CN114675355A - Method for manufacturing visual field control device - Google Patents
Method for manufacturing visual field control device Download PDFInfo
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- CN114675355A CN114675355A CN202210173685.4A CN202210173685A CN114675355A CN 114675355 A CN114675355 A CN 114675355A CN 202210173685 A CN202210173685 A CN 202210173685A CN 114675355 A CN114675355 A CN 114675355A
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- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000012634 optical imaging Methods 0.000 abstract description 20
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a manufacturing method of a visual field control device, which comprises the following steps: placing a first transparent substrate on a workbench surface; arranging a second substrate on the surface of the first substrate far away from the working table; a plurality of sequentially parallel and spaced mounting grooves are formed in the second base body; and filling a first light-transmitting substance or a second light-tight substance in the mounting groove. Therefore, the view field control device manufactured by the method can reduce the size of the view field angle of the optical imaging system, thereby inhibiting the generation of afterimages on two sides of the floating real image in the optical imaging system and improving the viewing experience of a user.
Description
Technical Field
The invention relates to the field of optical manufacturing, in particular to a manufacturing method of a view field control device.
Background
The flat lens is called as an equivalent negative refractive index flat lens, two layers of array optical waveguides which are periodically distributed are mutually orthogonal, so that light rays are subjected to primary total reflection in the two layers of array optical waveguides respectively, and because the flat lens is of a mutually orthogonal rectangular structure, the incident angle during the primary total reflection is the same as the emergent angle during the secondary total reflection. All the light rays within the light divergence angle of the light source can be converged into a three-dimensional space which is in plane symmetry with the flat lens after passing through the flat lens, so that a 1: 1, floating real image. Most of displays used as image sources in the market at present have large field angles close to 180-degree visual angles, and under the condition, the imaging characteristics of the flat lens are that an observer can see oblique residual images on two sides of a real image when observing a floating real image, when the positions of human eyes deviate from a normal viewing position and the deviation angles are gradually increased, the floating real image becomes more and more fuzzy, one of the residual images on the left side and the right side of the real image becomes clearer, the other one of the residual images becomes fuzzy, and the observation of the floating real image by the user can be seriously influenced by the occurrence of the residual images.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art. Therefore, an object of the present invention is to provide a method for manufacturing a visual field control device, which can reduce the size of the field angle of an optical imaging system, thereby suppressing the generation of afterimages on both sides of a floating real image in the optical imaging system and improving the viewing experience of a user.
The method for manufacturing a visual field control device according to the present invention includes: placing a first transparent substrate on a work table; arranging a second substrate on the surface of the first substrate far away from the working table top; a plurality of sequentially parallel and spaced mounting grooves are formed in the second base body; and filling a first light-transmitting substance or a second light-tight substance in the mounting groove.
According to the manufacturing method of the field control device, the field control device can be produced, and the field control device can reduce the field angle of the optical imaging system, so that the generation of residual images on two sides of a floating real image in the optical imaging system can be inhibited, and the viewing experience of a user can be improved.
In some examples of the invention, the surface of the first substrate close to the working table surface and the surface far away from the working table surface are plated with antireflection films, and the transmittance of the antireflection films is greater than 95%.
In some examples of the invention, the disposing a second substrate on the surface of the first substrate away from the work table surface comprises: the second substrate is photoresist, and the surface of the first substrate, which is far away from the worktable surface, is coated with the photoresist.
In some examples of the present invention, the providing a plurality of sequentially parallel and spaced-apart mounting grooves on the second base includes: and placing a mask plate on one side of the second base body, which is far away from the first base body, wherein the mask plate is provided with a plurality of gaps which are sequentially parallel and spaced, and irradiating light rays from one side of the mask plate, which is far away from the second base body, towards the mask plate.
In some examples of the present invention, an angle α between the light ray and a surface of the second substrate away from the first substrate satisfies a relation: alpha is more than 0 degree and less than 180 degrees.
In some examples of the present invention, after the irradiation with light is completed from the side of the mask plate away from the second substrate toward the mask plate, the exposed region of the photoresist or the non-exposed region of the photoresist is dissolved using a developing solution to form the mounting groove on the second substrate.
