CN207606657U - A kind of nanometer of anti-pollution polishing machine - Google Patents
A kind of nanometer of anti-pollution polishing machine Download PDFInfo
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- CN207606657U CN207606657U CN201721577884.2U CN201721577884U CN207606657U CN 207606657 U CN207606657 U CN 207606657U CN 201721577884 U CN201721577884 U CN 201721577884U CN 207606657 U CN207606657 U CN 207606657U
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- polishing
- rotating platform
- nanometer
- rack
- emery wheel
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- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
The utility model discloses a kind of nanometer of anti-pollution polishing machines, including rack, the rack is equipped with conveying mechanism, the rack includes workbench, the workbench is equipped with conveyer belt, is additionally provided with supporting rack in the rack, polishing system is equipped on the crossbeam of support frame as described above, the polishing system includes rotating platform, and the rotating platform rotates relative to crossbeam；Multiple throwing brush devices are installed, multiple throwing brush devices are distributed on the end face of rotating platform, and the throwing brush device includes rotary table, and multiple polishing mechanisms is equipped on the rotary table, and the polishing mechanism includes installation base plate and emery wheel on the rotating platform.The utility model does the circumnutation of two-stage by using rotating platform and rotary table drive emery wheel, and emery wheel itself does the spinning motion of high speed, lead to the swing mechanism of residence time unevenness due to eliminating, and emery wheel execution is the more complicated movement revolved round the sun with rotation, so that it is more uniform to throw brush.
Description
Technical field
The utility model is related to a kind of film forming systems of construction material, especially polishing machine.
Background technology
Nanometer anti-pollution polishing machine main technological features are that granularity is filled into ceramics or stone in 10nm nano-particles below
Material opens in the fine pore and crack on surface, and end reaction generates stable valence bond structure, to block various pollutions
The infiltration in source.Such equipment is mainly used for improving the antifouling property and texture of ceramics or stone surface.Normally, in such equipment
In, it is processed beam there are one the top settings of plank, multigroup throwing brushing head is set on beam, beam can supply direction transverse to plank
The reciprocating movement for doing straight line, the operating area to throw brushing head can cover the entire width of plank.Mobile amplitude with
The width dimensions of plank and change.As width dimensions become increasing, the shortcomings that existing swing type nanometer anti-pollution polishing machine
More utility model is aobvious, and since plank to be processed is very wide, the mobile range of beam can be very big, in order to ensure uniformly to process effect
Fruit, it is necessary to the speed for reducing supply direction, to which whole processing efficiency becomes low；Simultaneously because when moving back and forth, when
Moving direction need transformation when, beam needs certain residence time, swing the residence time inhomogeneities can cause by
Workpieces processing surface generates colour band, influences decorative effect.For the deficiency, Chinese patent CN201710004750.X discloses one
Equipment of the kind for large area ceramic tile surface to throw brush film still can not overcome although the mobile range of beam can be reduced
The problem of non-uniform of brush is thrown, and existing polishing machine, when replacing emery wheel, operation is inconvenient, and increases the labor of worker
Fatigue resistance.
Utility model content
The technical problems to be solved in the utility model is：A kind of efficient and uniformity that can be processed on a large scale is provided
Good polishing machine.
The solution that the utility model solves its technical problem is：A kind of nanometer of anti-pollution polishing machine, including rack, it is described
Rack is equipped with conveying mechanism, and the rack includes workbench, and the workbench is equipped with conveyer belt, the conveyer
Structure drives conveyer belt iterative motion, is additionally provided with supporting rack in the rack, support frame as described above across at the both ends of workbench,
Polishing system is installed on the crossbeam of support frame as described above, the polishing system includes rotating platform, the rotating platform relative to
Crossbeam rotates；Multiple throwing brush devices are installed, multiple throwing brush devices are distributed in rotating platform on the rotating platform
On end face, the throwing brush device includes rotary table, and multiple polishing mechanisms, the polishing mechanism are equipped on the rotary table
Including installation base plate and emery wheel.
As a further improvement of the above technical scheme, the throwing brush device further includes elevating mechanism, the elevating mechanism
On rotating platform, the rotary table is mounted on elevating mechanism.
As a further improvement of the above technical scheme, the elevating mechanism includes sliding sleeve, main shaft and driving cylinder, institute
Stating driving cylinder drives main shaft to be moved up and down along sliding sleeve, and the rotary table is fixedly connected with the lower end of main shaft.
As a further improvement of the above technical scheme, the elevating mechanism further includes limited block, and the limited block is fixed
On sliding sleeve.
As a further improvement of the above technical scheme, it is installed by snap-wise between the installation base plate and emery wheel.
As a further improvement of the above technical scheme, it is additionally provided with cushioning piece between the installation base plate and emery wheel.
As a further improvement of the above technical scheme, support frame as described above and polishing system it is equal there are two, two polishing systems
System is distributed before and after the direction of advance of conveyer belt, and the rotation direction of the rotating platform of two polishing systems is opposite.
As a further improvement of the above technical scheme, the granularity for being located at the emery wheel of the polishing system in front is more than rear
Polishing system emery wheel granularity.
