JPS62267044A - Production of target for sputtering - Google Patents
Production of target for sputteringInfo
- Publication number
- JPS62267044A JPS62267044A JP10913286A JP10913286A JPS62267044A JP S62267044 A JPS62267044 A JP S62267044A JP 10913286 A JP10913286 A JP 10913286A JP 10913286 A JP10913286 A JP 10913286A JP S62267044 A JPS62267044 A JP S62267044A
- Authority
- JP
- Japan
- Prior art keywords
- cooling member
- alloy
- target
- brittle alloy
- center
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 22
- 238000004544 sputter deposition Methods 0.000 title description 4
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 40
- 239000000956 alloy Substances 0.000 claims abstract description 40
- 238000001816 cooling Methods 0.000 claims abstract description 27
- 238000010438 heat treatment Methods 0.000 claims abstract description 17
- 238000005266 casting Methods 0.000 claims abstract description 12
- 230000002093 peripheral effect Effects 0.000 claims abstract description 12
- 238000000034 method Methods 0.000 claims description 12
- 238000005477 sputtering target Methods 0.000 claims description 6
- 238000003892 spreading Methods 0.000 claims description 2
- 230000007547 defect Effects 0.000 abstract 2
- 238000007711 solidification Methods 0.000 description 6
- 230000008023 solidification Effects 0.000 description 6
- 239000000843 powder Substances 0.000 description 5
- 238000005245 sintering Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- 229910000789 Aluminium-silicon alloy Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000009770 conventional sintering Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はスパッタリング用ターゲットの製造方法に係り
、特に８インチ以上の硬脆合金のターゲットを鋳造によ
って製造する方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a sputtering target, and particularly to a method for manufacturing a hard brittle alloy target of 8 inches or more by casting.
近年、スパッタリング技術の進歩と共に、スノくツタリ
ング装置は大量生産に適するよう大型化しつつあり、こ
れに使用するスパッタリング用ターゲット（以下ターゲ
ットと称す）も大きくなってきている。In recent years, with the progress of sputtering technology, the size of the snow sputtering apparatus has been increasing to be suitable for mass production, and the sputtering target (hereinafter referred to as target) used therein has also been increasing in size.
とこはか、例えばＦｅ−ＡｌＳｉ合金又はコバルト−ジ
ルコン合金のように一般に硬脆合金と呼ばれる硬くて、
帷い合金ターゲットで、特に８インチ以上の大型のもの
は、後述する理由によりヒビ、ワレが発生するため鋳造
によっては製造することはできなかった。For example, hard alloys, such as Fe-AlSi alloy or cobalt-zircon alloy, are generally called hard and brittle alloys.
Thick alloy targets, especially large ones of 8 inches or more, cannot be manufactured by casting because cracks and cracks occur for reasons described later.
第１図はターゲット１０の完成斜視図で、第４図〜第６
図は従来の鋳造による製造工程を示す漿略図である。FIG. 1 is a completed perspective view of the target 10, and FIGS.
The figure is a schematic diagram showing a manufacturing process by conventional casting.
一般に鋳造によるターゲット１０の製造方法としては、
第４図に示すようにルツボ４で溶融した硬脆合金３０を
例えば妖、セラミックスなどの定盤又は冷却用金型冷却
部材１の上に流出させ、冷却することによって凝固した
硬脆合金のインゴット３を作成し、例えばインゴット３
を第５図に点線で示すように研削加工などによって円盤
状のターゲットｌＯに形成する。Generally, the method for manufacturing the target 10 by casting is as follows:
As shown in FIG. 4, the hard brittle alloy 30 melted in the crucible 4 is poured onto a surface plate made of ceramic or the like or onto the cooling mold cooling member 1, and solidified by cooling to form an ingot of the hard brittle alloy. 3, for example ingot 3
is formed into a disk-shaped target lO by grinding or the like as shown by the dotted line in FIG.
しかしながら、従来の鋳造によって、例えば８インチ以
上の大型のターゲットｌＯを製造する場合には、溶融し
た硬脆合金３０を冷却部材１の上に流出させたとき、溶
融した硬脆合金３０は冷却部材１に接したところから凝
固が開始する。第４図は冷却部材１のほぼ中央部に溶融
した硬脆合金３０を流出させ、この硬脆合金３０が冷却
部材１の中央部から外周に向かって拡がってゆく状態を
示している。However, when manufacturing a large target lO of 8 inches or more, for example, by conventional casting, when the molten hard brittle alloy 30 is flowed onto the cooling member 1, the molten hard brittle alloy 30 flows into the cooling member 1. Coagulation starts from the point where it touches 1. FIG. 4 shows a state in which the molten hard brittle alloy 30 is flowed out approximately at the center of the cooling member 1, and the hard brittle alloy 30 spreads from the center to the outer circumference of the cooling member 1.
