JPS62226605A - Ferromagnetic thin film and magnetic head using the same - Google Patents
Ferromagnetic thin film and magnetic head using the sameInfo
- Publication number
- JPS62226605A JPS62226605A JP6832586A JP6832586A JPS62226605A JP S62226605 A JPS62226605 A JP S62226605A JP 6832586 A JP6832586 A JP 6832586A JP 6832586 A JP6832586 A JP 6832586A JP S62226605 A JPS62226605 A JP S62226605A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- thin film
- ferromagnetic thin
- film
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 95
- 239000010409 thin film Substances 0.000 title claims abstract description 45
- 230000005294 ferromagnetic effect Effects 0.000 title claims abstract description 31
- 239000010408 film Substances 0.000 claims abstract description 44
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 20
- 229910052703 rhodium Inorganic materials 0.000 claims abstract description 20
- 229910052741 iridium Inorganic materials 0.000 claims abstract description 18
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 18
- 229910052762 osmium Inorganic materials 0.000 claims abstract description 17
- 229910052707 ruthenium Inorganic materials 0.000 claims abstract description 17
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 16
- 239000000203 mixture Substances 0.000 claims abstract description 12
- 238000004544 sputter deposition Methods 0.000 claims abstract description 8
- 239000000696 magnetic material Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims 5
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 230000035699 permeability Effects 0.000 abstract description 4
- 230000004907 flux Effects 0.000 description 19
- 238000005260 corrosion Methods 0.000 description 16
- 230000007797 corrosion Effects 0.000 description 16
- 229910045601 alloy Inorganic materials 0.000 description 11
- 239000000956 alloy Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 239000000654 additive Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 230000000996 additive effect Effects 0.000 description 5
- 229910000889 permalloy Inorganic materials 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910000859 α-Fe Inorganic materials 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 230000005415 magnetization Effects 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 229910017082 Fe-Si Inorganic materials 0.000 description 1
- 229910002593 Fe-Ti Inorganic materials 0.000 description 1
- 229910017133 Fe—Si Inorganic materials 0.000 description 1
- 229910003271 Ni-Fe Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は高い飽和磁束密度を有し、磁歪定数が零に近く
、かつ耐食性が良好な、Ｆｅを主成分とした強磁性薄膜
、および駒れを用いた磁気ヘッドに関するものである６
〔発明の技術〕
近年の高密度記録の進展は著しく、特に垂直磁気記録方
式の出現により、記録密度は大幅に向上しつつある。垂
直磁気記録用単磁極型磁気ヘッドの磁気回路の一部は極
めて薄い主磁極で構成されるため、主磁極先端は磁気飽
和を起こしやすく、これを防ぐために極めて高い飽和磁
束密度を有する磁性薄膜が望まれている。また従来のＶ
ＴＲ用ヘッドにおいても記録密度増加のためにギャップ
長が狭小化し、かつ記録媒体の保磁力が増加する傾向に
あり、このような磁気ヘッドで記録媒体に十分信号を記
録し、再生するために高飽和磁束密度を有する磁性材料
が望まれている。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a ferromagnetic thin film mainly composed of Fe, which has a high saturation magnetic flux density, a magnetostriction constant close to zero, and good corrosion resistance, and a piece. 6 [Technique of the Invention] High-density recording has made remarkable progress in recent years, and in particular, with the advent of perpendicular magnetic recording, recording density is increasing significantly. A part of the magnetic circuit of a single-pole magnetic head for perpendicular magnetic recording consists of an extremely thin main pole, so the tip of the main pole is prone to magnetic saturation. To prevent this, a magnetic thin film with an extremely high saturation magnetic flux density is used. desired. Also, the conventional V
In TR heads, the gap length is becoming narrower due to the increase in recording density, and the coercive force of the recording medium is also increasing. A magnetic material with a saturation magnetic flux density is desired.
さらに計算機用記憶装置等に用いる薄膜磁気ヘッドにお
いても、記録密度向上のために磁極先端部の膜厚を薄く
する必要があり、磁極先端部の磁気飽和を防ぐために高
飽和磁束密度を有する磁性薄膜が望まれている。Furthermore, in thin-film magnetic heads used in computer storage devices, etc., it is necessary to reduce the film thickness at the tip of the magnetic pole to improve recording density, and to prevent magnetic saturation at the tip of the magnetic pole, a magnetic thin film with a high saturation magnetic flux density is required. is desired.
従来、ヘッドコア用の材料としてはＭ ｎ −Ｚ ｎフ
ェライトなどのフェライト系材料やＮ ｉ −Ｆ ｅ系
合金（パーマロイ）、Ｆｅ−ＡＱ−８ｉ系合金（センダ
スト）等の合金系材料が実用されてきたが、これらはい
ずれも飽和磁束密度が１０ＫＧ程度以下と低く、高密度
の記録再生を行うことが出来ないという欠点があった。Conventionally, ferrite-based materials such as Mn-Zn ferrite, alloy-based materials such as Ni-Fe-based alloy (Permalloy), and Fe-AQ-8i-based alloy (Sendust) have been used as materials for head cores. However, all of these have a low saturation magnetic flux density of about 10 KG or less, and have the disadvantage that high-density recording and reproduction cannot be performed.
