JPS5599724A - Method of exposing electron beam - Google Patents

Method of exposing electron beam

Info

Publication number
JPS5599724A
JPS5599724A JP753279A JP753279A JPS5599724A JP S5599724 A JPS5599724 A JP S5599724A JP 753279 A JP753279 A JP 753279A JP 753279 A JP753279 A JP 753279A JP S5599724 A JPS5599724 A JP S5599724A
Authority
JP
Japan
Prior art keywords
data
exposure
signals
hsc4
converters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP753279A
Other languages
Japanese (ja)
Inventor
Makoto Takeuchi
Itsuo Yamamoto
Osamu Kasai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP753279A priority Critical patent/JPS5599724A/en
Publication of JPS5599724A publication Critical patent/JPS5599724A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To reduce an exposure time in a system in which a position on a sample whereto electron beams are projected is specified by a deflection system to which position signals are supplied via D/A converters by storing the data of a fine pattern group in a memory and using these data repeatedly. CONSTITUTION:Data of exposure stored in a magnetic tape 1 are sent to a high speed data transmission control mechanism HSC4 via a direct memory access controller 3 in CPU2. The HSC4 gives signals which determine the dimension of electron beams, signals which specify the position of projecion in a subfield, etc., to an exposure means 5 via D/A converters 6, 8 and 10. As there are many subfields which have the same pattern group in a sample 13, the amount of data transmitted from storing means can be decreased and an exposure can be executed quickly if the number of fine patterns and the distances between the patterns are set beforehand and these distances are accumulated to specify the positions of the fine patterns.
JP753279A 1979-01-25 1979-01-25 Method of exposing electron beam Pending JPS5599724A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP753279A JPS5599724A (en) 1979-01-25 1979-01-25 Method of exposing electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP753279A JPS5599724A (en) 1979-01-25 1979-01-25 Method of exposing electron beam

Publications (1)

Publication Number Publication Date
JPS5599724A true JPS5599724A (en) 1980-07-30

Family

ID=11668385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP753279A Pending JPS5599724A (en) 1979-01-25 1979-01-25 Method of exposing electron beam

Country Status (1)

Country Link
JP (1) JPS5599724A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138836A (en) * 1979-04-16 1980-10-30 Fujitsu Ltd Electron beam exposure apparatus
JPS6054431A (en) * 1983-09-05 1985-03-28 Toppan Printing Co Ltd Exposing method of electron beam
JPS61255019A (en) * 1985-05-07 1986-11-12 Toshiba Corp Charged beam exposing device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119182A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52119182A (en) * 1976-03-31 1977-10-06 Fujitsu Ltd Electron beam exposure equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55138836A (en) * 1979-04-16 1980-10-30 Fujitsu Ltd Electron beam exposure apparatus
JPS6054431A (en) * 1983-09-05 1985-03-28 Toppan Printing Co Ltd Exposing method of electron beam
JPH0324770B2 (en) * 1983-09-05 1991-04-04 Toppan Printing Co Ltd
JPS61255019A (en) * 1985-05-07 1986-11-12 Toshiba Corp Charged beam exposing device

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