ところで、流出した前記硬脆合金３０は初め冷却部材１
の中央部に大量にあるため、冷却部材１に接していても
、温度の低下速度は外周に比べ遅く、従って外周部３ａ
と中央部３ｂとの間に温度差ができる。温度差ができる
ことによって熱膨張係数が外周部３ａと中央４３ｂとの
間で差異を生ずるため歪が中央部３ｂに集中する。この
歪が発生することによって、ヒビ、割れが発生するとい
う問題があり、鋳造では硬脆合金間の大型のターゲット
は作ることができなかった。尚、第６図は硬脆合金３０
が外周から中央部に凝固してゆく状態を矢印で示してい
る。このため、従来、例えば８インチ以上の大型ターゲ
ットを製造する場合には、硬脆合金３０の素材を微粉末
にしたのち、合金の成分比率によって混合し、この混合
した微粉末を例えば焼結時に焼結温度によって蒸発する
ようなバインダーで固めてから焼萌して製造する方法が
広く用いられている。しか°しながら、従来の焼結によ
って製造する方法においては、微粉末の硬脆合金３０を
混合しバインダーで固めてから焼結するため微粉末間に
隙間ができ、この隙間に例えば、焼結時使用する不活性
ガス４ｆどがガス状で混在し、このガスがスパッタリン
グ膜を形成するとき、酸化あるいは変質などの悪い影響
をスパッタリンク膜面に与える。By the way, the hard brittle alloy 30 that has flowed out is initially in the cooling member 1.
Since there is a large amount in the central part of
A temperature difference is created between the center portion 3b and the center portion 3b. The temperature difference causes a difference in thermal expansion coefficient between the outer peripheral portion 3a and the center 43b, so that strain is concentrated in the center 43b. This distortion causes cracks and cracks, which makes it impossible to create large targets between hard and brittle alloys by casting. Furthermore, Fig. 6 shows hard brittle alloy 30.
The arrows indicate the state in which the particles solidify from the outer periphery to the center. For this reason, conventionally, when manufacturing a large target of, for example, 8 inches or more, the material of the hard brittle alloy 30 is made into fine powder, and then mixed according to the alloy component ratio, and this mixed fine powder is used, for example, during sintering. A widely used method is to harden the material with a binder that evaporates depending on the sintering temperature and then sinter it. However, in the conventional manufacturing method by sintering, the hard and brittle alloy 30 in fine powder is mixed and hardened with a binder, and then sintered, which creates gaps between the fine powders. The inert gas 4f used at the time is mixed in gaseous form, and when this gas forms a sputtered film, it has adverse effects such as oxidation or deterioration on the surface of the sputtered film.
また、微２扮木の製造及び混合工程などにおいても不純
物が混入しや丁いなどの問題点がある。In addition, there are problems such as impurities being mixed in and dusting during the manufacturing and mixing process of finely divided wood.
本発明は、かかる従来例の欠点を解決し、大型のターゲ
ット１０を鋳造によって製造する方法を提供するこ々を
目的とする。An object of the present invention is to solve the drawbacks of the conventional example and provide a method for manufacturing a large target 10 by casting.
本発明は、上記目的を達成するため、冷却部材の裏面の
外周溝に電熱線を挿入Ｌ７、該電熱線に電圧を印加し、
溶融した硬脆合金を前記冷却部材の表面の中心部に流出
させ、前記電熱線と対応する外周部まで拡がるようζこ
して鋳造することを特徴トスるスパッタリング用ターゲ
ットの製造方法にあるう
〔作用〕
本発明の鋳造による硬脆合金の大型ターゲットの製造方
法によれば、冷却部材ｌの中心部に流出された硬俯合金
３０は、中心部から外周部に拡がってゆく、このとき冷
却部材１の中心部を除く外周部に位置させた電熱線に電
圧を印加し加熱しておくことによって、冷却部材の表面
の温度が中心部に比べ高くなっている。このため、流出
した硬脆合金は前記外周部のところでは凝固速度を低下
させることができる。従って、中心部の凝固速度と同じ
か、又は電熱線に印加する電圧を適時制御することによ
って凝固速度を中心部より遅くすることができ、従来外
周部より凝固が中心部に向かって集中するため発生する
歪を、中心部より外周部に向かってみξ固をさせるため
歪が外周部に拡散されるため、ヒビ、割れが発生しない
。In order to achieve the above object, the present invention inserts a heating wire into the outer circumferential groove on the back surface of the cooling member L7, applies a voltage to the heating wire,
A method for producing a sputtering target characterized by casting a molten hard brittle alloy flowing into the center of the surface of the cooling member and spreading to the outer periphery corresponding to the heating wire. ] According to the method of manufacturing a large target of a hard brittle alloy by casting of the present invention, the hard alloy 30 that has flowed out into the center of the cooling member 1 spreads from the center to the outer periphery. By applying a voltage to heating wires located on the outer periphery of the cooling member, excluding the center, the temperature of the surface of the cooling member is higher than that of the center. Therefore, the solidification rate of the hard and brittle alloy that has flowed out can be reduced at the outer peripheral portion. Therefore, the solidification rate can be the same as that of the center, or it can be made slower than that of the center by controlling the voltage applied to the heating wire in a timely manner. Since the generated strain is hardened from the center toward the outer periphery, the strain is diffused to the outer periphery, so cracks and cracks do not occur.