このため近年、Ｆ ｅ −Ｔ ｉ系統品質合金や、ある
いはＧｏを主成とし、７．ｒ、Ｔｉ、Ｈｆ、Ｎｂ。For this reason, in recent years, Fe-Ti quality alloys or Go have been used as main constituents.7. r, Ti, Hf, Nb.
Ｔｏなどの元素をガラス化元素とした非晶質合金などが
研究開発されているが、これらの飽和磁束密度は約１４
ＫＧ以下である。Amorphous alloys using elements such as To as vitrifying elements are being researched and developed, but the saturation magnetic flux density of these is approximately 14
KG or less.
一般に、Ｆ ｅ −Ｓ ｉ系合金は高飽和磁束密度の材
料として知られており、Ｓｉ約６．５ ｗｔ％（１２
ａｔ％）の合金は磁歪定数がほぼ零で、飽和磁束密度が
約１８ＫＧと高く、高Ｂｓヘッド材料として有望視され
ている（特開昭５９−７８５０３号）しかし、Ｆ ｅ
Ｓ ｘ系合金は耐食性に劣るため。In general, Fe-Si alloys are known as materials with high saturation magnetic flux density, and contain about 6.5 wt% Si (12
At%) alloy has a magnetostriction constant of almost zero and a high saturation magnetic flux density of about 18 KG, and is considered promising as a high Bs head material (Japanese Patent Application Laid-open No. 78503/1983).
S x alloys have poor corrosion resistance.
ヘッド製造工程中あるいはヘッド使用中に錆を生ずると
いう問題がある。There is a problem in that rust occurs during the head manufacturing process or during head use.
本発明の目的は上記の要請に応えるために、１８ＫＧ以
上の高飽和磁束密度を有し、磁歪定数が零に近く、かつ
耐食に優れた磁気ヘッド用磁性薄膜、ならびにこれを用
いた磁気ヘッドを提供することにある。The purpose of the present invention is to meet the above-mentioned demands by providing a magnetic thin film for a magnetic head that has a high saturation magnetic flux density of 18KG or more, a magnetostriction constant close to zero, and excellent corrosion resistance, and a magnetic head using the same. It is about providing.
〔問題点を解決するための手段〕
本発明は、上記目的を達成するために、Ｆｅを主成分と
し、Ｃｏ、Ｎｉ、Ｒｕ、Ｒｈ、Ｐｄ。[Means for Solving the Problems] In order to achieve the above object, the present invention uses Fe as a main component, Co, Ni, Ru, Rh, and Pd.
Ｏｓ、Ｉｒ、Ｐｔからなる群より選択した少なくとも一
元素を含有した強磁性薄膜を提案するものである。A ferromagnetic thin film containing at least one element selected from the group consisting of Os, Ir, and Pt is proposed.
Ｆｅに上記の元素を添加した時の磁気特性については、
飽和磁束密度について調べられているが、その他の磁歪
定数などの性質についてはＧｏ。Regarding the magnetic properties when the above elements are added to Fe,
The saturation magnetic flux density has been investigated, but other properties such as the magnetostriction constant have not been investigated.
Ｎｉ添加した場合を除いて知られていない、また。Not known except when Ni is added.
これを薄膜とした時の磁歪定数の組成による変化も知ら
れていない、さらに耐食性に関しても、薄膜材料はバル
ク材材料とは異なると考えられるが、これに関してもほ
とんど知られていない。It is not known that the magnetostriction constant changes depending on the composition when this material is made into a thin film.Furthermore, thin film materials are thought to be different from bulk materials in terms of corrosion resistance, but little is known about this either.
本発明者らは、Ｆｓを主成分として各種添加元素を加え
た磁性薄膜を作製し、飽和磁束密度、磁歪定数、耐食性
等の特性を測定し、以下の結果を得た。すなわち、一般
に非磁性の元素を添加した場合には添加量とともに飽和
磁束密度は減少するが、Ｃｏ、Ｎｉ、Ｒｕ、Ｒｈ、Ｐｄ
、Ｏｓ、Ｉ ｒ。The present inventors produced a magnetic thin film containing Fs as a main component and various additive elements, and measured properties such as saturation magnetic flux density, magnetostriction constant, and corrosion resistance, and obtained the following results. In other words, when a non-magnetic element is added, the saturation magnetic flux density generally decreases with the amount added, but Co, Ni, Ru, Rh, Pd
, Os, I r.
ｐｔを添加した場合には飽和磁束密度の減少は小さいか
、あるいは増加する。また、Ｆｅの磁歪定数λＳは約−
４Ｘ １０−８と負で大きな値を有し、このままでは磁
気ヘッド材料として使用するのが困難であるが、Ｃｏ、
Ｎｉ、Ｒｕ、Ｒｈ、Ｐｄ。When pt is added, the decrease in saturation magnetic flux density is small or increases. Also, the magnetostriction constant λS of Fe is approximately -
It has a large negative value of 4X 10-8, and it is difficult to use it as a magnetic head material as it is, but Co,
Ni, Ru, Rh, Pd.
