JPS572034A - Mask image forming material and formation of mask image - Google Patents

Mask image forming material and formation of mask image

Info

Publication number
JPS572034A
JPS572034A JP7580180A JP7580180A JPS572034A JP S572034 A JPS572034 A JP S572034A JP 7580180 A JP7580180 A JP 7580180A JP 7580180 A JP7580180 A JP 7580180A JP S572034 A JPS572034 A JP S572034A
Authority
JP
Japan
Prior art keywords
mask image
irradiated
active component
imagewise
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7580180A
Other languages
Japanese (ja)
Inventor
Nobumasa Sasa
Yoshio Kurita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP7580180A priority Critical patent/JPS572034A/en
Publication of JPS572034A publication Critical patent/JPS572034A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

PURPOSE:To form an image with a clear image profile and an accurate image width by using a mask image forming material having a photosensitive layer contg. an active component, a color developing component, a photosensitive resin and a coloring material showing absorption in a specified wavelength region on a transparent support. CONSTITUTION:This mask image forming material has a photosensitive layer contg. an active component such as tribromomethylphenylsulfone, a color developing component such as leucoxanthene, a photosensitive resin such as a styrene-methacrylic acid copolymer and a coloring material showing absorption in the 340-450nm wavelength region on a transparent support such as a PE film. The coloring material is added in an amount enough to provide >=1.0 optical density. The photosensitive layer is irradiated (A) with active rays of radiant light, whereby the active component is reacted with the color developing component to form a coloring compound in the irradiated part. The layer is then irradiated (B) with light not changing the active component and the resin by itself and having a wavelength region where the coloring compound shows absorption. One of the irradiations A, B is conducted imagewise, the other is carried out uniformly all over the surface to harden the imagewise irradiated part, and the imagewise unirradiated part is removed to form a mask image.
JP7580180A 1980-06-05 1980-06-05 Mask image forming material and formation of mask image Pending JPS572034A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7580180A JPS572034A (en) 1980-06-05 1980-06-05 Mask image forming material and formation of mask image

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7580180A JPS572034A (en) 1980-06-05 1980-06-05 Mask image forming material and formation of mask image

Publications (1)

Publication Number Publication Date
JPS572034A true JPS572034A (en) 1982-01-07

Family

ID=13586658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7580180A Pending JPS572034A (en) 1980-06-05 1980-06-05 Mask image forming material and formation of mask image

Country Status (1)

Country Link
JP (1) JPS572034A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166946A (en) * 1982-10-25 1984-09-20 Nippon Kankoushi Kogyo Kk Water-developable copying material
JPS59166945A (en) * 1982-10-25 1984-09-20 Nippon Kankoushi Kogyo Kk Water-developable photosensitive sheet having high light shielding property
JPS59218441A (en) * 1983-04-25 1984-12-08 Nippon Soda Co Ltd Color developing photosensitive resin composition
JPS62112574U (en) * 1986-01-09 1987-07-17
JPS6355539A (en) * 1986-05-30 1988-03-10 Toyobo Co Ltd Image forming material and image forming method
US5262247A (en) * 1989-05-17 1993-11-16 Fukuda Kinzoku Hakufun Kogyo Kabushiki Kaisha Thin copper foil for printed wiring board
WO2010109859A1 (en) * 2009-03-24 2010-09-30 太陽インキ製造株式会社 Image forming method and photocurable composition
JP2010225909A (en) * 2009-03-24 2010-10-07 Taiyo Ink Mfg Ltd Image forming method and photo-curing image, and photo-curable composition used for the method
JP2011068755A (en) * 2009-09-25 2011-04-07 Taiyo Holdings Co Ltd Photocurable composition
WO2011105011A1 (en) * 2010-02-26 2011-09-01 太陽ホールディングス株式会社 Image formation method and photosensitive composition used in said method

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59166946A (en) * 1982-10-25 1984-09-20 Nippon Kankoushi Kogyo Kk Water-developable copying material
JPS59166945A (en) * 1982-10-25 1984-09-20 Nippon Kankoushi Kogyo Kk Water-developable photosensitive sheet having high light shielding property
JPS59218441A (en) * 1983-04-25 1984-12-08 Nippon Soda Co Ltd Color developing photosensitive resin composition
JPH0352853B2 (en) * 1983-04-25 1991-08-13 Nippon Soda Co
JPS62112574U (en) * 1986-01-09 1987-07-17
JPS6355539A (en) * 1986-05-30 1988-03-10 Toyobo Co Ltd Image forming material and image forming method
US5262247A (en) * 1989-05-17 1993-11-16 Fukuda Kinzoku Hakufun Kogyo Kabushiki Kaisha Thin copper foil for printed wiring board
WO2010109859A1 (en) * 2009-03-24 2010-09-30 太陽インキ製造株式会社 Image forming method and photocurable composition
JP2010225909A (en) * 2009-03-24 2010-10-07 Taiyo Ink Mfg Ltd Image forming method and photo-curing image, and photo-curable composition used for the method
JP2011068755A (en) * 2009-09-25 2011-04-07 Taiyo Holdings Co Ltd Photocurable composition
WO2011105011A1 (en) * 2010-02-26 2011-09-01 太陽ホールディングス株式会社 Image formation method and photosensitive composition used in said method
CN102770805A (en) * 2010-02-26 2012-11-07 太阳控股株式会社 Image formation method and photosensitive composition used in said method
JPWO2011105011A1 (en) * 2010-02-26 2013-06-17 太陽ホールディングス株式会社 Image forming method and photosensitive composition used in the method
JP5916600B2 (en) * 2010-02-26 2016-05-11 太陽ホールディングス株式会社 Image forming method and photosensitive composition used in the method

Similar Documents

Publication Publication Date Title
JPS5560944A (en) Image forming method
JPS57148728A (en) Diffusing plate
JPS572034A (en) Mask image forming material and formation of mask image
DE3563481D1 (en) Improvements relating to photolithography
JPS5630129A (en) Manufacture of photomask
JPS5754939A (en) Optical mask and its manufacture
EP0517923A4 (en) Method of forming minute resist pattern
JPS54110857A (en) Optical production of sawtooth photo-sensitive resin flim
FR2322389A1 (en) Direct imaging using laser beam on evaporable particles - contained in or on polymer layer on transparent support
JPS6459302A (en) Manufacturer of plastic optical waveguide sheet
JPS55115003A (en) Production of color filter
JPS57162330A (en) Dry formation of pattern or dry removal of resist pattern
JPS5675601A (en) Plastic optical parts
JPS576839A (en) Film cassette of camera for endoscope
JPS5347825A (en) Photoresist exposure
JPS56149042A (en) Manufacture of gravure cylinder made of synthetic resin
JPS57168248A (en) Formation of image with nonsilver photoresist composition
JPS5632143A (en) Manufacture of photomask
JPS5780013A (en) Manufacture for dressed plastic plate
JPS57212445A (en) Production of photomask
JPS57186333A (en) Projecting exposure device
CN114675355A (en) Method for manufacturing visual field control device
ATE188297T1 (en) METHOD FOR PRODUCING A PLANT PRINTING FORM
JPS6465509A (en) Manufacture of microlens array
JPS5669633A (en) Production of reticle