In some examples of the present invention, the dissolving the exposed region of the photoresist or the non-exposed region of the photoresist using a developing solution includes: and soaking the whole structure of the first substrate and the second substrate in a developing solution to dissolve the exposed area of the photoresist or the non-exposed area of the photoresist so as to form the mounting groove on the second substrate.
In some examples of the present invention, the dissolving the exposed region of the photoresist or the non-exposed region of the photoresist using a developing solution includes: and spraying a developing solution on the surface of the photoresist far away from the first substrate, so that the exposed area of the photoresist or the unexposed area of the photoresist is dissolved to form the mounting groove on the second substrate.
In some examples of the present invention, after the installation groove is filled with a first material which is light-transmissive or a second material which is not light-transmissive, the second substrate on the first substrate is removed, and a surface of the first substrate away from the working platform is filled with a third material, the third material surrounds the first material or the second material, and the third material is optionally a light-transmissive material or a light-opaque material.
In some examples of the invention, the disposing a second substrate on the surface of the first substrate away from the work table surface comprises: the second substrate is stamping glue, and the surface of the first substrate, which is far away from the working table surface, is coated with the stamping glue.
In some examples of the present invention, the providing a plurality of sequentially parallel and spaced mounting grooves on the second substrate includes: and stamping a plurality of sequentially parallel and spaced mounting grooves on the second substrate by using a stamping die.
In some examples of the present invention, after the imprinting the second substrate with the imprinting mold has a plurality of sequentially parallel and spaced-apart mounting grooves, the imprinting paste is irradiated with a UV lamp to be cured.
In some examples of the invention, the imprint pressure of the imprint template is 0.3bar to 11 bar.
In some examples of the invention, the first substrate has a thickness of 0.2mm to 4mm,
in some examples of the invention, the second substrate has a thickness of 0.1 μm to 10 μm.
In some examples of the invention, the first substrate is a flat lens.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a flowchart of a method of manufacturing a visual field control device according to an embodiment of the present invention.
FIG. 2 is a schematic view of a first substrate of a field control device according to an embodiment of the invention;
FIG. 3 is a schematic view of a first substrate coated with antireflection coating on both sides;
FIG. 4 is a schematic view of a photoresist provided on a first substrate in accordance with an embodiment of the present invention;
FIG. 5 is a schematic illustration of a masking plate according to an embodiment of the present invention;
FIG. 6 is a schematic illustration of exposure after mating of a first substrate, a photoresist and a mask blank according to an embodiment of the invention;
FIG. 7 is a schematic view showing the first substrate and the photoresist after exposure being immersed in a developing solution;
FIG. 8 is a schematic view showing a developing solution being sprayed to the photoresist after completion of the exposure;
FIG. 9 is a schematic view of filling the installation groove with a first material that is transparent or a second material that is opaque;
FIG. 10 is a schematic illustration after removal of the photoresist;
FIG. 11 is a finished schematic view of a field control device according to an embodiment of the present invention;
FIG. 12 is a schematic illustration of an embodiment of the present invention with an imprint resist disposed on a first substrate;
FIG. 13 is a schematic illustration of imprinting an imprinting paste of an embodiment of the present invention;
FIG. 14 is a schematic drawing of the mold release;
FIG. 15 is a schematic view of filling the mounting groove with a second material that is opaque to light;
fig. 16 is a schematic view of a field control device according to an embodiment of the present invention.
Reference numerals:
a first substrate 201; an antireflection film 202; a photoresist 203; a mounting groove 204; a developing solution reservoir 206; a developing solution 207; a second substance 208; a first substance 209; an imprint resist 211; an imprint mold 212; a developing solution shower head 213; a first protective sheet 301; a base 302; a light shielding portion 303; a second protective sheet 304; a mask plate 305; a field-of-view control device 306; a bar-shaped microstructure 307; a third substance 308; a second substrate 309.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
A manufacturing method of a visual field control device according to an embodiment of the present invention, which is used to produce the visual field control device 306, is described below with reference to fig. 1 to 16.
