JPS57208133A - Electron-beam exposure method - Google Patents

Electron-beam exposure method

Info

Publication number
JPS57208133A
JPS57208133A JP9350281A JP9350281A JPS57208133A JP S57208133 A JPS57208133 A JP S57208133A JP 9350281 A JP9350281 A JP 9350281A JP 9350281 A JP9350281 A JP 9350281A JP S57208133 A JPS57208133 A JP S57208133A
Authority
JP
Japan
Prior art keywords
data
exposure
deflectors
dimensions
rectangle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9350281A
Other languages
Japanese (ja)
Inventor
Kazumitsu Tanaka
Kunio Takeuchi
Sakae Miyauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP9350281A priority Critical patent/JPS57208133A/en
Publication of JPS57208133A publication Critical patent/JPS57208133A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To effect a high speed exposure and improve the exposure accuracy, by obtaining the dimensions of a largest one of the rectangles which can be obtained by equally dividing a rectangular pattern in accordance with the dimensions of a rectangle to be lithographed, and effecting exposure by shooting an electron beam having the obtained dimensions. CONSTITUTION:In case of lithographing a ractangular pattern, exposure is effected by reading out from a memory means data X1, Y1 representing the position of the rectangular pattern and data X2, Y2 representing the dimentions of the rectangle. In this case, the data X2, Y2 are fed to an arithmetic circuit in order to calculate largest data a, b in those which are within a data range where data can be fed to contour-varying deflectors as well as integer multiples of which are equal to X2, Y2, respectively. Based on the data (a), (b), these deflectors are deflected. Then, the electron beams regulated by the deflectors are shot a plurality of times for exposure, while the projecting positions thereof are being shifted by projecting-position varying deflectors in the X and Y directions with pitches corresponding to the data (a), (b), respectively.
JP9350281A 1981-06-17 1981-06-17 Electron-beam exposure method Pending JPS57208133A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9350281A JPS57208133A (en) 1981-06-17 1981-06-17 Electron-beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9350281A JPS57208133A (en) 1981-06-17 1981-06-17 Electron-beam exposure method

Publications (1)

Publication Number Publication Date
JPS57208133A true JPS57208133A (en) 1982-12-21

Family

ID=14084117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9350281A Pending JPS57208133A (en) 1981-06-17 1981-06-17 Electron-beam exposure method

Country Status (1)

Country Link
JP (1) JPS57208133A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6085517A (en) * 1983-10-18 1985-05-15 Fujitsu Ltd Electron beam exposure system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5783030A (en) * 1980-11-11 1982-05-24 Fujitsu Ltd Exposure of electron beam

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5783030A (en) * 1980-11-11 1982-05-24 Fujitsu Ltd Exposure of electron beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6085517A (en) * 1983-10-18 1985-05-15 Fujitsu Ltd Electron beam exposure system

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