JPS57207339A - Electron beam exposure device - Google Patents
Electron beam exposure deviceInfo
- Publication number
- JPS57207339A JPS57207339A JP9340381A JP9340381A JPS57207339A JP S57207339 A JPS57207339 A JP S57207339A JP 9340381 A JP9340381 A JP 9340381A JP 9340381 A JP9340381 A JP 9340381A JP S57207339 A JPS57207339 A JP S57207339A
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- electron beam
- bias
- brightness
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To make constant the brightness of irradiation electron beam, by converting voltage or signal obtained from a sample into voltage to compare with reference voltage to impress the bias voltage corresponding to the difference. CONSTITUTION:Sample current is detected by a Faraday cup 10' on a sample base being converted 16 into voltage to compare 17 with the reference voltage 8. When the both a bias resistor 20 as the meter for voltage potential and a servo motor rotating by rotation angles correlated with difference input 17 provided on the side of a control circuit 19 are coupled by a shaft, the bias resistance is varied with the difference input 17 for the automatic control of bias voltage. This constitution can compensate the variation of electron beam brightness accompanied with time lapse variation of an electron gun to obtain constant brightness.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9340381A JPS57207339A (en) | 1981-06-16 | 1981-06-16 | Electron beam exposure device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9340381A JPS57207339A (en) | 1981-06-16 | 1981-06-16 | Electron beam exposure device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57207339A true JPS57207339A (en) | 1982-12-20 |
Family
ID=14081327
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9340381A Pending JPS57207339A (en) | 1981-06-16 | 1981-06-16 | Electron beam exposure device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57207339A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6197914A (en) * | 1984-10-19 | 1986-05-16 | Hitachi Ltd | Charged particle beam lithography equipment |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5140982A (en) * | 1974-10-02 | 1976-04-06 | Nippon Electron Optics Lab | Denshipuroobusochi niokeru biimuanteikasochi |
JPS556829A (en) * | 1978-06-29 | 1980-01-18 | Fujitsu Ltd | Electron beam exposure method |
JPS5622655A (en) * | 1979-08-03 | 1981-03-03 | Nippon Telegr & Teleph Corp <Ntt> | Glass material for optical glass fiber |
JPS57201021A (en) * | 1981-06-05 | 1982-12-09 | Hitachi Ltd | Electron ray drawing apparatus |
-
1981
- 1981-06-16 JP JP9340381A patent/JPS57207339A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5140982A (en) * | 1974-10-02 | 1976-04-06 | Nippon Electron Optics Lab | Denshipuroobusochi niokeru biimuanteikasochi |
JPS556829A (en) * | 1978-06-29 | 1980-01-18 | Fujitsu Ltd | Electron beam exposure method |
JPS5622655A (en) * | 1979-08-03 | 1981-03-03 | Nippon Telegr & Teleph Corp <Ntt> | Glass material for optical glass fiber |
JPS57201021A (en) * | 1981-06-05 | 1982-12-09 | Hitachi Ltd | Electron ray drawing apparatus |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6197914A (en) * | 1984-10-19 | 1986-05-16 | Hitachi Ltd | Charged particle beam lithography equipment |
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