The utility model has the beneficial effects that：The utility model drives emery wheel to do by using rotating platform and rotary table
The circumnutation of two-stage, and emery wheel itself does the spinning motion of high speed, and the swing of residence time unevenness is caused due to eliminating
Mechanism, and emery wheel execution is the more complicated movement revolved round the sun with rotation, so that it is more uniform to throw brush.
Description of the drawings
It is required in being described below to embodiment in order to illustrate more clearly of the technical scheme in the embodiment of the utility model
Attached drawing to be used is briefly described.Obviously, described attached drawing is a part of the embodiment of the utility model, rather than complete
Portion's embodiment, those skilled in the art without creative efforts, can also be obtained according to these attached drawings it
His design scheme and attached drawing.
Fig. 1 is the front view of the utility model；
Fig. 2 is the partial bottom view of the utility model；
Fig. 3 is the structural schematic diagram of the throwing brush device of the utility model.
Specific implementation mode
The technique effect of the design of the utility model, concrete structure and generation is carried out below with reference to embodiment and attached drawing
It clearly and completely describes, to be completely understood by the purpose of this utility model, feature and effect.Obviously, described embodiment
It is a part of the embodiment of the utility model, rather than whole embodiments, it is based on the embodiments of the present invention, the skill of this field
The other embodiment that art personnel are obtained without creative efforts belongs to the model of the utility model protection
It encloses.In addition, all connection/connection relations being previously mentioned in text, not singly refer to component and directly connect, and referring to can be according to specific reality
Situation is applied, by adding or reducing couple auxiliary, to form more preferably coupling structure.Each technology in the invention is special
Sign, can be with combination of interactions under the premise of not conflicting conflict.
Referring to Fig.1~Fig. 3, a kind of nanometer of anti-pollution polishing machine, including rack 1, the rack 1 are equipped with conveying mechanism 2, institute
It includes workbench to state rack 1, and the workbench is equipped with conveyer belt, and it is past that the conveying mechanism 2 drives conveyer belt to recycle
It is multiple to move, it is additionally provided with supporting rack 11 in the rack 1, support frame as described above 11 is across in the both ends of workbench, support frame as described above 11
Crossbeam on polishing system 3 is installed, the polishing system 3 includes rotating platform 31, and the rotating platform 31 is relative to crossbeam
It rotating, rotating platform has been mounted on the centre of crossbeam, and the diameter of rotating platform is suitable with the width of workbench,
It can ensure that the plank being placed on workbench can access and adequately throw brush；It is equipped on the rotating platform 31 multiple
Brush device 32 is thrown, multiple throwing brush devices 32 are distributed on the end face of rotating platform 31, it is preferable that the throwing brush device has four
A, four throwing brush devices are circularly and evenly distributed on rotating platform, and the throwing brush device 32 includes rotary table 321, and
In order to enable throwing, brush is more uniform, and the direction of rotation of rotary tables of four throwing brush devices can differ, such as two revolution
Disk is that clockwise and two rotary tables are counterclockwise, and are mutually staggered clockwise with rotary table counterclockwise, in this way can be with
So that it is more uniform when throwing brush, and stress is more preferable；Multiple polishing mechanisms 33, institute are installed on the rotary table 321
It includes installation base plate 331 and emery wheel 332 to state polishing mechanism 33.Preferably, there are six polishing mechanism includes, six polishing mechanisms
And circumference is evenly distributed on rotary table.
When work, plank to be processed is placed on workbench, is fed forward by conveyer belt, when plank enters
When polishing system, the upper surface of plank is contacted with emery wheel, emery wheel high speed rotation itself, while being thrown brush device and being driven revolution
Disk uniform rotation, and rotating platform drives and throws brush device uniform rotation, to which emery wheel is relative to plank just complicated compound fortune
It is dynamic, and rotate since emery wheel always is, without reciprocating motion, it can ensure emery wheel and plank when throwing brush
Contact area and time evenly.
It is further used as preferred embodiment, the throwing brush device 32 further includes elevating mechanism 322, the elevating mechanism
322 are mounted on rotating platform 31, and the rotary table 321 is mounted on elevating mechanism 322.
It is further used as preferred embodiment, the elevating mechanism 322 includes sliding sleeve, main shaft and driving cylinder, institute
Stating driving cylinder drives main shaft to be moved up and down along sliding sleeve, and the rotary table 321 is fixedly connected with the lower end of main shaft.
When conveyer belt, which drives plank to enter, throws brush system, main shaft declines, and drives rotary table to decline so that emery wheel contact plate
Material carries out throwing brush to plank；When stopping throwing brush or replacing emery wheel, the main shaft for throwing brushing head rises, and emery wheel is detached from plank.And
Rise in order to facilitate main shaft and reset, spring is also provided between sliding sleeve and main shaft.And due to main shaft can also work when
Time does circumnutation, therefore bearing is provided between sliding sleeve and main shaft.
It is further used as preferred embodiment, the elevating mechanism 322 further includes limited block, and the limited block setting exists
On sliding sleeve.Using limited block, main shaft can be made parked in given position, to control the tonnage for throwing brushing head, with true
Protect best processing effect.It of courses, in order to realize that automatically controlling for limited block, the limited block can be with motor etc.