As shown in fig. 16, using the above-described manufacturing method, a visual field control device 306 can be produced, the visual field control device 306 including: the light-shielding structure includes a base 302 and a plurality of light-shielding portions 303, wherein the base 302 has light-transmitting properties, and the plurality of light-shielding portions 303 may be provided on the base 302 such that the plurality of light-shielding portions 303 are parallel to each other. Further, the plurality of light shielding portions 303 may be sequentially disposed in the left-right direction of the base 302, and at least adjacent two light shielding portions 303 of the plurality of light shielding portions 303 are spaced apart to form a light transmission region between the adjacent two light shielding portions 303. The field-of-view control device 306 may further include: the first protective sheet 301 and the second protective sheet 304 may have a first surface and a second surface opposite to each other in the thickness direction of the base 302, and the first protective sheet 301 and the second protective sheet 304 may be provided on the first surface and the second surface, respectively, wherein both the first protective sheet 301 and the second protective sheet 304 have light transmittance. It should be noted that the first protective sheet 301 and the second protective sheet 304 can protect the base 302 and the light shielding portion 303, and the first protective sheet 301 and the second protective sheet 304 can be connected with the base 302 by adhesion or can be connected with the base 302 by screwing, so as to achieve the detachable connection of the first protective sheet 301 and the second protective sheet 304 with the base 302. In this arrangement, the base 302 and the light shielding portion 303 can be protected by the first protective sheet 301 and the second protective sheet 304, and the stability of the entire structure of the visual field control device 306 can be improved to prevent the relative positions of the base 302 and the light shielding portion 303 from changing.
Further, the field control device 306 may cooperate with the flat lens and the display, the field control device 306 may be disposed on the flat lens or the display, when the field control device 306 is disposed on the flat lens, after the display emits light toward the flat lens, the light passes through the field control device 306 after passing through the flat lens, or the light passes through the flat lens after passing through the field control device 306, the field control device 306 generates a floating real image after changing the size of the field angle, thereby achieving the purpose of adjusting the size of the field angle of the optical imaging system.
As shown in fig. 1, a manufacturing method of a visual field control device according to an embodiment of the present invention includes the steps of:
and S1, placing the first light-transmitting substrate on a working table.
And S2, arranging a second substrate on the surface of the first substrate far away from the working table.
And S3, arranging a plurality of sequentially parallel and spaced mounting grooves on the second base body.
And S4, filling the mounting groove with a first light-transmitting substance or a second light-transmitting substance.
S5, after filling the mounting groove with a first light-transmitting substance or a second light-transmitting substance, removing the second substrate on the first substrate, and filling a third substance on the surface of the first substrate away from the working platform, wherein the third substance surrounds the first substance or the second substance, and the third substance can be selectively set as a light-transmitting material or a light-transmitting material.
Through steps S1 to S4, a field-of-view control device can be produced, which can reduce the field angle of the optical imaging system, thereby suppressing the generation of afterimages on both sides of the floating real image in the optical imaging system, and improving the viewing experience of the user.
By further setting step S5, the second substrate on the first substrate may be removed by using a degumming solution, and then the surface of the first substrate far from the working table is filled with a third substance. The third material can be set up to light transmission material or opaque material, can guarantee the result of use of visual field controlling means through setting up the third material, specifically, when filling non-light tight first material in the mounting groove, set up the third material into opaque material, when filling non-light tight second material in the mounting groove, set up the third material into light transmission material, when setting up the third material into opaque material, the third material is as the light-blocking portion, when setting up the third material into light transmission material, the second material is as the light-blocking portion. When the light in the optical imaging system is emitted into the view field control device, the incident light can smoothly pass through the view field control device when the incident light accords with a preset angle, and when the incident light deviates from a preset route by a certain angle, the deviated light can be absorbed or scattered by the shading part, so that the function of reducing the size of the view field angle of the optical imaging system is realized.