Ｏｓ、Ｉｒ、Ｐｔを添加することにより、磁歪定数を零
に近い値とすることが出来ることを発明者らは見出した
。さらに、上記の元素を添加した磁性膜は耐食性におい
てもきわめて優れていることが明らかとなった。従って
これらの添加物の量を制御することにより、高飽和磁束
密度で、耐食性に優れ、かつ磁歪定数が零に近い優れた
露磁性薄膜が得られる。これを垂直磁気記録用磁気ヘッ
ド。The inventors have discovered that the magnetostriction constant can be made close to zero by adding Os, Ir, and Pt. Furthermore, it has been revealed that the magnetic film containing the above-mentioned elements has excellent corrosion resistance. Therefore, by controlling the amount of these additives, it is possible to obtain an excellent exposed magnetic thin film with a high saturation magnetic flux density, excellent corrosion resistance, and a magnetostriction constant close to zero. This is a magnetic head for perpendicular magnetic recording.
薄膜磁気ヘッド、およびＶＴＲ用磁気ヘッド等の磁気コ
アに用いた場合、優れた記録・再生特性が得られる。When used in magnetic cores such as thin film magnetic heads and magnetic heads for VTRs, excellent recording and reproducing characteristics can be obtained.
また、本発明の強磁性薄膜を主磁性膜として。Further, the ferromagnetic thin film of the present invention is used as the main magnetic film.
他の組成を有する磁性膜もしくは非磁性膜からなる中間
層と交互に積層することにより、保磁力が小さく透磁率
の高い磁気特性の優れた磁性膜が得られる。By alternately laminating interlayers made of magnetic films or non-magnetic films having other compositions, a magnetic film with excellent magnetic properties such as low coercive force and high magnetic permeability can be obtained.
なお、本発明の強磁性薄膜は、真空蒸着法、メッキ法、
化学的気相成長法（ＣＶＤ法）、スパッタリング法など
の薄膜形成技術により作製することが出来る。中でも高
周波スパッタリング法、マグネトロンスパッタリング法
、イオンビームスパッタリング法などのスパッタリング
法は、組成が均一で特性の優れた強磁性薄膜を得る上で
好適である。The ferromagnetic thin film of the present invention can be produced by vacuum evaporation, plating,
It can be manufactured by a thin film forming technique such as a chemical vapor deposition method (CVD method) or a sputtering method. Among these, sputtering methods such as high frequency sputtering, magnetron sputtering, and ion beam sputtering are suitable for obtaining a ferromagnetic thin film with a uniform composition and excellent properties.
以下、本発明を実施例により詳細に説明する。 Hereinafter, the present invention will be explained in detail with reference to Examples.
実施例１
高周波二極スパッタリング装置を用いてＦｅにＣｏ、Ｎ
ｉ、Ｒｕ、Ｒｈ、Ｐｄ、Ｏｓ、Ｉ ｒ。Example 1 Co and N were added to Fe using a high frequency two-pole sputtering device.
i, Ru, Rh, Pd, Os, Ir.
ｐｔを添加したスパッタ膜を作製した。ターゲットには
、純Ｆｅのターゲットに５＋ｍ＋角のＣｏ 。A sputtered film added with pt was produced. The target is a pure Fe target with 5+m+ square Co.
Ｎｉ、Ｒｕ、Ｒｈ、Ｐｄ、Ｏｓ、Ｉ ｒ’、ｐｔのベレ
ットもしくはこれらの元素とＦｅとの合金のペレットを
貼り付けた組合わせターゲットを用いた。A combination target to which pellets of Ni, Ru, Rh, Pd, Os, Ir', and pt or pellets of alloys of these elements and Fe were attached was used.
スパッタ時のアルゴン圧力を５ Ｘ １０−’Ｔｏｒｒ
、高周波電力密度２３ ｋ ｗ ／ ｒｒｒ ｖ基板温
度３５０℃とし、膜厚を約１μｍとした。基板として＃
７０５９ガラス（米国コーニング社製）を用いた。Argon pressure during sputtering was set to 5 x 10-'Torr.
, a high frequency power density of 23 kW/rrr, a substrate temperature of 350° C., and a film thickness of approximately 1 μm. # as a board
7059 glass (manufactured by Corning, USA) was used.
第１図に添加元素量Ｘに対する飽和磁束密度Ｂｓの変化
を示した。第１図（ａ）は比較のために、Ａｆｌ、Ｓｉ
、Ｃｒ、Ｍｏ、Ｔｉを添加した場合の例を示した０図の
ように、これらの非磁性元素を添加した場合には、添加
量とともにＢｓは大きく減少し、特にＴｉ、Ｍｏ等の遷
移金属元素を添加した場合のＢｓの減少が大きかった。FIG. 1 shows the change in saturation magnetic flux density Bs with respect to the amount of added elements X. For comparison, Fig. 1(a) shows Afl, Si
, Cr, Mo, and Ti are added, as shown in Figure 0, when these non-magnetic elements are added, Bs decreases greatly with the addition amount, especially when transition metals such as Ti and Mo are added. The decrease in Bs was large when the element was added.
第１図（ｂ）に１本発明のＣｏ、Ｎｉ、Ｒｕ、Ｒｈ。FIG. 1(b) shows Co, Ni, Ru, and Rh of the present invention.
