by preventing contaminated air from entering the main passage and branch passages from outside, and to facilitate entry and exit from the main passage to the branch passages. The purpose of the present invention is to provide a clean room device with excellent workability.
本発明は清浄室装置を、主通路空間１５と、該
主通路空間１５から側方に略直角方向に延びて分
岐した複数本の枝通路空間７３と、前記主通路空
間１５の天井部に配設されて前記主通路空間１５
に対して上方より清浄空気を供給するよう構成さ
れた第１の空気浄化手段１３と、前記枝通路空間
７３の内部に設けられて互いに並行して延びる作
業空間１６および通路空間１７と、前記枝通路空
間７３の天井部に配設されて前記作業空間１６と
前記通路空間１７とに清浄空気を供給するよう構
成された第２の空気浄化手段１４とを備えてお
り、前記枝通路空間７３の前記主通路空間１５の
側面への接続部が常時開口した連通部８０によつ
て連通されており、さらに前記主通路空間１５の
側方に設けられて前記枝通路空間７３の外側面を
囲むよう形成された保全域１８を備えてなるよう
に構成したことを特徴とする。
The present invention provides a clean room device disposed in a main passage space 15, a plurality of branch passage spaces 73 extending laterally from the main passage space 15 in a substantially right angle direction and branching off, and a ceiling portion of the main passage space 15. The main passage space 15 is provided with
a first air purifying means 13 configured to supply clean air from above to the branch passage space 73; a work space 16 and a passage space 17 provided inside the branch passage space 73 and extending in parallel to each other; A second air purifying means 14 is provided on the ceiling of the passageway space 73 and configured to supply clean air to the work space 16 and the passageway space 17. A connection part to the side surface of the main passage space 15 is communicated with a communication part 80 which is always open, and a communication part 80 is provided on the side of the main passage space 15 so as to surround the outer surface of the branch passage space 73. It is characterized in that it is configured to include a formed conservation area 18.
以下、本発明の実施例を図面を参照して説明す
る。
Embodiments of the present invention will be described below with reference to the drawings.
第２図は本発明を半導体製造工程に適用した一
実施例の切断平面図、第３図ａ，ｂはそれぞれ第
２図のＡ―Ａ線およびＢ―Ｂ線にそつた側断面図
であり、第１図と同一符号は対応する部分を示し
ている。第２，３図において、１３は主通路空間
１５を覆うよう建屋１内に設置された主通路用ユ
ニツト、１４は主通路空間１５の両側に略直角方
向に分岐して設けられる枝通路空間７３を覆うよ
う主通路用ユニツト１３に接続された製造ライン
用ユニツトである。主通路用ユニツト１３は、主
通路空間として用いる主空間１５を形成してお
り、これは第５図に示すように天板２５、両第１
側板２４、両第１端板７１、開閉口としての扉７
２及びエアーシヤワー装置４で主空間１５をトン
ネル状に覆い構成してある。詳しくは後で述べる
ように主通路用ユニツト１３はその天井部に第１
の空気浄化手段１５ａを内蔵して、主空間１５内
に天井面から清浄空気を吹き出す機能を有してい
る。また、製造ライン用ユニツト１４は、製造ラ
イン毎に設けられ、製造ライン用機器５を設置す
る作業空間としての第２帯域１６と、これに並行
して延びる通路空間としての第１帯域１７とより
なり、枝通路空間を形成する枝空間７３を覆うよ
う設けられる。枝通路空間の主通路空間への接続
部分は常時開口した連通部８０によつて連通さ
れ、この連通部８０を介して主通路空間と枝通路
空間の出入りが自由に行なえるよう構成される。
枝空間７３は、第６図に示すように天板３７、両
第２側板３６及び第２端板１９で枝空間７３をト
ンネル状に覆い、構成してある。製造ライン用ユ
ニツト１４は詳しくは後で述べるようにその天井
部に第２の空気浄化手段７３ａを内蔵して、第２
帯域１６と第１帯域１７にそれぞれの天井面から
清浄空気を吹き出し、清浄化する機能を有してお
り、この製造ライン用ユニツト１４の空気吸込み
口に空調用給気ダクト１１を接続することにより
製造ライン別の空調温度制御を可能にしている。
隣り合つた製造ライン用ユニツト１４の間および
製造ライン用ユニツト１４と建家１の壁面との間
には保全域としての保全用スペース１８が設けら
れている。第２端板１９には図示してないが扉が
ついておりユニツト１４で覆われた室内と保全用
スペース１８内とを往復できるようになつてい
る。また、主通路用ユニツト１３の両端は建家１
の壁面で仕切り、一般室３から主空間１５へはエ
アシヤワー装置４を通つて出入させる。 FIG. 2 is a cutaway plan view of an embodiment in which the present invention is applied to a semiconductor manufacturing process, and FIGS. 3a and 3b are side sectional views taken along line A-A and line B-B in FIG. 2, respectively. , the same symbols as in FIG. 1 indicate corresponding parts. In FIGS. 2 and 3, 13 is a main passage unit installed in the building 1 so as to cover the main passage space 15, and 14 is a branch passage space 73 that is provided on both sides of the main passage space 15 by branching approximately at right angles. This is a manufacturing line unit connected to the main passage unit 13 so as to cover the main passage unit 13. The main passage unit 13 forms a main space 15 used as a main passage space, and as shown in FIG.