It should be noted that the length of the first substrate may be set to 10mm-10000mm, and the width of the first substrate may be set to 10mm-10000 mm. Alternatively, the length of the first substrate may be set to 100mm, the width of the first substrate may be set to 100mm, and the error in the uniformity of the entire thickness of the light-transmitting first substrate is less than 10 μm. The first base may be a light-transmitting substrate, and the first base may be made of a material such as glass, quartz, or a polymer such as resin, which has light-transmitting properties. The light-transmitting first substance may be made of curable epoxy resin or acrylic resin, as long as it has good light transmittance. The opaque second substance may be a black light absorbing material based on light absorption, or may be a high haze material based on light scattering, as long as it has good light shielding properties.
Wherein, pack the first material of printing opacity or the second material of adiacticity in the mounting groove and include: when the second base body is a light-tight object, filling a light-tight first substance into the mounting groove; when the second base body is a light-transmitting object, the mounting groove is filled with a non-light-transmitting second substance. The second base and the second substance which do not transmit light may form a light shielding portion, and the second base and the first substance which transmit light may form a light transmitting portion. When the light in the optical imaging system is emitted into the view field control device, the incident light can smoothly pass through the view field control device when the incident light conforms to a preset angle, and when the incident light deviates from a preset route by a certain angle, the deviated light can be absorbed or scattered by the shading part, so that the function of reducing the size of the view field angle of the optical imaging system is realized. In addition, the size of the field angle of the optical imaging system can be controlled by adjusting the size of the intervals between the plurality of light shielding portions and the height of the light shielding portions. That is, the smaller the interval between the plurality of light shielding portions is, the more light rays are shielded by the light shielding portions, and the smaller the exit angle of the light rays is, so that the smaller the angle of view of the optical imaging system is; the higher the height of the light shielding part is, the more light rays are shielded by the light shielding part, the smaller the emergent angle of the light rays is, and the smaller the angle of field of the optical imaging system is.
Therefore, the view field control device produced by the manufacturing method can reduce the size of the view field angle of the optical imaging system, thereby inhibiting the generation of residual images on two sides of a floating real image in the optical imaging system and improving the watching experience of a user.
In some embodiments of the present invention, the surface of the first substrate close to the working platform and the surface of the first substrate far from the working platform may be coated with an antireflection film, and a light transmittance of the antireflection film is set to be greater than 95%. It can be understood that the surface of the first substrate close to the working table and the surface far from the working table are two oppositely arranged surfaces, and the light transmittance of the antireflection film is more than 95%. The arrangement can increase the transmittance of the first base body, and light can conveniently penetrate through the first base body.
In some embodiments of the invention, providing a second substrate on a surface of the first substrate remote from the work surface comprises: the second substrate may be a photoresist, i.e. a photoresist is coated on the surface of the first substrate far from the working platform. After the antireflection film is plated on the surface of the first substrate close to the workbench surface and the surface of the first substrate far from the workbench surface, the second substrate is spin-coated, the second substrate may be set to be a positive photoresist, the thickness of the photoresist may be set to be 0.1 μm-10 μm, and optionally, the thickness of the photoresist may be set to be 2 μm. The arrangement can ensure that the thickness range of the photoresist is reasonably arranged, and the photoresist is convenient to further expose.
In some embodiments of the present invention, providing a plurality of sequentially parallel and spaced mounting slots on the second substrate comprises: the mask plate is placed on one side, far away from the first base body, of the second base body, the mask plate can be provided with a plurality of gaps which are sequentially parallel and spaced, the mask plate can comprise a plurality of bar-shaped microstructures, the bar-shaped microstructures are sequentially parallel, two adjacent bar-shaped microstructures are spaced to form a gap, and light rays irradiate towards the mask plate from one side, far away from the second base body, of the mask plate. The gaps of the plurality of strip-shaped microstructures are equidistantly distributed at intervals, and it can also be understood that the gaps which are sequentially parallel and spaced are the same in distance, and preferably, the material of the mask plate can be chromium metal. After the mask plate is placed, irradiating light rays towards the mask plate. It should be noted that, before the irradiation light is irradiated towards the mask plate, the second substrate is dried at a drying temperature ranging from 60 ℃ to 90 ℃ for 10min to 40 min. After the second base body is dried, light rays are used for irradiating from one side, far away from the second base body, of the mask plate towards the mask plate, and the pattern of the mask plate is etched on the second base body. In some embodiments of the present invention, an angle α between the irradiation light and a surface of the second substrate away from the first substrate satisfies the relationship: alpha is more than 0 degree and less than 180 degrees. Alternatively, α may be set to 90 ° when the light is perpendicular to the second substrate. By setting the range of alpha to 0-180 degrees, the second substrate can be reasonably exposed, so that the part of the second substrate which is not blocked by the mask plate can be exposed.
