JPS6186172A - Polishing method for glass plate and its device - Google Patents
Polishing method for glass plate and its deviceInfo
- Publication number
- JPS6186172A JPS6186172A JP59162385A JP16238584A JPS6186172A JP S6186172 A JPS6186172 A JP S6186172A JP 59162385 A JP59162385 A JP 59162385A JP 16238584 A JP16238584 A JP 16238584A JP S6186172 A JPS6186172 A JP S6186172A
- Authority
- JP
- Japan
- Prior art keywords
- surface plate
- plate
- workpiece
- polishing
- glass plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野：
本発明は主として大型の平面板ガラスを高精度に研磨す
る方法及びその装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application: The present invention mainly relates to a method and apparatus for polishing a large flat glass plate with high precision.
従来技術：
通常ガラスの平面研磨に関しては、その対象物が小型の
場合には一般的な研磨手段でもって目的の精度迄研磨す
ることが可能であるが、被研磨物が大型になったときに
はすべてを機械による研磨仕上げが困難で、主に人手に
よる仕上げ作業が主休となり、そのために精度を高めよ
うとすると作業者に熟練度が要求さｎ１当然工費が嵩み
、しかも作業性が低い等多くの問題点がある。そのため
に一部で機械処理することも研究されているが、被研磨
物（以下単にワークと称する）に対する荷重の与え方及
びワークと研磨体との均等な面接触全行わぜることに未
だ満足できる結果が得られず、従って実用化する段階に
到っていない。Conventional technology: When it comes to flat surface polishing of glass, when the object is small, it is possible to polish it to the desired precision using general polishing methods, but when the object becomes large, it is impossible to polish it to the desired precision. It is difficult to polish and finish with a machine, and the finishing work is mainly done by hand. Therefore, if you try to improve the accuracy, the operator needs to be highly skilled. Naturally, the labor cost increases, and the workability is low, etc. There is a problem with this. For this purpose, some research has been carried out on mechanical processing, but it is still not satisfactory in how to apply the load to the object to be polished (hereinafter simply referred to as the workpiece) and in ensuring uniform surface contact between the workpiece and the polishing body. However, it has not yet reached the stage where it can be put to practical use.
而して所かる大型のガラス板（たとえばｓｏｏ ｘ６０
０ ｔａｘ、 ６００ Ｘ ７００ ｍ、 ７００
Ｘ ８００ ｗｍ等）で平面研磨して精度を要求さｎる
ものけ、たとえば精密なフォトエツチング加工用のパタ
ーン原板などに使用するためのものがあり、このような
用途として多量に必要とする場合、人手罠た工っていた
のでは生産性の向上をめざすべくもない。Therefore, a large glass plate (for example, SOO x60
0 tax, 600 x 700 m, 700
There are products that require high precision by flat-polishing them (e.g., 800 wm), such as pattern plates for precise photo-etching, and when large quantities are required for such applications. However, there is no way to improve productivity if the work is done manually.
発明の目的：
未発ＥＪＡは所かる現況に鑑みてなされたものであって
、大型平面ガラス板であってもその表面に対して＆ｆ磨
盤を均等荷重で全体にわたりほぼ均等な面接触状励を保
ち、自動的に精密な研磨加工を施すことかでき、生産性
の向上が図れる研磨加工方法とその装置とを提供するこ
とにある。Purpose of the invention: Undeveloped EJA was developed in view of the current situation, and it is a method to apply a &f polishing machine to the surface of a large flat glass plate with a uniform load to apply a substantially uniform surface contact over the entire surface. It is an object of the present invention to provide a polishing method and an apparatus therefor, which can maintain high quality and automatically perform precise polishing, thereby improving productivity.
発明の構成：
所かる目的を達成するために、本発明にては、所要寸法
の平面板ガラスを水平な直線往復動する下１ｌｌｓ定盤
上に載置して、該被加工物上面に対し、適宜速度で回転
する首振り自在でかつ昇降可能に支持され友上部定盤を
、その自重をかけて当接し、該上部定盤の盤面に溢わせ
て拡散するよう研磨剤液を供給し、上部定ｆＩ＆を回転
させつつ下品定盤により被加工物を適宜距離往復動させ
て研磨するようにし比のである。Structure of the invention: In order to achieve a certain object, in the present invention, a flat plate glass of required dimensions is placed on a lower 1lls surface plate that reciprocates in a horizontal straight line, and the upper surface of the workpiece is The abrasive liquid is supplied so as to overflow and spread over the surface of the upper surface plate by applying its own weight to the friend upper surface plate which rotates at an appropriate speed and is supported so as to be able to freely swing and move up and down. The workpiece is polished by reciprocating the workpiece by an appropriate distance using a rough surface plate while rotating a constant fI&.