Side plate 24, both first end plates 71, door 7 as an opening/closing opening
2 and the air shower device 4 cover the main space 15 in the form of a tunnel. As will be described in detail later, the main passage unit 13 has a first
It has a built-in air purifying means 15a and has a function of blowing clean air into the main space 15 from the ceiling surface. Furthermore, the manufacturing line unit 14 is provided for each manufacturing line, and includes a second zone 16 as a work space in which the manufacturing line equipment 5 is installed, and a first zone 17 as a passage space extending in parallel thereto. It is provided so as to cover the branch space 73 forming the branch passage space. The connecting portion of the branch passage space to the main passage space is communicated by a communication part 80 which is always open, and the main passage space and the branch passage space can be freely entered and exited via this communication part 80.
The branch space 73 is constructed by covering the branch space 73 in a tunnel shape with the top plate 37, both second side plates 36, and the second end plate 19, as shown in FIG. As will be described in detail later, the production line unit 14 has a second air purifying means 73a built-in in its ceiling,
The zone 16 and the first zone 17 have the function of blowing clean air from the respective ceiling surfaces to purify them, and by connecting the air conditioning air supply duct 11 to the air intake port of the manufacturing line unit 14 This enables air conditioning temperature control for each production line.
A maintenance space 18 as a maintenance area is provided between adjacent production line units 14 and between the production line units 14 and the wall surface of the building 1. The second end plate 19 has a door (not shown) so that it can be moved back and forth between the room covered by the unit 14 and the maintenance space 18. In addition, both ends of the main passage unit 13 are connected to the building 1.
The main space 15 is entered and exited from the general room 3 through an air shower device 4.
保全用スペース１８と一般室３との間には扉２
０を設け、保全用スペース１８には清浄室内を通
過せずに一般室３から出入りできるようにしてい
る。製造ライン用ユニツト１４の天井面から吹き
出した清浄空気は第２帯域１６および第１帯域１
７を下向に流れ、製造ライン用ユニツト１４の第
２側板３６の下部に設けられた流出口２１から排
出される。同様に、主通路用ユニツト１３の天井
面から吹き出した清浄空気も主空間１５内を下向
に流れ、主通路用ユニツト１３の第１側板２４の
下部に設けられた流出口３３から排出される。し
たがつて、保全用スペース１８は主通路ユニツト
１３と製造ライン用ユニツト１４から排出される
清浄空気によつてある程度清浄化されるが、ユニ
ツト１３，１４で覆われた室内よりは清浄度が低
い。製造ラインで使用する水、ガス等の配管類や
電線等の動力伝達手段６は保全用スペース１８に
設置され、製造ライン用ユニツト１４の流出口２
１を通して製造ライン用機器５へ引き込まれる。
こうすることによつて、配管類や電線等のメンテ
ナンスは保全用スペース１８で行うことができ
る。また、製造ライン用ユニツト１４の第２側板
３６を部分的に取りはずすことによつて製造ライ
ン用機器５の補修もそのほとんどが保全用スペー
ス１８から行なえる。しかも、前述のよう保全用
スペース１８には清浄室内を通過せずに一般室３
から出入りできるので、メンテナンス作業による
発塵が他の製造ラインに影響を及ぼすことはほと
んどない。また、ある工程の製造装置一式を補修
するような場合にも、その工程の清浄室内でのみ
処理でき、他の製造ラインへの影響を防止でき
る。 There is a door 2 between the maintenance space 18 and the general room 3.