In some embodiments of the invention, after the irradiation with light from the side of the mask plate away from the second substrate toward the mask plate is completed, the exposed region of the photoresist or the non-exposed region of the photoresist is dissolved by using a developing solution to form a mounting groove on the second substrate. It should be explained that, when the photoresist is a positive photoresist, the exposed region of the photoresist is fully dissolved by using a developing solution; when the photoresist is a negative photoresist, the non-exposure area of the photoresist is fully dissolved by using the developing solution, so that the mounting groove can be formed on the second substrate.
In some embodiments of the present invention, dissolving the exposed region of the photoresist or the non-exposed region of the photoresist using a developing solution comprises: and soaking the integral structure of the first substrate and the second substrate in a developing solution to dissolve an exposed area of the positive photoresist or a non-exposed area of the negative photoresist so as to form a mounting groove in the second substrate. It can be understood that, under the condition of sufficient developing solution, the whole structure of the first substrate and the second substrate can be soaked in the developing solution by using sufficient developing solution, so that the exposed area of the positive photoresist or the non-exposed area of the negative photoresist is sufficiently dissolved, and a mounting groove can be formed on the second substrate. And taking out the first substrate and the second substrate after the development is finished, removing the residual developing solution on the surfaces of the first substrate and the second substrate by using deionized water, blow-drying the deionized water on the surfaces of the first substrate and the second substrate by using compressed air or nitrogen, and then drying the first substrate and the second substrate at the drying temperature of 90-120 ℃ for 10-40 min. Namely, the photoresist can be dissolved by using the developing solution in a soaking manner to form the mounting groove, and the second substrate can be dissolved by using the developing solution in a soaking manner to be suitable for the first substrate and the second substrate with small sizes.
In some embodiments of the present invention, dissolving the exposed region of the photoresist or the non-exposed region of the photoresist using a developing solution comprises: and spraying the developing solution on the surface of the photoresist far away from the first substrate to dissolve an exposed area of the positive photoresist or a non-exposed area of the negative photoresist so as to form a mounting groove on the second substrate. It can be understood that a small amount of developing solution can be sprayed on the surface of the photoresist far away from the first substrate to fully dissolve the exposed area of the positive photoresist or the non-exposed area of the negative photoresist, so that a mounting groove can be formed on the second substrate, the residual developing solution on the surfaces of the first substrate and the second substrate is removed by deionized water, the deionized water on the surfaces of the first substrate and the second substrate is dried by compressed air or nitrogen, then the first substrate and the second substrate are dried, the drying temperature ranges from 90 ℃ to 120 ℃, and the drying time can be set to 10min to 40 min. Namely, the photoresist can be dissolved by utilizing the developing solution in a spraying mode to form the mounting groove, and the second substrate can be dissolved by utilizing the developing solution in a spraying mode and is suitable for the large-size first substrate and the large-size second substrate.
In some embodiments of the present invention, the photoresist removing solution may be used to remove the second substrate on the first substrate, the soaking or spraying method may be used to remove the second substrate on the first substrate using the photoresist removing solution, and then the surface of the first substrate far from the working table is filled with the third substance. When the mounting groove is filled with a non-light-tight second substance, a light-tight third substance is filled on the surface of the first base body, which is far away from the worktable, and the third substance can be made of epoxy resin, acrylic resin, organic silicon gel and the like which are set to be UV cured or thermosetting; when the mounting groove is filled with a light-transmitting second substance, a light-transmitting third substance is filled on the surface of the first base body away from the workbench surface, and at this time, the third substance may be a dark light-transmitting or high-scattering substance material, such as a curable epoxy resin or an acrylic resin. Furthermore, when the second substance and the third substance are filled, the light transmission or the light opacity of the second substance and the light transmission or the light opacity of the third substance can be flexibly selected according to the chemical or physical properties of the substances, i.e. the light transmission second substance can be filled first, then the light opacity third substance is filled, or the light opacity second substance can be filled first, then the light transmission third substance is filled, finally the second substrate is ground and polished, the surface unevenness caused by the filling substances is eliminated, and the production of the visual field control device is completed.
