JPS614234A - Resin molding method of semiconductor element and semiconductor lead frame - Google Patents

Resin molding method of semiconductor element and semiconductor lead frame

Info

Publication number
JPS614234A
JPS614234A JP12583284A JP12583284A JPS614234A JP S614234 A JPS614234 A JP S614234A JP 12583284 A JP12583284 A JP 12583284A JP 12583284 A JP12583284 A JP 12583284A JP S614234 A JPS614234 A JP S614234A
Authority
JP
Japan
Prior art keywords
gate opening
resin
lead frame
gate
cavity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12583284A
Other languages
Japanese (ja)
Inventor
Michio Osada
道男 長田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP12583284A priority Critical patent/JPS614234A/en
Publication of JPS614234A publication Critical patent/JPS614234A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C45/14Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles
    • B29C45/14639Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components
    • B29C45/14655Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor incorporating preformed parts or layers, e.g. injection moulding around inserts or for coating articles for obtaining an insulating effect, e.g. for electrical components connected to or mounted on a carrier, e.g. lead frame

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)

Abstract

PURPOSE:To prevent generation of a void near a gate opening, by a method wherein a molten resin which is first poured under pressure into a cavity section from the gate opening of a mold is allowed to flow down along the lower cavity surface. CONSTITUTION:After a semiconductor lead frame has been engaged with a recess 7 on the mold side and thereby set, mold clamping is effected. A molten resin 17 is poured under pressure into the space defined by upper and lower cavities 3, 4 through a runner 5, a gate 6 and a gate opening 61. The distance l2 between the gate opening 61 and a projection 27 of the lead frame is set such as to be relatively small, so that a resin leading end part 172 having a rectangular cross-section is inhibited by the projection 27 from flowing toward the upper cavity 3 and consequently flows down along the lower cavity surface from the gate opening 61. Accordingly, there is no possibility that the air near the gate opening 61 may be caught up by the resin leading end part 172, and the air in the space in the cavities 3, 4 is forced out of the space through an air vent when the molten resin 17 is charged. Therefore, no void is formed inside the resin body or near the gate opening 61.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、リードフレーム上に取イ]けた半導体素子を
樹脂モールド成形する方法とこれに用いられる半導体リ
ードフレームの改良に関するものであシ、この種の樹脂
モールド成形技術産業の分野において利用されるもので
ある。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to a method for resin molding a semiconductor element mounted on a lead frame, and an improvement in the semiconductor lead frame used in the method. This type of resin molding technology is used in the industrial field.

(従来技術とその問題点) 半導体素子の樹脂モールド成形用金型は、通常、第1図
乃至第4図に示すよ、うに、固定上型に対設した可動下
型2とから構成されている。 また、該両型のパーティ
ングライン(P−L)面における上型1側には成形樹脂
体の上半体を成形する上キャビティ3が設けられると共
に、下型2側にはその下半体を成形する下キャビティ4
が対向配置下 され、また、化キャビティ4側には溶融樹脂の移送用ラ
ンチ5側と連通するゲート6のゲート口6□が連通開設
されておシ、更に、下キャビティ4の上面部には半導体
リードフレームAのセット用凹所7が設けられると共に
、該凹所と連通ずるパーティングライン面には所要のエ
アベント8が形成されておシ、9−・・9は上記キャビ
ティ3・4とランプ5及びゲート6の各部にて成形され
る樹脂体の押出用エジェクタービンである。
(Prior Art and Its Problems) A mold for resin molding semiconductor devices usually consists of a movable lower mold 2 placed opposite a fixed upper mold, as shown in FIGS. 1 to 4. There is. Further, an upper cavity 3 for molding the upper half of the molded resin body is provided on the upper mold 1 side in the parting line (PL) plane of both molds, and an upper cavity 3 for molding the upper half of the molded resin body is provided on the lower mold 2 side. Lower cavity 4 for molding
are arranged facing each other, and a gate opening 6 □ of a gate 6 that communicates with the launch 5 side for transferring molten resin is opened on the side of the molding cavity 4 . A recess 7 for setting the semiconductor lead frame A is provided, and a required air vent 8 is formed on the parting line surface that communicates with the recess. This is an ejector turbine for extruding a resin body molded in each part of the lamp 5 and gate 6.