本発明は、適宜長さで上面にガイドレールを敷設し７’
Ｃ機台上に、そのガイドレールに沿って互助機構で作ｇ
ＩＪ基準位置から前後に所要寸法往復動する被加工物取
付は用の下部定盤を載置し、機台の適所には前記下部定
盤の１−動を妨げないようにして上側に門型のフレーム
をｌ！ｆ投し、該フレーム上面には前記下部定盤の作動
基準位置中心に、昇降機構によって上下前可能で、かつ
Ｗ、幼根にて所要速度で回転部！Ｉのさｎる主＠を中心
とする上部定盤支持ユニットを垂設し、その主軸の下端
に接手を介して一定量上下方同に自由になって回転力が
伝達されると共に首振り自在に連結された上部定盤を吊
設し、該上部定盤の研磨盤面には中央部から外周へ放射
状に多数の研磨剤液誘導溝を刻設して、機外から回転す
る上部定盤の盤１ｍ ＩＣＧい研磨剤液か供給されるよ
うにしてガラス板の板面研磨装置を構成し比のである〇
ス施例：
次に本発明の平面ガラス板を研磨する方決について、そ
の−大施６１ｊ表箇の図面に工り詳述すれば、第１図乃
至？ＪＪ５図に示すのは研磨装置の共体例であり、作業
に好適な高さにワーク支持面か位置するよう下Ｍ、疋盤
（３；か機台１１１上に配されており、該機台Ｉｌｌは
下部定盤（３１が前後方向（第１図において左石の方向
）［所要距離不平往復動自在な長さＫして、上面に該下
品定盤（３１栗内文Ｒ用のガイドレール１２＋ ＋２＋
が平行して配さ、ｒｔ、このガイドレール１２）上に案
内子（４）ｔ−介して下部定盤（３）かＩｉｔ置されて
いる。ま几、該下部定盤（３）は機台１１）内部に配役
さＡ九往復駆動機構（６）によって所要距離前後動する
ようになっており、＋８１ Ｆｉ［ａモータ、（７）（
））はチェノ（７１巻掛は鎖車、（８）は伝導機構であ
る。In the present invention, a guide rail is laid on the upper surface with an appropriate length.
Created using a mutual support mechanism on the C machine stand along the guide rail.
A lower surface plate for mounting a workpiece that reciprocates the required distance back and forth from the IJ reference position is placed, and a gate-shaped upper surface plate is placed at the appropriate location on the machine base so as not to interfere with the movement of the lower surface plate. The frame of l! f, the upper surface of the frame can be moved up and down by a lifting mechanism around the operating reference position of the lower surface plate, and W, a rotating part at the required speed with the radicle! An upper surface plate support unit is installed vertically around the main shaft of I, and a fixed amount of rotational force is transmitted upward and downward via a joint at the lower end of the main shaft, allowing it to swing freely. An upper surface plate connected to the machine is suspended, and a large number of abrasive liquid guide grooves are carved radially from the center to the outer periphery on the polishing surface of the upper surface plate, and the upper surface plate rotates from outside the machine. A plate surface polishing apparatus for a glass plate is configured so that a 1 m long ICG abrasive liquid is supplied. If the details of the work are described in the drawings in section 61j, Figure 1 to ? Figure JJ5 shows an example of a combined polishing device, in which a lower M, a grate (3) or a machine base 111 are arranged so that the work supporting surface is located at a height suitable for the work. Ill is a lower surface plate (31 is the front-rear direction (direction of the left stone in Figure 1) [length K that can freely reciprocate over the required distance), and the upper surface is the lower surface plate (31 guide rail for Kurinai-mon R). 12+ +2+
are arranged in parallel, and a lower surface plate (3) is placed on this guide rail 12) via a guide (4). The lower surface plate (3) is moved back and forth the required distance by a reciprocating drive mechanism (6) placed inside the machine base (11), and is driven by a +81 Fi[a motor (7) (
)) is the chain wheel (71 windings are the chain wheel, (8) is the transmission mechanism.
所かる機台＋１）の一方に片寄せて（第１図図上では右
側）上部罠前配下部定ｆ＆＋３）の移動に支障ない −
状態で門型状に上部定盤支持フレーム叫を跨役し、該フ
レーム叫の上面前部中央ＫＦｉ垂直く上部定盤支持ユニ
ット翰の本体＠υが収付けてあり、この本体ａｌｌには
後述する中空軸と上下動可能な主軸上をＪｔ １ｉ１７
支持せしめて軸の下部に上部定盤鴎が吊設されており、
７レ一ムａａ上面に載置された減速機（ＩＩ）を介して
モータａ匂により所要の速度で回転するようになさｎて
いる。There is no problem in moving the upper trap front subordinate position f&+3) by shifting it to one side of the machine base +1) (on the right side in Figure 1) -
In this state, the main body @υ of the upper surface plate support unit is housed vertically at the front center of the upper surface of the frame, which straddles the upper surface plate support frame in a gate shape. Jt 1i17 on the hollow shaft and main shaft that can move up and down.