In some embodiments of the invention, providing a second substrate on a surface of the first substrate remote from the work surface may comprise: the second substrate is stamping glue, and the surface of the first substrate, which is far away from the working table surface, is coated with the stamping glue. It should be explained that the surface of the first substrate facing away from the work surface may be spin coated or spray coated with an imprint glue, preferably the imprint glue may be provided as a photo-curable glue. The stamping glue has light transmittance, the stamping die can press a mounting groove on the stamping glue, the stamping die can be provided with a plurality of bosses which are sequentially arranged in parallel, the width range of the bosses can be set to be 1-10 mu m, the height range of the bosses can be set to be 1-10 mu m, the distance between every two adjacent bosses is 1-20 mu m, optionally, the height range of the bosses is set to be 5 mu m, and the distance between every two adjacent bosses is set to be 10 mu m, so that a reasonable stamping die can be obtained, and the second substrate can be stamped more suitably.
In some embodiments of the present invention, providing a plurality of sequentially parallel and spaced mounting grooves on the second base may include: use the impression mould impression a plurality of parallel and spaced apart mounting grooves in proper order on the second base member, a plurality of parallel and spaced apart mounting grooves interval distance between the same in proper order set up like this and can be convenient for set up the mounting groove on the second base member to visual field control device's production efficiency can be promoted.
In some embodiments of the present invention, after the imprinting mold is used to imprint a plurality of sequentially parallel and spaced-apart mounting grooves on the second substrate, the imprinting paste is irradiated with a UV lamp to cure the imprinting paste. After a plurality of sequentially parallel and spaced mounting grooves are stamped on the second substrate by using the stamping die, demolding treatment is firstly carried out to separate the stamping die from the stamping glue, then the UV lamp is used for irradiating the stamping glue to solidify the stamping glue, so that the stamping glue is fixed in shape, and then the mounting grooves are filled with a second substance. And finally, grinding and polishing the stamping surface to eliminate surface unevenness caused by filling substances, thereby finishing the manufacture of the visual field control device. This arrangement enables better curing of the imprint glue.
In some embodiments of the present invention, the imprinting pressure of the imprinting mold may be set to 0.3bar to 11 bar. It should be noted that the imprint pressure of the imprint mold may be set to any value in the range of 0.3bar to 11bar, and alternatively, the imprint pressure of the imprint mold may be set to 5 bar. The pressure value of the stamping pressure of the stamping die is set to be any value between 0.3bar and 11bar, so that the pressure value of the stamping pressure of the stamping die is reasonable, and the depth of the mounting groove stamped on the second substrate by the stamping die is appropriate.
In some embodiments of the present invention, the thickness of the first substrate may be set to 0.2mm to 4 mm. It should be noted that the thickness of the first substrate may be set to any value in the range of 0.2mm to 4mm, and alternatively, the thickness of the first substrate may be set to 3 mm. The thickness of the first base body is set to be any value between 0.2mm and 4mm, so that the thickness of the first base body is reasonable, the structural strength of the first base body is appropriate, and the transmittance of the first base body is guaranteed.
In some embodiments of the present invention, the thickness of the second substrate may be set to 0.1 μm to 10 μm. It should be noted that the thickness of the second substrate may be set to any value in the range of 0.1 μm to 10 μm, and alternatively, the thickness of the second substrate may be set to 3 μm. By setting the thickness of the second base body to any value between 0.1 μm and 10 μm, the thickness of the second base body can be made reasonable, so that it is possible to facilitate the provision of the mounting groove on the second base body.