以下本発明の１実施例を第２図ａ、ｂ及び第３図を用い
て説明する。第２図ａは、本発明の冷却部材の平面図、
第２図すは、同要部断面図、第３図は、前記冷却部材上
にインゴットを形成１．た状態を示す要部断面図である
。An embodiment of the present invention will be described below with reference to FIGS. 2a and 2b and FIG. 3. FIG. 2a is a plan view of the cooling member of the present invention;
FIG. 2 is a sectional view of the same essential part, and FIG. 3 is a sectional view of the ingot formed on the cooling member. FIG.
尚、従来例と四一部品、同一部分には同一符号を付し説
ψ１を省略する。It should be noted that four parts and the same parts as those of the conventional example are given the same reference numerals, and the explanation ψ1 is omitted.
１は冷却部材で、この冷却部材ｌは例えば鉄、セラｄ７
クスなど熱に強い材料からなり、第２図すに示すように
裏面１ｂにはドー鼾ノ状に外周溝１ｃが形成されており
、この外周溝１ｃには電熱線２が挿入されている。1 is a cooling member, and this cooling member l is made of iron, for example, Cera d7
It is made of a heat-resistant material such as wood, and as shown in FIG. 2, an outer circumferential groove 1c is formed in the shape of a bell on the back surface 1b, and a heating wire 2 is inserted into this outer circumferential groove 1c.
図示はしないが、前記電熱線２には外部から供給するＦ
ｌＩ諒とこの電源を制御する制御回路がつながっている
。Although not shown, the heating wire 2 is supplied with F from the outside.
The controller is connected to the control circuit that controls this power supply.
次に本発明の製造方法を説明する。製造方法は例えば溶
解炉又はルツボ４で浴融した硬脆合金３０を徐々に冷却
部材１の中心部に注いで行く七、前記硬脆合金３０は外
周部にｌｉ＋−ｉかって拡がってゆく、このとき、溶融
した硬脆合金３０はその中央部３ｂでは厚く堆積してい
るため、温度が高く凝固速度は遅く、周囲に流出した硬
脆合金３０は外周部３ａに近い程堆禎は薄くなり凝固し
やすい状態になっている。しかしながら、本発明の製造
方法では、冷却部材１の裏面１ｂの外周溝ＩＣに電熱線
２が配置されているため、外周溝１ｃに対応する冷却部
材１の外周部に流出した硬脆合金３（）は電熱線２の熱
により凝固速度が遅くなり、中心部とほぼ同じ凝固開始
とすることができる。従って、硬脆合金３０の外周部３
ａと中心部３ｂとの温度差を小さくすることができ、故
に熱１彫張係数の差も小さくすることができるので、歪
が中心部に集中することもなく、ヒビ、創」れが発生し
ない。Next, the manufacturing method of the present invention will be explained. The manufacturing method is such that a hard brittle alloy 30 that has been bath melted in a melting furnace or a crucible 4 is gradually poured into the center of the cooling member 1, and the hard brittle alloy 30 spreads to the outer periphery as li+-i. At this time, the molten hard brittle alloy 30 is thickly deposited in the central part 3b, so the temperature is high and the solidification rate is slow, and the hard brittle alloy 30 flowing out to the surroundings becomes thinner and more likely to solidify as it approaches the outer peripheral part 3a. is in a state. However, in the manufacturing method of the present invention, since the heating wire 2 is arranged in the outer peripheral groove IC on the back surface 1b of the cooling member 1, the hard brittle alloy 3 ( ), the solidification rate is slowed down by the heat of the heating wire 2, and the solidification can start almost at the same time as in the center. Therefore, the outer peripheral portion 3 of the hard brittle alloy 30
Since the temperature difference between a and the center part 3b can be reduced, and therefore the difference in thermal expansion coefficient can also be reduced, strain will not be concentrated in the center part and cracks and scratches will not occur. do not.