An upper surface plate is suspended from the bottom of the shaft to support it.
The motor is rotated at a required speed via a speed reducer (II) placed on the upper surface of the seventh frame.
而して上部定盤支持ユニット四は８３図及び第４図に示
すＬうに、クレーム（Ｉαに固着した零体圓内を垂直に
貫通して回動不能で上下動自在に支持さ八る中空軸−に
、その上下両端部で軸受（資）とテーパーａ−り軸受−
とにより回転自在に支持される主軸酬１を貝゛設し、該
主軸ご七の上部はや中細径にしてボールスプライン軸部
−となし、本体体９の上部に同軸心で収付けらＡ ｆＣ
”クジングＴ２６にボールベアリング６ｃ２今に工す￥
持される回転中空軸−の内下部には、ボールスプライン
ａａ ｆ ｆ？、設して、前記主袖価のボールスフリイ
ン軸部（２）員滑合させ、該；１！Ｊ伝中認軸Ｑの上端
に（１車餞を敗行けて減速機山）圧力軸（ｌｌ’ｌ上の
４ム車（１（１）とチェン弘の巻掛けで回転、４へ朝さ
几る工うにしてあり、［）ｉＩ記空中空軸の中間部−＋
！１１にはラックギヤ頒が収付けられ、本体体Ｊのギギ
’５ （２１ａ） 内でピニオンギャガと該ラックギ
ヤ翰とが噛合するようにし、ま之中同部の他側部にはカ
ム７オロアー（４を収付けて本体体ｌ）の胴側に設け７
’Ｃ艮孔り１１に伝望Ｊ目在に区め合せ、該中空軸−の
洞り止めの働き全するようｆ形成しである０そして面記
ピニオンギヤ２７１は本体（２１１に軸受ｃｈ６にて支
持され比軸ｄに支持さ几、該ビニオン４１１１１］己の
突出端軸頚とフレーム外側に付設さｎている昇降駆動用
、一連機ＯＱの圧力軸０４とは連結軸Ｏηの両端部で同
一軸線に合致するよう嵌合連結し、減速機ａ鴫付属のハ
ンドルＲＬ−の回助により、減速されて回ｅｊ操作する
工うになっている。As shown in FIGS. 83 and 4, the upper surface plate support unit 4 is a hollow structure that vertically passes through the zero body circle fixed to the claim (Iα) and is supported so as to be unrotatable but vertically movable. Bearings and tapered a-shaped bearings are installed on the shaft at both its upper and lower ends.
A main shaft 1 is rotatably supported by the main shaft 7, and the upper part of the main shaft 7 has a medium-thin diameter to form a ball spline shaft part, which is coaxially housed in the upper part of the main body 9. A fC
``I'm about to install a ball bearing 6c2 on Kujin T26.
A ball spline aa f f? , and slide the ball fly-in shaft part (2) of the main sleeve part into contact with each other; 1! At the upper end of the J transmission axis Q (1 car can be removed and the speed reducer mountain) is the pressure axis (4 wheels on ll'l (1 (1) and Chen Hong's winding, rotate, 4 to 4). It is designed to be a cooling mechanism, [) iI middle part of the air axis -+
! 11 houses a rack gear holder, so that the pinion gag and the rack gear holder mesh with each other in gear 5 (21a) of the main body J, and a cam 7 lower ( 4 and provided on the body side of the main body l) 7
The pinion gear 271 is arranged on the main body (211 at the bearing ch6. The pinion 41111 is supported on the ratio axis d, and the pinion 41111 is the same at both ends of the connecting shaft Oη and the pressure axis 04 of the series machine OQ for lifting and lowering drive attached to the outside of the frame is attached to the protruding end shaft neck. They are fitted and connected so as to match the axis, and are decelerated and rotated with the help of a handle RL- attached to the reducer a.
