JPS6232783B2 - - Google Patents

Info

Publication number
JPS6232783B2
JPS6232783B2 JP11710679A JP11710679A JPS6232783B2 JP S6232783 B2 JPS6232783 B2 JP S6232783B2 JP 11710679 A JP11710679 A JP 11710679A JP 11710679 A JP11710679 A JP 11710679A JP S6232783 B2 JPS6232783 B2 JP S6232783B2
Authority
JP
Japan
Prior art keywords
pattern
patterns
dimensions
mask
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11710679A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5640242A (en
Inventor
Mototsugu Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP11710679A priority Critical patent/JPS5640242A/ja
Publication of JPS5640242A publication Critical patent/JPS5640242A/ja
Publication of JPS6232783B2 publication Critical patent/JPS6232783B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11710679A 1979-09-11 1979-09-11 Mask for semiconductor device Granted JPS5640242A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11710679A JPS5640242A (en) 1979-09-11 1979-09-11 Mask for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11710679A JPS5640242A (en) 1979-09-11 1979-09-11 Mask for semiconductor device

Publications (2)

Publication Number Publication Date
JPS5640242A JPS5640242A (en) 1981-04-16
JPS6232783B2 true JPS6232783B2 (zh) 1987-07-16

Family

ID=14703542

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11710679A Granted JPS5640242A (en) 1979-09-11 1979-09-11 Mask for semiconductor device

Country Status (1)

Country Link
JP (1) JPS5640242A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5960439A (ja) * 1982-09-30 1984-04-06 Fujitsu Ltd フオト・マスク
JPS59143159A (ja) * 1983-02-07 1984-08-16 Mitsubishi Electric Corp 写真製版技術におけるパタ−ン重ね合わせ方法
JPS60202933A (ja) * 1984-03-16 1985-10-14 Fujitsu Ltd レチクルの検査方法
JPH07111953B2 (ja) * 1988-12-13 1995-11-29 富士通株式会社 ホトリソグラフィのパターン寸法管理方法

Also Published As

Publication number Publication date
JPS5640242A (en) 1981-04-16

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