JPS6232783B2 - - Google Patents
Info
- Publication number
- JPS6232783B2 JPS6232783B2 JP11710679A JP11710679A JPS6232783B2 JP S6232783 B2 JPS6232783 B2 JP S6232783B2 JP 11710679 A JP11710679 A JP 11710679A JP 11710679 A JP11710679 A JP 11710679A JP S6232783 B2 JPS6232783 B2 JP S6232783B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- patterns
- dimensions
- mask
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 18
- 238000001259 photo etching Methods 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 claims description 5
- 235000012431 wafers Nutrition 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000011179 visual inspection Methods 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/44—Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11710679A JPS5640242A (en) | 1979-09-11 | 1979-09-11 | Mask for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11710679A JPS5640242A (en) | 1979-09-11 | 1979-09-11 | Mask for semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5640242A JPS5640242A (en) | 1981-04-16 |
JPS6232783B2 true JPS6232783B2 (de) | 1987-07-16 |
Family
ID=14703542
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11710679A Granted JPS5640242A (en) | 1979-09-11 | 1979-09-11 | Mask for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5640242A (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5960439A (ja) * | 1982-09-30 | 1984-04-06 | Fujitsu Ltd | フオト・マスク |
JPS59143159A (ja) * | 1983-02-07 | 1984-08-16 | Mitsubishi Electric Corp | 写真製版技術におけるパタ−ン重ね合わせ方法 |
JPS60202933A (ja) * | 1984-03-16 | 1985-10-14 | Fujitsu Ltd | レチクルの検査方法 |
JPH07111953B2 (ja) * | 1988-12-13 | 1995-11-29 | 富士通株式会社 | ホトリソグラフィのパターン寸法管理方法 |
-
1979
- 1979-09-11 JP JP11710679A patent/JPS5640242A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5640242A (en) | 1981-04-16 |
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