0 is provided so that the maintenance space 18 can be accessed from the general room 3 without passing through the clean room. The clean air blown from the ceiling of the manufacturing line unit 14 is distributed to the second zone 16 and the first zone 1.
7 and is discharged from the outlet 21 provided at the bottom of the second side plate 36 of the manufacturing line unit 14. Similarly, the clean air blown from the ceiling surface of the main passage unit 13 also flows downward in the main space 15 and is discharged from the outlet 33 provided at the lower part of the first side plate 24 of the main passage unit 13. . Therefore, although the maintenance space 18 is purified to some extent by the clean air discharged from the main passage unit 13 and the production line unit 14, the level of cleanliness is lower than that of the room covered by the units 13 and 14. . Power transmission means 6 such as water and gas piping and electric wires used in the production line are installed in the maintenance space 18, and are connected to the outlet 2 of the production line unit 14.
1 to the production line equipment 5.
By doing so, maintenance of piping, electric wires, etc. can be performed in the maintenance space 18. Further, by partially removing the second side plate 36 of the production line unit 14, most of the repairs to the production line equipment 5 can be performed from the maintenance space 18. Moreover, as mentioned above, the maintenance space 18 can be accessed from the general room 3 without passing through the clean room.
Dust generated from maintenance work rarely affects other production lines. Furthermore, even when a set of manufacturing equipment for a certain process is to be repaired, the repair can be carried out only within the clean room of that process, thereby preventing any influence on other manufacturing lines.
半導体、IC等の製造工程は第４図にその一例
を示すように、拡散、露光、エツチング、CVD、
メタライズ等の諸工程をランダムにくり返して行
なわれる。そのため、第２図に示すように主空間
１５の両側に枝状に製造ライン用ユニツト１４を
配し、各工程別にレイアウトを組めば、主空間１
５を通じて次の工程へ最短距離で製品の移送がで
き、非常に便利が良い。しかし、建家の制約など
で主空間１５の片側にしか製造ライン用ユニツト
を配置できない場合でも、後述する本発明の効果
は十分ある。 The manufacturing process for semiconductors, ICs, etc. includes diffusion, exposure, etching, CVD, etc., as shown in Figure 4.
Processes such as metallization are repeated randomly. Therefore, as shown in FIG. 2, if the manufacturing line units 14 are arranged branch-like on both sides of the main space 15 and the layout is set up for each process, the main space 15
5, the product can be transferred to the next process in the shortest distance, which is very convenient. However, even if the manufacturing line unit can only be placed on one side of the main space 15 due to building restrictions, the effects of the present invention, which will be described later, are still sufficient.
次に、主通路用ユニツト１３、製品ライン用ユ
ニツト１４の具体的構成について説明する。 Next, the specific configurations of the main passage unit 13 and the product line unit 14 will be explained.
第５図は主通路用ユニツト１３の長手方向に直
角な断面を示す。この図に示すように、支柱２２
と横梁２３とで門形フレームを組み、これに両側
の第１側板２４と天板２５を張つて主空間１５を
覆う覆いを構成し、主通路用清浄空気吹出し口１
００と天板２５との間に第１の空気浄化手段１５
ａを構成する送風機２６、送風チヤンバ２７、高
性能フイルタ２８それに主通路照明灯２９を収納
する。３０は照明灯２９の下に設置した格子状の
散光板である。主空間１５の空気吹出し口高さは
作業者が立つて通行できる程度の高さ（たとえば
2200mm）とする。 FIG. 5 shows a section of the main passage unit 13 perpendicular to the longitudinal direction. As shown in this figure, the pillar 22
A gate-shaped frame is assembled with the cross beams 23 and the first side plates 24 and the top plate 25 on both sides to form a cover that covers the main space 15, and the clean air outlet 1 for the main passage.