また、上記樹脂モールド成形に用いられる半導体リード
フレームAは、通常、所要間隔を保って平行に配置させ
た両縁枠10・10.と、該両縁枠の中間部にタブリー
ド11を介して配置さゼた半導体素子12の取付用タブ
13と、一端側を上記タブ18側に他端側を上記両縁枠
10・10゜に沿って夫々平行に配置させ°た所要複数
本の外部用リード14−・・14と、該各外部用り−1
114間と両縁枠10・10□間との夫々を一体に連結
させたタイバー15とから構成されておシ、上記半導体
素子12と列部用リード14−14とけリードワイヤ1
6−・・16を介して接続されている。
Further, the semiconductor lead frame A used for the above-mentioned resin molding usually has both edge frames 10 and 10 arranged in parallel with a required interval. and a tab 13 for mounting the semiconductor element 12 which is placed in the middle part of the both edge frames via the tab lead 11, with one end facing the tab 18 and the other end facing the both edge frames 10.10°. A plurality of required external leads 14--14 are arranged parallel to each other, and each of the external leads-1
114 and a tie bar 15 that integrally connects each of the edge frames 10 and 10 □, and the lead wire 1 that connects the semiconductor element 12 and the row portion leads 14-14.
6-...16.

上記した従来の半導体リードフレームAを用いてそのも
゛パ脂モールド成形を行なう場合は、該リードフレーム
の両M、枠10・101を金型側の凹所7に保合セット
して第1図に示すように型締めを行ない、次に、第4図
に示すように、溶融樹脂17をランナ5とゲート6及び
そのゲート口6□を通して上下キャビティ3・4内に加
圧注入することにkるのであるが、この場合に、キャビ
ティ3・4にて成形される樹脂体、特に、上記したゲー
1−「161附近にボイド(気泡)による欠損部が生じ
易いといった成形」二の重大な欠点がみられると共に、
この欠損部は成形樹脂体の外観を損うことになシ、また
、該欠損部から水分が浸入して内部の半導体素子の機能
を損う等、この種製品の耐水(湿)性若しくは耐久性を
低下させる要因となっている。
When performing fat molding using the conventional semiconductor lead frame A described above, both M and the frames 10 and 101 of the lead frame are fixedly set in the recess 7 on the mold side and the first The mold is clamped as shown in the figure, and then, as shown in Figure 4, the molten resin 17 is injected under pressure into the upper and lower cavities 3 and 4 through the runner 5, gate 6, and its gate opening 6□. However, in this case, the resin body molded in cavities 3 and 4, especially the above-mentioned game 1 - ``molding where defects are likely to occur due to voids (bubbles) around 161'', is important. Along with the drawbacks,
These defects do not impair the appearance of the molded resin body, and may impair the water resistance (humidity) or durability of this type of product due to water infiltration through the defects and impairing the function of the internal semiconductor elements. This is a factor that reduces sexual performance.

」二連したような従来の弊害は、次のような原因に基づ
いて発生するものと考えられる。
The two consecutive negative effects of the conventional technology are thought to occur based on the following causes.

