JPS5771126A - Semiamorhous semiconductor - Google Patents
Semiamorhous semiconductorInfo
- Publication number
- JPS5771126A JPS5771126A JP55147303A JP14730380A JPS5771126A JP S5771126 A JPS5771126 A JP S5771126A JP 55147303 A JP55147303 A JP 55147303A JP 14730380 A JP14730380 A JP 14730380A JP S5771126 A JPS5771126 A JP S5771126A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- semiconductor
- silicon
- mass
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02524—Group 14 semiconducting materials
- H01L21/02532—Silicon, silicon germanium, germanium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/02373—Group 14 semiconducting materials
- H01L21/02381—Silicon, silicon germanium, germanium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02576—N-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/0257—Doping during depositing
- H01L21/02573—Conductivity type
- H01L21/02579—P-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
Abstract
PURPOSE:To obtain a third semiamorphous semiconductor having a dark current conductivity of 10<-7> to 10<-8> cm<-1> and a light conductivity of 10<-3> to 10 cm<-1> by neutralizing an unpaired coupling hand in an amorphous semiconductor by addition of H2 of halogens. CONSTITUTION:A substrate 10 is heated at 100 to 600 deg.C in a furnace 8 from the exterior of a reaction tube and high frequency of 13.56MHz is applied to the substrate 101. Since He and silicon containing diborane are introudced 4 through 6 and the pressure on a reaction system is adjusted outside the furnace to generate a glow discharge over a wide range, a decomposition energy is given to the silicon of a polymerization condiction which is spaced from the substrate and the silicon is reacted into crystallization to become the mass during sputtering. The mass facilitates the coupling between the substrate and the loose atoms and is covered as a mass of semicrystals, or pillar cluster. The cluster is not a multicrystal, a single crystal or an amorpholus semiconductor, but an intermediate, novel semiconductor, and has a desired electrical property and is suitable for a photoelectric transducer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55147303A JPS5771126A (en) | 1980-10-21 | 1980-10-21 | Semiamorhous semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55147303A JPS5771126A (en) | 1980-10-21 | 1980-10-21 | Semiamorhous semiconductor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5771126A true JPS5771126A (en) | 1982-05-01 |
JPH0253941B2 JPH0253941B2 (en) | 1990-11-20 |
Family
ID=15427141
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55147303A Granted JPS5771126A (en) | 1980-10-21 | 1980-10-21 | Semiamorhous semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5771126A (en) |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61180480A (en) * | 1984-10-02 | 1986-08-13 | イメツク(インタ−・ユニヴア−スイタリア・マイクロ−エレクトロニカ・セントラム)ヴイ・ズイ−・ダブリユ | Bipolar hetero junction transistor and manufacture thereof |
US7998801B2 (en) | 2008-04-25 | 2011-08-16 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of thin film transistor having altered semiconductor layer |
US8053294B2 (en) | 2008-04-21 | 2011-11-08 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of thin film transistor by controlling generation of crystal nuclei of microcrystalline semiconductor film |
US8119468B2 (en) | 2008-04-18 | 2012-02-21 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor and method for manufacturing the same |
US8138032B2 (en) | 2008-04-18 | 2012-03-20 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing thin film transistor having microcrystalline semiconductor film |
US8283667B2 (en) | 2008-09-05 | 2012-10-09 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor |
US8304775B2 (en) | 2009-03-09 | 2012-11-06 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor |
US8338240B2 (en) | 2010-10-01 | 2012-12-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing transistor |
US8525170B2 (en) | 2008-04-18 | 2013-09-03 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor and manufacturing method thereof |
US8546810B2 (en) | 2009-05-28 | 2013-10-01 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor, display device, and electronic appliance |
US8569120B2 (en) | 2008-11-17 | 2013-10-29 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing thin film transistor |
US8624254B2 (en) | 2010-09-14 | 2014-01-07 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor |
US8637866B2 (en) | 2008-06-27 | 2014-01-28 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7738050B2 (en) | 2007-07-06 | 2010-06-15 | Semiconductor Energy Laboratory Co., Ltd | Liquid crystal display device |
JP5216446B2 (en) | 2007-07-27 | 2013-06-19 | 株式会社半導体エネルギー研究所 | Plasma CVD apparatus and display device manufacturing method |
JP5058084B2 (en) | 2007-07-27 | 2012-10-24 | 株式会社半導体エネルギー研究所 | Method for manufacturing photoelectric conversion device and microwave plasma CVD apparatus |
JP5572307B2 (en) | 2007-12-28 | 2014-08-13 | 株式会社半導体エネルギー研究所 | Method for manufacturing photoelectric conversion device |
US7888167B2 (en) | 2008-04-25 | 2011-02-15 | Semiconductor Energy Laboratory Co., Ltd. | Photoelectric conversion device and method for manufacturing the same |
US8343858B2 (en) | 2010-03-02 | 2013-01-01 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing microcrystalline semiconductor film and method for manufacturing semiconductor device |
-
1980
- 1980-10-21 JP JP55147303A patent/JPS5771126A/en active Granted
Non-Patent Citations (3)
Title |
---|
APPL.PHYS.LETT=1980 * |
J.NON-CRYST.SOLIED=1979 * |
JAPAN.J.APPL.PHYS=1980 * |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61180480A (en) * | 1984-10-02 | 1986-08-13 | イメツク(インタ−・ユニヴア−スイタリア・マイクロ−エレクトロニカ・セントラム)ヴイ・ズイ−・ダブリユ | Bipolar hetero junction transistor and manufacture thereof |
US8119468B2 (en) | 2008-04-18 | 2012-02-21 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor and method for manufacturing the same |
US8138032B2 (en) | 2008-04-18 | 2012-03-20 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing thin film transistor having microcrystalline semiconductor film |
US8525170B2 (en) | 2008-04-18 | 2013-09-03 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor and manufacturing method thereof |
US8053294B2 (en) | 2008-04-21 | 2011-11-08 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of thin film transistor by controlling generation of crystal nuclei of microcrystalline semiconductor film |
US7998801B2 (en) | 2008-04-25 | 2011-08-16 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of thin film transistor having altered semiconductor layer |
US8637866B2 (en) | 2008-06-27 | 2014-01-28 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor |
US8283667B2 (en) | 2008-09-05 | 2012-10-09 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor |
US8569120B2 (en) | 2008-11-17 | 2013-10-29 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing thin film transistor |
US8304775B2 (en) | 2009-03-09 | 2012-11-06 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor |
US8604481B2 (en) | 2009-03-09 | 2013-12-10 | Semiconductor Energy Co., Ltd. | Thin film transistor |
US8546810B2 (en) | 2009-05-28 | 2013-10-01 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor, display device, and electronic appliance |
US8624254B2 (en) | 2010-09-14 | 2014-01-07 | Semiconductor Energy Laboratory Co., Ltd. | Thin film transistor |
US8338240B2 (en) | 2010-10-01 | 2012-12-25 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing transistor |
Also Published As
Publication number | Publication date |
---|---|
JPH0253941B2 (en) | 1990-11-20 |
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