JPS62267060A - Production of target for sputtering - Google Patents
Production of target for sputteringInfo
- Publication number
- JPS62267060A JPS62267060A JP10913386A JP10913386A JPS62267060A JP S62267060 A JPS62267060 A JP S62267060A JP 10913386 A JP10913386 A JP 10913386A JP 10913386 A JP10913386 A JP 10913386A JP S62267060 A JPS62267060 A JP S62267060A
- Authority
- JP
- Japan
- Prior art keywords
- cooling member
- insulating material
- heat insulating
- brittle alloy
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 238000004544 sputter deposition Methods 0.000 title description 3
- 239000000956 alloy Substances 0.000 claims abstract description 36
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 36
- 238000001816 cooling Methods 0.000 claims abstract description 34
- 239000011810 insulating material Substances 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims description 12
- 238000005266 casting Methods 0.000 claims description 10
- 238000005477 sputtering target Methods 0.000 claims description 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000835 fiber Substances 0.000 abstract description 2
- 238000007711 solidification Methods 0.000 description 7
- 230000008023 solidification Effects 0.000 description 7
- 239000000843 powder Substances 0.000 description 6
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009770 conventional sintering Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はスパッタリング用ターゲットの製造方法に係り
、特に８インチ以上の硬脆合金のターゲットを鋳造によ
って製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a sputtering target, and particularly to a method for manufacturing a hard brittle alloy target of 8 inches or more by casting.
近年、スパッタリング技術の進歩と共に、スノくツタリ
ング装置は大量生産に適するよう大型化しつつあり、こ
れに使用するスパッタリング用ターゲット（以下ターゲ
ットと称す）も犬きくなってきている。In recent years, with the advancement of sputtering technology, the size of the sputtering device has been increasing to be suitable for mass production, and the sputtering target (hereinafter referred to as target) used therein has also become more difficult.
ところが、例えばＦｅ−Ａｌ−８ｔ合金又はコバルト−
ジルコン合金のように一般に硬脆合金と呼ばれる硬くて
脆い合金ターゲットで、特に８インチ以上の大型のもの
は後述する理由により、ヒビ、ワレが発生するため鋳造
によっては製造することはできなかった。However, for example, Fe-Al-8t alloy or cobalt-
Hard and brittle alloy targets such as zircon alloys, which are generally called hard and brittle alloys, cannot be produced by casting, especially large ones of 8 inches or more, because of cracks and cracks, which will be explained later.
第１図はターゲット１０の完成斜視図で、第４図〜第６
図は従来の鋳造による製造工程を示す概略図である。FIG. 1 is a completed perspective view of the target 10, and FIGS.
The figure is a schematic diagram showing a manufacturing process by conventional casting.
一般に鋳造によるターゲット１０の製造方法としては、
第４図に示すようにルツボ４で溶融した硬脆合金３０を
、例えば鉄あるいはセラミックス等の定盤又は冷却用金
型からなる冷却部材１の上に流出させ、冷却することに
よって凝固した硬脆合金のインゴット３を作成し、例え
ばこのインゴット３を第５図に点線で示すように研削加
工などによって円盤状のターゲット１０を形成する。Generally, the method for manufacturing the target 10 by casting is as follows:
As shown in FIG. 4, a hard brittle alloy 30 melted in a crucible 4 is poured onto a cooling member 1 consisting of a surface plate made of iron or ceramics or a cooling mold, and solidified by cooling. An alloy ingot 3 is prepared, and a disk-shaped target 10 is formed by, for example, grinding the ingot 3 as shown by the dotted line in FIG.
しかしながら、従来の鋳造によって、例えば８インチ以
上の大型のターゲット１０を製造する場合には、溶融し
た硬脆合金Ｉを冷却部材１の上に流出させたとき、溶融
した硬脆合金３０は冷却部材１に接したところから凝固
が開始する。第４図は冷却部材１のほぼ中央部に溶融し
た硬脆合金３０を流出させ、この硬脆合金３０が冷却部
材１の中央部から外周に向かって広がってゆく状態を示
している。However, when manufacturing a large target 10 of, for example, 8 inches or more by conventional casting, when the molten hard brittle alloy I is flowed onto the cooling member 1, the molten hard brittle alloy 30 is transferred to the cooling member 1. Coagulation starts from the point where it touches 1. FIG. 4 shows a state in which the molten hard and brittle alloy 30 is flowed out approximately at the center of the cooling member 1, and the hard and brittle alloy 30 spreads from the center to the outer circumference of the cooling member 1.