即ち、上記ゲート口61を通してキャビティ3・4空間
内に注入された最初の樹脂は、該空間内への注入と同時
にその注入加圧力から一時的に開放されること、また、
第3図に示すように、上記ゲートロ63部に保合セット
されるリードフレームの縁辺101 と該ゲート口の前
方に配置される外部用リード141との間、及び、ゲー
1061と該外部用リード141との間には所要の間隙
L1・L2が構成されることから、第4図に示すよ゛う
に、ゲート口6□を通してキャビティ3・4空間内に最
初に注入される断面長方形状の樹脂先端部171は、ま
ず、上記間隙L□ ・し1.を通して上キャビティ3側
に向い、その後自重等によって下キャビティ4側に向う
といった流入作用を受けることになる。 従って、この
とき、ゲート口61附近の空気18が該樹脂先端部17
□によシ巻き込まれることになシ、この空気18が樹脂
充用後において効率良く外部に排出されないととから、
ゲートロ61位置に対応する樹脂成形体の内部或は外表
面にボイドを形成するとととなるのである。
That is, the first resin injected into the cavities 3 and 4 through the gate port 61 is temporarily released from the injection pressure at the same time as the resin is injected into the space.
As shown in FIG. 3, between the edge 101 of the lead frame that is fixedly set in the gate 63 and the external lead 141 disposed in front of the gate opening, and between the gate 1061 and the external lead Since the required gaps L1 and L2 are formed between the resin and the cavity 141, as shown in FIG. First, the tip portion 171 is inserted into the gap L□.1. It is subjected to an inflow action such that it is directed toward the upper cavity 3 side through the flow, and then directed toward the lower cavity 4 side due to its own weight. Therefore, at this time, the air 18 near the gate port 61 is absorbed into the resin tip 17.
□This air 18 should not be drawn in and not efficiently discharged to the outside after filling with resin.
If a void is formed inside or on the outer surface of the resin molded body corresponding to the position of the gatero 61, it becomes a void.

なお、上述した間に8点は、ランナ5−ゲート6及びゲ
ート口63等が上型1側に設けられている逆の配置態様
(第1図に示す金型の上型1と下型2とを反対に配設し
た構成)の金型においても同様に発生する。1 即ち、
その上型ゲート口を通してキャピテイ空商内に最初に注
入される断面長方形状の樹脂先端部は、まず、間隙(し
い ・Lりを通して下キャビティ側に所要の加圧力を受
けて斜下方へ注入された後に、自重等によって下方の下
キャビティ面に流下することになるため、このとき、上
記ゲートロ附近の空気を巻き込むことになるのである。
Note that the eight points in between mentioned above are the reverse arrangement in which the runner 5, gate 6, gate opening 63, etc. are provided on the upper mold 1 side (the upper mold 1 and the lower mold 2 of the mold shown in FIG. 1). The same problem occurs in a mold with a configuration in which the two are arranged oppositely. 1 That is,
The tip of the resin, which has a rectangular cross section and is first injected into the cavity through the upper mold gate, is first injected obliquely downward through the gap and into the lower cavity under the required pressure. After that, it will flow down to the lower cavity surface due to its own weight, and at this time, the air around the gatero will be drawn in.

(本発明の目的) 本発明は、ゲート口を通してキャビティ空間内に最初に
注入される樹脂の流入作用を改善することによってゲー
ト口ボイドの発生を防止できる樹脂モールド成形方法と
、この成形方法に用いることができる半導体リードフレ
ームを提供することによシ5、上述した従来の弊害を確
実に解消することを目的とするものである。
(Objective of the present invention) The present invention provides a resin molding method that can prevent the generation of gate opening voids by improving the inflow action of the resin that is first injected into the cavity space through the gate opening, and a resin molding method used in this molding method. It is an object of the present invention to provide a semiconductor lead frame capable of reliably eliminating the above-mentioned conventional disadvantages.

(本発明の方法及び構成) 本発明方法は、半導体素子をリードフレームを介して上
下両型間のキャビティ部にセットすると共に、溶融樹脂
をゲート口を通して上記ギャビテイ部に加圧注入するこ
とによシ上記1′導体素子を樹脂モールド成形する方法
において、上記リード・ フレームの外部用リード部に
延設した突片を上記ゲート口の前方位置に対向配置させ
て該ゲート口と上記外部用リード部との間の間隙が狭少
となるように設定することにより、上記ゲート口からキ
ャビ−ティ部に最初に加圧注入される溶融樹脂を下キャ
ビティ面に沼って流下させるようにしたことを特徴とす
るものである。
(Method and structure of the present invention) The method of the present invention includes setting a semiconductor element in a cavity between upper and lower molds via a lead frame, and injecting molten resin under pressure into the gap through a gate opening. In the method of resin molding the conductor element 1', a protruding piece extending from the external lead portion of the lead frame is disposed facing the front position of the gate opening, and the gate opening and the external lead portion are arranged facing each other. By setting the gap between the mold and the mold to be narrow, the molten resin that is first injected under pressure into the cavity from the gate is allowed to flow down to the lower cavity surface. This is a characteristic feature.