00 and the top plate 25, the first air purifying means 15
A blower 26, a blower chamber 27, a high-performance filter 28, and a main passage illumination light 29 are housed. 30 is a lattice-shaped light scattering plate installed under the illumination light 29. The height of the air outlet in the main space 15 is such that a worker can stand and pass through it (for example,
2200mm).
送風機２６の運転により、外部空気はプレフイ
ルタ３２を通して空気吸込み口３１から吸込まれ
る。送風機２６から送り出された空気は送風チヤ
ンバ２７を通つて高性能フイルタ２８により清浄
化された後、天井面の清浄空気吹出し口１００か
ら0.2m／ｓ程度の風速で主空間１５へ下向に吹
き出す。図中の矢印はこの空気の流れを示してい
る。散光板３０は、照明の散光と清浄気流の整流
のために設けられたものである。主空間１５内に
吹き出した清浄気流は図の矢印で示すように流れ
て、第１側板２４の下部に設けた流出口３３から
外部へ排出され、流出口３３での圧力損失分だ
け、主空間１５内は保全スペース１８に対して正
圧となる。これによつて、主空間１５内は製造ラ
イン間の製品の移送および作業者の通行中の汚染
防止に必要な清浄度に維持される。この主通路用
ユニツト１３は、製造ライン用ユニツト１４およ
びエアシヤワー装置４との接続口に当る部分のみ
第１側板２４を取り除き開放されている。 By operating the blower 26, external air is drawn through the prefilter 32 from the air suction port 31. The air sent out from the blower 26 passes through the blow chamber 27 and is purified by the high-performance filter 28, and then is blown downward into the main space 15 from the clean air outlet 100 on the ceiling at a wind speed of about 0.2 m/s. . The arrows in the figure indicate this air flow. The light scattering plate 30 is provided for scattering illumination and rectifying clean air. The clean airflow blown into the main space 15 flows as shown by the arrow in the figure and is discharged to the outside from the outlet 33 provided at the bottom of the first side plate 24. 15 has a positive pressure relative to the maintenance space 18. As a result, the interior of the main space 15 is maintained at a level of cleanliness necessary to prevent contamination during the transfer of products between manufacturing lines and during the passage of workers. This main passage unit 13 is opened by removing the first side plate 24 only at the portion corresponding to the connection port with the production line unit 14 and the air shower device 4.
第６〜８図は製造ライン用ユニツトの一例を示
す図で、第６図は長手方向に直角な断面図、第７
図はその要部拡大図、第８図は外観を示す斜視図
である。第６図において、製造ライン要機器５は
向い合せに配列され、２ラインを１組としてい
る。支柱３４と横梁３５とで門形フレームを組
み、これに両側の第２側板３６と天板３７を張つ
て製造ライン部を覆う覆いを構成し、この覆いと
それを設置する床面とで囲まれた清浄室内に製造
ライン用機器５を設置する第２帯域１６と作業者
が通行する第１帯域１７を第２側板３６と平行に
設ける。１０１，１０２はそれぞれ作業用清浄空
気吹出し口および通路部用清浄空気吹出し口であ
る。作業部用清浄空気吹出し口１０１と天板３７
との間には第２の空気浄化手段７３ａを構成する
送風機４０，４１、送風チヤンバ４２，４３、高
性能フイルタ４４，４５それに作業部照明灯４６
を収納し、照明灯４６の下に格子状の作業部用散
光板３８を設置する。これらの機材は図示しない
支持部材を介して横梁３５から吊り下げ支持され
ている。４７は空気吸込み口、４８はプレフイル
タ、４９は作業部用清浄空気吹出し口１０１と通
路部用清浄空気吹出し口１０２との間の仕切用化
粧板である。通路部用清浄空気吹出し口１０２と
天板３７との間には空気通路５０を設けて、通路
部照明灯５１を収納し、その下に格子状の通路部
用散光板３９を設置する。通路部１７の空気吹出
し口高さは作業者が立つて通行できる程度に高く
し、作業部１６の空気吹出し口高さは作業に支障
がない限り低くする（一例を示せば、通路部空気
吹出し口高さ2200mm、作業部空気吹出し口高さ
1800mm）。作業部空気吹出し口高さはできるだけ
低くした方が、作業部空間の気流の乱れが少な
く、清浄度保持性能が良くなるからである。 Figures 6 to 8 are views showing an example of a unit for a production line, with Figure 6 being a sectional view perpendicular to the longitudinal direction, and Figure 7
The figure is an enlarged view of the main part, and FIG. 8 is a perspective view showing the external appearance. In FIG. 6, the production line equipment 5 is arranged facing each other, and two lines form one set. A gate-shaped frame is assembled with the pillars 34 and the cross beams 35, and a second side plate 36 and a top plate 37 on both sides are attached to this to form a cover that covers the production line section, and is surrounded by this cover and the floor surface on which it is installed. A second zone 16 in which manufacturing line equipment 5 is installed and a first zone 17 through which workers pass are provided in parallel to the second side plate 36 in the clean room. 101 and 102 are a working clean air outlet and a passage part clean air outlet, respectively. Clean air outlet 101 and top plate 37 for working area