前記主軸ｅ２４１の下端には７ランジ接手（財）を収付
け、この１１チ手（至）に対向する接手片端は５１６部
を長くして中央孔に頭付き軸ピンｃ１１０１ｆ：神通し
てあり、ボス−の上端部外周には相対向して突起ｉｉを
横向きに突設し、前記軸ピン国の下端部には球体０６を
固着して、この球体（３６に被嵌する球面孔を備えた軸
受ｈ’ｂ２カバー−を介して上部定盤−の支持座片關内
に装着し、この球体０６と軸受＠１とが組合わさってな
る球面軸受＠υにエリ上部定盤顛を首振り自在に吊設す
る０なお支持座片−の上面には前記接手片開突設の突起
６凶と係合する受爪−一が適宜高さで直立形成してあり
、前記球面軸受制と繋いだ頭付き軸ビン−は上下方向に
適宜寸法移動可能な間隙（１）を関係個所に設け、これ
らの外周部はジャバラ−によって保護さｎるようにしで
ある。A 7-lunge joint is housed in the lower end of the main shaft e241, and one end of the joint opposite to the 11th hand has a length of 516 parts and a headed shaft pin c1101f in the central hole. A protrusion ii is provided on the outer periphery of the upper end of the boss to protrude sideways so as to face each other, and a sphere 06 is fixed to the lower end of the shaft pin. The bearing h'b2 is installed in the supporting seat part of the upper surface plate through the cover, and the upper surface plate can be freely swung to the spherical bearing @υ formed by combining the sphere 06 and the bearing @1. Furthermore, on the upper surface of the support seat piece which is suspended from the support seat piece, there is formed an upright receiving pawl at an appropriate height to engage with the protrusion 6 of the opening protrusion of the joint piece, and connects it to the spherical bearing system. The headed shaft bottle is provided with gaps (1) at relevant locations so that it can be moved up and down as appropriate, and the outer peripheries of these are protected by bellows.
そして上部定盤−は前記下部定盤（３）の幅とほぼ等し
い直径（こｎに限定されるものではない）の円形にして
前記し７ｃ工う【中央のボス１４ｉｔ部で支持座片−を
介し吊下げられており、このボス１．％ｌ）には支持座
片−取付は部の周囲に研磨剤供給用の環状溝〔力が刻設
してあり、この環状溝−の底部から定盤の盤面禰まで適
宜ピッチで等分して多数の研磨剤液流通小孔■が？設し
てあり、盤面−には第５図に例示するよう放射状に研磨
剤誘導溝部が前記小孔−から外周に向は刻役し、小孔−
に連結する誘導溝補間に途中から外周までの誘導溝−を
各区画当り１または複数条それぞれ刻設しである。（至
）は保護カバー、０１ｌ−は取付はナツトである。Then, the upper surface plate is made into a circular shape with a diameter (not limited to) approximately equal to the width of the lower surface plate (3). This boss 1. %l) has an annular groove carved around the periphery of the supporting seat piece for supplying abrasive, and the annular groove is equally divided at appropriate pitches from the bottom of the groove to the surface of the surface plate. Is there a large number of small holes for abrasive liquid distribution? As shown in FIG. 5, abrasive guide grooves are radially carved from the small holes toward the outer periphery of the disk surface, and the small holes are
One or more guide grooves are carved in each section from the middle to the outer periphery of the guide groove interpolation connected to the guide groove. (to) is a protective cover, and 01l- is installed with a nut.
なお、前記主軸（財）に接手側御を介して連結した上部
定盤間吊下げの定めの球面軸受ｒ３υによる首振り支持
中心（０）が盤面（転）に近い位置となるように構成し
である。また、フレーム叫の上面には研磨剤の貯槽−を
載置しておき、この貯槽−から配管（図示省略）Ｉｃよ
って上部定盤−の環状溝（４２に研磨剤が供給される工
うＫしである。In addition, the structure is such that the swing support center (0) by the spherical bearing r3υ connected to the main shaft (material) via a joint side control and suspended between the upper surface plates is located close to the board surface (rotation). It is. In addition, an abrasive storage tank is placed on the upper surface of the frame, and the abrasive is supplied from this storage tank to the annular groove (42) of the upper surface plate through a pipe (not shown). It is.