また、本発明方法に用いられる半511体リードフレー
ムは、縁枠にタブリードを介して配置させた半導体素子
の取付用タグと、一端側を上記タブ側に向って配置させ
た所要複数本の外部用リードと1、      *4!
rl’p@l=Mv−rr15.Th1Ei!?I’J
I&C’1l−Kに連結させたタイバーとから成る半導
体リードフレームにおいて、上記縁枠に対向配置される
外部膜しで形成した溶融樹脂の流入抑制用突片が設けら
れていることをr÷徴とするものである。
Furthermore, the half-511 lead frame used in the method of the present invention includes a tag for mounting a semiconductor element placed on the edge frame via a tab lead, and a plurality of external tags placed with one end facing the tab side. Lead and 1, *4!
rl'p@l=Mv-rr15. Th1Ei! ? I'J
In a semiconductor lead frame consisting of a tie bar connected to an I&C'1l-K, a protrusion for suppressing the inflow of molten resin formed of an external film disposed opposite to the edge frame is provided. That is.

(実施例) 以下、本発明を第5図乃至第9図に示す実施例図に基づ
いて説明する。
(Example) Hereinafter, the present invention will be explained based on the example diagrams shown in FIGS. 5 to 9.

第5図は、本発明方法に用いられる半導体リードフレー
ムを示しておシ、該リードフレームは所要の間隔を保っ
て平行に配置させた両縁枠2o・20□と、該両縁枠の
中間部にタグリード21を介して配置させた半導体素子
22の取付用タブ′23と、一端側を上記タブ23側に
他端側を上記両縁枠20・20□に沿って夫々平行に配
置させた所要複数本の外部用リード24・・・24と、
該番外部用リード24間と両縁枠20・201間との夫
々を一体に連結さゼたタイバー25と、上記半導体素子
22と外部用リード24・・・24とを接続させたリー
ドワイヤ26・・・26とから構成されておシ、また、
第8図及び第9図に示す樹脂モールド成型用金−型の下
キャビティ4側に連通開設するゲート口61の前方位置
、即ち、上記縁枠20□に対向配置される外部用リード
24□に、該リードを上記ゲート口61側となる縁枠2
01(lllに向って延設し、て形成した溶融樹脂の上
キャビティ3側への流入抑制用突片27が設けられてい
る。 寸だ、上記縁枠201と外部用リード241との
間隙は、前述した従来のものめ間隙り、と略同−に形成
されるが、該縁枠20□ と上記突片27とのI7i’
iには上記間隙L1よシも狭少となる間隙J、1が構成
されると共に、金型の上記ゲート口6□と上記突ハ27
との間には、前述した従来のものの間隙1.、/2よυ
も狭少となる間@ J−2が構成されることになる。 
なお、第8図及び第9図に示す金型の具体的構成は前述
した従来金型の構成と実質的に同一であるため、これと
対応する構成部材には同一の符−号を付している。
FIG. 5 shows a semiconductor lead frame used in the method of the present invention. A tab '23 for mounting the semiconductor element 22 is placed on the part via the tag lead 21, and one end is placed on the tab 23 side and the other end is placed in parallel along the both edge frames 20 and 20□. The required plurality of external leads 24...24,
A tie bar 25 that integrally connects the external leads 24 and both edge frames 20 and 201, and a lead wire 26 that connects the semiconductor element 22 and the external leads 24...24. It is composed of ...26, and also,
At the front position of the gate opening 61 which communicates with the lower cavity 4 side of the mold for resin molding shown in FIGS. 8 and 9, that is, at the external lead 24□ which is arranged opposite to the edge frame 20□. , the lead is attached to the edge frame 2 on the gate opening 61 side.
A protruding piece 27 is provided which extends toward the upper cavity 3 and prevents the molten resin from flowing into the upper cavity 3. The gap between the edge frame 201 and the external lead 241 is , is formed approximately the same as the conventional gripping gap described above, but I7i' between the edge frame 20□ and the protruding piece 27
A gap J,1 which is narrower than the gap L1 is formed in i, and the gate opening 6□ of the mold and the protrusion 27 are formed.
There is a gap 1 between the above-mentioned conventional one. , /2yoυ
@J-2 will be constructed while the area becomes narrower.
The specific structure of the mold shown in FIGS. 8 and 9 is substantially the same as that of the conventional mold described above, so the corresponding components are given the same reference numerals. ing.