Air blowers 40, 41, air chambers 42, 43, high performance filters 44, 45, and work area lighting 46, which constitute the second air purifying means 73a, are installed between the
is housed, and a lattice-shaped work section light diffusion plate 38 is installed below the illumination light 46. These equipments are suspended and supported from the cross beam 35 via support members (not shown). 47 is an air intake port, 48 is a prefilter, and 49 is a decorative plate for partitioning between the clean air outlet 101 for the working section and the clean air outlet 102 for the passage section. An air passage 50 is provided between the clean air outlet 102 for the passage and the top plate 37, and a passage illumination lamp 51 is housed therein, and a lattice-shaped passage diffusion plate 39 is installed below it. The height of the air outlet in the passage section 17 is set high enough for workers to stand and pass through, and the height of the air outlet in the working section 16 is set low as long as it does not hinder work (for example, the height of the air outlet in the passage section Mouth height 2200mm, working part air outlet height
1800mm). This is because the lower the height of the air outlet in the working part, the less turbulence in the airflow in the working part space and the better the cleanliness maintenance performance.
送風機４０，４１の運転により、外部空気はプ
レフイルタ４８を通して空気吸込み口４７から吸
込まれる。作業部用送風機４０から送り出された
空気は送風チヤンバ４２を通つて作業部用高性能
フイルタ４４により清浄化された後、作業部用清
浄空気吹出し口１０１から室内の第２帯域１６へ
下向きに吹き出し、一方、通路部用送風機４１か
ら送り出された空気は送風チヤンバ４３を通つて
通路部用高性能フイルタ４５により清浄化された
後、空気通路５０へ入り、通路部用清浄空気吹出
し口１０２から室内の第１帯域１７へ下向に吹き
出す。図中の矢印はこの空気の流れを示してい
る。散光板３８，３９は第５図の散光板３０と同
様に照明の散光と清浄気流の整流のために設けた
ものであり、第７図の５２は第１帯域１７の風速
分布を調整するためのパンチング板である。清浄
気流の風速は、たとえば第２帯域１６で0.4m／
ｓ、第１帯域１７で0.2m／ｓというように、各
部の心要清浄度に応じて設定する。こうすること
によつて、第２帯域１６の清浄度を第１帯域１７
の清浄度よりも高くすることができる。 By operating the blowers 40 and 41, external air is sucked in from the air suction port 47 through the prefilter 48. The air sent out from the working area blower 40 passes through the ventilation chamber 42 and is purified by the working area high performance filter 44, and then is blown downward from the working area clean air outlet 101 into the second zone 16 in the room. On the other hand, the air sent out from the passage blower 41 passes through the ventilation chamber 43 and is purified by the passage high-performance filter 45, then enters the air passage 50 and is discharged indoors from the passage clean air outlet 102. It blows out downward into the first zone 17 of The arrows in the figure indicate this air flow. Diffusion plates 38 and 39 are provided for scattering illumination and rectifying clean airflow, similar to the diffusion plate 30 in FIG. 5, and 52 in FIG. 7 is for adjusting the wind speed distribution in the first zone 17. This is a punching board. The wind speed of the clean airflow is, for example, 0.4 m/m in the second zone 16.
s and 0.2 m/s in the first zone 17, depending on the required cleanliness of each part. By doing this, the cleanliness of the second zone 16 can be increased to the level of cleanliness of the first zone 17.