以上の製造方法で硬脆合金インゴット３を形成した後、
周囲及び上下両面を切削又は研磨などの方法で加工１−
２、第３図に点線で示す規定の大きさに加工し、第１図
に示すような鋳造によるターゲットが完成する。After forming the hard brittle alloy ingot 3 by the above manufacturing method,
Processing the surrounding area and both upper and lower surfaces by cutting or polishing 1-
2. The target is processed to a specified size as shown by the dotted line in FIG. 3, and a cast target as shown in FIG. 1 is completed.
本発明のスパッタリング用ターゲットの製造方法によれ
ば、冷却部材１の（ＩＩ！！詭合金インゴット３の外周
部３ａに当るところに電熱線２を配置しであるので、溶
融した硬脆合金３０の凝固速度が外周部３ａと中心ｉ％
３ｂで差が小さくなることによって歪の発生が小さくな
り、硬脆合金インゴット３のヒビ、割れの発生を防ぐこ
とができる。従って、特に８インチ以上の大型のターゲ
ット１０を製造することができる。According to the method for manufacturing a sputtering target of the present invention, since the heating wire 2 is disposed at a position corresponding to the outer circumference 3a of the (II!!) alloy ingot 3 of the cooling member 1, the molten hard brittle alloy 30 is The solidification rate is between the outer periphery 3a and the center i%
As the difference in 3b becomes smaller, the generation of strain becomes smaller, and the occurrence of cracks and cracks in the hard brittle alloy ingot 3 can be prevented. Therefore, a large target 10 of 8 inches or more in particular can be manufactured.
また、鋳造で製造するため従来の焼結法で形成したター
ゲットに比較してガスの混入がほとんどなく、また、工
程上不純物の混入もしにくいので、スパッタリング膜を
形成したとき理想的な膜を形成することができ、その上
微粉末状に原材料を加工することが不要なので、容易に
大型のターゲットを製造することができる。In addition, since it is manufactured by casting, there is almost no gas contamination compared to targets formed by conventional sintering methods, and it is also difficult for impurities to be mixed in during the process, so when forming a sputtering film, it forms an ideal film. Moreover, since it is not necessary to process the raw material into a fine powder, it is possible to easily manufacture a large target.
第１図はスパッタリング用ターゲットの外観を示す斜視
図、第２図ａは本発明の冷却部材を示す平面図、第２図
すは同要部断面図、第３図はターゲ・トの製造方法を示
す要部断面図、第４図は従来の製造刃尖を示す要部断面
図、第５図は第６図のターゲットの＆！造方法を示す平
面図のＡ −Ａ’部の断面図、第６図は同平面図である
。
１・冷却部材
１ｃ 外周溝
２・・電熱線
３ ・硬脆合金インコツト
寞・・外周部
３ｂ・・中心部
１０・ターゲット
３０・・溶融した硬脆合金
特許出願人 アルプス電気株式会社
第 １ 図Fig. 1 is a perspective view showing the external appearance of a sputtering target, Fig. 2a is a plan view showing the cooling member of the present invention, Fig. 2 is a sectional view of the same essential part, and Fig. 3 is a method for manufacturing the target. Figure 4 is a cross-sectional view of the main part showing a conventionally manufactured cutting edge, and Figure 5 is a cross-sectional view of the main part of the target shown in Figure 6. FIG. 6 is a sectional view taken along the line A-A' of the plan view showing the manufacturing method. 1. Cooling member 1c Outer circumferential groove 2. Heating wire 3. Hard brittle alloy.. Outer peripheral portion 3b.. Center portion 10. Target 30. Molten hard brittle alloy patent applicant Alps Electric Co., Ltd. Figure 1
Claims (1)
電圧を印加し、溶融した硬脆合金を前記冷却部材の表面
の中心部に流出させ、前記電熱線と対応する外周部まで
拡がるようにして鋳造することを特徴とするスパッタリ
ング用ターゲットの製造方法。A heating wire is inserted into the outer peripheral groove on the back surface of the cooling member, and a voltage is applied to the heating wire to cause the molten hard brittle alloy to flow out to the center of the surface of the cooling member, and to the outer peripheral portion corresponding to the heating wire. A method for manufacturing a sputtering target, characterized by casting in a spreading manner.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10913286A JPS62267044A (en) | 1986-05-13 | 1986-05-13 | Production of target for sputtering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10913286A JPS62267044A (en) | 1986-05-13 | 1986-05-13 | Production of target for sputtering |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62267044A true JPS62267044A (en) | 1987-11-19 |
Family
ID=14502387
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10913286A Pending JPS62267044A (en) | 1986-05-13 | 1986-05-13 | Production of target for sputtering |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62267044A (en) |
-
1986
- 1986-05-13 JP JP10913286A patent/JPS62267044A/en active Pending
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