また、上記突片27は、溶副1樹脂17の上キャビティ
3側へ、の流入を完全にl!11止させるものではシ・
いから、第7図に示すように、該突片27に所要の切欠
部27エ・・・271を形成して、ゲート10口61か
ら流入する溶融樹脂の一部を、該切欠部を通して上キー
rビテイ8(Iliへ同時に流入させるように1.′J
成してもよい。
Further, the protruding piece 27 completely prevents the flow of the molten sub-1 resin 17 into the upper cavity 3 side! 11 There is nothing to stop it.
Therefore, as shown in FIG. 7, the required notches 27 and 271 are formed in the projecting piece 27, and a portion of the molten resin flowing from the gate 10 opening 61 is directed upward through the notches. key r bitty 8 (1.'J so that it flows into Ili at the same time)
may be completed.

また、第5図に/i−′1.たり一ドフレームは、両縁
枠20・201と、該両縁枠間にクジジード21番介し
てタブ23を配fW描成したものを図示しているが、同
図に示した一方の縁枠20を省略した構成を有するもの
、或は、同じく、一方何の縁枠208、省略すると共に
、タイバー25を介して他方の縁枠201に連結したタ
ブリード(図示なし)の先端部にタブ(23)を一体に
形成する構成を採用しても差支えない。
Also, in FIG. 5 /i-'1. The double frame is shown with both edge frames 20 and 201 and a tab 23 arranged between the two edge frames through the Kujijid 21, but one of the edge frames shown in the figure is 20 is omitted, or similarly, one edge frame 208 is omitted and a tab (23 ) may be adopted.

次に、本発明の詳細な説明する。Next, the present invention will be explained in detail.

本発明の半導体リードフレームは、前述した従来のもの
と同様に、金型側の凹所7に係合セットした後に型間f
めを行ない、次に、第9図に示すように、溶融υd脂1
7をランナ5とゲート6及びゲート口61を通して上下
キャビティ3・4内に加圧注入することになる。 しか
しながら、本発明においては、ゲート口6工とリードフ
レームの突片27との間VIi、、L、が狭少に構成さ
れることになるから、ゲート口61を通してキ4ビテイ
3・4空間内に最初に注入される断面長方形状の樹脂先
端部17□け、上記突片27によって」ニキャビテイ3
側への流入作用を抑制されて該ゲート口から下キャビテ
ィ面に沿って流下することになるのである。 捷た、こ
のような溶融樹脂(17□)の最初の注入作用に連続し
て行なわれる溶θ、!11樹脂17のキャビティ3・4
内への加圧注入作用は、該溶融樹脂がゲート口61から
エアベント(8)側へ順次流入して該キャビティ3・4
内を充填した後に終了することになるが、上述し7たよ
うにゲート1161附近の空気(18)の樹脂先端部、
17.による巻込作用は発生せず、また、キャビティ3
・4空間内の他の空気は上記した溶融樹脂の充填時にエ
アベント(8)を通して外部へ押し出されるから、結局
、キャビティ3・4によって成形される樹脂体の内部或
はゲート口部その他の列表面にボイドを形成することが
ないのである。
Similar to the conventional semiconductor lead frame described above, the semiconductor lead frame of the present invention, after being engaged and set in the recess 7 on the mold side,
Then, as shown in Figure 9, melt υd fat 1
7 is injected under pressure into the upper and lower cavities 3 and 4 through the runner 5, gate 6, and gate port 61. However, in the present invention, since the spaces VIi, L, between the gate opening 6 and the protruding piece 27 of the lead frame are configured to be narrow, the gate opening 61 can be passed through the gate opening 61 into the opening 3/4 space. The tip portion 17 of the resin having a rectangular cross section is first injected into the cavity 3 by means of the protruding piece 27.
The inflow effect to the side is suppressed, and the liquid flows down from the gate opening along the lower cavity surface. The melting θ, which is carried out continuously after the initial injection of the molten resin (17□), which has been shrunk,! 11 Resin 17 cavities 3 and 4
The pressurized injection action causes the molten resin to sequentially flow from the gate port 61 to the air vent (8) side and fill the cavities 3 and 4.
This will end after filling the inside, but as mentioned in 7 above, the resin tip of the air (18) near the gate 1161,
17. There is no entrainment action caused by the cavity 3.
・Since the other air in the 4 spaces is pushed out through the air vent (8) when the molten resin is filled, it ends up inside the resin body formed by the cavities 3 and 4 or on the gate opening and other row surfaces. Therefore, no voids are formed.