ところで、流出した前記硬脆合金３０は初め冷却部材１
の中央部に大型にあるため、冷却部材１に接していても
、温度の低下速度は外周に比べ遅く、従って外周部−と
中央部３ｂとの間に温度差ができる。温度差ができるこ
とによって熱膨張係数が外周部３ａと中央部３ｂとの間
で差異を生するため歪が中央部３ｂに集中する。この歪
が発生することによって、ヒビ、割れが発生するという
問題があり、鋳造では硬脆合金３（）の大型のターゲッ
トは作ることができなかった。By the way, the hard brittle alloy 30 that has flowed out is initially in the cooling member 1.
Since it is large in the central part of the cooling member 1, the rate of temperature decrease is slower than that at the outer periphery even when it is in contact with the cooling member 1, and therefore a temperature difference is created between the outer periphery and the central part 3b. The temperature difference causes a difference in thermal expansion coefficient between the outer circumferential portion 3a and the central portion 3b, so that strain is concentrated in the central portion 3b. Due to the generation of this strain, there is a problem that cracks and cracks occur, and it has not been possible to produce a large target of hard brittle alloy 3() by casting.
第６図は硬脆合金３０が外周から中央部に凝固してゆく
状態を矢印で示している。このため、従来例えば８イン
チ以上の大型ターゲットを製造する場合には、硬脆合金
３０の素材を微粉末にしたのち、合金の成分比率によっ
て混合し、この混合した微粉末を例えば焼結時に焼結温
度によって蒸発するようなバインダーで固めてから焼結
して製造する方法が広く用いられている。しかしながら
従来の焼結によって製造する方法においては、微粉末の
硬脆合金３０を混合し、バインダーで固めてから焼結す
るため微粉末間に隙間ができ、この隙間に例えば焼結時
使用する不活性ガスなどがガス状で混在し、このガスが
スパッタリング膜を形成するとき、酸化あるいは変質な
どの悪い影響をスパッタリング膜面に与える。また、微
粉末の製造及び混合工程などにおいても不純物が混入し
やすいなどの問題点がある。In FIG. 6, arrows indicate the state in which the hard brittle alloy 30 solidifies from the outer periphery to the center. For this reason, conventionally, when manufacturing a large target of 8 inches or more, for example, the material of the hard brittle alloy 30 is made into fine powder, and then mixed according to the alloy component ratio, and this mixed fine powder is sintered during sintering. A widely used method is to solidify with a binder that evaporates depending on the sintering temperature and then sinter it. However, in the conventional manufacturing method by sintering, the hard and brittle alloy 30 in fine powder is mixed, solidified with a binder, and then sintered, so that gaps are created between the fine powders, and in these gaps, for example, a material used during sintering is used. Active gas and the like are present in gaseous form, and when this gas forms a sputtered film, it exerts negative effects such as oxidation or deterioration on the surface of the sputtered film. Further, there are also problems in that impurities are likely to be mixed in during the production and mixing process of fine powder.
本発明は、かかる従来例の欠点を解決し、大型のターゲ
ット１０を鋳造によって製造する方法を提供することを
目的とする。An object of the present invention is to solve the drawbacks of the conventional example and provide a method for manufacturing a large target 10 by casting.
本発明は、上記目的を達成するため、冷却部材上の中心
部を除いて外周部に位置するように断熱材を配置し、溶
融した硬脆合金を前記断熱材まで拡がるようにして鋳造
することを特徴とするものである。In order to achieve the above-mentioned object, the present invention arranges a heat insulating material to be located on the outer periphery of the cooling member except for the center, and casts a molten hard brittle alloy so that it spreads to the heat insulating material. It is characterized by:
本発明の鋳造による硬脆合金の大型ターゲットの製造方
法によれば、冷却部材１の中心部に流出された硬脆合金
３０は、中心部から外周部に拡がってゆく、このとき冷
却部材１上の中心部を除いて外周部に位置するよう断熱
材２が配置されているため、断熱材２のところでは凝固
又は冷却速度が低下するため、外周部の凝固速度と中心
部の凝固速度がほぼ同じとなり、このため外周部と中心
部との間に大きな温度差は生じない。従って膨張係数の
差異によって生ずる歪も吸収できる程度の小さなものと
なうため、ヒビ、割れが発生することがない。According to the method of manufacturing a large hard brittle alloy target by casting of the present invention, the hard brittle alloy 30 that has flowed out into the center of the cooling member 1 spreads from the center to the outer periphery. Since the heat insulating material 2 is arranged so as to be located at the outer periphery excluding the center, the solidification or cooling rate decreases at the heat insulating material 2, so the solidification speed at the outer periphery and the solidification speed at the center are approximately equal. Therefore, there is no large temperature difference between the outer periphery and the center. Therefore, the strain caused by the difference in expansion coefficients is small enough to be absorbed, so that cracks and cracks do not occur.