The cleanliness level can be higher than that of
室内に吹き出された清浄気流は図の矢印で示す
ように流れ、第２側板３６の下部に設けられた流
出口２１から外部へ排出される。室内圧力は流出
口２１での圧力損失分だけ保全スペース１８に対
し正圧となるので、室外からの汚染空気の流入を
防止できる。また、本実施例では保全スペース１
８が枝空間７３の外周面を囲むよう設けられてい
るので外部の汚染空気が枝空間７３に侵入するの
を防止できる。 The clean airflow blown into the room flows as shown by the arrow in the figure, and is discharged to the outside from the outlet 21 provided at the lower part of the second side plate 36. Since the indoor pressure becomes positive with respect to the conservation space 18 by the amount of pressure loss at the outlet 21, it is possible to prevent contaminated air from entering the room. In addition, in this embodiment, the conservation space 1
8 surrounding the outer peripheral surface of the branch space 73, it is possible to prevent contaminated air from outside from entering the branch space 73.
主通路空間と枝通路空間の接続部は、本実施例
においては、主通路用ユニツト１３の第１側板２
４を取り除いて開放することにより常時開口した
連通部８０を形成している。これにより第４図に
示されるような各枝通路空間への出入りが頻繁に
行なわれるような工程であつても出入りの度に扉
の開閉を行なう必要がなく作業性が向上するとと
もに、扉の開閉に伴う気流の乱れや圧力の変動を
防止できて室内の清浄度を維持できる。 In this embodiment, the connecting portion between the main passage space and the branch passage space is connected to the first side plate 2 of the main passage unit 13.
By removing 4 and opening it, a communication part 80 which is always open is formed. As a result, even in processes where entry and exit to each branch passage space are frequently performed as shown in Fig. 4, there is no need to open and close the door each time entry and exit is performed, improving work efficiency and improving the workability of the door. It is possible to maintain the cleanliness of the room by preventing airflow turbulence and pressure fluctuations caused by opening and closing.
流出口２１は、製造ライン用機器５への水、ガ
ス等の配管や電線類の引き込みにも利用される。
第２側板３６は、配管や機器の補修などのため、
ねじ止めあるいは引掛金具などを用いて部分的に
取りはずせるようにしておく。また、室内の作業
環境の改善と外部からの作業管理の必要上、第２
側板３６の一部を透明板とすることがある。 The outlet 21 is also used to lead in piping for water, gas, etc. and electric wires to the production line equipment 5.
The second side plate 36 is used for repairing piping and equipment, etc.
Use screws or hooks to allow partial removal. In addition, due to the need to improve the indoor work environment and manage work from outside, a second
A part of the side plate 36 may be a transparent plate.
第８図にはモジユール化した覆いを多数連結し
てなる本実施例による製造ライン用ユニツトの外
観を示す。 FIG. 8 shows the appearance of a manufacturing line unit according to this embodiment, which is constructed by connecting a large number of modular covers.
第６〜８図には室内空気を第１，第２側板の下
部に設けた流出口から流出させる例を示したが、
第１図の従来方式と同様に清浄室の床部に多孔板
を用いて、室内空気の一部または全部を床下より
流出させるようにすれば、室内の清浄気流が完全
な下向流となり、作業部である第２帯域１６の清
浄度をさらに高めることができる。 Figures 6 to 8 show an example in which indoor air flows out from the outlet provided at the bottom of the first and second side plates.
Similar to the conventional method shown in Figure 1, if a perforated plate is used on the floor of the clean room to allow some or all of the room air to flow out from under the floor, the clean air flow inside the room will become a complete downward flow. The cleanliness of the second zone 16, which is the working section, can be further improved.