なお、前述し、たように、上型1と下型2とが反対に配
置された金型(図示なし、)においては、ゲート口(6
エ)が上型1側に設けられるが、この場合にもゲート口
附近の空気巻込作用は発生しない。
As mentioned above, in a mold (not shown) in which the upper mold 1 and the lower mold 2 are arranged oppositely, the gate opening (6
D) is provided on the upper mold 1 side, but in this case as well, air entrainment near the gate opening does not occur.

即チ、ゲート1コ(6t)を通し7てキャビティ(3・
4)空間内に最初に注入される断面長方形状の樹脂先端
部は、リードフレームの突片(27)によって、下キャ
ビティ(4)側へ向う斜下方への流入作用が抑制される
ことになシ、その結果として、上記樹脂先端部はゲート
口(6□)から下キャビティ、(4)面に沿って流下す
ることとなるのである。 寸だ、その他のキャビティ(
3・4)「内への樹脂性ノm作用は、上述した図例のも
のと略同様に行なわれるものである。
Immediately, pass through the gate 1 (6t) and enter the cavity (3.
4) The tip of the resin having a rectangular cross section that is first injected into the space is prevented from flowing diagonally downward toward the lower cavity (4) by the protruding piece (27) of the lead frame. As a result, the resin tip flows down from the gate opening (6□) into the lower cavity and along the (4) surface. Other cavities (
3.4) The inward action of the resin is carried out in substantially the same manner as in the example shown above.

(′A発明の作用・効果) 本発明方法によるときは、ゲート口を通してキャビティ
空間内に最初に注メされる樹脂がゲート口附近の空気を
巻き込まないので、該巻込空気の残溜に起因したゲート
ロポイドの発生を確実に防止することができる。 従っ
て、成形樹脂体のゲート口附近には欠損部が形成されな
いため、従来の成形樹脂体のように該欠損部から内部に
水分が浸入して樹脂モールド成形品の耐水(湿)性・1
nrJ久性を低下させることがなく、また、成形樹脂体
の外観を損う等の弊害を確実に解消できるといった優れ
た効果を奏するものである。
(Operations and effects of invention 'A') When using the method of the present invention, the resin that is first poured into the cavity space through the gate port does not involve the air around the gate port, so This makes it possible to reliably prevent the generation of gatelopoids. Therefore, since no defect is formed in the vicinity of the gate of the molded resin body, moisture infiltrates into the interior through the defect like in conventional molded resin bodies, and the water resistance (moisture) of the resin molded product is 1.
This has excellent effects such as not reducing nrJ durability and reliably eliminating problems such as spoiling the appearance of the molded resin body.