Ｐｄ、Ｏｓ、Ｉ ｒ、Ｐｔの■族元素を添加した場合を
示した０図のように、Ｐｄ、Ｒｕ、Ｏ３の添加によりＢ
ｓは低下するが、その減少率は図１（、）に示した元素
を添加した場合よりも小さい。As shown in Figure 0, which shows the case of adding group III elements such as Pd, Os, Ir, and Pt, the addition of Pd, Ru, and O3 increases B
Although s decreases, the rate of decrease is smaller than when the elements shown in FIG. 1(,) are added.
またＮｉ、Ｉ ｒ、Ｒｈ、Ｃｏ、Ｐｔを添加した場合に
は、添加量とともにＢｓは増加の傾向を示す。Furthermore, when Ni, Ir, Rh, Co, and Pt are added, Bs tends to increase with the amount of addition.
従って本発明の添加元素を用いた場合、極めて高いＢｓ
を有する磁性膜を得ることが出来る。Therefore, when using the additive elements of the present invention, extremely high Bs
It is possible to obtain a magnetic film having the following characteristics.
第２図に、本発明の添加元素を加えた時の磁歪定数の変
化を示した。図のように純Ｆｅスパッタ膜の磁歪定数λ
Ｓは約−４Ｘ１０−’であり、これに添加元素を加えた
時には、添加量とともにλＳは零に近づき、さらに正の
値で増加した。このようにこれらの元素の少量の添加は
、λＳを零に近づけるので磁気ヘッド材料として好まし
い、これらの元素の添加の効果を得るためには合計０．
１ａｔ％の添加量が必要である。しかし、多量に添加し
た場合にはλＳの絶対値が無添加の場合の１λ５ｌ＝４
Ｘ１０−８より大きくなってしまうので好ましくない、
従って、第２図より１λ８１＜４Ｘ１０−６の条件を満
たすためには、Ｃｏ、Ｎｉ。FIG. 2 shows the change in magnetostriction constant when the additive element of the present invention is added. As shown in the figure, the magnetostriction constant λ of pure Fe sputtered film
S was about -4X10-', and when an additive element was added to this, λS approached zero and further increased to a positive value as the amount of addition increased. As described above, addition of a small amount of these elements brings λS close to zero, which is preferable as a magnetic head material.To obtain the effect of addition of these elements, a total of 0.
An addition amount of 1 at% is required. However, when a large amount is added, the absolute value of λS is 1λ5l=4 when no additive is added.
This is not desirable because it becomes larger than X10-8.
Therefore, from FIG. 2, in order to satisfy the condition of 1λ81<4X10-6, Co and Ni must be used.
Ｒｕ、Ｒｈ、Ｐｄ、Ｏｓ、Ｉｒ、Ｐｔの添加量をそれぞ
れａ、ｂ、ａ、ｄ、ｅ、ｆ、ｇ、ｈ ａｔ％とした時
に、
の関係式を満たす組成範囲とすることが必要である。ま
た磁気ヘッド用材料としては磁歪定数の絶対値はさらに
小さいことが好ましく、１λｓ１≦２ Ｘ Ｉ Ｑ−８
の条件を満たすためには、ａ＋ｂ１０ 、７ ＋ ｃ
／ ２ ＋ ｄ ／ １ 、４ ＋ ｅ ／ ０ 、５
＋ ｆ ／１ 、５ ＋ ｇ ／ １ 、６ ＋ ｈ
／ ０ 、５≧１ でかっ、ａ／３ ＋ｂ ／ １
、６ ＋ ｃ ／ ７ ＋ ｄ ／ ４ 、６ ＋ ｅ
／ ７ ＋ ｆ／ ８ ＋ ｇ ／ ５ ＋ ｈ ／
２≦１の関係式を満たす組成範囲とすることが必要で
ある。When the amounts of Ru, Rh, Pd, Os, Ir, and Pt added are a, b, a, d, e, f, g, and hat%, respectively, it is necessary to set the composition range to satisfy the following relational expression. be. Further, as a material for a magnetic head, it is preferable that the absolute value of the magnetostriction constant is even smaller, and 1λs1≦2 X I Q-8
In order to satisfy the condition, a+b10,7+c
/ 2 + d / 1, 4 + e / 0, 5
+ f / 1, 5 + g / 1, 6 + h
/ 0, 5≧1 big, a/3 +b/1
, 6 + c / 7 + d / 4, 6 + e
/ 7 + f/ 8 + g / 5 + h /
It is necessary to set the composition range to satisfy the relational expression 2≦1.
実施例２ 実施例１と同様の方法でＦｅにＣｏ、Ｎｉ。Example 2 Co and Ni were added to Fe in the same manner as in Example 1.
Ｒｕ、Ｒｈ、Ｐｄ、Ｏｓ、Ｉ ｒ、Ｐｔを一種以上添加
した合金薄膜を作製した。第１表にこれらの薄膜の飽和
磁束密度Ｂｓおよび磁歪定数λＳを示した。An alloy thin film containing one or more of Ru, Rh, Pd, Os, Ir, and Pt was produced. Table 1 shows the saturation magnetic flux density Bs and magnetostriction constant λS of these thin films.