In some embodiments of the invention, the first substrate may be provided as a flat lens. The flat lens can reduce the field angle of the optical imaging system, so that the generation of residual images on two sides of a floating real image in the optical imaging system can be inhibited, the viewing experience of a user can be improved, and the flat lens and the field control device can be integrated together by the arrangement.
In some embodiments of the present invention, as shown in fig. 1-11, a first transparent substrate 201 is placed on a work table, and then the first substrate 201 is coated with an antireflection film 202 on both sides close to the surface of the work table and far from the work table. A second substrate 309 is disposed on the surface of the first substrate 201 away from the work table, wherein the second substrate 309 may be a photoresist 203, and the photoresist 203 is a positive photoresist. Then, a plurality of sequentially parallel and spaced mounting grooves 204 are formed in the photoresist 203, a mask plate 305 is placed on one side of the photoresist 203 away from the first substrate 201, after the photoresist 203 is exposed, the exposed area of the photoresist 203 is developed through a soaking method or a spraying method to form a photoresist light-transmitting area and a photoresist light-proof area, finally, after a light-transmitting first substance 209 or a light-proof second substance 208 is filled in the mounting groove 204, a photoresist removing process is performed on the first substrate 201, namely, the photoresist 203 on the first substrate 201 is removed, a third substance 308 is filled on the surface of the first substrate 201 away from the worktable, and finally, the manufacturing of the visual field control device 306 is completed.
As shown in fig. 7, when the photoresist 203 is a positive photoresist, the specific operation flow of the immersion method is as follows: enough developing solution 207 is placed in the developing solution pool 206, so that the first substrate 201 and the photoresist 203 are completely soaked in the developing solution 207 to develop the exposed area of the photoresist 203, as shown in fig. 8, the specific operation flow of the spraying method is as follows: the developer 207 is sprayed on the first substrate 201 and the photoresist 203 by using a developer spray head 213 to develop the exposed region of the photoresist 203.
In other embodiments of the present invention, as shown in fig. 1 to 11, a light-transmissive first substrate 201 is first placed on a work table, then the anti-reflection film 202 is coated on both sides of the first substrate 201 close to the work table and far from the work table, a second substrate 309 is disposed on the surface of the first substrate 201 far from the work table, the second substrate 309 is disposed as a photoresist 203, the photoresist 203 is a negative photoresist, then a plurality of parallel and spaced mounting grooves 204 are disposed on the photoresist 203, a mask plate 305 is disposed on the side of the photoresist 203 far from the first substrate 201, after the photoresist 203 is exposed, a non-exposure region of the photoresist 203 is developed by a soaking method or a spraying method to form a photoresist light-transmissive region and a photoresist light-opaque region, and finally a light-transmissive first substance 209 or an opaque second substance 208 is filled in the mounting groove 204, the photoresist removing process is performed on the first substrate 201, that is, the photoresist 203 on the first substrate 201 is removed, and finally the field control device 306 is manufactured.
As shown in fig. 7, when the photoresist 203 is a negative photoresist, the specific operation flow of the immersion method is as follows: enough developing solution 207 is placed in the developing solution pool 206, so that the first substrate 201 and the photoresist 203 are completely soaked in the developing solution 207 to develop the non-exposure area of the photoresist 203, as shown in fig. 8, the specific operation flow of the spraying method is as follows: the developer 207 is sprayed on the first substrate 201 and the photoresist 203 by using a developer spray head 213 to develop the non-exposed region of the photoresist 203.
In other embodiments of the present invention, as shown in fig. 1 to fig. 15, a light-transmitting first substrate 201 is first placed on a work table, then the antireflection film 202 is coated on both surfaces of the first substrate 201 close to the work table and far from the work table, a second substrate 309 is disposed on the surface of the first substrate 201 far from the work table, the second substrate 309 is disposed as an imprint glue 211, then the imprint glue 211 is placed in an imprint mold 212 for imprinting, then a plurality of sequentially parallel and spaced mounting grooves 204 are imprinted on the imprint glue 211 by an imprint method, and finally the imprint glue 211 is subjected to a demolding process, so as to complete the manufacturing of the field control device 306.