所くの如き＠成からなる研磨装置によって平面板ガラス
を研磨する操作を説明すれば、先づ目的とする所要厚み
の平面板ガラス囚を下部定盤（３）上に所要位置で定置
する。なお必要に応じ接着剤等で適宜固定することが望
ましい。次いで上部定盤−の昇降操作用ハンドル車０口
を回転してピニオンギヤ罰を回幼し、これに噛合のラッ
クギヤ翰を介して中空軸＠を下降させれば該中空軸□□
□内組込みの主軸−と共に下方に吊設の上部定盤−が下
降し、該定盤ｘｔ−ガラス板囚の被研磨面（以下ワーク
面という）に当接させる。なお、この際主軸（財）の下
端に接手！２１１四を介して実質的に上部定盤−を吊下
げている頭付き軸ビン−が接手片四内で上方１司に＄利
して、該上部定盤鴎とこれに付属した部品との重量（以
下単に定盤の自重という）がワーク面に作用する工うに
中空軸間の下降量を多くしておく。To explain the operation of polishing a flat plate glass using a polishing apparatus such as the one shown in FIG. Note that it is desirable to fix it with an adhesive or the like as necessary. Next, the handle wheel for raising and lowering the upper surface plate is rotated to regenerate the pinion gear, and the hollow shaft is lowered through the rack gear that meshes with it, and the hollow shaft □□
□The upper surface plate suspended below is lowered together with the built-in main shaft, and the surface plate xt is brought into contact with the surface to be polished (hereinafter referred to as the work surface) of the glass plate. In addition, at this time, there is a joint at the bottom end of the main shaft (goods)! 211-4, the headed shaft bottle which is substantially suspending the upper surface plate is suspended upwardly within the joint piece 4, and the upper surface plate is connected to the parts attached thereto. The amount of descent between the hollow shafts is increased so that the weight (hereinafter simply referred to as the surface plate's own weight) acts on the work surface.
このようにし友後上部定ａｆ４１の研磨剤供給用環状溝
ｆｔ２に貯４１１州から研磨剤分数液（念と、ｔばグリ
ーンカーボランダム微細粒と水とを１：１０程度の重量
比で混合したもので、以下研磨剤液というンを適宜量供
給しつつ互助モータＱ匂から減速機（１１）を経て回転
中空軸−上端の鎖車α３１に所要速度で回転力を伝達す
れば、該中空軸（至）と主軸（財）とはスプライン軸部
（２石とこれに係合しているボールスプライン−とにエ
リそのまま伝導されて、主軸例に連結する接手（ハ）四
を介し上部定盤θＱ、が回転し、ガラス板（４）ワーク
面が研磨される。この研磨操作時下部定盤（３）上に静
置しているガラス板（２）ワーク面に対して回転する上
部定盤−１の盤面（４１には環状溝（６）底に穿孔の流
通小孔（４蜀から連通して放射状に刻設さ八ている誘辱
溝顛を通じて遠心力で外周方向に誘導さｎて盤面＠ｊと
ワーク面との間に研磨剤液が拡散さｎ、前記流通小孔（
ロ）と直結している誘導溝−から送り出され之研磨剤液
は盤面中間ＫｊｉｌＪ設の誘導溝−にも受入ルられて定
盤０１の回転中に研磨剤液による膜が途ｇＪＡないよう
保ってワーク面を研磨する。In this way, a fraction of the abrasive liquid from the 411 state was stored in the annular groove ft2 for abrasive supply in the upper part of the af41. By supplying an appropriate amount of abrasive liquid and transmitting the rotational force from the mutually auxiliary motor Q through the reducer (11) to the chain wheel α31 at the upper end of the rotating hollow shaft at the required speed, the hollow shaft (2) and the main shaft (1) are connected to the spline shaft (2 stones and the ball spline engaged with this). θQ rotates, and the work surface of the glass plate (4) is polished. During this polishing operation, the upper surface plate rotates relative to the work surface of the glass plate (2), which is placed stationary on the lower surface plate (3). -1 board surface (41 has an annular groove (6) and a small circulation hole perforated at the bottom (4). The abrasive liquid is diffused between the disk surface @j and the work surface, and the small circulation holes (
The abrasive liquid is sent out from the guide groove directly connected to the surface plate 01 and is also received by the guide groove installed in the middle of the board to keep the abrasive liquid from forming a film during the rotation of the surface plate 01. Polish the work surface.