第 １ 表
第１表続き
とその絶対値が大きい、従来のＦ ｅ −Ｓ ｘ合金薄
膜はＳ ｘ １２ ａ ｔ％の組成で零に近い磁歪定数
を有するが、Ｂｓが約１８ＫＧに減少した。これに対し
て本発明の強磁性薄膜では、Ｃｏ、Ｎｉ。The conventional Fe-S x alloy thin film, which has a large absolute value, has a magnetostriction constant close to zero at a composition of S x 12 at %, but Bs has decreased to about 18 KG. On the other hand, in the ferromagnetic thin film of the present invention, Co and Ni are used.
Ｒｕ、Ｒｈ、Ｐｄ、Ｏｓ、 Ｉｒ ｅ Ｐ ｔを小量
添加することにより磁歪定数を零に近い値とすることが
出来、また２０ＫＧ以上の極めて高いＢｓを得ることが
出来た。By adding small amounts of Ru, Rh, Pd, Os, and IrePt, the magnetostriction constant could be brought to a value close to zero, and an extremely high Bs of 20 KG or more could be obtained.
実施例３
実施例１と同様の方法により作製したスパッタ膜の耐食
性を高温・高湿度試験法により評価した。Example 3 The corrosion resistance of a sputtered film produced by the same method as in Example 1 was evaluated by a high temperature/high humidity test method.
試験条件は６０℃、９０％の高温・高温雰囲気に試料を
３４０時間（２週間）放置し、試験前後の飽和磁化の変
化率（Ｍｏ Ｍ）／Ｍｏ （Ｍｏ ：試験前の飽和磁
化、Ｍ：試験後の飽和磁化）を腐食率として求めた。試
験結果を第２表に示した。The test conditions were to leave the sample in a 90% high-temperature atmosphere at 60°C for 340 hours (2 weeks), and calculate the rate of change in saturation magnetization before and after the test (Mo M)/Mo (Mo: saturation magnetization before the test, M: The saturation magnetization after the test was determined as the corrosion rate. The test results are shown in Table 2.
第 ２ 表
表のように、純Ｆｅスパッタ膜は本試験法では良好な耐
食性を示し、試験後も試料表面は金属光沢を示した。Ｆ
ｅにＳｉ、Ｔｉ、Ｍｏを添加した場合には少量の添加に
より耐食性は著しく劣化し。As shown in Table 2, the pure Fe sputtered film showed good corrosion resistance in this test method, and the sample surface showed metallic luster even after the test. F
When Si, Ti, and Mo are added to e, the corrosion resistance deteriorates significantly even with the addition of a small amount.
試験後の試料表面には全面に赤サビが発生した。After the test, red rust appeared on the entire surface of the sample.
−力木発明のＣｏ、Ｎｉ、Ｒｕ、Ｒｈ、Ｐｄ。-Co, Ni, Ru, Rh, and Pd invented by Shiki.
Ｏｓ、Ｉｒ、Ｐｔを添加したスパッタ膜では腐食は全く
発生せず良好な耐食性を示した。第２表においては添加
量５％の場合について示したが、添加量１％および１０
％の場合も同様に腐食は全く発生しなかった。The sputtered film containing Os, Ir, and Pt showed good corrosion resistance without causing any corrosion. Table 2 shows the case where the addition amount is 5%, but the addition amount is 1% and 10%.
%, no corrosion occurred at all.
実施例４
本発明の組成を有する強磁性薄膜を主磁性膜として、他
の組成を有する磁性体、または非磁性体からなる中間層
と交互に積層することは、磁気特性を向上する上で効果
がある。−例として、主磁性体をＦｅ５ｔＲｈａ、中間
層をＳ ｉ Ｏｘおよびパーマロイとし、主磁性体の膜
厚を０．１ μｍ、中間層の膜厚を３０人として、総膜
厚を１μｍとした積層膜を作製した例を示す、なお主磁
性体膜および中間層は実施例］と同様の条件で作製した
。これらの膜の磁気特性を第３表に示した。Example 4 Stacking a ferromagnetic thin film having the composition of the present invention as the main magnetic film and alternately stacking intermediate layers made of magnetic material or non-magnetic material having other compositions is effective in improving magnetic properties. There is. - As an example, the main magnetic material is Fe5tRha, the intermediate layer is SiOx and permalloy, and the main magnetic material is 0.1 μm thick, the intermediate layer is 30 layers, and the total film thickness is 1 μm. The main magnetic material film and the intermediate layer were prepared under the same conditions as in Example]. The magnetic properties of these films are shown in Table 3.
第 ３ 表
表のように、ＦｅＯ２Ｒｈ ｓの組成を有する単層膜に
比較して、非磁性材料である５ｉＯｚおよび磁性材料で
あるパーマロイを中間層として積層した場合には、ＩＩ
Ｃが低下し、透磁率が大幅に向上することが明らかとな
った。なお、本実施例の効果は、主磁性体の膜厚が０．
０２〜０．５μｍ、中間層の膜厚が２０〜５００人の範
囲において顕著に認められた。As shown in Table 3, compared to a single layer film having the composition of FeO2Rhs, when 5iOz, a non-magnetic material, and Permalloy, a magnetic material, are laminated as an intermediate layer, II
It became clear that C decreased and magnetic permeability significantly improved. Note that the effect of this example is obtained when the film thickness of the main magnetic body is 0.
