JPS5599724A - Method of exposing electron beam - Google Patents
Method of exposing electron beamInfo
- Publication number
- JPS5599724A JPS5599724A JP753279A JP753279A JPS5599724A JP S5599724 A JPS5599724 A JP S5599724A JP 753279 A JP753279 A JP 753279A JP 753279 A JP753279 A JP 753279A JP S5599724 A JPS5599724 A JP S5599724A
- Authority
- JP
- Japan
- Prior art keywords
- data
- exposure
- signals
- hsc4
- converters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To reduce an exposure time in a system in which a position on a sample whereto electron beams are projected is specified by a deflection system to which position signals are supplied via D/A converters by storing the data of a fine pattern group in a memory and using these data repeatedly. CONSTITUTION:Data of exposure stored in a magnetic tape 1 are sent to a high speed data transmission control mechanism HSC4 via a direct memory access controller 3 in CPU2. The HSC4 gives signals which determine the dimension of electron beams, signals which specify the position of projecion in a subfield, etc., to an exposure means 5 via D/A converters 6, 8 and 10. As there are many subfields which have the same pattern group in a sample 13, the amount of data transmitted from storing means can be decreased and an exposure can be executed quickly if the number of fine patterns and the distances between the patterns are set beforehand and these distances are accumulated to specify the positions of the fine patterns.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP753279A JPS5599724A (en) | 1979-01-25 | 1979-01-25 | Method of exposing electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP753279A JPS5599724A (en) | 1979-01-25 | 1979-01-25 | Method of exposing electron beam |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5599724A true JPS5599724A (en) | 1980-07-30 |
Family
ID=11668385
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP753279A Pending JPS5599724A (en) | 1979-01-25 | 1979-01-25 | Method of exposing electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5599724A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55138836A (en) * | 1979-04-16 | 1980-10-30 | Fujitsu Ltd | Electron beam exposure apparatus |
JPS6054431A (en) * | 1983-09-05 | 1985-03-28 | Toppan Printing Co Ltd | Exposing method of electron beam |
JPS61255019A (en) * | 1985-05-07 | 1986-11-12 | Toshiba Corp | Charged beam exposing device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52119182A (en) * | 1976-03-31 | 1977-10-06 | Fujitsu Ltd | Electron beam exposure equipment |
-
1979
- 1979-01-25 JP JP753279A patent/JPS5599724A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52119182A (en) * | 1976-03-31 | 1977-10-06 | Fujitsu Ltd | Electron beam exposure equipment |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55138836A (en) * | 1979-04-16 | 1980-10-30 | Fujitsu Ltd | Electron beam exposure apparatus |
JPS6054431A (en) * | 1983-09-05 | 1985-03-28 | Toppan Printing Co Ltd | Exposing method of electron beam |
JPH0324770B2 (en) * | 1983-09-05 | 1991-04-04 | Toppan Printing Co Ltd | |
JPS61255019A (en) * | 1985-05-07 | 1986-11-12 | Toshiba Corp | Charged beam exposing device |
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