而して所かる上部定盤（６）の回転による研磨操作に対
して、下部定盤（３）をその往復駆動機構（６）Ｋより
定盤（３）の２７３程度前後方向に緩やかな速度で往イ
ス移助させ、ワーク面を直線往復移動させつつ回転する
上品定ａ（４１の自重でもって盤面−に沿い供給される
研磨剤液をすりつけてくまなく研磨するのである。この
際ワーク面に乗った状態で回転する上部定盤ｈａは、前
記したように回転力を伝導する主軸（２）下部で接手片
開の横向き突起凶ｉと定盤側の支持座片−上の受爪−一
との保合で回転力が保友九つつ、連結する球面軸受＠ｌ
）Ｋおける自在首振りとで、回転による遠心力の作用に
より常時水平状唇に床几れて盤面（ロ）全体がワーク面
にほぼ均等に回転接触し、盤面−の回転半径の小さい中
心部で研磨されるワーク面も、下部定盤（３）の移動に
よって定位置で回転する上部定盤−の外周寄り盤面と接
触することＫなって、全面にわたり研磨むらもなくなり
均等の研磨が行われるのである。なお、上部定盤−は主
軸（２）との連結部において首振り自在に連結されてい
るので、上記したように回転時における遠心力の作用に
よる盤面の水平維持のほかに、ガラス板被加工面に凹、
凸が生じていたり、不測の事愚か生じた場合でも球面軸
受のり８で定盤四が首振りして被加工面に大きな傷を生
じさせたりすることなく安全に対応でき、また主軸（２
）軸芯が被加工面九対し垂直でない状態にあっても球面
軸受０１１部でその傾きが補正されて回転し、正確な平
面研磨が行えるのである。In response to the polishing operation caused by the rotation of the upper surface plate (6), the lower surface plate (3) is moved at a gentle speed in the front and rear direction of the surface plate (3) by its reciprocating drive mechanism (6) K. The workpiece surface is moved back and forth by the chair, and the workpiece surface is reciprocated in a straight line while being rotated.With its own weight, the abrasive liquid supplied along the board surface is applied and polished thoroughly.At this time, the workpiece surface is thoroughly polished. The upper surface plate ha, which rotates while riding on the surface plate, has a main shaft (2) that transmits rotational force as described above, a horizontal protrusion i with one joint open at the bottom of the main shaft (2), and a receiving pawl on the support seat piece on the surface plate side. The rotational force is increased by the engagement with the first, and the connected spherical bearing @l
) Due to the free oscillation of K, the centrifugal force caused by rotation causes the entire board surface (B) to be in rotational contact with the work surface almost evenly due to the horizontal lip being in constant contact with the work surface, and the center part of the board surface (-) having a small rotation radius. As the lower surface plate (3) moves, the work surface to be polished also comes into contact with the surface of the upper surface plate near the outer periphery, which rotates in a fixed position, thereby eliminating uneven polishing over the entire surface and ensuring uniform polishing. It is. The upper surface plate is connected to the main shaft (2) so that it can swing freely, so in addition to maintaining the horizontal surface of the plate due to the action of centrifugal force during rotation as described above, Concave on the surface,
Even if a convexity occurs or something unexpected happens, the surface plate 4 can be safely handled by the spherical bearing glue 8 without causing large scratches on the workpiece surface.
) Even if the axis is not perpendicular to the surface to be machined, the spherical bearing 011 corrects the inclination and rotates, allowing accurate surface polishing.
所くして所要Ｖｆ間研磨操作を行った後は研磨剤液の供
給を止めて昇降操作用・・ンドル車（１角を前記下降操
作時と逆の操作を行うことにより、中空軸−と共に主軸
２４１が引き上げられ、軸ビン−の頭部−が接手片開の
段部（２９ａ） と接した後は該軸、ビン−を介して
上部定盤−がワーク面から離れて引き上げられることに
なる。・・従って上部定盤四を引き上げた後、下部定盤
（３）上に静置された処理済みガラス板を収り外して次
の被処理ガラス板と交換し、析たに前記要領で研磨操作
を行えばよい。After performing the polishing operation for the required Vf, stop the supply of the polishing liquid and use the lift wheel (one corner of the wheel for lifting and lowering) in the opposite manner to the lowering operation to remove the hollow shaft and the main shaft. 241 is pulled up, and after the head of the shaft bin comes into contact with the step part (29a) with one joint open, the upper surface plate is pulled up away from the work surface via the shaft and the bin. ...Therefore, after pulling up the upper surface plate 4, the treated glass plate placed on the lower surface plate (3) is removed and replaced with the next glass plate to be treated, and then analyzed in the same manner as described above. All you have to do is perform a polishing operation.
なお、研磨操作部から外部に流れ出し比研磨剤液は機台
１０上に設は九戸樋（図面省略）から、該機台１凰）端
部に付設した排出部を経て適宜沈澱ｍ＜図示省Ｗｆｒ）
に導き、この槽にて研磨粒だけを沈降分１碓させ、再使
用するようになす。In addition, the abrasive liquid flowing out from the polishing operation part is appropriately precipitated from the Kunohe gutter (not shown) installed on the machine stand 10 through a discharge part attached to the end of the machine stand 10 (not shown). Wfr)
In this tank, only the abrasive grains are allowed to settle and are reused.