02 to 0.5 μm, and the thickness of the intermediate layer was significantly observed in the range of 20 to 500 people.
実施例５
本発明の強磁性薄膜を用いて、磁気ヘッドの一例として
記載の垂直磁気記録用磁気ヘッドを作製した。第３図に
作製したヘッドの斜視図を示した。Example 5 A magnetic head for perpendicular magnetic recording described as an example of a magnetic head was manufactured using the ferromagnetic thin film of the present invention. FIG. 3 shows a perspective view of the manufactured head.
図において、主磁極膜として実施例４に述べた本発明の
ＦｅｅフＲｈａとパーマロイとの積層膜、及びＦｅ５ｔ
Ｒｈａの単層膜を用いた。また、比較のためにＦｅを主
磁極膜としたヘッドも作製した。なお。In the figure, a laminated film of FeeF Rha of the present invention and permalloy described in Example 4 as the main magnetic pole film, and Fe5t
A monolayer film of Rha was used. For comparison, a head with a main pole film made of Fe was also fabricated. In addition.
主磁極膜の膜厚は０．３μｍ とした、本試作ヘッドを
、Ｃｏ−Ｃｒ垂直磁気記録用媒体を用いて記録再生特性
を測定した結果、Ｆｅ膜を主磁極膜としたヘッドに比較
して、Ｆθｅ７Ｒｈａ単層膜を主磁極膜としたヘッドの
出力は約２ ｄ Ｂ 、Ｆｅ５ｔＲｈａとパーマロイの
積層膜を主磁極膜としたヘッドは約４ｄＢ高く、本発明
の強磁性薄膜を用いた場合の効果が確認出来た。なお１
本発明の強磁性薄膜は、本実施例の磁気ヘッドのみなら
ず、＊Ｓ磁気ヘッドおよびＶＴＲ用磁気ヘッド等に用い
た場合にも優れた効果を発揮する。また、本発明の強磁
性薄膜は磁気ヘッドのみでなく、高飽和磁束密度と低磁
歪定数、低保磁力、高透磁率、高耐食性が要求される用
途に用いることが出来る。このような川途として例えば
、磁気バブル素子のバブル転送用の磁極膜、垂直磁気記
録用二層膜媒体の下地膜。The recording and reproducing characteristics of this prototype head, in which the thickness of the main pole film was 0.3 μm, were measured using a Co-Cr perpendicular magnetic recording medium. , the output of the head with the main pole film made of a Fθe7Rha single layer film is about 2 dB, and the output of the head with the main pole film made of a laminated film of Fe5tRha and permalloy is about 4 dB higher.The effect of using the ferromagnetic thin film of the present invention is was confirmed. Note 1
The ferromagnetic thin film of the present invention exhibits excellent effects not only in the magnetic head of this embodiment, but also when used in *S magnetic heads, VTR magnetic heads, and the like. Further, the ferromagnetic thin film of the present invention can be used not only for magnetic heads but also for applications requiring high saturation magnetic flux density, low magnetostriction constant, low coercive force, high magnetic permeability, and high corrosion resistance. Examples of such applications include magnetic pole films for bubble transfer in magnetic bubble devices, and base films for double-layer media for perpendicular magnetic recording.
ＭＲ効果を用いた磁気ヘッドのシールド膜等が挙げられ
る。Examples include shield films for magnetic heads that use the MR effect.
なお、本発明の強磁性薄膜に微量の不可避の不純物が含
まれる場合にも、本発明の効果は維持される。Note that even if the ferromagnetic thin film of the present invention contains a trace amount of unavoidable impurities, the effects of the present invention are maintained.
以上述べたように１本発明の強磁性薄膜において、Ｆａ
にＣｏ、Ｎｉ、Ｒｕ、Ｒｈ、Ｐｄ、Ｏｓ。As described above, in the ferromagnetic thin film of the present invention, Fa
Co, Ni, Ru, Rh, Pd, Os.
Ｉｒ、Ｐｔの一種または一種以上を適量添加することに
より、極めて高い飽和磁束密度を有し、磁歪定数が零に
近く、かつ耐食性に優れた強磁性薄膜を得ることが出来
、これを用いた磁気ヘッドにおいて優れたヘッド特性が
得られることが明らかである。By adding appropriate amounts of one or more of Ir and Pt, it is possible to obtain a ferromagnetic thin film that has an extremely high saturation magnetic flux density, a magnetostriction constant close to zero, and excellent corrosion resistance. It is clear that excellent head characteristics can be obtained in the head.
第１図および第２図はＦｅにＣｏ、Ｎｉ、Ｒｕ。
Ｒｈ、Ｐｄ、Ｏｓ、Ｉｒ、Ｐｔを添加した薄膜の添加板
と飽和磁束密度Ｂｓおよび磁歪定数λＳの関係をそれぞ
れ示す特性図、第３図は本発明で実施した磁気ヘッドの
斜視図である。
１・・・主磁極膜、２・・・非磁性材、３・・・充填ガ
ラス、４・・・Ｍ ｎ −Ｚ ｎフェライト、５・・・
Ｍ ｎ −Ｚ ｎフェライト、６・・・巻線窓。
／ヂFigures 1 and 2 show Fe, Co, Ni, and Ru. A characteristic diagram showing the relationship between a thin film doped plate doped with Rh, Pd, Os, Ir, and Pt, a saturation magnetic flux density Bs, and a magnetostriction constant λS, and FIG. 3 is a perspective view of a magnetic head implemented in the present invention. DESCRIPTION OF SYMBOLS 1... Main magnetic pole film, 2... Non-magnetic material, 3... Filling glass, 4... Mn-Zn ferrite, 5...
