JPS5764930A - Carrying apparatus for glass substrate - Google Patents
Carrying apparatus for glass substrateInfo
- Publication number
- JPS5764930A JPS5764930A JP55140334A JP14033480A JPS5764930A JP S5764930 A JPS5764930 A JP S5764930A JP 55140334 A JP55140334 A JP 55140334A JP 14033480 A JP14033480 A JP 14033480A JP S5764930 A JPS5764930 A JP S5764930A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- loader part
- pawls
- sucked
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To transfer a glass substrate as a mask or the like to such a designation as an aligner without rubbing, by a method wherein a carrying arm on which the substrate is mounted is drawn out of a substrate container and raised, and the substrate is abutted against a loader part and positioned before being sucked to be suspended. CONSTITUTION:A loader part 62 is disposed through a moving member 61 on a guide member 60 provided above a cartridge loaded with a container. When reaching a position below the loader part, an arm 16 drawn out with a substrate 10 mounted thereon stops its horizontal movement and moves upward. The loader part 62 is provided with pawl members 65 ar the four sides of a supporting plate 63 and a suction plate 64 on the lower surface thereof, and the lower part of each of the pawls 65 closed by the operation of cylinders 67 respectively is a roller 69 made of resin. With end surface sections of the raised substrate 10 crossing each other at right angles positioned by the pawls 65a, 65b provided with stoppers 66a, 66b respectively, the substrate 10 is received by means of the rolles 69 and sucked to be transferred to a destionation. Thereby, it is possible to carry the substrate as a mask or the like without any damage.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55140334A JPS5764930A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55140334A JPS5764930A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5764930A true JPS5764930A (en) | 1982-04-20 |
JPH03783B2 JPH03783B2 (en) | 1991-01-08 |
Family
ID=15266402
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55140334A Granted JPS5764930A (en) | 1980-10-07 | 1980-10-07 | Carrying apparatus for glass substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5764930A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5981074A (en) * | 1982-10-30 | 1984-05-10 | 住友金属鉱山株式会社 | Automatic feeder for tabular body |
JPS6477140A (en) * | 1987-09-18 | 1989-03-23 | Olympus Optical Co | Wafer taking out/housing device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5032767U (en) * | 1973-07-20 | 1975-04-09 | ||
JPS5116572A (en) * | 1974-07-30 | 1976-02-09 | Mitsubishi Heavy Ind Ltd | RITSUTAIJIDOSOKO |
JPS5592683U (en) * | 1978-12-22 | 1980-06-26 |
-
1980
- 1980-10-07 JP JP55140334A patent/JPS5764930A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5032767U (en) * | 1973-07-20 | 1975-04-09 | ||
JPS5116572A (en) * | 1974-07-30 | 1976-02-09 | Mitsubishi Heavy Ind Ltd | RITSUTAIJIDOSOKO |
JPS5592683U (en) * | 1978-12-22 | 1980-06-26 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5981074A (en) * | 1982-10-30 | 1984-05-10 | 住友金属鉱山株式会社 | Automatic feeder for tabular body |
JPS6477140A (en) * | 1987-09-18 | 1989-03-23 | Olympus Optical Co | Wafer taking out/housing device |
JP2514214B2 (en) * | 1987-09-18 | 1996-07-10 | オリンパス光学工業株式会社 | Wafer take-out and storage device |
Also Published As
Publication number | Publication date |
---|---|
JPH03783B2 (en) | 1991-01-08 |
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