JPS6067841U - polishing equipment - Google Patents

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第１図ａ、　ｂは従来の結晶研磨装置の正面図と平面図
、第２図と第３図は第１図の要部斜視図とその正面図、
第４図は本考案の研磨装置の一実施例の要部構成を示す
斜視図である。 １・・・研磨盤、２・・・結晶体保持部〔研磨物保持部
材〕、８・・・結晶体〔被研磨物〕、９・・・結晶体取
付部材〔研磨物取付部材〕、１０・・・Ｘ方向研磨面調
整部材、１１・・・Ｙ方向研磨面調整部材〔第１の案内
部材〕、１２・・・研磨方向調整部材〔第２の案内部材
〕、１３・・・アーム〔基台〕、１４．１６・・・円弧
状あり溝、１５・・・研磨点。Figures 1a and 1b are a front view and a plan view of a conventional crystal polishing device, Figures 2 and 3 are a perspective view of the main part of Figure 1 and its front view,
FIG. 4 is a perspective view showing the configuration of essential parts of an embodiment of the polishing apparatus of the present invention. DESCRIPTION OF SYMBOLS 1... Polishing disk, 2... Crystal body holding part [polishing object holding member], 8... Crystal body [workpiece to be polished], 9... Crystal body mounting member [polishing object mounting member], 10 ... X direction polishing surface adjustment member, 11 ... Y direction polishing surface adjustment member [first guide member], 12 ... Polishing direction adjustment member [second guide member], 13 ... Arm [ base], 14.16... arc-shaped dovetail groove, 15... polishing point.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 回転運動する研磨盤を設けると共に、研磨物取付部材と
、この研磨物取付部材を円弧状係合部を介して回動自在
に案内する第１の案内部材と、第１の案内部材を円弧状
保合部を介して前記回動方向と直交する方向で同一の回
動中心を持つように案内する第２の案内部材と、第２の
案内部材を回転自在でかつ研磨盤の研磨面に対して回転
軸が直交するよう保持する基台とから構成される研磨物
保持部を設け、前記回動中心に被研磨物を配置して研磨
物保持部を研磨盤の半径方向に往復運動するよう構成し
た研磨装置。A polishing disk that rotates is provided, and an abrasive object mounting member, a first guide member that rotatably guides the abrasive object attaching member via an arcuate engagement part, and a first guide member that is arranged in an arc shape. a second guide member that is guided through a retaining portion so as to have the same center of rotation in a direction perpendicular to the rotation direction; and a second guide member that is rotatable and relative to the polishing surface of the polishing disk. A polishing object holder is provided, which is composed of a base for holding the rotating shaft so that the axes of rotation are perpendicular to each other, and the object to be polished is placed at the center of rotation, and the polishing object holder is reciprocated in the radial direction of the polishing disk. The configured polishing device.