M n -Z n ferrite, 6... wire-wound window. ／も
Claims (10)
、Ｏｓ、Ｉｒ、Ｐｔからなる群より選択した少なくとも
一元素を合計０．１ａｔ％以上含有し、Ｃｏ、Ｎｉ、Ｒ
ｕ、Ｒｈ、Ｐｄ、Ｏｓ、Ｉｒ、Ｐｔの含有量をそれぞれ
ａ、ｂ、ｃ、ｄ、ｅ、ｆ、ｇ、ｈ（ａｔ％）した時に、 ▲数式、化学式、表等があります▼ なる関係式を満たすことを特徴とした強磁性薄膜。1. Main component is Fe, Co, Ni, Ru, Rh, Pd
, Os, Ir, and Pt, containing a total of 0.1 at% or more of at least one element selected from the group consisting of Co, Ni, and R.
When the contents of u, Rh, Pd, Os, Ir, and Pt are expressed as a, b, c, d, e, f, g, and h (at%), respectively, ▲There are mathematical formulas, chemical formulas, tables, etc.▼ A ferromagnetic thin film that satisfies the formula.
Ｃｏ、Ｎｉ、Ｒｕ、Ｒｈ、Ｐｄ、Ｏｓ、Ｉｒ、Ｐｔの含
有量が、 ▲数式、化学式、表等があります▼ であり、かつ ▲数式、化学式、表等があります▼ なる関係を満たすことを特徴とした強磁性薄膜。2. In the ferromagnetic thin film according to claim 1,
The contents of Co, Ni, Ru, Rh, Pd, Os, Ir, and Pt satisfy the following relationship: ▲There are mathematical formulas, chemical formulas, tables, etc.▼ and ▲There are mathematical formulas, chemical formulas, tables, etc.▼ Characteristic ferromagnetic thin film.
において、該強磁性薄膜がスパッタリング法により形成
されたことを特徴とする強磁性薄膜。3. A ferromagnetic thin film according to claim 1 or 2, characterized in that the ferromagnetic thin film is formed by a sputtering method.
の強磁性薄膜において、該強磁性薄膜を主磁性膜として
、他の組成を有する磁性材料もしくは非磁性材料からな
る中間層と交互に積層してなることを特徴とした強磁性
薄膜。4. In the ferromagnetic thin film according to claim 1, 2, or 3, the ferromagnetic thin film is used as the main magnetic film and alternately with intermediate layers made of magnetic material or nonmagnetic material having other compositions. A ferromagnetic thin film characterized by being made of laminated layers.
前記主磁性膜の一層の膜厚が０．０２〜０．５μｍであ
り、前記中間層の一層の膜厚が２０〜５００Åであるこ
とを特徴とする強磁性薄膜。5. In the ferromagnetic thin film according to claim 4,
A ferromagnetic thin film, wherein the main magnetic film has a thickness of 0.02 to 0.5 μm, and the intermediate layer has a thickness of 20 to 500 Å.
、Ｏｓ、Ｉｒ、Ｐｔからなる群より選択した少なくとも
一元素を合計０．１ａｔ％以上含有し、Ｃｏ、Ｎｉ、Ｒ
ｕ、Ｒｈ、Ｐｄ、Ｏｓ、Ｉｒ、Ｐｔの含有量をそれぞれ
ａ、ｂ、ｃ、ｄ、ｅ、ｆ、ｇ、ｈ（ａｔ％）とした時に
、 ▲数式、化学式、表等があります▼ なる関係式を満たす強磁性薄膜を磁気回路の少なくとも
一部に用いたことを特徴とする磁気ヘッド。6. Main component is Fe, Co, Ni, Pu, Rh, Pd
, Os, Ir, and Pt, containing a total of 0.1 at% or more of at least one element selected from the group consisting of Co, Ni, and R.
When the contents of u, Rh, Pd, Os, Ir, and Pt are respectively a, b, c, d, e, f, g, and h (at%), there are ▲mathematical formulas, chemical formulas, tables, etc.▼ A magnetic head characterized in that a ferromagnetic thin film satisfying a relational expression is used in at least a portion of a magnetic circuit.
上記強磁性薄膜は、Ｃｏ、Ｎｉ、Ｒｕ、Ｒｈ、Ｐｄ、Ｏ
ｓ、Ｉｒ、Ｐｔの含有量が、▲数式、化学式、表等があ
ります▼ であり、かつ なる関係を満たすことを特徴とした磁気ヘッド。7. In the magnetic head according to claim 6,
The above ferromagnetic thin film is made of Co, Ni, Ru, Rh, Pd, O
A magnetic head characterized in that the contents of s, Ir, and Pt satisfy the following relationship: ▲There are mathematical formulas, chemical formulas, tables, etc.▼.