In the description herein, references to the description of the term "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the present invention have been shown and described, it will be understood by those of ordinary skill in the art that: various changes, modifications, substitutions and alterations can be made to the embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the claims and their equivalents.
Claims (16)
1. A method of manufacturing a field control device, comprising:
placing a first transparent substrate on a work table;
arranging a second substrate on the surface of the first substrate far away from the working table;
a plurality of sequentially parallel and spaced mounting grooves are formed in the second base body;
and filling a first light-transmitting substance or a second light-tight substance in the mounting groove.
2. The manufacturing method of the visual field control device according to claim 1, wherein an antireflection film is coated on the surface of the first substrate close to the working table and the surface of the first substrate far from the working table, and the transmittance of the antireflection film is greater than 95%.
3. The method of manufacturing a visual field control device according to claim 1, wherein the disposing a second substrate on a surface of the first substrate remote from the work table comprises: the second substrate is photoresist, and the surface of the first substrate, which is far away from the working table surface, is coated with the photoresist.
4. The method for manufacturing a visual field control device according to claim 3, wherein the providing of a plurality of sequentially parallel and spaced mounting grooves on the second base body comprises: and placing a mask plate on one side of the second base body, which is far away from the first base body, wherein the mask plate is provided with a plurality of sequentially parallel and spaced gaps, and irradiating light from one side of the mask plate, which is far away from the second base body, towards the mask plate.
5. The method of claim 4, wherein the angle between the light ray and the surface of the second substrate far from the first substrate is α, which satisfies the following relation: alpha is more than 0 degree and less than 180 degrees.
6. The manufacturing method of the visual field control device according to claim 4, wherein after irradiation with light from a side of the mask plate away from the second substrate toward the mask plate is completed, an exposed region of the photoresist or a non-exposed region of the photoresist is dissolved with a developing solution to form the mounting groove in the second substrate.
7. The method of claim 6, wherein the dissolving the exposed region of the photoresist or the non-exposed region of the photoresist using a developer solution comprises: and soaking the whole structure of the first substrate and the second substrate in a developing solution to dissolve the exposed area of the photoresist or the non-exposed area of the photoresist so as to form the mounting groove on the second substrate.
8. The method of claim 6, wherein dissolving the exposed region of the photoresist or the non-exposed region of the photoresist using a developer comprises: and spraying a developing solution on the surface of the photoresist far away from the first substrate, so that the exposed area of the photoresist or the unexposed area of the photoresist is dissolved to form the mounting groove on the second substrate.
9. The method of claim 3, wherein the mounting groove is filled with a first material that is transparent to light or a second material that is opaque to light, the second substrate is removed from the first substrate, and a third material is filled on a surface of the first substrate away from the working platform, the third material surrounding the first material or the second material, and the third material is optionally transparent to light or opaque to light.
10. The method for manufacturing a visual field control device according to claim 1, wherein the step of providing a second substrate on a surface of the first substrate away from the work table comprises: the second substrate is stamping glue, and the surface of the first substrate, which is far away from the working table surface, is coated with the stamping glue.
11. The method of claim 9, wherein the providing a plurality of sequential parallel and spaced-apart mounting slots on the second substrate comprises: and stamping a plurality of sequentially parallel and spaced mounting grooves on the second substrate by using a stamping die.
12. The method of claim 11, wherein after the second substrate is imprinted with the imprinting mold to form a plurality of sequentially parallel and spaced-apart mounting grooves, the imprinting paste is irradiated with a UV lamp to cure the imprinting paste.
13. The manufacturing method of the visual field control device according to claim 11, wherein an imprint pressure of the imprint mold is 0.3bar to 11 bar.
14. The manufacturing method of a visual field control device according to claim 1, wherein the thickness of the first base is 0.2mm to 4 mm.
15. The manufacturing method of the visual field control device according to claim 1, wherein the thickness of the second substrate is 0.1 μm to 10 μm.
16. The manufacturing method of a visual field control device according to any one of claims 1 to 15, wherein the first substrate is a flat lens.
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