本発明によれば枝通路空間の外周面を囲むよう
形成された保全域を設けることにより、清浄室内
を通過することなく一般室から保全域に直接出入
りできるとともに配管類や電線等のメンテナンス
および作業用機器の補修を保全域で行なうことが
できて保守時の作業性に優れ、しかも、メンテナ
ンス作業による発塵の他の製造ラインへの影響を
防止できる。また、枝通路空間の外周面が保全域
により囲まれているので枝通路空間への外気から
の汚染空気の侵入を防止して有効に清浄度の維持
を図ることができる。さらに、主通路空間と枝通
路空間との接続部に常時開口した連通部を形成す
ることにより枝通路空間への出入りが容易で清浄
室内での作業性にも優れた清浄室装置を得ること
ができる。
According to the present invention, by providing a maintenance area formed to surround the outer peripheral surface of the branch passage space, it is possible to directly enter and exit the maintenance area from the general room without passing through the clean room, and also to perform maintenance and work on piping, electric wires, etc. It is possible to repair equipment in the maintenance area, which improves workability during maintenance, and prevents dust from being generated due to maintenance work from affecting other production lines. Further, since the outer peripheral surface of the branch passage space is surrounded by the conservation area, it is possible to prevent contaminated air from entering the branch passage space from outside, thereby effectively maintaining cleanliness. Furthermore, by forming a communication section that is always open at the connection between the main passage space and the branch passage space, it is possible to obtain a clean room device that allows easy access to and from the branch passage space and has excellent workability in the clean room. can.
第１図は先行技術である全面ダウンフロー式ク
リーンルームのレイアウトの一例を示す図で、ａ
は切断平面図、ｂは側断面図、第２図は本発明に
よる清浄室装置のレイアウトの一例を示す切断平
面図、第３図ａ，ｂはそれぞれ第２図のＡ―Ａ線
およびＢ―Ｂ線にそつた側断面図、第４図は参考
のために示した半導体ICの製造工程図、第５図
は主通路用ユニツトの具体的構成を示す長手方向
に直角な断面図、第６図は製造ライン用ユニツト
の具体的構成を示す長手方向に直角な断面図、第
７図はその要部拡大図、第８図は製造ライン用ユ
ニツトの外観を示す斜視図である。
４：開閉口の一例としてのエアーシヤワー装
置、５：製造ライン用機器、６：動力伝達手段、
１３：主通路用ユニツト、４：製造ライン用ユニ
ツト、１５：主通路空間、１５ａ：第１の空気浄
化手段、１６：作業空間、１７：通路空間、１
８：保全域、１９：第２端板、２０：保全用スペ
ースの出入り用扉、２１，３３：流出口、２４，
３６：第１及び第２側板、２５，３７：天板、２
６，４０，４１：送風機、２８，４４，４５：高
性能フイルタ、７１：第１端板、７２：開閉口と
しての扉、７３：枝通路空間、７３ａ：第２の空
気浄化手段、８０：連通部、１００：主通路用清
浄空気吹出し口、１０１：作業部用清浄空気吹出
し口、１０２：通路部用清浄空気吹出し口。
Figure 1 is a diagram showing an example of the layout of a full-scale downflow type clean room, which is the prior art.
is a cutaway plan view, b is a side sectional view, FIG. 2 is a cutaway plan view showing an example of the layout of the clean room apparatus according to the present invention, and FIGS. 3a and 3b are lines AA and B- in FIG. 2, respectively. 4 is a manufacturing process diagram of the semiconductor IC shown for reference; FIG. 5 is a sectional view perpendicular to the longitudinal direction showing the specific configuration of the main path unit; and FIG. The figure is a sectional view perpendicular to the longitudinal direction showing the specific structure of the manufacturing line unit, FIG. 7 is an enlarged view of the main part thereof, and FIG. 8 is a perspective view showing the appearance of the manufacturing line unit. 4: Air shower device as an example of opening/closing port, 5: Production line equipment, 6: Power transmission means,
13: Main passage unit, 4: Production line unit, 15: Main passage space, 15a: First air purification means, 16: Work space, 17: Passage space, 1
8: Conservation area, 19: Second end plate, 20: Door for entrance and exit of conservation space, 21, 33: Outlet, 24,
36: First and second side plates, 25, 37: Top plate, 2
6, 40, 41: Blower, 28, 44, 45: High performance filter, 71: First end plate, 72: Door as opening/closing opening, 73: Branch passage space, 73a: Second air purification means, 80: Communication part, 100: Clean air outlet for main passage, 101: Clean air outlet for working part, 102: Clean air outlet for passage.