において、上記強磁性薄膜がスパッタリング法により形
成されたことを特徴とする磁気ヘッド。8. 8. A magnetic head according to claim 6, wherein the ferromagnetic thin film is formed by a sputtering method.
の磁気ヘッドにおいて、上記強磁性薄膜を主磁性膜とし
て、他の組成を有する磁性材料もしくは非磁性材料から
なる中間層と交互に積層してなることを特徴とした磁気
ヘッド。9. In the magnetic head according to claim 6, 7, or 8, the ferromagnetic thin film is used as a main magnetic film, and intermediate layers made of magnetic materials or non-magnetic materials having other compositions are alternately laminated. A magnetic head characterized by:
、前記主磁性膜の一層の膜厚が０．０２〜０．５μｍで
あり、前記中間層の一層の膜厚が２０〜５００Åである
ことを特徴とする磁気ヘッド。10. The magnetic head according to claim 9, wherein the thickness of one layer of the main magnetic film is 0.02 to 0.5 μm, and the thickness of one layer of the intermediate layer is 20 to 500 Å. magnetic head.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6832586A JPS62226605A (en) | 1986-03-28 | 1986-03-28 | Ferromagnetic thin film and magnetic head using the same |
| US07/016,402 US4891278A (en) | 1986-02-21 | 1987-02-19 | Ferrromagnetic thin film and magnetic head using it |
| DE3788579T DE3788579T3 (en) | 1986-02-21 | 1987-02-20 | Ferromagnetic thin film and magnetic head using it. |
| EP87301470A EP0234879B2 (en) | 1986-02-21 | 1987-02-20 | Ferromagnetic thin film and magnetic head using it |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6832586A JPS62226605A (en) | 1986-03-28 | 1986-03-28 | Ferromagnetic thin film and magnetic head using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62226605A true JPS62226605A (en) | 1987-10-05 |
Family
ID=13370558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6832586A Pending JPS62226605A (en) | 1986-02-21 | 1986-03-28 | Ferromagnetic thin film and magnetic head using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62226605A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5363211A (en) * | 1976-11-18 | 1978-06-06 | Ibm | Corrossionnresistant ferromagnetic alloy for thin film use |
| JPS5975610A (en) * | 1982-10-25 | 1984-04-28 | Hitachi Ltd | Iron base magnetic alloy thin film and manufacture thereof |
| JPS5984407A (en) * | 1982-11-05 | 1984-05-16 | Hitachi Ltd | Magnetic recording medium |
| JPS59207608A (en) * | 1983-05-11 | 1984-11-24 | Hitachi Ltd | High permeability magnetic thin film |
-
1986
- 1986-03-28 JP JP6832586A patent/JPS62226605A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5363211A (en) * | 1976-11-18 | 1978-06-06 | Ibm | Corrossionnresistant ferromagnetic alloy for thin film use |
| JPS5975610A (en) * | 1982-10-25 | 1984-04-28 | Hitachi Ltd | Iron base magnetic alloy thin film and manufacture thereof |
| JPS5984407A (en) * | 1982-11-05 | 1984-05-16 | Hitachi Ltd | Magnetic recording medium |
| JPS59207608A (en) * | 1983-05-11 | 1984-11-24 | Hitachi Ltd | High permeability magnetic thin film |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4743491A (en) | Perpendicular magnetic recording medium and fabrication method therefor | |
| EP0297776A1 (en) | Soft magnetic thin films | |
| Kohmoto | Recent development of thin film materials for magnetic heads | |
| US5439754A (en) | Ferromagnetic film, method of manufacturing the same, and magnetic head | |
| EP0234879B1 (en) | Ferromagnetic thin film and magnetic head using it | |
| US4707417A (en) | Magnetic composite film | |
| JP2508489B2 (en) | Soft magnetic thin film | |
| EP0178634B1 (en) | Amorphous soft magnetic thin film | |
| JPH01238106A (en) | Corrosion-resistant ferromagnetic thin-film | |
| JPS62226605A (en) | Ferromagnetic thin film and magnetic head using the same | |
| JP2552546B2 (en) | Metal thin film magnetic recording medium | |
| JPS60132305A (en) | Iron-nitrogen laminated magnetic film and magnetic head using the same | |
| JPS58100412A (en) | Manufacture of soft magnetic material | |
| JP3232592B2 (en) | Magnetic head | |
| JPS6313256B2 (en) | ||
| JPS58118015A (en) | Magnetic head | |
| JPS62139846A (en) | Ferromagnetic material | |
| JP2551008B2 (en) | Soft magnetic thin film | |
| JP3194578B2 (en) | Multilayer ferromagnetic material | |
| JP3796136B2 (en) | Soft magnetic thin film and thin film magnetic head using the same | |
| JP3233538B2 (en) | Soft magnetic alloys, soft magnetic thin films and multilayer films | |
| KR940008644B1 (en) | Magnetic alloy thin film for magnetic head | |
| JPH01143312A (en) | Amorphous soft magnetic laminated film | |
| JPH04252006A (en) | Corrosion-resistant magnetically soft film and magnetic head using the same | |
| JPS6399507A (en) | Soft magnetic film |