また、本発明の装置にあっては、その作業・目的から、
下部定盤（３）の盤面が平滑で、かつ上部定盤−が自然
みのとき、両者の盤面は平行であることが必要であるの
で、ワークの研磨時以外のときに、上下両定盤の盤面を
接触させて正常な研磨作業時と同様の操作を行うことに
より両者盤面の修正をできる。 ・
以上に述べたように本発明にては上部定盤の自重を利用
して研磨力ｔ−得るようにしであるので、目的ワークの
加工面積に見合った荷重が作用するよう上部定盤の重量
は予め選定しておくことが望ましい。そのために必要に
応じて定盤上面側に荷重調節用のクエイトを加減装着で
きるようにしておけば便利である。ま北上部定盤の往復
駆動機構さしてはチェン巻掛け［＃式、ラックピニオン
駆幼方１式、流体圧シリンダーや電動式の往復駆動機構
ど直線作幼機を用いて操作する方式などが採用できる０
なお、本発明の趣旨に則すれば回転上部定盤の回転駆動
支持構造について前記実施例に限定されるものではなく
、必要に応じて任意に変更することができる。In addition, in the device of the present invention, from its work and purpose,
When the lower surface plate (3) has a smooth surface and the upper surface plate has a natural surface, both surfaces must be parallel. By bringing the surfaces of the two surfaces into contact with each other and performing the same operations as during normal polishing work, the surfaces of both surfaces can be corrected. - As mentioned above, in the present invention, the polishing force t- is obtained by using the weight of the upper surface plate, so the weight of the upper surface plate is adjusted so that a load commensurate with the processing area of the target workpiece is applied. It is desirable to select in advance. For this purpose, it would be convenient if a weight for adjusting the load could be attached to the upper surface of the surface plate as needed. The reciprocating drive mechanism of the north upper surface plate is a chain winding mechanism [# type, one set of rack and pinion drive mechanism, and a system operated using a linear machine such as a hydraulic cylinder or an electric reciprocating drive mechanism is adopted. Can do 0
Note that, in keeping with the spirit of the present invention, the rotational drive support structure of the rotating upper surface plate is not limited to the above-mentioned embodiments, and can be arbitrarily modified as necessary.
発明の効果：
叙上の如く本発明によれば水平の定盤上に載置したガラ
ス板全少なくとも２／３程基準基準から前後方向に往復
動させながら、研磨剤液を盤面に浴って拡散させつつ回
転する上部定盤をその自重だけの荷重でもってワーク而
に当接させ、該酪面が回転軸に対して首振り自在な状態
で研磨操作できるようにしたことで、回＠駆動部の影＠
を受けることなくワーク面全体に均等な接触圧を与えて
、大聖の平面ガラス板を平滑で精度の高い研磨仕上げが
自制的に実施でき、熟練度を盛典とせず機械的に操作で
きるから作業性も著しく向上し、画一的に凸精度の製品
が得られるようになり、産業的効果大なるものであると
いえる。Effects of the Invention: As described above, according to the present invention, a glass plate placed on a horizontal surface plate is moved back and forth by at least 2/3 of the entire plate from a reference standard, and an abrasive liquid is applied to the plate surface. The upper surface plate, which rotates while spreading, is brought into contact with the workpiece with a load equal to its own weight, and the polishing operation can be performed with the surface plate swinging freely relative to the rotation axis. Shadow of the Department @
By applying uniform contact pressure to the entire work surface without any damage, Daisei's flat glass plate can be polished with a smooth and highly precise finish, and it is easy to operate because it can be operated mechanically without requiring a high degree of skill. This can be said to have a great industrial effect, as it has become possible to obtain products with uniform convexity.
図面は本発明方法をヌ施する装置の一具体例を示すもの
であって、第１図は一耶切欠き正面図、第２図は第１図
の左側面図、＠３図は要部の拡大ａ断面図、第４図は昇
降操作機構の要部切断側面図、第５図は回転上部定盤の
盤面を表わした図である。The drawings show a specific example of an apparatus for applying the method of the present invention, in which Fig. 1 is a cutaway front view, Fig. 2 is a left side view of Fig. 1, and Fig. 3 is a main part. FIG. 4 is an enlarged cross-sectional view of the main part of the lifting operation mechanism, and FIG. 5 is a view showing the plate surface of the rotating upper surface plate.