Claims (1)
方に略直角方向に延びて分岐した複数本の枝通路
空間７３と、前記主通路空間１５の天井部に配設
されて前記主通路空間１５に対して上方より清浄
空気を供給するよう構成された第１の空気浄化手
段１５ａと、前記枝通路空間７３の内部に設けら
れて互いに並行して延びる作業空間１６および通
路空間１７と、前記枝通路空間７３の天井部に配
設されて前記作業空間１６と前記通路空間１７と
に清浄空気を供給するよう構成された第２の空気
浄化手段７３ａとを備えており、前記枝通路空間
７３の前記主通路空間１５の側面への接続部が常
時開口した連通部８０によつて連通されており、
さらに前記主通路空間１５の側方に設けられて前
記枝通路空間７３の外側面を囲むよう形成された
保全域１８を備えてなることを特徴とする清浄室
装置。 ２ 前記保全域１８は少なくとも前記枝通路空間
７３の外側面を囲む部分が連続するよう形成され
てなることを特徴とする特許請求の範囲第１項記
載の清浄室装置。[Scope of Claims] 1. A main passage space 15, a plurality of branch passage spaces 73 that extend laterally from the main passage space 15 in a substantially perpendicular direction and branch off, and a plurality of branch passage spaces 73 arranged on the ceiling of the main passage space 15. a first air purifying means 15a configured to supply clean air to the main passage space 15 from above; a work space 16 provided inside the branch passage space 73 and extending parallel to each other; It includes a passage space 17 and a second air purifying means 73a arranged on the ceiling of the branch passage space 73 and configured to supply clean air to the work space 16 and the passage space 17. , a connection part of the branch passage space 73 to the side surface of the main passage space 15 is communicated with a communication part 80 that is always open;
A clean room apparatus further comprising a maintenance area 18 provided on the side of the main passage space 15 and formed to surround the outer surface of the branch passage space 73. 2. The clean room apparatus according to claim 1, wherein the conservation area 18 is formed so that at least a portion surrounding the outer surface of the branch passage space 73 is continuous.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57008853A JPS58127035A (en) | 1982-01-25 | 1982-01-25 | Clean working room |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57008853A JPS58127035A (en) | 1982-01-25 | 1982-01-25 | Clean working room |
Related Child Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11999384A Division JPS6036837A (en) | 1984-06-13 | 1984-06-13 | Cleaned chamber device |
| JP5641489A Division JPH01273942A (en) | 1989-03-10 | 1989-03-10 | Clean room device |
| JP5641389A Division JPH01273941A (en) | 1989-03-10 | 1989-03-10 | Clean room device |
| JP22262090A Division JPH03230039A (en) | 1990-08-27 | 1990-08-27 | Purifying chamber device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58127035A JPS58127035A (en) | 1983-07-28 |
| JPS6314258B2 true JPS6314258B2 (en) | 1988-03-30 |
Family
ID=11704287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57008853A Granted JPS58127035A (en) | 1982-01-25 | 1982-01-25 | Clean working room |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58127035A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2578455B1 (en) * | 1985-03-08 | 1987-05-07 | Lami Philippe | ASSEMBLY FOR RETURNING INITIAL CLEANLINESS CONDITIONS IN A QUARTZ TUBE USED AS A REACTION CHAMBER FOR THE MANUFACTURE OF INTEGRATED CIRCUITS |
| JPS6263633U (en) * | 1985-10-14 | 1987-04-20 | ||
| US20010039715A1 (en) * | 1999-11-02 | 2001-11-15 | Pommer | Substrate manufacturing plant having minimum footprint skinned lines |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56162335A (en) * | 1980-05-16 | 1981-12-14 | Hitachi Ltd | Air conditioner |
-
1982
- 1982-01-25 JP JP57008853A patent/JPS58127035A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56162335A (en) * | 1980-05-16 | 1981-12-14 | Hitachi Ltd | Air conditioner |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58127035A (en) | 1983-07-28 |
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