JPS592134U - Rotary coating device - Google Patents
Rotary coating deviceInfo
- Publication number
- JPS592134U JPS592134U JP9577182U JP9577182U JPS592134U JP S592134 U JPS592134 U JP S592134U JP 9577182 U JP9577182 U JP 9577182U JP 9577182 U JP9577182 U JP 9577182U JP S592134 U JPS592134 U JP S592134U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- outer periphery
- coating device
- gas
- rotary coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来例の要部断面正面図、第２図は本考案の第
１の実施例の要部断面正面図、第３図は同じく第２の実
施例の要部断面正面図、第４図は同一しく第３の実施例
の要部断面正面図である。
３・・・チャンバ、５・・・ウェハチャック、６・・・
ウェハ、６Ｃ・・・外周縁部、１６． ２０． ３２・
・・開口、１７ａ、２１ａ、３１ａ・・・内壁面、２５
ａ・・・内側壁面。FIG. 1 is a sectional front view of the main part of the conventional example, FIG. 2 is a sectional front view of the main part of the first embodiment of the present invention, and FIG. 3 is a sectional front view of the main part of the second embodiment. FIG. 4 is also a sectional front view of the main part of the third embodiment. 3...Chamber, 5...Wafer chuck, 6...
Wafer, 6C... outer peripheral edge, 16. 20. 32・
...Opening, 17a, 21a, 31a...Inner wall surface, 25
a...Inner wall surface.
Claims (1)
上記ウェハを収容するとともに上記ウェハの上方および
下方に開口をもち、上記両開口から気体を吸入し外部に
排出するチャンバーとを有し、上記回転によりウェハ上
の塗布液を拡げ余分の塗布液を気流とともに外部に排出
する回転塗布装置において、上記チャンバは、上記ウェ
ハの外周縁部に沿ってその上方および下方にそれぞれ近
接し上記外周縁部と協働して流入気体を絞る流入口をそ
れぞれ形成しかつ上記回転の中心から遠ざかるに従って
順次互の間隔が大となる一対の環状内壁面と、上記ウェ
ハの外周縁を離間して囲繞し上方に向って内方に傾斜し
た内側壁面とを具備したことを特徴とする回転塗布装置
。A wafer chuck that attracts and rotates a disc-shaped wafer,
It has a chamber that houses the wafer and has openings above and below the wafer, and sucks in gas from both openings and discharges it to the outside.The rotation spreads the coating liquid on the wafer and removes the excess coating liquid. In a rotary coating device that discharges the gas to the outside along with an air flow, the chambers each form an inlet that is close to above and below the outer periphery of the wafer and cooperates with the outer periphery to throttle the incoming gas. and a pair of annular inner wall surfaces whose mutual spacing becomes larger as they move away from the center of rotation, and an inner wall surface which surrounds the outer periphery of the wafer at a distance and slopes upward and inward. A rotary coating device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9577182U JPS592134U (en) | 1982-06-28 | 1982-06-28 | Rotary coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9577182U JPS592134U (en) | 1982-06-28 | 1982-06-28 | Rotary coating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS592134U true JPS592134U (en) | 1984-01-09 |
| JPS6339966Y2 JPS6339966Y2 (en) | 1988-10-19 |
Family
ID=30228548
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9577182U Granted JPS592134U (en) | 1982-06-28 | 1982-06-28 | Rotary coating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS592134U (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5337189A (en) * | 1976-09-17 | 1978-04-06 | Inoue Japax Res Inc | Production of surfactant |
| JPS5337701A (en) * | 1976-09-20 | 1978-04-07 | Kobe Steel Ltd | Preparation of carbonaceous raw material for metallurgical use from coal |
| JPS5337702A (en) * | 1976-09-18 | 1978-04-07 | Mitsui Mining & Smelting Co | Briquets |
| JPS5472973A (en) * | 1977-11-24 | 1979-06-11 | Hitachi Ltd | Rotary applying unit |
| JPS5999361A (en) * | 1982-11-30 | 1984-06-08 | Kanaasu Data Kk | Digital rate meter |
-
1982
- 1982-06-28 JP JP9577182U patent/JPS592134U/en active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5337189A (en) * | 1976-09-17 | 1978-04-06 | Inoue Japax Res Inc | Production of surfactant |
| JPS5337702A (en) * | 1976-09-18 | 1978-04-07 | Mitsui Mining & Smelting Co | Briquets |
| JPS5337701A (en) * | 1976-09-20 | 1978-04-07 | Kobe Steel Ltd | Preparation of carbonaceous raw material for metallurgical use from coal |
| JPS5472973A (en) * | 1977-11-24 | 1979-06-11 | Hitachi Ltd | Rotary applying unit |
| JPS5999361A (en) * | 1982-11-30 | 1984-06-08 | Kanaasu Data Kk | Digital rate meter |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6339966Y2 (en) | 1988-10-19 |
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