Claims (1)
する下部定盤上に載置して、該被加工物上面に対し、適
宜速度で回転する首振り自在でかつ昇降可能に支持され
た上部定盤を、その自重をかけて当接し、該上部定盤の
盤面に沿わせて拡散するよう研磨剤液を供給し、上部定
盤を回転させつつ下部定盤により被加工物を適宜距離往
復動させて研磨することを特徴とするガラス板の研磨方
法。 ２ 適宜長さで上面にガイドレールを敷設した機台上に
、そのガイドレールに沿い駆動機構で作動基準位置から
前後に所要寸法往復動する被加工物取付け用の下部定盤
を載置し、機台の適所には前記下部定盤の移動を妨げな
いようにして上側に門型のフレームを跨設し、該フレー
ム上面には前記下部定盤の作動基準位置中心に、昇降機
構により上下動可能で、かつ駆動機にて所要速度で回転
駆動される主軸を中心とする上部定盤ユニットを垂設し
、該主軸下端に接手を介して一定量上下方向に自由にな
つて回転力が伝達されると共に首振り自在に連結された
上部定盤を吊設し、該上部定盤の研磨盤面には中央部か
ら外周へ放射状に多数の研磨剤液誘導溝を刻設し、機外
から回転する上部定盤の盤面側へ研磨剤液が供給される
ように構成したことを特徴とするガラス板の研磨装置。[Claims] 1. A flat glass plate to be processed having the required dimensions is placed on a lower surface plate that reciprocates in a horizontal straight line, and is swingable and rotates at an appropriate speed relative to the upper surface of the workpiece. The upper surface plate, which is supported so as to be able to rise and fall, is brought into contact with its own weight, and the abrasive liquid is supplied so as to be spread along the plate surface of the upper surface plate, and the lower surface plate is rotated while the upper surface plate is rotated. A method for polishing a glass plate, characterized in that the workpiece is polished by reciprocating the workpiece a suitable distance. 2. Place a lower surface plate for attaching the workpiece, which is reciprocated by the drive mechanism along the guide rail by the required distance back and forth from the operating reference position, on the machine base on which a guide rail of an appropriate length has been laid on the upper surface; A gate-shaped frame is installed on the upper side of the machine at a suitable location so as not to obstruct the movement of the lower surface plate, and the upper surface of the frame is provided with a lifting mechanism that moves vertically around the reference position of the lower surface plate. An upper surface plate unit is installed vertically around the main shaft, which is rotatably driven by a drive machine at the required speed, and the rotational force is freely transmitted vertically by a certain amount via a joint to the lower end of the main shaft. At the same time, an upper surface plate is suspended, which is connected so as to be able to swing freely, and a large number of abrasive liquid guide grooves are carved radially from the center to the outer periphery on the polishing surface of the upper surface plate. 1. A glass plate polishing apparatus characterized in that a polishing liquid is supplied to the surface side of an upper surface plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59162385A JPS6186172A (en) | 1984-07-30 | 1984-07-30 | Polishing method for glass plate and its device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59162385A JPS6186172A (en) | 1984-07-30 | 1984-07-30 | Polishing method for glass plate and its device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6186172A true JPS6186172A (en) | 1986-05-01 |
Family
ID=15753571
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59162385A Pending JPS6186172A (en) | 1984-07-30 | 1984-07-30 | Polishing method for glass plate and its device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6186172A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010208015A (en) * | 2009-03-06 | 2010-09-24 | Lg Chem Ltd | Float glass polishing system and method for the same |
| TWI503205B (en) * | 2009-03-06 | 2015-10-11 | Lg Chemical Ltd | Glass polishing system |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5645366A (en) * | 1979-09-17 | 1981-04-25 | Speedfam Corp | Bearing mount for pressure plate of lapping machine |
| JPS56119367A (en) * | 1980-02-25 | 1981-09-18 | Matsushita Electric Ind Co Ltd | Surface polishing method |
| JPS5859764A (en) * | 1981-10-07 | 1983-04-08 | Toshiba Ceramics Co Ltd | Lapping surface plate |
| JPS5920938U (en) * | 1982-07-29 | 1984-02-08 | トヨタ自動車株式会社 | Workpiece positioning guide mechanism in press equipment |
| JPS5969258A (en) * | 1982-10-09 | 1984-04-19 | Nippon Telegr & Teleph Corp <Ntt> | Polishing method of glass rod |
-
1984
- 1984-07-30 JP JP59162385A patent/JPS6186172A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5645366A (en) * | 1979-09-17 | 1981-04-25 | Speedfam Corp | Bearing mount for pressure plate of lapping machine |
| JPS56119367A (en) * | 1980-02-25 | 1981-09-18 | Matsushita Electric Ind Co Ltd | Surface polishing method |
| JPS5859764A (en) * | 1981-10-07 | 1983-04-08 | Toshiba Ceramics Co Ltd | Lapping surface plate |
| JPS5920938U (en) * | 1982-07-29 | 1984-02-08 | トヨタ自動車株式会社 | Workpiece positioning guide mechanism in press equipment |
| JPS5969258A (en) * | 1982-10-09 | 1984-04-19 | Nippon Telegr & Teleph Corp <Ntt> | Polishing method of glass rod |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010208015A (en) * | 2009-03-06 | 2010-09-24 | Lg Chem Ltd | Float glass polishing system and method for the same |
| TWI503205B (en) * | 2009-03-06 | 2015-10-11 | Lg Chemical Ltd | Glass polishing system |
| TWI511842B (en) * | 2009-03-06 | 2015-12-11 | Lg Chemical Ltd | System and method for polishing glass |
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