また、本発明方法に用いられる゛しj″す什す−ドフ溶
融樹脂の流入抑制用突片を′lL設するものであるから
、例えば、長尺の板材からリードフレームを打抜形成す
る工程において同時に形成することができてその製作が
容易である。 また、このリードフレームを用いて樹脂
モールド成形を行なうときは、上記突片によって、ゲー
1−111を通してキャビティ空間内に最初に注入され
る樹脂を、該ゲート口から下キャビティ面に沿って流]
:させるどいつだ流入抑制作用が得られるため、従来の
リードフレームを用いた場合のように上記樹脂による空
気の巻き込みがなく、従って一成形樹脂体の内部或はゲ
ート口部その他の外表面に巻込空気の残溜に起因したボ
イド・欠損部が形成されるのを確実に防止することがで
きるといった優れた効果を奏するものである。
In addition, since the protrusion for suppressing the inflow of the molten resin used in the method of the present invention is provided, for example, the step of punching and forming the lead frame from a long plate material is necessary. It is easy to manufacture because it can be formed at the same time as the lead frame. Also, when performing resin molding using this lead frame, the protrusion allows the resin to be initially injected into the cavity space through the gate 1-111. Flow the resin along the lower cavity surface from the gate opening]
: Since the inflow suppressing effect is obtained whenever the resin is used, there is no air entrainment by the resin as in the case of using a conventional lead frame. This provides an excellent effect of reliably preventing the formation of voids and defects caused by residual trapped air.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図乃至第4図は、従来の半導体リードフレームを用
いた場合のトランスファー樹脂モールド成形例を示すも
ので、第1図はその金型要部の縦断面図、第2図及び第
3図はその下型の平面図及び拡大317面図、第4図は
その成形作用説明図である。 第5図乃至第9図は、本発明の実施例を示すものであシ
、第5図はその半導体リードフレームの一部切欠平面図
、第6図は該リードフレームの要部拡大平面図、第7図
は該リードフレームの他の実施例の要部を示す平面図、
第8図及び第9図はその成形作用説明図である。 1・・・上型、 2・・・下型、 3・・・上キャビテ
ィ、4v・下キャビティ、 6・・・ゲート、 6□・
・・ゲート口、 17・・・溶融樹脂、 20・20工
・・・縁枠、 21・・・タブリード、 22・・・半
導体素子、 23・・・クプ、 24・24□・・・外
部用リード、 25・・・ クイバー、 27・・・ 
突片、上、・・・間隙。 第5図
Figures 1 to 4 show an example of transfer resin molding using a conventional semiconductor lead frame. Figure 1 is a longitudinal sectional view of the main part of the mold, and Figures 2 and 3 4 is a plan view and an enlarged 317-plane view of the lower mold, and FIG. 4 is an explanatory view of the molding operation. 5 to 9 show embodiments of the present invention, FIG. 5 is a partially cutaway plan view of the semiconductor lead frame, FIG. 6 is an enlarged plan view of the main part of the lead frame, FIG. 7 is a plan view showing the main parts of another embodiment of the lead frame;
FIGS. 8 and 9 are explanatory diagrams of the forming operation. 1... Upper mold, 2... Lower mold, 3... Upper cavity, 4V/lower cavity, 6... Gate, 6□/
...Gate opening, 17...Melted resin, 20/20 work...Edge frame, 21...Tab lead, 22...Semiconductor element, 23...Cup, 24/24□...For external use Reed, 25... Quiver, 27...
Projection, top, ... gap. Figure 5

Claims (2)

【特許請求の範囲】[Claims] (1)半導体素子をリードフレームを介して上下両型間
のキャビティ部にセットすると共に、溶融樹脂をゲート
口を通して上記キャビティ部に加圧注入することにより
上記半導体素子を樹脂モールド成形する方法において、
上記リードフレームの外部用リード部に延設した突片を
上記ゲート口の前方位置に対向配置させて該ゲート口と
上記外部用リード部との間の間隙が狭少となるように設
定することにより、上記ゲート口からキャビティ部に最
初に加圧注入される溶融樹脂を下キャビティ面に沿って
流下させるようにしたことを特徴とする半導体素子の樹
脂モールド成形方法。
(1) A method of resin molding the semiconductor element by setting the semiconductor element in a cavity between the upper and lower molds via a lead frame, and injecting molten resin under pressure into the cavity through the gate,
Protrusions extending from the external lead portion of the lead frame are disposed oppositely in front of the gate opening so that the gap between the gate opening and the external lead portion is narrowed. A method of resin molding a semiconductor element, characterized in that the molten resin that is first injected under pressure into the cavity from the gate opening flows down along the lower cavity surface.
(2)縁枠にタブリードを介して配置させた半導体素子
の取付用タブと、一端側を上記タブ側に向って配置させ
た所要複数本の外用部リードと、該各外部用リード間と
上記縁枠間との夫々を一体に連結させたタイバーとから
成る半導体リードフレームにおいて、上記縁枠に対向配
置される外部用リード部に、該リード側から縁枠側に向
って延設して形成した溶融樹脂の流入抑制用突片が設け
られていることを特徴とする半導体リードフレーム。
(2) A semiconductor element mounting tab placed on the edge frame via a tab lead, a plurality of required external leads with one end facing the tab, and between each external lead and the above In a semiconductor lead frame consisting of a tie bar integrally connected to the edge frame, the external lead portion is disposed opposite to the edge frame, and is formed by extending from the lead side toward the edge frame side. A semiconductor lead frame characterized in that a protrusion for suppressing the inflow of molten resin is provided.
JP12583284A 1984-06-19 1984-06-19 Resin molding method of semiconductor element and semiconductor lead frame Pending JPS614234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12583284A JPS614234A (en) 1984-06-19 1984-06-19 Resin molding method of semiconductor element and semiconductor lead frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12583284A JPS614234A (en) 1984-06-19 1984-06-19 Resin molding method of semiconductor element and semiconductor lead frame

