JPS60195028A - Method of gas exhaust during preparation of parent material of optical fiber - Google Patents
Method of gas exhaust during preparation of parent material of optical fiberInfo
- Publication number
- JPS60195028A JPS60195028A JP5192284A JP5192284A JPS60195028A JP S60195028 A JPS60195028 A JP S60195028A JP 5192284 A JP5192284 A JP 5192284A JP 5192284 A JP5192284 A JP 5192284A JP S60195028 A JPS60195028 A JP S60195028A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- exhaust
- support pipe
- optical fiber
- parent material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01846—Means for after-treatment or catching of worked reactant gases
Abstract
Description
【発明の詳細な説明】
(at 発明の技術分野
本発明は、内付は化学気相蒸着法(以下CVD法と称す
)で元ファイバ母材乞S遺する時のガス排気方法に係り
、ガスの流れンスムースに出来ると共に空気中の不純物
の反応管に堆積するガラスへの悪影Vv無くすることが
出来るガス排気方法に関する。DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a method for exhausting gas when the inner fiber is left in the original fiber base material by chemical vapor deposition (hereinafter referred to as CVD method). The present invention relates to a gas exhaust method capable of smoothing the flow of gas and eliminating the bad influence Vv of impurities in the air deposited on the glass.
(bl 従来技術と問題点
円付けCND法で光ファイバ母材ン製造する時のガスの
排気方法としては従来第1図の断面図に示す方法が用い
られている。(bl) Prior Art and Problems The method shown in the cross-sectional view of FIG. 1 has conventionally been used as a method for exhausting gas when manufacturing an optical fiber preform by the circular CND method.
即ち反応管1ン、旋盤のチャック3にチャックする為の
サポート管2ン排気ダクト4の内に入れ、発生したCI
!ガスを排気すると共に不要のスートン排出している。That is, a reaction tube 1, a support tube 2 for chucking to the chuck 3 of the lathe, and an exhaust duct 4 are inserted to remove the generated CI.
! In addition to exhausting gas, unnecessary suton is also discharged.
しかしこの方法では排気ダクト4とサポート管2の間よ
り外部の空気が吸い込まれ、空気が逆流し、空気中の不
純物か、反応管1内に堆積するガラスに悪影#ン及ぼす
ことがある。これを防ぐためサポート管2を十分長くす
る方法が考えられるがこれでは不要なスートかサポート
管2内にたまりスムースなガスの流れが得られに(い問
題が生ずる。However, in this method, external air is sucked in from between the exhaust duct 4 and the support tube 2, and the air flows back, which may adversely affect impurities in the air or the glass deposited in the reaction tube 1. In order to prevent this, a method of making the support tube 2 sufficiently long has been considered, but in this case, unnecessary soot accumulates in the support tube 2, making it difficult to obtain a smooth gas flow.
尚、図中5は光ファイバ母材乞製造する場合反応管1を
熱するガスバーナである。In the figure, reference numeral 5 denotes a gas burner that heats the reaction tube 1 when manufacturing the optical fiber preform.
(C1発明の目的
本発明の目的は上記の問題に鑑み、ガスの流れンスムー
スに出来ると共に空気中の不純物の反応管に堆積するガ
ラスへの悪影響ン無くすることが出来るガス排気方法の
提供にある。(C1 Purpose of the Invention In view of the above-mentioned problems, the purpose of the present invention is to provide a gas exhaust method that can smooth the flow of gas and eliminate the harmful effects of impurities in the air deposited on the glass. .
fdl 発明の構成
本発明は上記の目的Z達成するために、ガス排気側のサ
ポート管と排気用ダクトの間よりガス排気方向に高純度
の不活性ガス乞流すようにすることで、サポート91Y
短くしても外部よりの空気の反応管への逆流を防止し、
又該ガスの流れによって不要のスートンスト−スに排出
出来る工うにしたものである。fdl Structure of the Invention In order to achieve the above-mentioned object Z, the present invention provides support 91Y by flowing high-purity inert gas in the gas exhaust direction from between the support pipe on the gas exhaust side and the exhaust duct.
Even if it is shortened, it prevents air from outside from flowing back into the reaction tube.
Further, the gas flow allows the gas to be discharged to unnecessary suton storage.
fe) 発明の実施例 以下本発明の実施例につき図に従って説明する。fe) Examples of the invention Embodiments of the present invention will be described below with reference to the drawings.
第2図は本発明の実施例のガス排気方法ヶ示す断面図で
あり、図中第】図と同一機能のものは同一記号で示し、
2′譬サポート管、6はガス流入部アポす。Fig. 2 is a sectional view showing a gas exhaust method according to an embodiment of the present invention, and parts with the same functions as those in Fig. 2 are indicated by the same symbols.
2' support pipe, 6 is a gas inlet port.