Structure connects.
It is further used as preferred embodiment, is pacified by snap-wise between the installation base plate 331 and emery wheel 332
Dress.By snapping over emery wheel on installation base plate, so that dismounting emery wheel is more convenient efficiently.
It is further used as preferred embodiment, cushioning piece is additionally provided between the installation base plate 331 and emery wheel 332.
The effect for throwing brush can be improved by cushioning piece.
Be further used as preferred embodiment, support frame as described above 11 and polishing system 3 there are two, two polishing systems
3 are distributed before and after the direction of advance of conveyer belt, and the rotation direction of the rotating platform 31 of two polishing systems 3 is opposite.Utilize two
A polishing system, can not only further increase working efficiency, but also for force balance, adjacent two polishing systems
Rotating platform is arranged to opposite rotation direction.
It is further used as preferred embodiment, the granularity for being located at the emery wheel 332 of the polishing system 3 in front is more than rear
Polishing system emery wheel 332 granularity.In a preferred embodiment, the ruler of the emery wheel abrasive grains of posterior polishing system
The very little size being less than in preceding used emery wheel abrasive grains, to which when plank after polishing twice, surface smoothness obtains
With enhancing.
The better embodiment of the utility model is illustrated above, but the invention be not limited to it is described
Embodiment, those skilled in the art can also make various equivalent changes without departing from the spirit of the present invention
Type or replacement, these equivalent modifications or replacement are all contained in the application claim limited range.
Claims (8)
1. a kind of nanometer of anti-pollution polishing machine, including rack (1), the rack (1) is equipped with conveying mechanism (2), the rack (1)
Include workbench, the workbench is equipped with conveyer belt, and the conveying mechanism (2) driving conveyer belt moves in circles fortune
It is dynamic, supporting rack (11) is additionally provided on the rack (1), support frame as described above (11) is across in the both ends of workbench, support frame as described above
(11) polishing system (3) is installed on crossbeam, it is characterised in that：The polishing system (3) includes rotating platform (31), described
Rotating platform (31) rotates relative to crossbeam；Multiple throwing brush devices (32) are installed on the rotating platform (31), it is more
A throwing brush device (32) is distributed on the end face of rotating platform (31), and the throwing brush device (32) includes rotary table (321), institute
It states and multiple polishing mechanism (33) is installed on rotary table (321), the polishing mechanism (33) includes installation base plate (331) and mill
It takes turns (332).
2. according to claim 1 nanometer of anti-pollution polishing machine, it is characterised in that：The throwing brush device (32) further includes lifting
Mechanism (322), the elevating mechanism (322) are mounted on rotating platform (31), and the rotary table (321) is mounted on elevating mechanism
(322) on.
3. according to claim 2 nanometer of anti-pollution polishing machine, it is characterised in that：The elevating mechanism (322) includes sliding
It covers, main shaft and driving cylinder, the driving cylinder drive main shaft to be moved up and down along sliding sleeve, the rotary table (321) and master
The lower end of axis is fixedly connected.
4. according to claim 3 nanometer of anti-pollution polishing machine, it is characterised in that：The elevating mechanism (322) further includes limit
Position block, the limited block are arranged on sliding sleeve.
5. according to claim 1 nanometer of anti-pollution polishing machine, it is characterised in that：The installation base plate (331) and emery wheel
(332) it is installed by snap-wise between.
6. according to claim 5 nanometer of anti-pollution polishing machine, it is characterised in that：The installation base plate (331) and emery wheel
(332) cushioning piece is additionally provided between.
7. the nanometer anti-pollution polishing machine according to claim 1-6 any one, it is characterised in that：Support frame as described above (11) with
There are two polishing system (3) is equal, two polishing systems (3) are distributed before and after the direction of advance of conveyer belt, two polishing systems
(3) rotation direction of rotating platform (31) is opposite.
8. according to claim 7 nanometer of anti-pollution polishing machine, it is characterised in that：Positioned at the mill of the polishing system (3) in front
The granularity of wheel (332) is more than the granularity of the emery wheel (332) of the polishing system at rear.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721577884.2U CN207606657U (en) | 2017-11-22 | 2017-11-22 | A kind of nanometer of anti-pollution polishing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201721577884.2U CN207606657U (en) | 2017-11-22 | 2017-11-22 | A kind of nanometer of anti-pollution polishing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207606657U true CN207606657U (en) | 2018-07-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201721577884.2U Active CN207606657U (en) | 2017-11-22 | 2017-11-22 | A kind of nanometer of anti-pollution polishing machine |
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| CN (1) | CN207606657U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107671694A (en) * | 2017-11-22 | 2018-02-09 | 广东赛因迪科技股份有限公司 | A kind of nanometer anti-soil polishing machine |
-
2017
- 2017-11-22 CN CN201721577884.2U patent/CN207606657U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107671694A (en) * | 2017-11-22 | 2018-02-09 | 广东赛因迪科技股份有限公司 | A kind of nanometer anti-soil polishing machine |
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