Publications (1)

Publication Number Publication Date
JPS614234A true JPS614234A (en) 1986-01-10

Family

ID=14920038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12583284A Pending JPS614234A (en) 1984-06-19 1984-06-19 Resin molding method of semiconductor element and semiconductor lead frame

Country Status (1)

Country Link
JP (1) JPS614234A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6471270A (en) * 1987-09-11 1989-03-16 Nec Corp Level adjusting device
US4862586A (en) * 1985-02-28 1989-09-05 Michio Osada Lead frame for enclosing semiconductor chips with resin
US4946633A (en) * 1987-04-27 1990-08-07 Hitachi, Ltd. Method of producing semiconductor devices
US4954308A (en) * 1988-03-04 1990-09-04 Citizen Watch Co., Ltd. Resin encapsulating method
US5071612A (en) * 1988-12-12 1991-12-10 Kabushiki Kaisha Toshiba Method for sealingly molding semiconductor electronic components
US5094937A (en) * 1989-07-31 1992-03-10 Fuji Photo Film Co., Ltd. Method for processing silver halide color photographic material
US5197183A (en) * 1991-11-05 1993-03-30 Lsi Logic Corporation Modified lead frame for reducing wire wash in transfer molding of IC packages
US5371044A (en) * 1991-05-27 1994-12-06 Hitachi, Ltd. Method of uniformly encapsulating a semiconductor device in resin
US5891384A (en) * 1994-11-21 1999-04-06 Apic Yamada Corporation Method of operating a molding machine with release film
JP2008060193A (en) * 2006-08-30 2008-03-13 New Japan Radio Co Ltd Lead frame and manufacturing method of semiconductor device using the same

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4862586A (en) * 1985-02-28 1989-09-05 Michio Osada Lead frame for enclosing semiconductor chips with resin
US4946633A (en) * 1987-04-27 1990-08-07 Hitachi, Ltd. Method of producing semiconductor devices
JPS6471270A (en) * 1987-09-11 1989-03-16 Nec Corp Level adjusting device
US4954308A (en) * 1988-03-04 1990-09-04 Citizen Watch Co., Ltd. Resin encapsulating method
US5071612A (en) * 1988-12-12 1991-12-10 Kabushiki Kaisha Toshiba Method for sealingly molding semiconductor electronic components
US5094937A (en) * 1989-07-31 1992-03-10 Fuji Photo Film Co., Ltd. Method for processing silver halide color photographic material
US5371044A (en) * 1991-05-27 1994-12-06 Hitachi, Ltd. Method of uniformly encapsulating a semiconductor device in resin
US5197183A (en) * 1991-11-05 1993-03-30 Lsi Logic Corporation Modified lead frame for reducing wire wash in transfer molding of IC packages
US5891384A (en) * 1994-11-21 1999-04-06 Apic Yamada Corporation Method of operating a molding machine with release film
JP2008060193A (en) * 2006-08-30 2008-03-13 New Japan Radio Co Ltd Lead frame and manufacturing method of semiconductor device using the same
JP4763554B2 (en) * 2006-08-30 2011-08-31 新日本無線株式会社 Manufacturing method of semiconductor device

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