第2図で第1図と機なる点は排気ダクト4の端からサポ
ート管2′に沿って高純度のN2カス(不活性ガス)が
流れるよう第2図に示す如きガス流入部6を設け、ガス
流入部6より高純度のN2ガスン流すようにしに点と、
このことによりサポート管2′ケ短くした点である。The difference between FIG. 2 and FIG. 1 is that a gas inlet 6 as shown in FIG. 2 is provided so that high-purity N2 gas (inert gas) flows from the end of the exhaust duct 4 along the support pipe 2'. , to allow high-purity N2 gas to flow from the gas inlet 6,
This allows the support tube 2' to be shortened.
このようにすると高純度のN2ガスはサポート管2′に
沿って排気方向に流れサポート管2′が短くとも外部よ
り流入した空気は反応憤1へ逆流しなくなり又サポート
管2′内のふんい気は高純度に保つことが出来反応管l
に堆積するガラスへの悪影響が防げると共に不要スート
はスムースに外部に排出される。In this way, high-purity N2 gas flows in the exhaust direction along the support pipe 2', and even if the support pipe 2' is short, air flowing in from the outside will not flow back into the reactor 1, and the air inside the support pipe 2' will not flow back. The reaction tube can maintain high purity.
This prevents harmful soot from accumulating on the glass and allows unnecessary soot to be smoothly discharged to the outside.
まILSN2ガスは、排気方向に流すことがより効果的
であるが、必ずしも排気方向に流す必要はなく、他の方
向に流すことによっても本発明の目的は達成される。Although it is more effective to flow the ILSN2 gas in the exhaust direction, it is not necessarily necessary to flow it in the exhaust direction, and the object of the present invention can also be achieved by flowing it in other directions.
(f) 発明の効果
以上詳細に説明せる如く、本発明によれば、ガスの流れ
ンスムースに出来ると共に空気中の不純物の反応管に堆
積するガラスへの悪影響を無くすることが出来るので、
低損失の光フアイバ母材を高歩留まりで安定に作ること
が出来る効果がある。(f) Effects of the Invention As explained in detail above, according to the present invention, the flow of gas can be made smooth and the adverse effect of impurities in the air on the glass deposited in the reaction tube can be eliminated.
This has the effect of making it possible to stably produce a low-loss optical fiber base material at a high yield.
゛ 第1図は従来例のガス排気方法ン示す断面図、第2
図は本発明の実施例のガス排気方法2示す断面図である
。
図中1は反応%−12,2’はサポート管、3は旋盤の
チャック、4はわ[気ダクト、5はガスバーナ、6はガ
ス流入部l示す。
代理人 弁理士 松 岡 宏四部
第1図
隼2に゛ Figure 1 is a sectional view showing a conventional gas exhaust method;
The figure is a sectional view showing a gas exhaust method 2 according to an embodiment of the present invention. In the figure, 1 shows the reaction %-12, 2' shows the support pipe, 3 shows the chuck of the lathe, 4 shows the air duct, 5 shows the gas burner, and 6 shows the gas inlet l. Agent: Hiroshi Matsuoka, Patent Attorney, Section 1, Hayabusa 2
Claims (1)
ガス排気方法において、ガス排気側のサポート管と排気
用ダクトの間より不活性ガスン流丁ようにしたことン特
徴とする元ファイバ母材製造時のガス排気方法。The internal structure is characterized by an inert gas flow channel between the support pipe on the gas exhaust side and the exhaust duct in the gas exhaust method when manufacturing optical fiber base material by chemical vapor deposition method. Gas exhaust method during fiber base material manufacturing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5192284A JPS60195028A (en) | 1984-03-16 | 1984-03-16 | Method of gas exhaust during preparation of parent material of optical fiber |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5192284A JPS60195028A (en) | 1984-03-16 | 1984-03-16 | Method of gas exhaust during preparation of parent material of optical fiber |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60195028A true JPS60195028A (en) | 1985-10-03 |
JPH0140777B2 JPH0140777B2 (en) | 1989-08-31 |
Family
ID=12900363
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5192284A Granted JPS60195028A (en) | 1984-03-16 | 1984-03-16 | Method of gas exhaust during preparation of parent material of optical fiber |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60195028A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10428420B2 (en) * | 2015-05-08 | 2019-10-01 | Applied Materials, Inc. | Method for controlling a processing system |
-
1984
- 1984-03-16 JP JP5192284A patent/JPS60195028A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10428420B2 (en) * | 2015-05-08 | 2019-10-01 | Applied Materials, Inc. | Method for controlling a processing system |
US11396699B2 (en) | 2015-05-08 | 2022-07-26 | Applied Materials, Inc. | Method for controlling a processing system |
Also Published As
Publication number | Publication date |
---|---|
JPH0140777B2 (en) | 1989-08-31 |
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