以下、本発明の１実施例を第２図（ａ）、（ｂｌ及び第
３図を用いて説明すると、第２図（ａｌは本発明の製造
方法に使用する冷却部材の要部断面図、第２図ｔｂ）は
第２図（ａ）の平面図、第３図は本発明の製造方法を示
す要部断面図である。尚、従来例と同一部品、同一部分
には同一符号を付は説明を省略する。Hereinafter, one embodiment of the present invention will be explained using FIGS. 2(a), (bl and FIG. 3). Fig. 2 (tb) is a plan view of Fig. 2 (a), and Fig. 3 is a sectional view of a main part showing the manufacturing method of the present invention.The same parts and parts as in the conventional example are given the same reference numerals. The explanation will be omitted.
図において、１はターゲット１０を形成するための定盤
又は冷却用金型などからなる冷却部材であり、該冷却部
材１の表面には、例えばアルミナファイバー（具体的に
は東芝セラミック社製の商品名フランクスーペーター）
などからなり、その形状は冷却部材１の中心部３ｂを除
いて外周部−に位置するように断熱材２が配置されてい
る。この断熱材２は固定しても装置いただけでもよい。In the figure, 1 is a cooling member consisting of a surface plate or a cooling mold for forming the target 10, and the surface of the cooling member 1 is coated with, for example, alumina fiber (specifically, a product manufactured by Toshiba Ceramic Co., Ltd.). Frank Supervisor)
The heat insulating material 2 is arranged so as to be located at the outer peripheral part of the cooling member 1 except for the center part 3b. This heat insulating material 2 may be fixed or may only be provided as a device.
第３図はこの冷却部材１の上に形成した硬脆合金のイン
ゴット３を示している。FIG. 3 shows a hard brittle alloy ingot 3 formed on this cooling member 1. As shown in FIG.
次に本発明の製造方法を説明する。製造方法は冷却部材
１上の中心部３ｂを除いた外周部加に断熱材を配置する
こと以外は従来例と同一である。例えば、溶解炉又はル
ツボ４で溶融した硬脆合金３０を徐々に冷却部材１の中
心部３ｂに注いで行くと、前記硬脆合金３０は外周部に
向かって拡がってゆく。Next, the manufacturing method of the present invention will be explained. The manufacturing method is the same as that of the conventional example except that a heat insulating material is placed on the outer circumferential portion of the cooling member 1 excluding the center portion 3b. For example, when the hard brittle alloy 30 melted in the melting furnace or crucible 4 is gradually poured into the center 3b of the cooling member 1, the hard brittle alloy 30 spreads toward the outer periphery.
このとき、溶融した硬脆合金３０は中央部３ｂでは厚く
堆積しているため温度が高く凝固速度は遅く、周囲に流
出した硬脆合金（資）は外周′部３ａに近い程堆積は薄
くなり、凝固しやすい状態になっている。At this time, the molten hard brittle alloy 30 is thickly deposited in the central part 3b, so the temperature is high and the solidification rate is slow, and the hard brittle alloy (material) that has flowed out to the surroundings becomes thinner as it approaches the outer periphery 3a. , it is in a state where it is easy to coagulate.
しかしながら、本発明の製造方法では、冷却部材１上に
中心部３ｂを除いて外周部諷に断熱材２が配置されてい
るため、周囲に流出した硬脆合金３０は直接冷却部材１
に接しないため凝固速度が遅くなり、直接冷却部材１に
接する中心部とほぼ閤じ凝固開始とすることができる。However, in the manufacturing method of the present invention, since the heat insulating material 2 is arranged on the cooling member 1 along the outer periphery except for the center part 3b, the hard brittle alloy 30 flowing out to the surroundings is directly transferred to the cooling member 1.
Since the cooling member 1 is not in contact with the cooling member 1, the solidification rate is slow, and the solidification can start almost at the same time as the central part that is in direct contact with the cooling member 1.
従って、外周部諷と中心部３ｂとの温度差を小さくする
ことができ、故に熱膨張係数の差も小さくすることがで
きるので歪が中心部に集中することもなく、ヒビ、割れ
が発生しない。Therefore, the temperature difference between the outer peripheral part and the center part 3b can be reduced, and therefore the difference in thermal expansion coefficient can also be reduced, so that strain does not concentrate in the center part and cracks and cracks do not occur. .
以上の製造方法で硬脆合金インゴット３を形成した後、
周囲及び上下両面を切削又は研磨などの方法で加工し、
第３図に点線で示す規定の大きさに加工し、第１図に示
すような鋳造によるターゲットが完成する。After forming the hard brittle alloy ingot 3 by the above manufacturing method,
The surrounding area and both upper and lower surfaces are processed by cutting or polishing,
It is processed to a specified size as shown by the dotted line in FIG. 3, and a cast target as shown in FIG. 1 is completed.
本発明のスパッタリング用ター・ゲットの製造方法１こ
よれば、冷却部材１の硬脆合金インゴット３の外周部３
ａに当るところに断熱材２を配置しであるので、溶融し
た硬脆合金間の凝固温度が外周部謳と中心部３ｂで差が
小さくなることによって歪の発生が小さくなり、硬脆合
金インゴット３のヒビ、割れの発生を防ぐことができる
。従って、特に８インチ以上の大型のターゲット１０を
製造することができる。また、鋳造で製造するため、従
来の焼結法で形成したターゲットに比較して、ガスの混
入がほとんどなく、また工程上不純物の混入もしにくい
ので、ス“・くツ・クリング膜を形成したとき理想的な
膜を形成することができ、その上微粉末状に原材料を加
工することが不要なので、容易に大型のターゲットを製
造することができる。According to the method 1 for manufacturing a sputtering target of the present invention, the outer peripheral portion 3 of the hard brittle alloy ingot 3 of the cooling member 1
Since the heat insulating material 2 is placed in the area corresponding to 3b, the difference in the solidification temperature between the molten hard and brittle alloy between the outer peripheral part and the center part 3b becomes smaller, which reduces the occurrence of distortion, and the hard and brittle alloy ingot It can prevent the occurrence of cracks and cracks in step 3. Therefore, a large target 10 of 8 inches or more in particular can be manufactured. In addition, since the target is manufactured by casting, there is almost no gas contamination compared to targets formed by conventional sintering methods, and it is less likely that impurities will be mixed in during the process. An ideal film can be formed, and since it is not necessary to process raw materials into fine powder, large targets can be easily manufactured.
第１図はスパッタリング用ターゲットの外観を示す斜視
図、第２図（ａ）は本発明の冷却部材を示す要部断面図
、第２図ｔｂｌは同平面図、第３図はターゲットの製造
方法を示す要部断面図、第４図は従来の製造方法を示す
要部断面図、第５図は第６図のターゲットの製造方法を
示す平面図の・Ａ −Ａ’部の断面図、第６図は同平面
図である。
１ 冷却部材
２・・・断熱材
３・・・硬脆合金インコツト
諷・・外周部
３ｂ・・中心部
１０・・ターゲット
３０・・・溶融した硬脆合金
特許出願人 アルプス電気株式会社
第 ２ 図 （ａ） ２．＠堅核、〆Fig. 1 is a perspective view showing the appearance of a sputtering target, Fig. 2(a) is a sectional view of a main part showing the cooling member of the present invention, Fig. 2 tbl is a plan view of the same, and Fig. 3 is a method for manufacturing the target. 4 is a sectional view of essential parts showing a conventional manufacturing method. FIG. Figure 6 is a plan view of the same. 1 Cooling member 2...Insulating material 3...Hard brittle alloy Inkotsuto...Outer periphery 3b...Center 10...Target 30...Melted hard brittle alloy Patent applicant Alps Electric Co., Ltd. Figure 2 (a) 2. @hard core, 〆
Claims (1)
熱材を配置し、溶融した硬脆合金を前記冷却部材の中心
部に流出させ、該硬脆合金を前記断熱材まで拡がるよう
にして鋳造することを特徴とするスパッタリング用ター
ゲットの製造方法。A heat insulating material is arranged so as to be located on the outer periphery of the cooling member excluding the center thereof, and the molten hard brittle alloy is caused to flow into the center of the cooling member and the hard brittle alloy is spread to the heat insulating material. A method for producing a sputtering target, the method comprising casting a sputtering target.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10913386A JPS62267060A (en) | 1986-05-13 | 1986-05-13 | Production of target for sputtering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10913386A JPS62267060A (en) | 1986-05-13 | 1986-05-13 | Production of target for sputtering |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62267060A true JPS62267060A (en) | 1987-11-19 |
Family
ID=14502414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10913386A Pending JPS62267060A (en) | 1986-05-13 | 1986-05-13 | Production of target for sputtering |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62267060A (en) |
-
1986
- 1986-05-13 JP JP10913386A patent/JPS62267060A/en active Pending
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